DE69806672T2 - Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas - Google Patents

Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas

Info

Publication number
DE69806672T2
DE69806672T2 DE69806672T DE69806672T DE69806672T2 DE 69806672 T2 DE69806672 T2 DE 69806672T2 DE 69806672 T DE69806672 T DE 69806672T DE 69806672 T DE69806672 T DE 69806672T DE 69806672 T2 DE69806672 T2 DE 69806672T2
Authority
DE
Germany
Prior art keywords
quartz glass
synthetic quartz
optical
manufacturing
excimer laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69806672T
Other languages
English (en)
Other versions
DE69806672D1 (de
Inventor
H Nishimura
A Fujinoki
H Otsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd, Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE69806672D1 publication Critical patent/DE69806672D1/de
Publication of DE69806672T2 publication Critical patent/DE69806672T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
DE69806672T 1997-04-08 1998-01-22 Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas Expired - Fee Related DE69806672T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10521297 1997-04-08

Publications (2)

Publication Number Publication Date
DE69806672D1 DE69806672D1 (de) 2002-08-29
DE69806672T2 true DE69806672T2 (de) 2003-03-20

Family

ID=14401370

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69806672T Expired - Fee Related DE69806672T2 (de) 1997-04-08 1998-01-22 Optisches synthetisches Quarzglas, Herstellungsverfahren davon, und optisches Element für Excimer-Laser mit dem synthetischen Quarzglas

Country Status (3)

Country Link
US (1) US6499315B1 (de)
EP (1) EP0870737B1 (de)
DE (1) DE69806672T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100554091B1 (ko) 1997-12-08 2006-05-16 가부시키가이샤 니콘 엑시머레이저내성을향상시킨석영글래스의제조방법및석영글래스부재
JP3794664B2 (ja) 1998-07-29 2006-07-05 信越化学工業株式会社 合成石英ガラス部材及びその製造方法、並びにエキシマレーザ用光学部品
JP2000143258A (ja) * 1998-09-10 2000-05-23 Shinetsu Quartz Prod Co Ltd ＡｒＦエキシマレ―ザ―リソグラフィ―用合成石英ガラスの製造方法
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6682859B2 (en) 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6782716B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
TW581747B (en) * 1999-02-16 2004-04-01 Nikon Corp Synthetic quartz glass optical member for ultraviolet light
JP4601022B2 (ja) * 1999-03-04 2010-12-22 信越石英株式会社 ＡｒＦエキシマレーザーリソグラフィー用合成石英ガラス部材
US6649268B1 (en) * 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
EP1114802A4 (de) * 1999-04-21 2008-12-31 Nikon Corp Quartzglas-element, verfahren zur herstellung und projektionsausrichteinrichtung, das dieses verwendet
EP1129998B1 (de) 1999-07-05 2012-03-21 Nikon Corporation Verfahren zur herstellung von quarzglasteilen
JP2001019465A (ja) * 1999-07-07 2001-01-23 Shin Etsu Chem Co Ltd エキシマレーザ用合成石英ガラス部材及びその製造方法
US7797966B2 (en) 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US6761951B2 (en) 2001-12-11 2004-07-13 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass blank
JP4158009B2 (ja) * 2001-12-11 2008-10-01 信越化学工業株式会社 合成石英ガラスインゴット及び合成石英ガラスの製造方法
JP4017863B2 (ja) 2001-12-18 2007-12-05 信越石英株式会社 アニール炉及び光学用合成石英ガラスの製造方法
ATE477218T1 (de) * 2002-03-01 2010-08-15 Schott Ag Verfahren zu herstellung von quarzglas und einer quarzglasvorform
JP3531870B2 (ja) * 2002-03-27 2004-05-31 独立行政法人 科学技術振興機構 合成石英ガラス
AU2003284494A1 (en) * 2002-11-29 2004-06-23 Shin-Etsu Quartz Products Co., Ltd. Method for producing synthetic quartz glass and synthetic quartz glass article
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材

Family Cites Families (16)

* Cited by examiner, † Cited by third party
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ZA884511B (en) * 1987-07-15 1989-03-29 Boc Group Inc Method of plasma enhanced silicon oxide deposition
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
JP2588447B2 (ja) 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
JP2821056B2 (ja) 1992-03-31 1998-11-05 信越石英株式会社 耐レーザ用光学部材及びその製造方法
JP3919831B2 (ja) 1992-12-29 2007-05-30 東ソー・クォーツ株式会社 光学用合成石英ガラス
JP3519426B2 (ja) 1993-03-30 2004-04-12 東ソー・クォーツ株式会社 光学用合成石英ガラスの安定化方法
JP3259460B2 (ja) 1993-08-26 2002-02-25 株式会社ニコン 耐紫外線性を有する石英ガラスの製造方法および石英ガラス光学部材
JP3336761B2 (ja) 1994-09-09 2002-10-21 住友金属工業株式会社 光透過用合成石英ガラスの製造方法
US5707908A (en) 1995-01-06 1998-01-13 Nikon Corporation Silica glass
JP2936138B2 (ja) 1995-01-06 1999-08-23 株式会社ニコン 石英ガラス、それを含む光学部材、並びにその製造方法
US5616159A (en) 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
EP0747327B2 (de) * 1995-06-07 2003-08-27 Corning Incorporated Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten
US5876683A (en) * 1995-11-02 1999-03-02 Glumac; Nicholas Combustion flame synthesis of nanophase materials
EP0780345A1 (de) 1995-12-22 1997-06-25 Corning Incorporated Optisches Element für UV-Transmission
EP0835848A3 (de) 1996-08-21 1998-06-10 Nikon Corporation Fluor enthaltendes Silicaglas, sein Herstellungsverfahren und ein dieses Glas enthaltender Projektionsbelichtungsapparat
US6309991B1 (en) * 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation

Also Published As

Publication number Publication date
US6499315B1 (en) 2002-12-31
DE69806672D1 (de) 2002-08-29
EP0870737B1 (de) 2002-07-24
EP0870737A1 (de) 1998-10-14

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee