GB1275672A - Improvements in or relating to copying apparatus and methods of copying - Google Patents
Improvements in or relating to copying apparatus and methods of copyingInfo
- Publication number
- GB1275672A GB1275672A GB1086969A GB1086969A GB1275672A GB 1275672 A GB1275672 A GB 1275672A GB 1086969 A GB1086969 A GB 1086969A GB 1086969 A GB1086969 A GB 1086969A GB 1275672 A GB1275672 A GB 1275672A
- Authority
- GB
- United Kingdom
- Prior art keywords
- slice
- light
- mask
- aligned
- mark
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
1275672 Photo-electric positioning RANK ORGANISATION Ltd 27 Feb 1970 [28 Feb 1969] 10869/69 Heading G1A [Also in Divisions G2 and G3] In a method and apparatus for reproducing a pattern from one planar element, e.g. a master mask 106, on to a first surface of a second planar element e.g. a silicon slice 101, using a collimated beam of light from a source 110, a photoelectric detector 109 is used to sense fiducial marks on the two elements, the mark on the slice 101 being underneath or within the slice, and, if the marks are not correctly aligned, error signals from the germanium detector 109 cause at least one of the elements to be displaced in its own plane. Sequence of operations. A glass plate (not shown) is introduced into the optical path, the mask 106 being removed, and a tungsten filament light source 102 is used to illuminate the mark on the slice 101 by means of fibre optic light guides 103, 104. The slice is transparent to light from the lamp 102. The sensitive area of the photodetector is aligned with the mark image by changes in orientation of a refracting block (not shown) placed between the slice and the detector. The glass plate is then replaced by a mask 106 of equal optical thickness. Misalignment of the fiducial marks causes an error signal which controls correcting servomotors. When aligned, a photoresist layer on the slice is exposed to ultraviolet light from the source 110.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1086969A GB1275672A (en) | 1969-02-28 | 1969-02-28 | Improvements in or relating to copying apparatus and methods of copying |
DE19702005982 DE2005982A1 (en) | 1969-02-28 | 1970-02-10 | Method and device for generating a mask image on a flat surface, in particular a semiconductor arrangement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1086969A GB1275672A (en) | 1969-02-28 | 1969-02-28 | Improvements in or relating to copying apparatus and methods of copying |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1275672A true GB1275672A (en) | 1972-05-24 |
Family
ID=9975814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB1086969A Expired GB1275672A (en) | 1969-02-28 | 1969-02-28 | Improvements in or relating to copying apparatus and methods of copying |
Country Status (2)
Country | Link |
---|---|
DE (1) | DE2005982A1 (en) |
GB (1) | GB1275672A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2123980A (en) * | 1981-12-15 | 1984-02-08 | Canon Kk | Aligning photomask with wafer |
-
1969
- 1969-02-28 GB GB1086969A patent/GB1275672A/en not_active Expired
-
1970
- 1970-02-10 DE DE19702005982 patent/DE2005982A1/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2123980A (en) * | 1981-12-15 | 1984-02-08 | Canon Kk | Aligning photomask with wafer |
Also Published As
Publication number | Publication date |
---|---|
DE2005982A1 (en) | 1970-09-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PS | Patent sealed | ||
PLNP | Patent lapsed through nonpayment of renewal fees |