FR2281996A1 - Control unit for thin film deposition - uses optical system with light source and photo-receivers for reflected and transmitted light fractions - Google Patents

Control unit for thin film deposition - uses optical system with light source and photo-receivers for reflected and transmitted light fractions

Info

Publication number
FR2281996A1
FR2281996A1 FR7525071A FR7525071A FR2281996A1 FR 2281996 A1 FR2281996 A1 FR 2281996A1 FR 7525071 A FR7525071 A FR 7525071A FR 7525071 A FR7525071 A FR 7525071A FR 2281996 A1 FR2281996 A1 FR 2281996A1
Authority
FR
France
Prior art keywords
photo
receivers
light source
reflected
control unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7525071A
Other languages
French (fr)
Other versions
FR2281996B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers und Leybold Deutschland Holding AG
Original Assignee
Leybold Heraeus GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Heraeus GmbH filed Critical Leybold Heraeus GmbH
Publication of FR2281996A1 publication Critical patent/FR2281996A1/en
Application granted granted Critical
Publication of FR2281996B1 publication Critical patent/FR2281996B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
    • C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

The apparatus comprises a number of optical lenses (10). Supported by a holder with a segmented cap structure with a rod to adjust the height (14), the rod being attached to the support at the lower end and passing through a bush at the top. Beneath the lens system is a light source (40) and a photo-receiver (42) which receives the reflected component (41a), and above the lens system a photo-receiver (43) which receives the transmitted component. The receivers have connecting leads (44, 45) to a differential quotient former and an amplifier, connected to a logic circuit and servo unit for automatic control.
FR7525071A 1974-08-14 1975-08-12 Control unit for thin film deposition - uses optical system with light source and photo-receivers for reflected and transmitted light fractions Granted FR2281996A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742438963 DE2438963A1 (en) 1974-08-14 1974-08-14 PROCESS AND ARRANGEMENT FOR REGULATING THE STRUCTURE OF THE LAYER IN THE PRODUCTION OF OPTICALLY EFFECTIVE THIN LAYERS

Publications (2)

Publication Number Publication Date
FR2281996A1 true FR2281996A1 (en) 1976-03-12
FR2281996B1 FR2281996B1 (en) 1979-04-27

Family

ID=5923159

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7525071A Granted FR2281996A1 (en) 1974-08-14 1975-08-12 Control unit for thin film deposition - uses optical system with light source and photo-receivers for reflected and transmitted light fractions

Country Status (3)

Country Link
JP (1) JPS5145683A (en)
DE (1) DE2438963A1 (en)
FR (1) FR2281996A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2816714A1 (en) * 2000-11-16 2002-05-17 Shakticom Optical filter thin layer deposition method having thin deposition layers several substrates deposited and luminous beams produced optically controlling substrate thickness
WO2006094647A1 (en) * 2005-03-09 2006-09-14 Leybold Optics Gmbh Measuring arrangement for the optical monitoring of coating processes

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5852475A (en) * 1981-09-24 1983-03-28 Ulvac Corp Method and device for monitoring and measuring thin film in thin film former

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NEANT *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2816714A1 (en) * 2000-11-16 2002-05-17 Shakticom Optical filter thin layer deposition method having thin deposition layers several substrates deposited and luminous beams produced optically controlling substrate thickness
WO2002040737A1 (en) * 2000-11-16 2002-05-23 Highwave Optical Technologies Marseille Method and device for depositing thin films
US6620249B2 (en) 2000-11-16 2003-09-16 Highwave Optical Technologies Method and apparatus for depositing thin layers
WO2006094647A1 (en) * 2005-03-09 2006-09-14 Leybold Optics Gmbh Measuring arrangement for the optical monitoring of coating processes
US8184302B2 (en) 2005-03-09 2012-05-22 Leybold Optics Gmbh Measuring system for optical monitoring of coating processes

Also Published As

Publication number Publication date
FR2281996B1 (en) 1979-04-27
DE2438963A1 (en) 1976-02-26
JPS5145683A (en) 1976-04-19

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Legal Events

Date Code Title Description
ST Notification of lapse