WO2016161945A1 - 一种抛光方法 - Google Patents

一种抛光方法 Download PDF

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Publication number
WO2016161945A1
WO2016161945A1 PCT/CN2016/078680 CN2016078680W WO2016161945A1 WO 2016161945 A1 WO2016161945 A1 WO 2016161945A1 CN 2016078680 W CN2016078680 W CN 2016078680W WO 2016161945 A1 WO2016161945 A1 WO 2016161945A1
Authority
WO
WIPO (PCT)
Prior art keywords
polishing
water
ceramic
workpiece
belt
Prior art date
Application number
PCT/CN2016/078680
Other languages
English (en)
French (fr)
Chinese (zh)
Inventor
冯竞浩
宋宪君
Original Assignee
广东一鼎科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 广东一鼎科技有限公司 filed Critical 广东一鼎科技有限公司
Priority to BR112017012252-9A priority Critical patent/BR112017012252B1/pt
Priority to EP16776120.4A priority patent/EP3281742B1/de
Priority to ES16776120T priority patent/ES2877434T3/es
Publication of WO2016161945A1 publication Critical patent/WO2016161945A1/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/06—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving conveyor belts, a sequence of travelling work-tables or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00—Other grinding machines or devices
    • B24B27/0076—Other grinding machines or devices grinding machines comprising two or more grinding tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/005—Feeding or manipulating devices specially adapted to grinding machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • B24B41/068—Table-like supports for panels, sheets or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
    • B24B55/06—Dust extraction equipment on grinding or polishing machines
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain

Definitions

  • the present invention relates to a polishing method.
  • the surface to be processed of the workpiece is usually oriented directly upward, and polished and polished on the surface to be processed by a polishing and polishing device; for example, ceramic polished tiles, including a rough back surface and a smooth surface (rough back surface is a veneer surface)
  • the smooth surface is the decorative surface
  • the ceramic polishing brick 40 is first placed on the horizontally disposed conveyor belt 1 such that the decorative surface 41 of the ceramic polishing brick 40 faces upward, that is, the tile of the ceramic polishing tile 40.
  • the veneer is facing the ground, and a plurality of polishing heads 2 arranged along the conveying direction of the conveyor belt are disposed above the conveyor belt 1.
  • the ceramic polishing bricks 40 are continuously moved along with the conveyor belt 1, and each of the polishing mills 2 is ceramic from top to bottom.
  • the polished tile 40 is polished. (Ceramic polished tiles are generally bricks before polishing, therefore, in the art, ceramic polished tiles are also referred to as ceramic polished tiles before polishing)
  • the polishing head 2 polishes the decorative surface 41 of the ceramic polishing tile 40, a large amount of minute-grained abrasive chips 42 are generated, which remain on the decorative surface 41 and follow the polishing head 2 at a high speed. Rotation will scratch the decorative surface 41, seriously affecting the polishing effect, and at the same time, since there is a layer of wear debris 42 between the polishing head 2 and the decorative surface 41, the contact ratio between the polishing head 2 and the decorative surface 41 is lowered. , thus seriously affecting the efficiency of polishing; in order to solve the above problems, the traditional approach is to treat while polishing A large amount of water is sprayed on the surface to wash away the wear debris.
  • the object of the present invention is to provide a polishing method which can effectively prevent the grinding debris from remaining on the surface to be processed of the workpiece, and simplifies the polishing process of the workpiece.
  • the present invention adopts the following technical solutions:
  • the water is applied from the bottom to the top by the water application device.
  • the water application device is a water spray mechanism for spraying water from the bottom to the top during the polishing process, and the water is subjected to pressure atomization treatment during water spray, and the atomized water is sprayed onto the surface to be processed.
  • the polishing apparatus includes at least one polishing head driven by a first drive mechanism.
  • the number of polishing heads is plural, and the plurality of polishing heads are disposed below the surface to be processed of the workpiece and are arranged at intervals along the conveying direction of the conveying mechanism.
  • the transport mechanism includes a belt driven by the second drive mechanism and a backup roller positioned below the belt, and the workpiece is clamped between the belt and the backup roller during polishing.
  • a support beam is arranged in the annular region of the belt, the support beam extending in the same direction as the belt.
  • the polishing method of the present invention when polishing and polishing the workpiece, causes the surface to be processed of the workpiece to face the ground, and the polishing surface is used to polish the surface to be processed under the workpiece, and the grinding debris generated during the polishing process will be
  • the polishing method of the present invention can effectively prevent the grinding debris from remaining on the surface to be processed of the workpiece, thereby improving the polishing efficiency and improving the polishing effect.
  • 1 is a schematic view showing a polishing method of a conventional ceramic polished tile
  • Figure 2 is an enlarged view of a portion A in Figure 1;
  • Figure 3 is a schematic view of a polishing method of the present invention.
  • Figure 4 is an enlarged view of B in Figure 3;
  • 3 and 4 illustrate a polishing method of the present invention applied to polishing of a ceramic polished tile, the method specifically conveying a ceramic polished tile along a predetermined track by a transport mechanism, and when transporting, the ceramic polished tile
  • the decorative surface 41 of the 40 faces the ground 50, and moves along the conveying path of the ceramic polishing tile 40 along the transport mechanism.
  • the decorative surface 41 of the ceramic polished tile is polished under the ceramic polishing tile by a polishing device.
  • the above method puts the decorative surface 41 of the ceramic polishing tile 40 downward, that is, the decorative surface 41 faces the ground 50, and the grinding generated during the polishing process falls according to its own gravity, thereby effectively avoiding grinding on the ceramic polishing brick 40. Remaining on the decorative surface 41, avoiding the grinding effect on the polishing effect, and improving the polishing efficiency.
  • the above polishing apparatus of the present invention may be a polishing head 30 for polishing a ceramic polishing brick in the prior art, which will not be described herein.
  • the water spray mechanism is used to spray the decorative surface 41 of the ceramic polished tile from bottom to top.
  • a high-pressure pump can be arranged inside the water spray mechanism, and at the same time, an atomizing nozzle can be arranged at the water spray port of the water spray mechanism, and the high-pressure pump and the atomizing nozzle are used.
  • the water is atomized by high pressure and sprayed onto the decorative surface 41 of the ceramic polished tile.
  • the above method can polish the ceramic polishing tile 40 with at least one polishing head 30, which is driven by the first drive mechanism.
  • the first drive mechanism can be driven by a motor or other similar drive mechanism other than the motor.
  • a plurality of polishing heads 30 are disposed under the transport mechanism, and the plurality of polishing heads 30 are arranged along the transport direction of the transport mechanism, such that during polishing A plurality of ceramic polishing bricks can be continuously conveyed by a conveying mechanism, and each of the ceramic polishing bricks is sequentially polished by a plurality of polishing grinding heads 30 to achieve a polishing grade of the surface of the ceramic polishing brick.
  • the plurality of polishing heads 30 may be arranged at equal intervals or may be arranged at unequal intervals. Moreover, each of the polishing heads 30 can be separately driven by a first drive mechanism, or the plurality of polishing heads 30 can be collectively driven by a first drive mechanism.
  • each of the above-mentioned polishing heads 30 can be regarded as a polishing station, and the polishing surface 41 of the ceramic polishing bricks located at the polishing station can be sprayed at each polishing station, specifically
  • the water spray mechanism may be provided with a plurality of water spray ports, which may share a single water supply channel, or may have an independent water supply channel, the plurality of water spray ports corresponding to each other.
  • the water is disposed in the middle of the plurality of polishing heads 30.
  • the high-pressure pump and the atomizing nozzle can uniformly distribute the sprayed water on the ceramic polishing bricks.
  • the face 41 is decorated and the sprayed water is allowed to cover as much as possible the decorative face 41 of the ceramic buff.
  • the decorative surface 41 of the ceramic polishing brick 40 is oriented toward the ground 50, that is, the surface of the ceramic polishing brick 40 having a high water absorption is located at the polishing head 30.
  • the above polishing method of the present invention greatly reduces the ceramic The amount of water absorption of the polished tile during the polishing process, therefore, for the ceramic polished tile having high water absorption, after the polishing by the above-described polishing method of the present invention, the subsequent drying step can be eliminated.
  • the method of the present invention is not limited to the above-mentioned method of supplying water to the surface of the ceramic polishing brick by means of spraying, and other water application equipment can be utilized during the polishing process.
  • the decorative surface 41 of the ceramic polished tile is supplied with water.
  • a roller made of absorbent cotton may be disposed under the ceramic polished tile.
  • the squeeze roller passes the water inside the roller.
  • the water supply mechanism can be used to continuously supply water inside the roller to supplement the amount of water inside the roller.
  • the transport mechanism in the above method of the present invention includes a belt 10 driven by a second drive mechanism and a backup roller located below the belt 10, and the belt 10 is used to drive the movement of the ceramic polishing tile 40.
  • the ceramic polishing tile 40 is transported. Clamped between the lower surface of the belt 10 and the top end surface of the polishing head 30, while the ceramic polishing brick 40 is also clamped between the lower surface of the belt 10 and the backup roller, after the ceramic polishing brick 40 is clamped, the ceramic polishing The upper surface of the brick 40 having a certain roughness has a large frictional force with the lower surface of the belt 10, which is the driving force for driving the horizontal movement of the ceramic polishing brick 40, and the ceramic polishing brick 40 is topped up by the polishing grinding head 30.
  • the belt 10 defines the degree of freedom of the ceramic polishing tile 40 to move upward, so that a certain pressure is generated between the decorative surface 41 of the ceramic polishing tile 40 and the polishing head 30, thus ensuring that the polishing can be performed normally, of course, considering
  • the belt 10 may be deformed when pressed by the ceramic polishing tile 40, so that the mutual pressure between the polishing head 30 and the ceramic polishing tile 40 is too small, which affects the polishing effect.
  • a supporting beam 20 is disposed in the annular region of the belt 10, and the supporting beam 20 extends in the same direction as the conveying direction of the belt 10. When the belt 10 is deformed upwardly, the supporting beam 20 can be used to support the belt 10. Thereby, it is ensured that there is a sufficiently large pressure between the ceramic polishing tile 40 and the polishing head 30.
  • the second drive mechanism can be a motor or a similar drive mechanism belt other than the motor move.
  • the present invention can also adopt the transmission mechanism other than the above-mentioned belt conveying device to realize the transportation of the ceramic polishing brick.
  • the decorative surface 41 of the ceramic polishing brick is facing downward and the polishing head can be polished. There is a mutual pressure between the ceramic polished tiles and the ceramic polishing tiles.
  • polishing method for ceramic polishing tiles is merely an application example of the present invention, and the polishing method of the present invention can also be applied to polishing processing of other types of workpieces, for example, other ceramics other than ceramic polished tiles.
  • Pieces, sheet metal parts of course, the shape of these workpieces is not limited to the plate-like structure, in short, as long as the decorative surface 41 of the workpiece faces the ground 50 during the polishing process.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Devices For Post-Treatments, Processing, Supply, Discharge, And Other Processes (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
PCT/CN2016/078680 2015-04-08 2016-04-07 一种抛光方法 WO2016161945A1 (zh)

Priority Applications (3)

Application Number Priority Date Filing Date Title
BR112017012252-9A BR112017012252B1 (pt) 2015-04-08 2016-04-07 Método de polimento
EP16776120.4A EP3281742B1 (de) 2015-04-08 2016-04-07 Polierverfahren
ES16776120T ES2877434T3 (es) 2015-04-08 2016-04-07 Método de pulido

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201510166326.6 2015-04-08
CN201510166326.6A CN104759958B (zh) 2015-04-08 2015-04-08 一种抛光方法

Publications (1)

Publication Number Publication Date
WO2016161945A1 true WO2016161945A1 (zh) 2016-10-13

Family

ID=53642223

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2016/078680 WO2016161945A1 (zh) 2015-04-08 2016-04-07 一种抛光方法

Country Status (5)

Country Link
EP (1) EP3281742B1 (de)
CN (1) CN104759958B (de)
BR (1) BR112017012252B1 (de)
ES (1) ES2877434T3 (de)
WO (1) WO2016161945A1 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110253431A (zh) * 2019-07-08 2019-09-20 佛山科学技术学院 一种水雾降温反置式瓷砖抛光磨头及瓷砖抛光方法
CN110625530A (zh) * 2018-06-22 2019-12-31 三星显示有限公司 基板抛光设备

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104759958B (zh) * 2015-04-08 2016-11-30 广东一鼎科技有限公司 一种抛光方法
CN105312969B (zh) * 2015-10-26 2018-01-16 广东科达洁能股份有限公司 一种陶瓷砖表面处理方法及陶瓷砖表面处理设备

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GB1372119A (en) * 1972-11-24 1974-10-30 Keramik Wtb Veb Grinding apparatus for finishing cermaic products particularly bases of plates and dishes
CN2917935Y (zh) * 2006-06-21 2007-07-04 广东科达机电股份有限公司 陶瓷砖加工装置
CN102666009A (zh) * 2009-11-25 2012-09-12 卢卡·通切利 用于使例如为天然石和再造石、陶瓷以及玻璃的石材的板坯平滑或抛光的机器
CN202317897U (zh) * 2011-11-04 2012-07-11 黄春生 一种背面粗磨型自动磨石机
CN202317964U (zh) * 2011-11-30 2012-07-11 黄春生 一种倒扣式压板输送装置
CN102794683A (zh) * 2012-08-29 2012-11-28 广东蒙娜丽莎新型材料集团有限公司 一种在陶瓷板材背部增加锚固点的加工设备
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110625530A (zh) * 2018-06-22 2019-12-31 三星显示有限公司 基板抛光设备
KR20200000509A (ko) * 2018-06-22 2020-01-03 삼성디스플레이 주식회사 기판 연마 장치
KR102565411B1 (ko) * 2018-06-22 2023-08-10 삼성디스플레이 주식회사 기판 연마 장치
CN110625530B (zh) * 2018-06-22 2024-03-15 三星显示有限公司 基板抛光设备
CN110253431A (zh) * 2019-07-08 2019-09-20 佛山科学技术学院 一种水雾降温反置式瓷砖抛光磨头及瓷砖抛光方法

Also Published As

Publication number Publication date
EP3281742B1 (de) 2021-03-24
CN104759958B (zh) 2016-11-30
CN104759958A (zh) 2015-07-08
BR112017012252A2 (pt) 2018-01-30
BR112017012252B1 (pt) 2021-12-28
ES2877434T3 (es) 2021-11-16
EP3281742A4 (de) 2018-12-19
EP3281742A1 (de) 2018-02-14

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