DE69826120D1 - Vakuumbehandlungsverfahren - Google Patents
VakuumbehandlungsverfahrenInfo
- Publication number
- DE69826120D1 DE69826120D1 DE69826120T DE69826120T DE69826120D1 DE 69826120 D1 DE69826120 D1 DE 69826120D1 DE 69826120 T DE69826120 T DE 69826120T DE 69826120 T DE69826120 T DE 69826120T DE 69826120 D1 DE69826120 D1 DE 69826120D1
- Authority
- DE
- Germany
- Prior art keywords
- treatment process
- vacuum treatment
- vacuum
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title 1
- 238000009489 vacuum treatment Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11131997 | 1997-04-28 | ||
JP11131997 | 1997-04-28 | ||
PCT/JP1998/001949 WO1998049720A1 (fr) | 1997-04-28 | 1998-04-28 | Procede et dispositif de traitement sous vide |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69826120D1 true DE69826120D1 (de) | 2004-10-14 |
DE69826120T2 DE69826120T2 (de) | 2005-09-22 |
Family
ID=14558215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69826120T Expired - Fee Related DE69826120T2 (de) | 1997-04-28 | 1998-04-28 | Vakuumbehandlungsverfahren |
Country Status (8)
Country | Link |
---|---|
US (2) | US6465363B1 (de) |
EP (1) | EP0980092B1 (de) |
JP (1) | JP3394263B2 (de) |
KR (1) | KR100319662B1 (de) |
CN (1) | CN1149646C (de) |
DE (1) | DE69826120T2 (de) |
TW (1) | TW411491B (de) |
WO (1) | WO1998049720A1 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100456088C (zh) * | 2002-02-05 | 2009-01-28 | 乐金显示有限公司 | Lcd粘接机和用这种粘接机制造lcd的方法 |
US20070252347A1 (en) * | 2005-12-28 | 2007-11-01 | Trig Cycling Ltd. | Quick release mechanism with integrated/attached multi-tool |
JP2008177479A (ja) * | 2007-01-22 | 2008-07-31 | Tokyo Electron Ltd | プラズマ処理装置の部品及びその製造方法 |
JP4912907B2 (ja) * | 2007-02-06 | 2012-04-11 | 東京エレクトロン株式会社 | プラズマエッチング方法及びプラズマエッチング装置 |
DE102007060515A1 (de) | 2007-12-13 | 2009-06-18 | Christof-Herbert Diener | Oberflächenbehandlungsverfahren |
US8785331B2 (en) * | 2012-05-25 | 2014-07-22 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Method for replacing chlorine atoms on a film layer |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4180432A (en) * | 1977-12-19 | 1979-12-25 | International Business Machines Corporation | Process for etching SiO2 layers to silicon in a moderate vacuum gas plasma |
JPS5582782A (en) * | 1978-12-18 | 1980-06-21 | Fujitsu Ltd | Dry etching method |
JPS5779620A (en) * | 1980-11-05 | 1982-05-18 | Mitsubishi Electric Corp | Plasma etching process |
JPS59150427A (ja) | 1983-02-15 | 1984-08-28 | Toshiba Corp | 半導体装置およびその製造方法 |
JPS59173273A (ja) | 1983-03-18 | 1984-10-01 | Matsushita Electric Ind Co Ltd | 反応性イオンエツチング装置 |
US4673456A (en) * | 1985-09-17 | 1987-06-16 | Machine Technology, Inc. | Microwave apparatus for generating plasma afterglows |
US4996077A (en) * | 1988-10-07 | 1991-02-26 | Texas Instruments Incorporated | Distributed ECR remote plasma processing and apparatus |
US5198634A (en) * | 1990-05-21 | 1993-03-30 | Mattson Brad S | Plasma contamination removal process |
JPH05114592A (ja) * | 1991-10-22 | 1993-05-07 | Hitachi Chem Co Ltd | 有機膜のエツチング方法および半導体装置の製造法 |
US5310453A (en) * | 1992-02-13 | 1994-05-10 | Tokyo Electron Yamanashi Limited | Plasma process method using an electrostatic chuck |
JPH05226653A (ja) | 1992-02-14 | 1993-09-03 | Toshiba Corp | Tftアレイのエッチング加工方法 |
JPH05275326A (ja) | 1992-03-30 | 1993-10-22 | Sumitomo Metal Ind Ltd | レジストのアッシング方法 |
JPH05347282A (ja) | 1992-06-15 | 1993-12-27 | Fujitsu Ltd | アッシング装置及びその処理方法 |
TW255839B (de) * | 1993-05-20 | 1995-09-01 | Hitachi Seisakusyo Kk | |
JP3323298B2 (ja) * | 1993-09-29 | 2002-09-09 | 芝浦メカトロニクス株式会社 | 静電チャック装置及び同装置を備えたプラズマ処理装置 |
FI95421C (fi) * | 1993-12-23 | 1996-01-25 | Heikki Ihantola | Puolijohteen, kuten piikiekon, prosessoinnissa käytettävä laitteisto ja menetelmä |
JPH0864581A (ja) | 1994-08-25 | 1996-03-08 | Sumitomo Metal Ind Ltd | プラズマアッシング装置 |
JPH0982787A (ja) * | 1995-09-19 | 1997-03-28 | Toshiba Corp | プラズマ処理装置およびプラズマ処理方法 |
JP2956571B2 (ja) * | 1996-03-07 | 1999-10-04 | 日本電気株式会社 | 半導体装置 |
-
1998
- 1998-04-28 DE DE69826120T patent/DE69826120T2/de not_active Expired - Fee Related
- 1998-04-28 KR KR1019997009949A patent/KR100319662B1/ko not_active IP Right Cessation
- 1998-04-28 TW TW087106552A patent/TW411491B/zh not_active IP Right Cessation
- 1998-04-28 JP JP54682898A patent/JP3394263B2/ja not_active Expired - Fee Related
- 1998-04-28 CN CNB988065010A patent/CN1149646C/zh not_active Expired - Fee Related
- 1998-04-28 EP EP98917717A patent/EP0980092B1/de not_active Expired - Lifetime
- 1998-04-28 WO PCT/JP1998/001949 patent/WO1998049720A1/ja active IP Right Grant
-
1999
- 1999-10-28 US US09/429,558 patent/US6465363B1/en not_active Expired - Fee Related
-
2002
- 2002-05-22 US US10/152,001 patent/US20020134753A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
EP0980092A4 (de) | 2000-03-29 |
KR20010020335A (ko) | 2001-03-15 |
EP0980092A1 (de) | 2000-02-16 |
JP3394263B2 (ja) | 2003-04-07 |
US6465363B1 (en) | 2002-10-15 |
WO1998049720A1 (fr) | 1998-11-05 |
US20020134753A1 (en) | 2002-09-26 |
KR100319662B1 (ko) | 2002-01-16 |
CN1261460A (zh) | 2000-07-26 |
CN1149646C (zh) | 2004-05-12 |
DE69826120T2 (de) | 2005-09-22 |
EP0980092B1 (de) | 2004-09-08 |
TW411491B (en) | 2000-11-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |