FI991160A - Menetelmä ja laitteisto puolijohdeteollisuuden työvälineiden pesemisek si - Google Patents
Menetelmä ja laitteisto puolijohdeteollisuuden työvälineiden pesemisek si Download PDFInfo
- Publication number
- FI991160A FI991160A FI991160A FI991160A FI991160A FI 991160 A FI991160 A FI 991160A FI 991160 A FI991160 A FI 991160A FI 991160 A FI991160 A FI 991160A FI 991160 A FI991160 A FI 991160A
- Authority
- FI
- Finland
- Prior art keywords
- semiconductor industry
- washing utensils
- utensils
- washing
- industry
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI991160A FI113750B (fi) | 1999-05-21 | 1999-05-21 | Menetelmä ja laitteisto puolijohdeteollisuuden työvälineiden pesemiseksi |
GB0012086A GB2351436B (en) | 1999-05-21 | 2000-05-18 | The cleaning of instruments used in the semiconductor industry using a flammable solvent |
IE2000/0384A IE83509B1 (en) | 2000-05-18 | The cleaning of instruments used in the semiconductor industry using a flammable solvent | |
DE10024870A DE10024870A1 (de) | 1999-05-21 | 2000-05-19 | Verfahren und Einrichtung zum Waschen von Arbeitsgeräten der Halbleiterindustrie |
US09/575,614 US6620258B1 (en) | 1999-05-21 | 2000-05-22 | Method for washing instruments used in semiconductor industry |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI991160 | 1999-05-21 | ||
FI991160A FI113750B (fi) | 1999-05-21 | 1999-05-21 | Menetelmä ja laitteisto puolijohdeteollisuuden työvälineiden pesemiseksi |
Publications (3)
Publication Number | Publication Date |
---|---|
FI991160A0 FI991160A0 (fi) | 1999-05-21 |
FI991160A true FI991160A (fi) | 2000-11-22 |
FI113750B FI113750B (fi) | 2004-06-15 |
Family
ID=8554708
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI991160A FI113750B (fi) | 1999-05-21 | 1999-05-21 | Menetelmä ja laitteisto puolijohdeteollisuuden työvälineiden pesemiseksi |
Country Status (4)
Country | Link |
---|---|
US (1) | US6620258B1 (fi) |
DE (1) | DE10024870A1 (fi) |
FI (1) | FI113750B (fi) |
GB (1) | GB2351436B (fi) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7819981B2 (en) | 2004-10-26 | 2010-10-26 | Advanced Technology Materials, Inc. | Methods for cleaning ion implanter components |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE235548C (fi) | ||||
DE3145815C2 (de) | 1981-11-19 | 1984-08-09 | AGA Gas GmbH, 2102 Hamburg | Verfahren zum Entfernen von ablösungsfähigen Materialschichten von beschichteten Gegenständen, |
DE3804694A1 (de) | 1987-06-23 | 1989-01-05 | Taiyo Sanso Co Ltd | Verfahren zur oberflaechenbearbeitung fuer halbleiter-wafer und vorrichtung zur durchfuehrung des verfahrens |
US5168886A (en) * | 1988-05-25 | 1992-12-08 | Semitool, Inc. | Single wafer processor |
CA2003859A1 (en) * | 1989-02-01 | 1990-08-01 | David Alan Dickinson | Technique for cleaning an object with a combustible cleaning solvent |
CA2011397C (en) * | 1989-03-06 | 1994-07-12 | Michael T. Mittag | Method and apparatus for cleaning electronic and other devices |
US5027841A (en) * | 1990-04-24 | 1991-07-02 | Electronic Controls Design, Inc. | Apparatus to clean printed circuit boards |
US5593507A (en) | 1990-08-22 | 1997-01-14 | Kabushiki Kaisha Toshiba | Cleaning method and cleaning apparatus |
US5201960A (en) | 1991-02-04 | 1993-04-13 | Applied Photonics Research, Inc. | Method for removing photoresist and other adherent materials from substrates |
FI97920C (fi) | 1991-02-27 | 1997-03-10 | Okmetic Oy | Tapa puhdistaa puolijohdevalmiste |
US5486235A (en) | 1993-08-09 | 1996-01-23 | Applied Materials, Inc. | Plasma dry cleaning of semiconductor processing chambers |
US5863348A (en) * | 1993-12-22 | 1999-01-26 | International Business Machines Corporation | Programmable method for cleaning semiconductor elements |
US5599743A (en) | 1994-04-07 | 1997-02-04 | Matsushita Electronics Corporation | Method of manufacturing a semiconductor device |
US5454390A (en) | 1994-05-16 | 1995-10-03 | International Business Machines Corporation | Vapor rinse-vapor dry process tool |
US5711821A (en) * | 1995-04-13 | 1998-01-27 | Texas Instruments Incorporated | Cleansing process for wafer handling implements |
US5839455A (en) * | 1995-04-13 | 1998-11-24 | Texas Instruments Incorporated | Enhanced high pressure cleansing system for wafer handling implements |
US5715612A (en) | 1995-08-17 | 1998-02-10 | Schwenkler; Robert S. | Method for precision drying surfaces |
-
1999
- 1999-05-21 FI FI991160A patent/FI113750B/fi not_active IP Right Cessation
-
2000
- 2000-05-18 GB GB0012086A patent/GB2351436B/en not_active Expired - Fee Related
- 2000-05-19 DE DE10024870A patent/DE10024870A1/de not_active Ceased
- 2000-05-22 US US09/575,614 patent/US6620258B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
GB2351436A (en) | 2001-01-03 |
FI113750B (fi) | 2004-06-15 |
GB2351436B (en) | 2003-07-02 |
IE20000384A1 (en) | 2001-02-21 |
FI991160A0 (fi) | 1999-05-21 |
DE10024870A1 (de) | 2000-12-07 |
US6620258B1 (en) | 2003-09-16 |
GB0012086D0 (en) | 2000-07-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MA | Patent expired |