EP1573287A4 - OFF-PLAN BIREFRINGENCE MEASUREMENT - Google Patents

OFF-PLAN BIREFRINGENCE MEASUREMENT

Info

Publication number
EP1573287A4
EP1573287A4 EP03799977A EP03799977A EP1573287A4 EP 1573287 A4 EP1573287 A4 EP 1573287A4 EP 03799977 A EP03799977 A EP 03799977A EP 03799977 A EP03799977 A EP 03799977A EP 1573287 A4 EP1573287 A4 EP 1573287A4
Authority
EP
European Patent Office
Prior art keywords
plane birefringence
birefringence measurement
measurement
plane
birefringence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03799977A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1573287A2 (en
Inventor
Baoliang Wang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hinds Instruments Inc
Original Assignee
Hinds Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/364,006 external-priority patent/US7016039B2/en
Application filed by Hinds Instruments Inc filed Critical Hinds Instruments Inc
Publication of EP1573287A2 publication Critical patent/EP1573287A2/en
Publication of EP1573287A4 publication Critical patent/EP1573287A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/23—Bi-refringence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
EP03799977A 2002-12-20 2003-12-19 OFF-PLAN BIREFRINGENCE MEASUREMENT Withdrawn EP1573287A4 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US43558802P 2002-12-20 2002-12-20
US435588P 2002-12-20
US364006 2003-02-10
US10/364,006 US7016039B2 (en) 2003-02-10 2003-02-10 Purging light beam paths in optical equipment
US49283803P 2003-08-06 2003-08-06
US492838P 2003-08-06
PCT/US2003/040366 WO2004059266A2 (en) 2002-12-20 2003-12-19 Out-of-plane birefringence measurement

Publications (2)

Publication Number Publication Date
EP1573287A2 EP1573287A2 (en) 2005-09-14
EP1573287A4 true EP1573287A4 (en) 2009-11-11

Family

ID=32685986

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03799977A Withdrawn EP1573287A4 (en) 2002-12-20 2003-12-19 OFF-PLAN BIREFRINGENCE MEASUREMENT

Country Status (6)

Country Link
EP (1) EP1573287A4 (zh)
JP (1) JP4657105B2 (zh)
KR (1) KR20050093790A (zh)
CN (1) CN1739007B (zh)
AU (1) AU2003299695A1 (zh)
WO (1) WO2004059266A2 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009508170A (ja) * 2005-09-14 2009-02-26 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ露光システムの光学システム
JP4317558B2 (ja) * 2006-08-23 2009-08-19 株式会社堀場製作所 試料解析方法、試料解析装置及びプログラム
TWI331213B (en) 2005-11-29 2010-10-01 Horiba Ltd Sample analyzing method, sample analyzing apparatus,and recording medium
US7746465B2 (en) 2007-01-18 2010-06-29 Hinds Instruments, Inc. Sample holder for an optical element
KR100911626B1 (ko) * 2007-07-13 2009-08-12 서강대학교산학협력단 바이오 센서 측정 장치
JP5917803B2 (ja) 2007-07-31 2016-05-18 ザ ジェネラル ホスピタル コーポレイション 高速ドップラー光周波数領域撮像法のためのビーム走査パターンを放射するシステムおよび方法
JP5140451B2 (ja) * 2008-02-05 2013-02-06 富士フイルム株式会社 複屈折測定方法及び装置並びにプログラム
JP2009229229A (ja) * 2008-03-21 2009-10-08 Fujifilm Corp 複屈折測定装置及び複屈折測定方法
US8582101B2 (en) * 2008-07-08 2013-11-12 Hinds Instruments, Inc. High throughput birefringence measurement
JP2012150107A (ja) * 2010-12-27 2012-08-09 Nippon Zeon Co Ltd 光学異方性膜の評価方法、光学異方性膜の光学特性の測定装置および光学異方性膜の製造方法
GB201308434D0 (en) * 2013-05-10 2013-06-19 Innovia Films Sarl Authentication apparatus and method
WO2014189967A2 (en) 2013-05-23 2014-11-27 Hinds Instruments, Inc. Polarization properties imaging systems

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3106818A1 (de) * 1981-02-24 1982-09-09 Basf Ag, 6700 Ludwigshafen Verfahren zur kontinuierlichen bestimmung mehrachsiger orientierungszustaende von verstreckten folien oder platten
US5864403A (en) * 1998-02-23 1999-01-26 National Research Council Of Canada Method and apparatus for measurement of absolute biaxial birefringence in monolayer and multilayer films, sheets and shapes

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0623689B2 (ja) * 1988-12-12 1994-03-30 株式会社オーク製作所 複屈折測定方法
JPH0545278A (ja) * 1991-08-09 1993-02-23 Matsushita Electric Ind Co Ltd 複屈折測定装置
JPH08201277A (ja) * 1995-01-31 1996-08-09 New Oji Paper Co Ltd 複屈折測定方法及び装置
US5956146A (en) * 1997-01-29 1999-09-21 Victor Company Of Japan, Ltd. Birefringence measuring apparatus for optical disc substrate
JPH10267831A (ja) * 1997-03-25 1998-10-09 Unie Opt:Kk 複屈折測定光学系および高空間分解能偏光解析装置
JP4629869B2 (ja) * 1998-02-20 2011-02-09 ハインズ インスツルメンツ インコーポレイテッド 複屈折特性測定方法および装置
US6268914B1 (en) * 2000-01-14 2001-07-31 Hinds Instruments, Inc. Calibration Process For Birefringence Measurement System

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3106818A1 (de) * 1981-02-24 1982-09-09 Basf Ag, 6700 Ludwigshafen Verfahren zur kontinuierlichen bestimmung mehrachsiger orientierungszustaende von verstreckten folien oder platten
US5864403A (en) * 1998-02-23 1999-01-26 National Research Council Of Canada Method and apparatus for measurement of absolute biaxial birefringence in monolayer and multilayer films, sheets and shapes

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
RICHARD S STEIN: "Measurement of Birefringence of Biaxially Oriented Films", JOURNAL OF POLYMER SCIENCE, INTERSCIENCE PUBLISHERS, XX, vol. 24, 1 January 1957 (1957-01-01), pages 383 - 386, XP007910024 *

Also Published As

Publication number Publication date
KR20050093790A (ko) 2005-09-23
WO2004059266A3 (en) 2004-10-21
CN1739007B (zh) 2013-06-19
JP2006511823A (ja) 2006-04-06
WO2004059266A2 (en) 2004-07-15
AU2003299695A1 (en) 2004-07-22
AU2003299695A8 (en) 2004-07-22
EP1573287A2 (en) 2005-09-14
JP4657105B2 (ja) 2011-03-23
CN1739007A (zh) 2006-02-22

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Legal Events

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A4 Supplementary search report drawn up and despatched

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