EP3281742B1 - Polierverfahren - Google Patents

Polierverfahren Download PDF

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Publication number
EP3281742B1
EP3281742B1 EP16776120.4A EP16776120A EP3281742B1 EP 3281742 B1 EP3281742 B1 EP 3281742B1 EP 16776120 A EP16776120 A EP 16776120A EP 3281742 B1 EP3281742 B1 EP 3281742B1
Authority
EP
European Patent Office
Prior art keywords
polishing
ceramic tile
water
decorative surface
polished ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
EP16776120.4A
Other languages
English (en)
French (fr)
Other versions
EP3281742A4 (de
EP3281742A1 (de
Inventor
Jinghao FENG
Xianjun SONG
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Eding Industrial Co Ltd
Original Assignee
Guangdong Eding Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Eding Industrial Co Ltd filed Critical Guangdong Eding Industrial Co Ltd
Publication of EP3281742A1 publication Critical patent/EP3281742A1/de
Publication of EP3281742A4 publication Critical patent/EP3281742A4/de
Application granted granted Critical
Publication of EP3281742B1 publication Critical patent/EP3281742B1/de
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Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/06—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving conveyor belts, a sequence of travelling work-tables or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • B24B41/068—Table-like supports for panels, sheets or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/06—Dust extraction equipment on grinding or polishing machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain

Definitions

  • the present invention relates to a polishing method.
  • a surface to be processed of the workpiece is oriented upward, and a polishing and grinding device is used to polish and grind the surface to be processed; for example, a polished ceramic tile comprises a rough back face and a smooth surface (the rough back face is a tiling surface, and the smooth surface is a decorative surface), and the polishing process needs to be performed on the decorative surface.
  • the polished ceramic tile blank 40 is firstly placed on a horizontal conveying belt 1 so that a decorative surface 41 of the polished ceramic tile blank 40 faces upward, that is to say, the tiling surface of the polished ceramic tile blank 40 is oriented toward the ground.
  • a plurality of polishing grinders 2 are arranged above the conveying belt 1 along a conveying direction of the conveying belt.
  • the polished ceramic tile blank 40 continuously moves along the conveying belt 1, and each polishing grinder 2 polishes the polished ceramic tile blank 40 from above.
  • the polished ceramic tile is generally a blank before polishing, and therefore, in the art, the polished ceramic tile before polishing is also referred to as a polished ceramic tile blank.
  • the polishing grinders 2 grind the decorative surface 41 of the polished ceramic tile blank 40, which can generate a large number of grinding debris 42 in the shape of micro particles. These debris 42 are left on the decorative surface 41 and are rotated along with the polishing grinder 2 at a high speed, which will scratch the decorative surface 41 and seriously affect the polishing effect. At the same time, since there is a layer of debris 42 between the polishing grinders 2 and the decorative surface 41, the contact rate between the polishing grinders 2 and the decorative surface 41 is reduced, thereby seriously affecting the polishing efficiency.
  • a traditional method is to spray a great amount of water on the surface to be processed so as to wash the debris off.
  • Such a polishing method is for instance known from CN-A-104 128 867 which shows a ceramic tile being conveyed on a conveyor belt and polished by polishing devices placed above the ceramic tile. Water is applied to the upper surface being polished by means of a water supply device.
  • an objective of the present invention is to provide a polishing method, which can effectively prevent the debris from being left on a surface to be processed of a ceramic tile, and simplify the polishing process of the ceramic tile.
  • the present invention provides a polishing method according to Claim 1.
  • the water applying device is a water spraying mechanism which sprays water onto the surface to be processed from below during polishing.
  • the mechanism pressurizes and atomizes the water and sprays the atomized water onto the surface to be processed.
  • the polishing device comprises at least one polishing grinder driven by a first drive mechanism.
  • the plurality of polishing grinders is provided below the surface to be processed of the ceramic tile and are arranged at intervals along a conveying direction of the conveying mechanism.
  • the conveying mechanism comprises a belt driven by a second driving mechanism and a support beam provided in an annular region of the belt, and the extending direction of the support beam is identical to the conveying direction of the belt.
  • the polishing method of the present invention enables the surface to be processed of the ceramic tile to be oriented toward the ground when the ceramic tile is polished and ground, and the polishing device is used to polish the surface to be processed from below the ceramic tile, so that the grinding debris generated during polishing can drop down by means of its self weight. Therefore, the polishing method of the present invention can effectively prevent the grinding debris from being left on the surface to be processed of the Z ceramic tile, thereby improving the polishing efficiency and the polishing effect.
  • Figs. 3 and 4 show a polishing method in the present invention, which is used for polishing a polished ceramic tile blank.
  • the method uses a conveying mechanism to convey a polished ceramic tile blank along a predetermined track.
  • a decorative surface 41 of the polished ceramic tile blank 40 (the decorative surface 41 being a smoother surface of the polished ceramic tile blank 40, and the decorative surface 41 being a surface to be processed of the polished ceramic tile blank 40) is oriented toward the ground 50.
  • the polishing device is used to polish the decorative surface 41 of the polished ceramic tile blank under the polished ceramic tile blank.
  • the above-mentioned method enables the decorative surface 41 of the polished ceramic tile blank 40 to be oriented downward, that is to say, the decorative surface 41 faces toward the ground 50.
  • the grinding debris produced during the polishing process will drop down by means of its self weight so as to effectively prevent the debris from being left on the decorative surface 41 of the polished ceramic tile blank 40, avoid the influence of the grinding on the polishing effect, and at the same time improve the polishing efficiency.
  • the above-mentioned polishing device of the present invention can be a polishing grinder 30 used for polishing a polished ceramic tile blank, which will not be described herein.
  • a spraying mechanism is used to spray water onto the decorative surface 41 of the polished ceramic tile blank from below.
  • a high pressure pump is provided in the water spraying mechanism, and at the same time, an atomizing spray nozzle is provided at a water spray port of the water spraying mechanism. With the high pressure pump and the atomizing spray nozzle, the water can be sprayed onto the decorative surface 41 of the polished ceramic tile blank after atomization under a high pressure.
  • the above-mentioned method can use at least one polishing grinder 30 to polish the polished ceramic tile blank 40, and the polishing grinder 30 is driven by the first driving mechanism.
  • the first driving mechanism can be driven by an electric motor or another similar driving mechanism other than an electric motor.
  • the plurality of polishing grinders 30 is all provided below the conveying mechanism, and the plurality of polishing grinders 30 is arranged at intervals along the conveying direction of the conveying mechanism, such that during polishing, a plurality of polished ceramic tile blanks can be conveyed successively by the conveying mechanism, and each of the polished ceramic tile blanks is successively ground by the plurality of polishing grinders 30 so as to reach the polishing level for the surface of polished ceramic tile.
  • the plurality of polishing grinders 30 can be arranged at either equal or different intervals.
  • each polishing grinder 30 can be respectively driven by one first driving mechanism, or the plurality of polishing grinders 30 can be driven by one first driving mechanism altogether.
  • each of the above-mentioned polishing grinders 30 can be considered as one polishing station in which water can be sprayed onto the decorative surface 41 of the polished ceramic tile blank located at the polishing station.
  • the above-mentioned water spraying mechanism can be provided with a plurality of water spray ports.
  • the plurality of water spray ports can share one water supply channel or can be respectively provided with one individual water supply channel.
  • the plurality of water spray ports is provided in the middle of the plurality of polishing grinders 30 in a one-to-one corresponding manner, so that water is supplied for polishing the polished ceramic tile blank in the middle of the polishing grinders 30.
  • the above-mentioned high pressure pump and atomizing spray nozzle can enable the sprayed water to be evenly distributed on the decorative surface 41 of the polished ceramic tile blank and to cover the decorative surface 41 of the polished ceramic tile blank as much as possible.
  • the above-mentioned method of the present invention enables the decorative surface 41 of the polished ceramic tile blank 40 to be oriented toward the ground 50 when the polished ceramic tile blank 40 is polished and ground, that is to say, the tiling surface of the polished ceramic tile blank 40 which has a higher water absorption is located above the polishing grinders 30 and the water spray port of the water spraying mechanism.
  • the decorative surface 41 of the polished ceramic tile blank 40 separates the titling surface of the polished ceramic tile blank 40 from the water spray port of the water spraying mechanism. Since the water absorption of the decorative surface 41 is very low, the great amount of water dripping from the periphery of the polished ceramic tile blank after being blocked by the decorative surface 41 will not enter the tiling surface of the polished ceramic tile blank 40.
  • the above-mentioned polishing method of the present invention greatly lowers the amount of absorbed water of the polished ceramic tile blank during the polishing. Therefore, for the polished ceramic tiles with a high water absorption, there is no need to perform a subsequent drying steps after the polishing is completed by using the above-mentioned polishing method.
  • the method of the present invention is not limited only to supply water to the surface of the polished ceramic tile blank by spraying as mentioned above. During the polishing, other water supply devices can also be used in place of the above-mentioned water spraying mechanism to supply water to the decorative surface 41 of the polished ceramic tile blank.
  • a roller made of water-absorbing cotton can be provided below the polished ceramic tile blank, and during polishing, the roller is squeezed to apply the water inside the roller onto the decorative surface 41 of the polished ceramic tile blank from below.
  • a water supply mechanism can be used to continuously supply water to the inside of the roller for supplementing the water content in the roller.
  • the conveying mechanism in the above-mentioned method of the present invention comprises the belt 10 driven by the second driving mechanism and the support roller located below the belt 10.
  • the belt 10 is used to drive the movement of the polished ceramic tile blank 40.
  • the polished ceramic tile blank 40 is clamped between a lower surface of the belt 10 and top end sides of the polishing grinders 30 when the polished ceramic tile blank is being conveyed.
  • the polished ceramic tile blank 40 is also clamped between the lower surface of the belt 10 and the support roller. After the polished ceramic tile blank 40 is tightly clamped, there is a large frictional force between an upper surface of the polished ceramic tile blank 40 which has a certain roughness and the lower surface of the belt 10. The frictional force drives the polished ceramic tile blank 40 to move horizontally.
  • a support beam 20 can also be provided in an annular region of the belt 10. The extending direction of the support beam 20 is identical to the conveying direction of the beam 10.
  • the second driving mechanism can be driven by an electric motor or another similar driving mechanism other than an electric motor.
  • the present invention can also use a conveying mechanism other than the above-mentioned belt conveying device so as to realize the conveyance of the polished ceramic tile blank, as long as it is ensured that the decorative surface 41 of the polished ceramic tile blank can be oriented downward and a pressure which satisfies a polishing requirement can be provided between the polishing grinders and the polished ceramic tile blank.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Devices For Post-Treatments, Processing, Supply, Discharge, And Other Processes (AREA)

Claims (5)

  1. Polierverfahren, worin
    ein Fördermechanismus (10) verwendet wird, um eine Keramikfliese (40) zu fördern, eine Dekorfläche (41) der Keramikfliese in Richtung auf den Boden gerichtet ist, und eine Poliervorrichtung (30) unter der Dekorfläche (41) verwendet wird, um die Dekorfläche (41) zu polieren;
    während des Polierens eine Wasserbeaufschlagungsvorrichtung verwendet wird, um die Dekorfläche (41) von unten mit Wasser zu beaufschlagen.
  2. Polierverfahren nach Anspruch 1, dadurch gekennzeichnet, dass die Wasserbeaufschlagungsvorrichtung ein Wassersprühmechanismus ist, der Wasser auf die Dekorfläche von unten während des Polierens sprüht, und während des Sprühens der Wassersprühmechanismus das Wasser unter Druck setzt und zerstäubt und das zerstäubte Wasser auf die Dekorfläche sprüht.
  3. Polierverfahren nach Anspruch 1, dadurch gekennzeichnet, dass die Poliervorrichtung zumindest einen Polierschleifapparat umfasst, der von einem ersten Antriebsmechanismus angetrieben wird.
  4. Polierverfahren nach Anspruch 3, dadurch gekennzeichnet, dass es eine Vielzahl von Polierschleifapparaten gibt, wobei die Vielzahl von Polierschleifapparaten unter der Dekorfläche der Keramikfliese vorgesehen ist und sie in Abständen entlang einer Förderrichtung des Fördermechanismus angeordnet sind.
  5. Polierverfahren nach Anspruch 1, dadurch gekennzeichnet, dass der Fördermechanismus ein Band umfasst, das von einem zweiten Antriebsmechanismus angetrieben wird, ein Stützbalken in einem ringförmigen Bereich des Bandes vorgesehen ist, und die Erstreckungsrichtung des Stützbalkens mit der Förderrichtung des Bandes identisch ist.
EP16776120.4A 2015-04-08 2016-04-07 Polierverfahren Active EP3281742B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201510166326.6A CN104759958B (zh) 2015-04-08 2015-04-08 一种抛光方法
PCT/CN2016/078680 WO2016161945A1 (zh) 2015-04-08 2016-04-07 一种抛光方法

Publications (3)

Publication Number Publication Date
EP3281742A1 EP3281742A1 (de) 2018-02-14
EP3281742A4 EP3281742A4 (de) 2018-12-19
EP3281742B1 true EP3281742B1 (de) 2021-03-24

Family

ID=53642223

Family Applications (1)

Application Number Title Priority Date Filing Date
EP16776120.4A Active EP3281742B1 (de) 2015-04-08 2016-04-07 Polierverfahren

Country Status (5)

Country Link
EP (1) EP3281742B1 (de)
CN (1) CN104759958B (de)
BR (1) BR112017012252B1 (de)
ES (1) ES2877434T3 (de)
WO (1) WO2016161945A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104759958B (zh) * 2015-04-08 2016-11-30 广东一鼎科技有限公司 一种抛光方法
CN105312969B (zh) * 2015-10-26 2018-01-16 广东科达洁能股份有限公司 一种陶瓷砖表面处理方法及陶瓷砖表面处理设备
KR102565411B1 (ko) * 2018-06-22 2023-08-10 삼성디스플레이 주식회사 기판 연마 장치
CN110253431A (zh) * 2019-07-08 2019-09-20 佛山科学技术学院 一种水雾降温反置式瓷砖抛光磨头及瓷砖抛光方法

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Also Published As

Publication number Publication date
BR112017012252B1 (pt) 2021-12-28
EP3281742A4 (de) 2018-12-19
WO2016161945A1 (zh) 2016-10-13
CN104759958A (zh) 2015-07-08
EP3281742A1 (de) 2018-02-14
BR112017012252A2 (pt) 2018-01-30
ES2877434T3 (es) 2021-11-16
CN104759958B (zh) 2016-11-30

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