EP2511911A3 - Diffraction grating for x-ray talbot interferometer, method of manufacturing the same, and x-ray talbot interferometer - Google Patents
Diffraction grating for x-ray talbot interferometer, method of manufacturing the same, and x-ray talbot interferometer Download PDFInfo
- Publication number
- EP2511911A3 EP2511911A3 EP12164090.8A EP12164090A EP2511911A3 EP 2511911 A3 EP2511911 A3 EP 2511911A3 EP 12164090 A EP12164090 A EP 12164090A EP 2511911 A3 EP2511911 A3 EP 2511911A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- talbot interferometer
- ray talbot
- diffraction grating
- manufacturing
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Measurement Of Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011090607A JP2012225966A (ja) | 2011-04-15 | 2011-04-15 | X線タルボ干渉計用回折格子及びその製造方法、並びにx線タルボ干渉計 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2511911A2 EP2511911A2 (en) | 2012-10-17 |
EP2511911A3 true EP2511911A3 (en) | 2013-11-13 |
Family
ID=46026652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP12164090.8A Withdrawn EP2511911A3 (en) | 2011-04-15 | 2012-04-13 | Diffraction grating for x-ray talbot interferometer, method of manufacturing the same, and x-ray talbot interferometer |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP2511911A3 (ja) |
JP (1) | JP2012225966A (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5714968B2 (ja) * | 2011-04-15 | 2015-05-07 | 株式会社日立ハイテクサイエンス | X線タルボ干渉計用回折格子及びその製造方法、並びにx線タルボ干渉計 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050286680A1 (en) * | 2002-12-26 | 2005-12-29 | Atsushi Momose | X-ray imaging system and imaging method |
JP2009107088A (ja) * | 2007-10-31 | 2009-05-21 | Nippon Zeon Co Ltd | 金型の製造方法および光学素子の製造方法 |
JP2009282322A (ja) * | 2008-05-22 | 2009-12-03 | Konica Minolta Medical & Graphic Inc | 振幅型回折格子の製造方法 |
US20110051889A1 (en) * | 2009-08-26 | 2011-03-03 | Canon Kabushiki Kaisha | X-ray phase grating and method for producing the same |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4608679B2 (ja) | 2005-03-17 | 2011-01-12 | 財団法人新産業創造研究機構 | X線タルボ干渉計に用いられる位相型回折格子と振幅型回折格子の製造方法 |
JP2009042528A (ja) | 2007-08-09 | 2009-02-26 | Hyogo Prefecture | 回折格子の製造方法 |
-
2011
- 2011-04-15 JP JP2011090607A patent/JP2012225966A/ja not_active Withdrawn
-
2012
- 2012-04-13 EP EP12164090.8A patent/EP2511911A3/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050286680A1 (en) * | 2002-12-26 | 2005-12-29 | Atsushi Momose | X-ray imaging system and imaging method |
JP2009107088A (ja) * | 2007-10-31 | 2009-05-21 | Nippon Zeon Co Ltd | 金型の製造方法および光学素子の製造方法 |
JP2009282322A (ja) * | 2008-05-22 | 2009-12-03 | Konica Minolta Medical & Graphic Inc | 振幅型回折格子の製造方法 |
US20110051889A1 (en) * | 2009-08-26 | 2011-03-03 | Canon Kabushiki Kaisha | X-ray phase grating and method for producing the same |
Also Published As
Publication number | Publication date |
---|---|
JP2012225966A (ja) | 2012-11-15 |
EP2511911A2 (en) | 2012-10-17 |
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Legal Events
Date | Code | Title | Description |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
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AX | Request for extension of the european patent |
Extension state: BA ME |
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PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
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RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: HITACHI HIGH-TECH SCIENCE CORPORATION |
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AK | Designated contracting states |
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AX | Request for extension of the european patent |
Extension state: BA ME |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: G21K 1/06 20060101AFI20131007BHEP |
|
17P | Request for examination filed |
Effective date: 20140513 |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
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17Q | First examination report despatched |
Effective date: 20160107 |
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STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
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18D | Application deemed to be withdrawn |
Effective date: 20160518 |