DE60023964D1 - Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren - Google Patents

Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren

Info

Publication number
DE60023964D1
DE60023964D1 DE60023964T DE60023964T DE60023964D1 DE 60023964 D1 DE60023964 D1 DE 60023964D1 DE 60023964 T DE60023964 T DE 60023964T DE 60023964 T DE60023964 T DE 60023964T DE 60023964 D1 DE60023964 D1 DE 60023964D1
Authority
DE
Germany
Prior art keywords
manufacturing
same
exposure apparatus
laser
laser apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60023964T
Other languages
English (en)
Other versions
DE60023964T2 (de
Inventor
Tadahiro Ohmi
Nobumasa Suzuki
Nobuyoshi Tanaka
Masaki Hirayama
Hiroshi Ohsawa
Toshikuni Shinohara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP05181399A external-priority patent/JP4302810B2/ja
Priority claimed from JP05180799A external-priority patent/JP4256518B2/ja
Priority claimed from JP05180999A external-priority patent/JP4256519B2/ja
Priority claimed from JP11051812A external-priority patent/JP2000252563A/ja
Priority claimed from JP05180899A external-priority patent/JP4204689B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60023964D1 publication Critical patent/DE60023964D1/de
Publication of DE60023964T2 publication Critical patent/DE60023964T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/0315—Waveguide lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE60023964T 1999-02-01 2000-01-31 Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren Expired - Lifetime DE60023964T2 (de)

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
JP2390299 1999-02-01
JP2390299 1999-02-01
JP05181399A JP4302810B2 (ja) 1999-02-26 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法
JP05180799A JP4256518B2 (ja) 1999-02-26 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法
JP05180999A JP4256519B2 (ja) 1999-02-01 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法
JP5181299 1999-02-26
JP5181399 1999-02-26
JP5181099 1999-02-26
JP5180899 1999-02-26
JP5180999 1999-02-26
JP11051812A JP2000252563A (ja) 1999-02-26 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法
JP5181099 1999-02-26
JP5180799 1999-02-26
JP05180899A JP4204689B2 (ja) 1999-02-26 1999-02-26 レーザ発振装置、露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
DE60023964D1 true DE60023964D1 (de) 2005-12-22
DE60023964T2 DE60023964T2 (de) 2006-06-22

Family

ID=27564011

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60023964T Expired - Lifetime DE60023964T2 (de) 1999-02-01 2000-01-31 Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren

Country Status (3)

Country Link
US (1) US6829279B1 (de)
EP (1) EP1026796B1 (de)
DE (1) DE60023964T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1026796B1 (de) * 1999-02-01 2005-11-16 Tadahiro Ohmi Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren
JP3619141B2 (ja) 2000-11-10 2005-02-09 キヤノン株式会社 投影露光装置及びデバイス製造方法
DE602008005858D1 (de) 2008-03-20 2011-05-12 Univ Ruhr Bochum Verfahren zur Steuerung der Ionenenergie in Radiofrequenzplasmen
US9853501B2 (en) * 2012-02-03 2017-12-26 Nec Corporation Electromagnetic wave transmission sheet and electromagnetic wave transmission device
CN102780149B (zh) * 2012-07-25 2014-08-13 西安电子科技大学 一种光纤耦合输出侧面泵浦固体激光器
CN102780150B (zh) * 2012-07-25 2014-08-13 西安电子科技大学 一种光纤耦合输出激光二极管泵浦固体激光器及制造工艺
US20150218700A1 (en) * 2013-03-08 2015-08-06 Applied Materials, Inc. Chamber component with protective coating suitable for protection against flourine plasma
KR102177738B1 (ko) 2013-03-08 2020-11-11 어플라이드 머티어리얼스, 인코포레이티드 불소 플라즈마에 대한 보호에 적합한 보호 코팅을 갖는 챔버 컴포넌트
DE102015004414A1 (de) * 2015-04-02 2016-10-06 Centrotherm Photovoltaics Ag Plasma-Behandlungsvorrichtung für Wafer

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE263648C (de)
DE3855896T2 (de) * 1987-01-26 1998-01-02 Mitsubishi Electric Corp Plasmavorrichtung
DD263648B5 (de) * 1987-08-31 1996-01-25 Buck Werke Gmbh Einrichtung zur erzeugungs eines Mikrowellenplasmas mit grosser Ausdehnung und Homogenitaet
JP2592085B2 (ja) * 1988-02-09 1997-03-19 マツダ株式会社 アンチロック装置
JPH02237183A (ja) * 1989-03-10 1990-09-19 Mitsubishi Electric Corp 気体レーザ装置
DE3912569A1 (de) * 1989-04-17 1990-10-18 Siemens Ag Verfahren und vorrichtung zur erzeugung eines elektrischen hochfrequenzfeldes in einem nutzraum
DE3912568A1 (de) * 1989-04-17 1990-10-18 Siemens Ag Gas-laser, insbesondere co(pfeil abwaerts)2(pfeil abwaerts)-laser
DE3937491C2 (de) * 1989-11-10 1996-02-15 Deutsche Forsch Luft Raumfahrt Wellenleiterlaser mit Mikrowellenanregung
WO2004089046A1 (ja) * 1991-11-05 2004-10-14 Nobumasa Suzuki 無端環状導波管を有するマイクロ波導入装置及び該装置を備えたプラズマ処理装置
JP3382314B2 (ja) 1993-08-24 2003-03-04 キヤノン株式会社 通信装置及び通信装置の制御方法
US6331994B1 (en) * 1996-07-19 2001-12-18 Canon Kabushiki Kaisha Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube
JP3818405B2 (ja) 1996-07-19 2006-09-06 忠弘 大見 レーザ発振装置
US6049170A (en) * 1996-11-01 2000-04-11 Matsushita Electric Industrial Co., Ltd. High frequency discharge energy supply means and high frequency electrodeless discharge lamp device
US6497783B1 (en) * 1997-05-22 2002-12-24 Canon Kabushiki Kaisha Plasma processing apparatus provided with microwave applicator having annular waveguide and processing method
EP1026796B1 (de) * 1999-02-01 2005-11-16 Tadahiro Ohmi Laservorrichtung, Belichtungsapparat unter Verwendung derselben und Herstellungsverfahren
JP4256520B2 (ja) * 1999-02-26 2009-04-22 忠弘 大見 レーザ発振装置、露光装置及びデバイスの製造方法

Also Published As

Publication number Publication date
US6829279B1 (en) 2004-12-07
DE60023964T2 (de) 2006-06-22
EP1026796A3 (de) 2001-09-12
EP1026796B1 (de) 2005-11-16
EP1026796A2 (de) 2000-08-09

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Legal Events

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8364 No opposition during term of opposition