EP2511911A3 - Diffraction grating for x-ray talbot interferometer, method of manufacturing the same, and x-ray talbot interferometer - Google Patents
Diffraction grating for x-ray talbot interferometer, method of manufacturing the same, and x-ray talbot interferometer Download PDFInfo
- Publication number
- EP2511911A3 EP2511911A3 EP12164090.8A EP12164090A EP2511911A3 EP 2511911 A3 EP2511911 A3 EP 2511911A3 EP 12164090 A EP12164090 A EP 12164090A EP 2511911 A3 EP2511911 A3 EP 2511911A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- talbot interferometer
- ray talbot
- diffraction grating
- manufacturing
- ray
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2207/00—Particular details of imaging devices or methods using ionizing electromagnetic radiation such as X-rays or gamma rays
- G21K2207/005—Methods and devices obtaining contrast from non-absorbing interaction of the radiation with matter, e.g. phase contrast
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Measurement Of Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Abstract
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011090607A JP2012225966A (en) | 2011-04-15 | 2011-04-15 | Diffraction grating for x-ray talbot interferometer, method for manufacturing the same, and x-ray talbot interferometer |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2511911A2 EP2511911A2 (en) | 2012-10-17 |
EP2511911A3 true EP2511911A3 (en) | 2013-11-13 |
Family
ID=46026652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP12164090.8A Withdrawn EP2511911A3 (en) | 2011-04-15 | 2012-04-13 | Diffraction grating for x-ray talbot interferometer, method of manufacturing the same, and x-ray talbot interferometer |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP2511911A3 (en) |
JP (1) | JP2012225966A (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5714968B2 (en) * | 2011-04-15 | 2015-05-07 | 株式会社日立ハイテクサイエンス | Diffraction grating for X-ray Talbot interferometer, manufacturing method thereof, and X-ray Talbot interferometer |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050286680A1 (en) * | 2002-12-26 | 2005-12-29 | Atsushi Momose | X-ray imaging system and imaging method |
JP2009107088A (en) * | 2007-10-31 | 2009-05-21 | Nippon Zeon Co Ltd | Manufacturing method for die, and manufacturing method for optical element |
JP2009282322A (en) * | 2008-05-22 | 2009-12-03 | Konica Minolta Medical & Graphic Inc | Method of manufacturing amplitude type diffraction grating |
US20110051889A1 (en) * | 2009-08-26 | 2011-03-03 | Canon Kabushiki Kaisha | X-ray phase grating and method for producing the same |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4608679B2 (en) | 2005-03-17 | 2011-01-12 | 財団法人新産業創造研究機構 | Manufacturing method of phase type diffraction grating and amplitude type diffraction grating used in X-ray Talbot interferometer |
JP2009042528A (en) | 2007-08-09 | 2009-02-26 | Hyogo Prefecture | Method of manufacturing diffraction grating |
-
2011
- 2011-04-15 JP JP2011090607A patent/JP2012225966A/en not_active Withdrawn
-
2012
- 2012-04-13 EP EP12164090.8A patent/EP2511911A3/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050286680A1 (en) * | 2002-12-26 | 2005-12-29 | Atsushi Momose | X-ray imaging system and imaging method |
JP2009107088A (en) * | 2007-10-31 | 2009-05-21 | Nippon Zeon Co Ltd | Manufacturing method for die, and manufacturing method for optical element |
JP2009282322A (en) * | 2008-05-22 | 2009-12-03 | Konica Minolta Medical & Graphic Inc | Method of manufacturing amplitude type diffraction grating |
US20110051889A1 (en) * | 2009-08-26 | 2011-03-03 | Canon Kabushiki Kaisha | X-ray phase grating and method for producing the same |
Also Published As
Publication number | Publication date |
---|---|
JP2012225966A (en) | 2012-11-15 |
EP2511911A2 (en) | 2012-10-17 |
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Legal Events
Date | Code | Title | Description |
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PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
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AX | Request for extension of the european patent |
Extension state: BA ME |
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PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
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RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: HITACHI HIGH-TECH SCIENCE CORPORATION |
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AK | Designated contracting states |
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AX | Request for extension of the european patent |
Extension state: BA ME |
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RIC1 | Information provided on ipc code assigned before grant |
Ipc: G21K 1/06 20060101AFI20131007BHEP |
|
17P | Request for examination filed |
Effective date: 20140513 |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
17Q | First examination report despatched |
Effective date: 20160107 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
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18D | Application deemed to be withdrawn |
Effective date: 20160518 |