EP1639642A2 - Hochfrequenz-package - Google Patents
Hochfrequenz-packageInfo
- Publication number
- EP1639642A2 EP1639642A2 EP04741915A EP04741915A EP1639642A2 EP 1639642 A2 EP1639642 A2 EP 1639642A2 EP 04741915 A EP04741915 A EP 04741915A EP 04741915 A EP04741915 A EP 04741915A EP 1639642 A2 EP1639642 A2 EP 1639642A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- component
- circuit carrier
- film
- frequency
- components
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910000679 solder Inorganic materials 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 238000001465 metallisation Methods 0.000 claims description 9
- 239000002184 metal Substances 0.000 abstract description 6
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 239000000919 ceramic Substances 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- SWPMTVXRLXPNDP-UHFFFAOYSA-N 4-hydroxy-2,6,6-trimethylcyclohexene-1-carbaldehyde Chemical compound CC1=C(C=O)C(C)(C)CC(O)C1 SWPMTVXRLXPNDP-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910015363 Au—Sn Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/552—Protection against radiation, e.g. light or electromagnetic waves
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/66—High-frequency adaptations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3164—Partial encapsulation or coating the coating being a foil
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0102—Calcium [Ca]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01068—Erbium [Er]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19106—Disposition of discrete passive components in a mirrored arrangement on two different side of a common die mounting substrate
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
- Y10T29/49144—Assembling to base an electrical component, e.g., capacitor, etc. by metal fusion
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
Definitions
- hermetically sealed high-frequency packages for modules mainly consist of milled metal housings, which are gold-plated and then sealed with a soldered-on metal cover.
- Hermetic single-component ceramic housings, such as those used for OF components, are also expensive and less suitable for components with high power dissipation.
- Usual HF metal housings as they are often used for modules, if no hermeticity but good shielding is necessary, are very expensive, very large and not hermetically sealed.
- RF module housings based on the latest LTCC technology are also expensive.
- the ceramic only serves to guide the cable while the cover is being soldered on.
- Typical OF filter housings which are based on HTCC technology, are roll seam welded and can be used up to approx. 5 GHz for components without high power dissipation.
- the cover welding is complex and the housings can only be used for a limited frequency range.
- DE 100 41 770 A1 discloses a substrate with a first dielectric layer, a high-frequency structure layer, which contains a high-frequency distribution network, and at least one low-frequency structure layer.
- a module thus formed also includes a cover.
- From WO 97/45955 AI, WO 99/43084 AI, DE 195 48 048 AI and DE 198 18 824 AI electronic components located on circuit carriers are known, which are covered with covers, in particular in the form of foils. Metal foils used here have proven to be very difficult to handle and often have not proven to be long-term.
- the object of the invention is to specify an inexpensive method for producing a high-frequency package.
- a circuit carrier is connected to a component via contacts which space the component from the circuit carrier, so that cavities are formed between the component, the circuit carrier and the contacts.
- a film is applied to the component and the circuit carrier in such a way that it lies closely against the surface of the circuit carrier on which the component is located and on the sides of the component not facing the circuit carrier. After it has been applied to the component and the circuit carrier, the film is provided with a metallization.
- the metallization is preferably applied by sputtering or vapor deposition and then galvanically reinforced.
- a window can be opened in the film on the side of the component facing away from the circuit carrier, through which window the component can be contacted. If the window is opened before the film is metallized, the contact can be made immediately by the metallization.
- a solder bump is applied to the side of the circuit carrier on which the component is attached. This solder bump projects above the component in that it is higher than the component when viewed from the circuit carrier.
- the package consisting of circuit carrier, component, foil and metallization of the foil on the side on which the component is arranged on the circuit carrier can be electrically connected to, for example, another circuit carrier via the solder bump.
- the component is in particular an active component, a high-frequency component and / or a high-frequency component.
- one or more passive components can also be arranged on the circuit carrier.
- the passive components are preferably arranged on the side of the circuit carrier opposite the component.
- FIG. 1 shows a circuit carrier equipped on one side with screen-printed solder bumps on the rear of the circuit carrier
- Figure 2 shows a double-sided circuit carrier with attached solder balls or solder bumps on the front of the circuit carrier and a surface-mounted passive component on the back of the circuit carrier.
- Components 1 in the form of chips are bumped and, in the case of printed contacts 2 in the form of solder bumps, these are remelted.
- a circuit carrier 3 can also be bumped.
- the components 1 are separated, dipped upside down with the contacts 2 into flux and placed on connection pads of the circuit carrier 3, for example made of ceramic. This creates cavities 4 between the component 1, the contacts 2 and the circuit carrier 3.
- a film 5 is laminated over the entire surface of the components 1 and removed at contact points and on the module edges (saw marks), for example by means of a laser.
- the film 5 is provided with a metallization 6, for example by means of Cu sputtering, which is optionally galvanically reinforced.
- one or more frames 12 run in the form of metallizations on the ceramic on which the film 5 has been removed.
- the metal shielding stretched over the components 1 in the form of the metallization 6 is connected directly to the circuit carrier 3. This creates a hermetic package.
- the contacts 2 in the form of bumps in the cavities 4 are surrounded by air, that is to say the dielectric constant between the contacts 2 is approximately 1, use in high-frequency technology is possible.
- Components with high losses for example GaAs chips, can be ground thin before they are put on.
- a window 7 cut freely in the photo by means of a laser or the like lie 5 on the side of the component 1 facing away from the circuit carrier 3 enables the copper metallization 6 to be contacted directly on the component surface. The heat dissipation is thus not hindered by the film 5. In the same way, a ground connection of the component substrate back can be realized.
- a contact element 8 in the form of a solder bump is arranged on the side of the circuit carrier 3 opposite the component 1.
- a passive component 9 is arranged on the side of the circuit carrier 3 opposite the component 1 and is soldered to solder 10.
- a contact element 11 in the form of a solder bump is arranged, which rises higher above the surface of the circuit carrier 3 than the component 1 with the contacts 2.
- the variants shown represent only preferred embodiments.
- Si or GaAs chips can also be used in mixed assembly.
- LTCC ceramics have been tested as substrates for the circuit carrier, other ceramics, such as HTCC or Al2O3, or organic substrates, such as FR5, with the lowest possible expansion coefficients are also conceivable.
- the embodiment according to FIG. 1 can be made pick & place-capable, for example, by a casting compound, which enables inexpensive assembly.
- chips need to be contacted by wire bonding, they can either be arranged on the back or can also be inserted under the shielding film 5 with a protective cover.
- Cooling of components is possible, for example by applying heat sinks,
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Microwave Amplifiers (AREA)
- Wire Bonding (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10329329A DE10329329B4 (de) | 2003-06-30 | 2003-06-30 | Hochfrequenz-Gehäuse und Verfahren zu seiner Herstellung |
PCT/EP2004/051282 WO2005001934A2 (de) | 2003-06-30 | 2004-06-29 | Hochfrequenz-package |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1639642A2 true EP1639642A2 (de) | 2006-03-29 |
Family
ID=33546724
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04741915A Withdrawn EP1639642A2 (de) | 2003-06-30 | 2004-06-29 | Hochfrequenz-package |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060162157A1 (zh) |
EP (1) | EP1639642A2 (zh) |
JP (1) | JP2006510235A (zh) |
KR (1) | KR100697434B1 (zh) |
CN (1) | CN100382306C (zh) |
DE (1) | DE10329329B4 (zh) |
WO (1) | WO2005001934A2 (zh) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100691160B1 (ko) * | 2005-05-06 | 2007-03-09 | 삼성전기주식회사 | 적층형 표면탄성파 패키지 및 그 제조방법 |
KR100703090B1 (ko) * | 2005-08-30 | 2007-04-06 | 삼성전기주식회사 | 후면 접지형 플립칩 반도체 패키지 |
DE102006025162B3 (de) * | 2006-05-30 | 2008-01-31 | Epcos Ag | Flip-Chip-Bauelement und Verfahren zur Herstellung |
DE102010054782A1 (de) | 2010-12-16 | 2012-06-21 | Epcos Ag | Gehäustes elektrisches Bauelement |
JP5799541B2 (ja) | 2011-03-25 | 2015-10-28 | 株式会社ソシオネクスト | 半導体装置及びその製造方法 |
FR2984882A1 (fr) | 2011-12-23 | 2013-06-28 | Saint Gobain Ct Recherches | Procede de fabrication d'un produit mesoporeux. |
KR101356791B1 (ko) | 2012-01-20 | 2014-01-27 | 한국과학기술원 | 박막형 수퍼커패시터 및 그의 제조 방법 |
CN105702664A (zh) * | 2012-11-16 | 2016-06-22 | 日月光半导体制造股份有限公司 | 半导体封装构造及其制造方法 |
US9484313B2 (en) * | 2013-02-27 | 2016-11-01 | Advanced Semiconductor Engineering, Inc. | Semiconductor packages with thermal-enhanced conformal shielding and related methods |
WO2015197551A1 (de) * | 2014-06-23 | 2015-12-30 | Epcos Ag | Gehäuse für ein elektrisches bauelement und verfahren zur herstellung eines gehäuses für ein elektrisches bauelement |
CN106816420A (zh) * | 2015-11-30 | 2017-06-09 | 讯芯电子科技(中山)有限公司 | 一种声波元件封装结构及其制造方法 |
US10741501B1 (en) * | 2018-10-22 | 2020-08-11 | Keysight Technologies, Inc. | Systems and methods for sheathing electronic components |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4967262A (en) * | 1989-11-06 | 1990-10-30 | Micron Technology, Inc. | Gull-wing zig-zag inline lead package having end-of-package anchoring pins |
US6274391B1 (en) * | 1992-10-26 | 2001-08-14 | Texas Instruments Incorporated | HDI land grid array packaged device having electrical and optical interconnects |
US5477082A (en) * | 1994-01-11 | 1995-12-19 | Exponential Technology, Inc. | Bi-planar multi-chip module |
US5639989A (en) * | 1994-04-19 | 1997-06-17 | Motorola Inc. | Shielded electronic component assembly and method for making the same |
FR2728392A1 (fr) * | 1994-12-16 | 1996-06-21 | Bull Sa | Procede et support de connexion d'un circuit integre a un autre support par l'intermediaire de boules |
DE69621983T2 (de) * | 1995-04-07 | 2002-11-21 | Shinko Electric Industries Co., Ltd. | Struktur und Verfahren zur Montage eines Halbleiterchips |
DE19548048C2 (de) * | 1995-12-21 | 1998-01-15 | Siemens Matsushita Components | Elektronisches Bauelement, insbesondere mit akustischen Oberflächenwellen arbeitendes Bauelement (OFW-Bauelement) |
WO1997045955A1 (de) * | 1996-05-24 | 1997-12-04 | Siemens Matsushita Components Gmbh & Co. Kg | Elektronisches bauelement, insbesondere mit akustischen oberflächenwellen arbeitendes bauelement - ofw-bauelement |
US5899705A (en) * | 1997-11-20 | 1999-05-04 | Akram; Salman | Stacked leads-over chip multi-chip module |
DE19806818C1 (de) * | 1998-02-18 | 1999-11-04 | Siemens Matsushita Components | Verfahren zur Herstellung eines elektronischen Bauelements, insbesondere eines mit akustischen Oberflächenwllen arbeitenden OFW-Bauelements |
DE19818824B4 (de) * | 1998-04-27 | 2008-07-31 | Epcos Ag | Elektronisches Bauelement und Verfahren zu dessen Herstellung |
FR2799883B1 (fr) * | 1999-10-15 | 2003-05-30 | Thomson Csf | Procede d'encapsulation de composants electroniques |
DE10002852A1 (de) * | 2000-01-24 | 2001-08-02 | Infineon Technologies Ag | Abschirmeinrichtung und elektrisches Bauteil mit einer Abschirmeinrichtung |
DE10016867A1 (de) * | 2000-04-05 | 2001-10-18 | Epcos Ag | Bauelement mit Beschriftung |
TW445612B (en) * | 2000-08-03 | 2001-07-11 | Siliconware Precision Industries Co Ltd | Solder ball array structure to control the degree of collapsing |
DE10136743B4 (de) * | 2001-07-27 | 2013-02-14 | Epcos Ag | Verfahren zur hermetischen Verkapselung eines Bauelementes |
DE10142542A1 (de) * | 2001-08-30 | 2003-03-27 | Infineon Technologies Ag | Anordnung eines Halbleiterchips in einem Gehäuse, Chipkarte und Chipmodul |
DE10164502B4 (de) * | 2001-12-28 | 2013-07-04 | Epcos Ag | Verfahren zur hermetischen Verkapselung eines Bauelements |
TW517368B (en) * | 2002-01-22 | 2003-01-11 | Via Tech Inc | Manufacturing method of the passivation metal on the surface of integrated circuit |
DE10256945A1 (de) * | 2002-12-05 | 2004-06-17 | Epcos Ag | Elektronisches Bauelement mit mehreren Chips und Verfahren zur Herstellung |
-
2003
- 2003-06-30 DE DE10329329A patent/DE10329329B4/de not_active Expired - Fee Related
-
2004
- 2004-06-29 EP EP04741915A patent/EP1639642A2/de not_active Withdrawn
- 2004-06-29 CN CNB2004800008421A patent/CN100382306C/zh not_active Expired - Fee Related
- 2004-06-29 US US10/527,961 patent/US20060162157A1/en not_active Abandoned
- 2004-06-29 WO PCT/EP2004/051282 patent/WO2005001934A2/de active Application Filing
- 2004-06-29 JP JP2005518163A patent/JP2006510235A/ja active Pending
- 2004-06-29 KR KR1020057004365A patent/KR100697434B1/ko not_active IP Right Cessation
Non-Patent Citations (1)
Title |
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See references of WO2005001934A2 * |
Also Published As
Publication number | Publication date |
---|---|
CN100382306C (zh) | 2008-04-16 |
JP2006510235A (ja) | 2006-03-23 |
CN1701440A (zh) | 2005-11-23 |
KR100697434B1 (ko) | 2007-03-20 |
WO2005001934A3 (de) | 2005-05-12 |
KR20050042200A (ko) | 2005-05-04 |
US20060162157A1 (en) | 2006-07-27 |
DE10329329B4 (de) | 2005-08-18 |
WO2005001934A2 (de) | 2005-01-06 |
DE10329329A1 (de) | 2005-02-17 |
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