GB1275672A - Improvements in or relating to copying apparatus and methods of copying - Google Patents

Improvements in or relating to copying apparatus and methods of copying

Info

Publication number
GB1275672A
GB1275672A GB1086969A GB1086969A GB1275672A GB 1275672 A GB1275672 A GB 1275672A GB 1086969 A GB1086969 A GB 1086969A GB 1086969 A GB1086969 A GB 1086969A GB 1275672 A GB1275672 A GB 1275672A
Authority
GB
United Kingdom
Prior art keywords
slice
light
mask
aligned
mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1086969A
Inventor
Douglas Favel Horne
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rank Organization Ltd
Original Assignee
Rank Organization Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rank Organization Ltd filed Critical Rank Organization Ltd
Priority to GB1086969A priority Critical patent/GB1275672A/en
Priority to DE19702005982 priority patent/DE2005982A1/en
Publication of GB1275672A publication Critical patent/GB1275672A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

1275672 Photo-electric positioning RANK ORGANISATION Ltd 27 Feb 1970 [28 Feb 1969] 10869/69 Heading G1A [Also in Divisions G2 and G3] In a method and apparatus for reproducing a pattern from one planar element, e.g. a master mask 106, on to a first surface of a second planar element e.g. a silicon slice 101, using a collimated beam of light from a source 110, a photoelectric detector 109 is used to sense fiducial marks on the two elements, the mark on the slice 101 being underneath or within the slice, and, if the marks are not correctly aligned, error signals from the germanium detector 109 cause at least one of the elements to be displaced in its own plane. Sequence of operations. A glass plate (not shown) is introduced into the optical path, the mask 106 being removed, and a tungsten filament light source 102 is used to illuminate the mark on the slice 101 by means of fibre optic light guides 103, 104. The slice is transparent to light from the lamp 102. The sensitive area of the photodetector is aligned with the mark image by changes in orientation of a refracting block (not shown) placed between the slice and the detector. The glass plate is then replaced by a mask 106 of equal optical thickness. Misalignment of the fiducial marks causes an error signal which controls correcting servomotors. When aligned, a photoresist layer on the slice is exposed to ultraviolet light from the source 110.
GB1086969A 1969-02-28 1969-02-28 Improvements in or relating to copying apparatus and methods of copying Expired GB1275672A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
GB1086969A GB1275672A (en) 1969-02-28 1969-02-28 Improvements in or relating to copying apparatus and methods of copying
DE19702005982 DE2005982A1 (en) 1969-02-28 1970-02-10 Method and device for generating a mask image on a flat surface, in particular a semiconductor arrangement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB1086969A GB1275672A (en) 1969-02-28 1969-02-28 Improvements in or relating to copying apparatus and methods of copying

Publications (1)

Publication Number Publication Date
GB1275672A true GB1275672A (en) 1972-05-24

Family

ID=9975814

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1086969A Expired GB1275672A (en) 1969-02-28 1969-02-28 Improvements in or relating to copying apparatus and methods of copying

Country Status (2)

Country Link
DE (1) DE2005982A1 (en)
GB (1) GB1275672A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2123980A (en) * 1981-12-15 1984-02-08 Canon Kk Aligning photomask with wafer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2123980A (en) * 1981-12-15 1984-02-08 Canon Kk Aligning photomask with wafer

Also Published As

Publication number Publication date
DE2005982A1 (en) 1970-09-24

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees