FR2281996B1 - - Google Patents
Info
- Publication number
- FR2281996B1 FR2281996B1 FR7525071A FR7525071A FR2281996B1 FR 2281996 B1 FR2281996 B1 FR 2281996B1 FR 7525071 A FR7525071 A FR 7525071A FR 7525071 A FR7525071 A FR 7525071A FR 2281996 B1 FR2281996 B1 FR 2281996B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19742438963 DE2438963A1 (en) | 1974-08-14 | 1974-08-14 | PROCESS AND ARRANGEMENT FOR REGULATING THE STRUCTURE OF THE LAYER IN THE PRODUCTION OF OPTICALLY EFFECTIVE THIN LAYERS |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2281996A1 FR2281996A1 (en) | 1976-03-12 |
FR2281996B1 true FR2281996B1 (en) | 1979-04-27 |
Family
ID=5923159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7525071A Granted FR2281996A1 (en) | 1974-08-14 | 1975-08-12 | Control unit for thin film deposition - uses optical system with light source and photo-receivers for reflected and transmitted light fractions |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5145683A (en) |
DE (1) | DE2438963A1 (en) |
FR (1) | FR2281996A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5852475A (en) * | 1981-09-24 | 1983-03-28 | Ulvac Corp | Method and device for monitoring and measuring thin film in thin film former |
FR2816714B1 (en) * | 2000-11-16 | 2003-10-10 | Shakticom | METHOD AND DEVICE FOR DEPOSITING THIN FILMS |
DE102005010681B4 (en) * | 2005-03-09 | 2016-05-04 | Leybold Optics Gmbh | Measuring arrangement for optical monitoring of coating processes |
-
1974
- 1974-08-14 DE DE19742438963 patent/DE2438963A1/en not_active Withdrawn
-
1975
- 1975-08-12 FR FR7525071A patent/FR2281996A1/en active Granted
- 1975-08-14 JP JP9904075A patent/JPS5145683A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2281996A1 (en) | 1976-03-12 |
DE2438963A1 (en) | 1976-02-26 |
JPS5145683A (en) | 1976-04-19 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |