DE60023964D1 - Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren - Google Patents
Laservorrichtung, Belichtungsapparat unter Verwendung derselben und HerstellungsverfahrenInfo
- Publication number
- DE60023964D1 DE60023964D1 DE60023964T DE60023964T DE60023964D1 DE 60023964 D1 DE60023964 D1 DE 60023964D1 DE 60023964 T DE60023964 T DE 60023964T DE 60023964 T DE60023964 T DE 60023964T DE 60023964 D1 DE60023964 D1 DE 60023964D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- same
- exposure apparatus
- laser
- laser apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/0315—Waveguide lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (14)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2390299 | 1999-02-01 | ||
JP2390299 | 1999-02-01 | ||
JP05181399A JP4302810B2 (ja) | 1999-02-26 | 1999-02-26 | レーザ発振装置、露光装置及びデバイスの製造方法 |
JP05180799A JP4256518B2 (ja) | 1999-02-26 | 1999-02-26 | レーザ発振装置、露光装置及びデバイスの製造方法 |
JP05180999A JP4256519B2 (ja) | 1999-02-01 | 1999-02-26 | レーザ発振装置、露光装置及びデバイスの製造方法 |
JP5181299 | 1999-02-26 | ||
JP5181399 | 1999-02-26 | ||
JP5181099 | 1999-02-26 | ||
JP5180899 | 1999-02-26 | ||
JP5180999 | 1999-02-26 | ||
JP11051812A JP2000252563A (ja) | 1999-02-26 | 1999-02-26 | レーザ発振装置、露光装置及びデバイスの製造方法 |
JP5181099 | 1999-02-26 | ||
JP5180799 | 1999-02-26 | ||
JP05180899A JP4204689B2 (ja) | 1999-02-26 | 1999-02-26 | レーザ発振装置、露光装置及びデバイスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60023964D1 true DE60023964D1 (de) | 2005-12-22 |
DE60023964T2 DE60023964T2 (de) | 2006-06-22 |
Family
ID=27564011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60023964T Expired - Lifetime DE60023964T2 (de) | 1999-02-01 | 2000-01-31 | Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren |
Country Status (3)
Country | Link |
---|---|
US (1) | US6829279B1 (de) |
EP (1) | EP1026796B1 (de) |
DE (1) | DE60023964T2 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1026796B1 (de) * | 1999-02-01 | 2005-11-16 | Tadahiro Ohmi | Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren |
JP3619141B2 (ja) | 2000-11-10 | 2005-02-09 | キヤノン株式会社 | 投影露光装置及びデバイス製造方法 |
DE602008005858D1 (de) | 2008-03-20 | 2011-05-12 | Univ Ruhr Bochum | Verfahren zur Steuerung der Ionenenergie in Radiofrequenzplasmen |
US9853501B2 (en) * | 2012-02-03 | 2017-12-26 | Nec Corporation | Electromagnetic wave transmission sheet and electromagnetic wave transmission device |
CN102780149B (zh) * | 2012-07-25 | 2014-08-13 | 西安电子科技大学 | 一种光纤耦合输出侧面泵浦固体激光器 |
CN102780150B (zh) * | 2012-07-25 | 2014-08-13 | 西安电子科技大学 | 一种光纤耦合输出激光二极管泵浦固体激光器及制造工艺 |
US20150218700A1 (en) * | 2013-03-08 | 2015-08-06 | Applied Materials, Inc. | Chamber component with protective coating suitable for protection against flourine plasma |
KR102177738B1 (ko) | 2013-03-08 | 2020-11-11 | 어플라이드 머티어리얼스, 인코포레이티드 | 불소 플라즈마에 대한 보호에 적합한 보호 코팅을 갖는 챔버 컴포넌트 |
DE102015004414A1 (de) * | 2015-04-02 | 2016-10-06 | Centrotherm Photovoltaics Ag | Plasma-Behandlungsvorrichtung für Wafer |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE263648C (de) | ||||
DE3855896T2 (de) * | 1987-01-26 | 1998-01-02 | Mitsubishi Electric Corp | Plasmavorrichtung |
DD263648B5 (de) * | 1987-08-31 | 1996-01-25 | Buck Werke Gmbh | Einrichtung zur erzeugungs eines Mikrowellenplasmas mit grosser Ausdehnung und Homogenitaet |
JP2592085B2 (ja) * | 1988-02-09 | 1997-03-19 | マツダ株式会社 | アンチロック装置 |
JPH02237183A (ja) * | 1989-03-10 | 1990-09-19 | Mitsubishi Electric Corp | 気体レーザ装置 |
DE3912569A1 (de) * | 1989-04-17 | 1990-10-18 | Siemens Ag | Verfahren und vorrichtung zur erzeugung eines elektrischen hochfrequenzfeldes in einem nutzraum |
DE3912568A1 (de) * | 1989-04-17 | 1990-10-18 | Siemens Ag | Gas-laser, insbesondere co(pfeil abwaerts)2(pfeil abwaerts)-laser |
DE3937491C2 (de) * | 1989-11-10 | 1996-02-15 | Deutsche Forsch Luft Raumfahrt | Wellenleiterlaser mit Mikrowellenanregung |
WO2004089046A1 (ja) * | 1991-11-05 | 2004-10-14 | Nobumasa Suzuki | 無端環状導波管を有するマイクロ波導入装置及び該装置を備えたプラズマ処理装置 |
JP3382314B2 (ja) | 1993-08-24 | 2003-03-04 | キヤノン株式会社 | 通信装置及び通信装置の制御方法 |
US6331994B1 (en) * | 1996-07-19 | 2001-12-18 | Canon Kabushiki Kaisha | Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube |
JP3818405B2 (ja) | 1996-07-19 | 2006-09-06 | 忠弘 大見 | レーザ発振装置 |
US6049170A (en) * | 1996-11-01 | 2000-04-11 | Matsushita Electric Industrial Co., Ltd. | High frequency discharge energy supply means and high frequency electrodeless discharge lamp device |
US6497783B1 (en) * | 1997-05-22 | 2002-12-24 | Canon Kabushiki Kaisha | Plasma processing apparatus provided with microwave applicator having annular waveguide and processing method |
EP1026796B1 (de) * | 1999-02-01 | 2005-11-16 | Tadahiro Ohmi | Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren |
JP4256520B2 (ja) * | 1999-02-26 | 2009-04-22 | 忠弘 大見 | レーザ発振装置、露光装置及びデバイスの製造方法 |
-
2000
- 2000-01-31 EP EP00300719A patent/EP1026796B1/de not_active Expired - Lifetime
- 2000-01-31 DE DE60023964T patent/DE60023964T2/de not_active Expired - Lifetime
- 2000-02-01 US US09/494,945 patent/US6829279B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6829279B1 (en) | 2004-12-07 |
DE60023964T2 (de) | 2006-06-22 |
EP1026796A3 (de) | 2001-09-12 |
EP1026796B1 (de) | 2005-11-16 |
EP1026796A2 (de) | 2000-08-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |