DE69824658D1 - Optisches System für Projektion - Google Patents

Optisches System für Projektion

Info

Publication number
DE69824658D1
DE69824658D1 DE69824658T DE69824658T DE69824658D1 DE 69824658 D1 DE69824658 D1 DE 69824658D1 DE 69824658 T DE69824658 T DE 69824658T DE 69824658 T DE69824658 T DE 69824658T DE 69824658 D1 DE69824658 D1 DE 69824658D1
Authority
DE
Germany
Prior art keywords
projection
optical system
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69824658T
Other languages
English (en)
Other versions
DE69824658T2 (de
Inventor
Shintaro Kudo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69824658D1 publication Critical patent/DE69824658D1/de
Application granted granted Critical
Publication of DE69824658T2 publication Critical patent/DE69824658T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/12Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having three components only
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE69824658T 1997-04-03 1998-04-02 Optisches System für Projektion Expired - Lifetime DE69824658T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10250497 1997-04-03
JP10250497A JP3823436B2 (ja) 1997-04-03 1997-04-03 投影光学系

Publications (2)

Publication Number Publication Date
DE69824658D1 true DE69824658D1 (de) 2004-07-29
DE69824658T2 DE69824658T2 (de) 2005-07-07

Family

ID=14329243

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69824658T Expired - Lifetime DE69824658T2 (de) 1997-04-03 1998-04-02 Optisches System für Projektion

Country Status (4)

Country Link
US (1) US6088171A (de)
EP (1) EP0869382B1 (de)
JP (1) JP3823436B2 (de)
DE (1) DE69824658T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3925576B2 (ja) 1997-07-24 2007-06-06 株式会社ニコン 投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH1195095A (ja) 1997-09-22 1999-04-09 Nikon Corp 投影光学系
JPH11214293A (ja) 1998-01-22 1999-08-06 Nikon Corp 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
US6700645B1 (en) 1998-01-22 2004-03-02 Nikon Corporation Projection optical system and exposure apparatus and method
JP2000143278A (ja) 1998-11-10 2000-05-23 Nikon Corp 耐久性の向上された投影露光装置及び結像光学系の製造方法
DE19942281A1 (de) 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
WO2001023935A1 (fr) * 1999-09-29 2001-04-05 Nikon Corporation Procede et dispositif d'exposition par projection, et systeme optique de projection
WO2001023933A1 (fr) 1999-09-29 2001-04-05 Nikon Corporation Systeme optique de projection
EP1094350A3 (de) 1999-10-21 2001-08-16 Carl Zeiss Optisches Projektionslinsensystem
JP2004524554A (ja) 2000-12-22 2004-08-12 カール・ツアイス・エスエムテイ・アーゲー 投射対物レンズ
DE10064685A1 (de) * 2000-12-22 2002-07-04 Zeiss Carl Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2002244034A (ja) 2001-02-21 2002-08-28 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2002323652A (ja) 2001-02-23 2002-11-08 Nikon Corp 投影光学系,該投影光学系を備えた投影露光装置および投影露光方法
JP2002323653A (ja) * 2001-02-23 2002-11-08 Nikon Corp 投影光学系,投影露光装置および投影露光方法
US20040005266A1 (en) * 2001-06-15 2004-01-08 Shigeru Sakuma Optical member, process for producing the same, and projection aligner
JP4238727B2 (ja) * 2001-07-17 2009-03-18 株式会社ニコン 光学部材の製造方法
US7154676B2 (en) 2002-03-01 2006-12-26 Carl Zeiss Smt A.G. Very-high aperture projection objective
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
DE602005003665T2 (de) 2004-05-17 2008-11-20 Carl Zeiss Smt Ag Katadioptrisches projektionsobjektiv mit zwischenbildern
EP2101209A1 (de) * 2006-05-05 2009-09-16 Carl Zeiss SMT AG Symmetrisches Objektiv mit vier Linsengruppen für die Mikrolithographie
US8345350B2 (en) 2008-06-20 2013-01-01 Carl Zeiss Smt Gmbh Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2153543B (en) * 1983-12-28 1988-09-01 Canon Kk A projection exposure apparatus
US4811055A (en) * 1984-02-27 1989-03-07 Canon Kabushiki Kaisha Projection exposure apparatus
JPH09311278A (ja) * 1996-05-20 1997-12-02 Nikon Corp 反射屈折光学系
JP3747951B2 (ja) * 1994-11-07 2006-02-22 株式会社ニコン 反射屈折光学系
US5568325A (en) * 1993-08-25 1996-10-22 Asahi Kogaku Kogyo Kabushiki Kaisha Achromatic lens system
JPH07128590A (ja) * 1993-10-29 1995-05-19 Olympus Optical Co Ltd 縮小投影レンズ
JPH0817719A (ja) * 1994-06-30 1996-01-19 Nikon Corp 投影露光装置
JPH08179204A (ja) * 1994-11-10 1996-07-12 Nikon Corp 投影光学系及び投影露光装置
JPH08203812A (ja) * 1995-01-30 1996-08-09 Nikon Corp 反射屈折縮小投影光学系及び露光装置
JPH103040A (ja) * 1996-06-14 1998-01-06 Nikon Corp 反射屈折光学系
JPH103041A (ja) * 1996-06-14 1998-01-06 Nikon Corp 反射屈折縮小光学系
JPH1020195A (ja) * 1996-06-28 1998-01-23 Nikon Corp 反射屈折光学系

Also Published As

Publication number Publication date
US6088171A (en) 2000-07-11
JP3823436B2 (ja) 2006-09-20
EP0869382A3 (de) 1999-05-06
DE69824658T2 (de) 2005-07-07
EP0869382B1 (de) 2004-06-23
JPH10282411A (ja) 1998-10-23
EP0869382A2 (de) 1998-10-07

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8380 Miscellaneous part iii

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