DE69617288D1 - Verfahren zur Herstellung einer piezoelektrischen Dünnschicht - Google Patents
Verfahren zur Herstellung einer piezoelektrischen DünnschichtInfo
- Publication number
- DE69617288D1 DE69617288D1 DE69617288T DE69617288T DE69617288D1 DE 69617288 D1 DE69617288 D1 DE 69617288D1 DE 69617288 T DE69617288 T DE 69617288T DE 69617288 T DE69617288 T DE 69617288T DE 69617288 D1 DE69617288 D1 DE 69617288D1
- Authority
- DE
- Germany
- Prior art keywords
- producing
- thin film
- piezoelectric thin
- piezoelectric
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/077—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition
- H10N30/078—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by liquid phase deposition by sol-gel deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
- H10N30/8554—Lead-zirconium titanate [PZT] based
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S310/00—Electrical generator or motor structure
- Y10S310/80—Piezoelectric polymers, e.g. PVDF
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3103595 | 1995-02-20 | ||
JP32266295 | 1995-12-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69617288D1 true DE69617288D1 (de) | 2002-01-10 |
DE69617288T2 DE69617288T2 (de) | 2002-05-23 |
Family
ID=26369488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69617288T Expired - Lifetime DE69617288T2 (de) | 1995-02-20 | 1996-02-20 | Verfahren zur Herstellung einer piezoelektrischen Dünnschicht |
Country Status (4)
Country | Link |
---|---|
US (1) | US6543107B1 (de) |
EP (1) | EP0727832B1 (de) |
JP (1) | JP3405498B2 (de) |
DE (1) | DE69617288T2 (de) |
Families Citing this family (51)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3209082B2 (ja) * | 1996-03-06 | 2001-09-17 | セイコーエプソン株式会社 | 圧電体薄膜素子及びその製造方法、並びにこれを用いたインクジェット式記録ヘッド |
EP1179861A3 (de) | 1997-03-27 | 2003-03-19 | Seiko Epson Corporation | Piezoelektrisches Bauelement und dessen Herstellungsverfahren |
US6328433B1 (en) * | 1998-01-22 | 2001-12-11 | Seiko Epson Corporation | Piezoelectric film element and ink-jet recording head using the same |
US6478412B1 (en) * | 1999-01-22 | 2002-11-12 | Kansai Research Institute | Piezoelectric thin film device, its production method, and ink-jet recording head |
JP2001203401A (ja) * | 2000-01-18 | 2001-07-27 | Seiko Epson Corp | 圧電体素子及びその製造方法、インクジェット式記録ヘッド並びにインクジェットプリンタ |
US7527982B1 (en) * | 2000-07-14 | 2009-05-05 | Kabushiki Kaisha Toshiba | Manufacturing method of a semiconductor device including a crystalline insulation film made of perovskite type oxide |
JP4925516B2 (ja) * | 2001-03-30 | 2012-04-25 | 京セラ株式会社 | 積層型圧電アクチュエータ及び噴射装置 |
US6730575B2 (en) | 2001-08-30 | 2004-05-04 | Micron Technology, Inc. | Methods of forming perovskite-type material and capacitor dielectric having perovskite-type crystalline structure |
JP4286492B2 (ja) * | 2002-06-13 | 2009-07-01 | 富士通株式会社 | 強誘電体キャパシタの製造方法 |
JP3974096B2 (ja) * | 2002-09-20 | 2007-09-12 | キヤノン株式会社 | 圧電体素子及びインクジェット記録ヘッド |
JP3999156B2 (ja) * | 2003-03-31 | 2007-10-31 | 日本碍子株式会社 | 圧電/電歪膜型素子及び圧電/電歪磁器組成物 |
US7633210B2 (en) * | 2003-07-28 | 2009-12-15 | Kyocera Corporation | Multi-layer electronic component and method for manufacturing the same, multi-layer piezoelectric element |
JP5013035B2 (ja) | 2003-12-11 | 2012-08-29 | セイコーエプソン株式会社 | 誘電体膜の製造方法及び液体噴射ヘッドの製造方法 |
US7094709B2 (en) * | 2004-06-15 | 2006-08-22 | Braggone Oy | Method of synthesizing hybrid metal oxide materials and applications thereof |
US7739777B2 (en) * | 2004-08-31 | 2010-06-22 | Brother Kogyo Kabushiki Kaisha | Method of manufacturing a liquid transporting apparatus |
JP4868200B2 (ja) * | 2004-09-22 | 2012-02-01 | ブラザー工業株式会社 | 圧電アクチュエータおよびインクジェットヘッドの製造方法 |
WO2006069677A2 (en) * | 2004-12-30 | 2006-07-06 | Cinvention Ag | Combination comprising an agent providing a signal, an implant material and a drug |
CN101098916A (zh) * | 2005-01-13 | 2008-01-02 | 金文申有限公司 | 含有碳纳米颗粒的复合材料 |
CA2591944A1 (en) * | 2005-01-24 | 2006-07-27 | Cinvention Ag | Metal containing composite materials |
EA012083B1 (ru) * | 2005-02-03 | 2009-08-28 | Синвеншен Аг | Материал для доставки лекарств, способ его получения и имплантат, содержащий этот материал |
CN101142149A (zh) * | 2005-03-18 | 2008-03-12 | 金文申有限公司 | 制备多孔烧结金属材料的方法 |
JP5019020B2 (ja) | 2005-03-31 | 2012-09-05 | セイコーエプソン株式会社 | 誘電体膜の製造方法及び圧電体素子の製造方法並びに液体噴射ヘッドの製造方法 |
CA2612195A1 (en) * | 2005-07-01 | 2007-01-11 | Cinvention Ag | Medical devices comprising a reticulated composite material |
CN101238166A (zh) * | 2005-07-01 | 2008-08-06 | 金文申有限公司 | 制备多孔网状复合材料的方法 |
US7673976B2 (en) | 2005-09-16 | 2010-03-09 | Eastman Kodak Company | Continuous ink jet apparatus and method using a plurality of break-off times |
US7273270B2 (en) | 2005-09-16 | 2007-09-25 | Eastman Kodak Company | Ink jet printing device with improved drop selection control |
US7364276B2 (en) * | 2005-09-16 | 2008-04-29 | Eastman Kodak Company | Continuous ink jet apparatus with integrated drop action devices and control circuitry |
JP5088916B2 (ja) * | 2005-10-28 | 2012-12-05 | 富士フイルム株式会社 | 無機膜基板の製造方法 |
JP4998675B2 (ja) * | 2006-03-27 | 2012-08-15 | セイコーエプソン株式会社 | 圧電素子の製造方法及び液体噴射ヘッド |
US7777395B2 (en) * | 2006-10-12 | 2010-08-17 | Eastman Kodak Company | Continuous drop emitter with reduced stimulation crosstalk |
JP4737027B2 (ja) * | 2006-10-13 | 2011-07-27 | セイコーエプソン株式会社 | 圧電体素子の製造方法、及びインクジェット式記録ヘッドの製造方法 |
US7879395B2 (en) * | 2006-10-17 | 2011-02-01 | Qimonda Ag | Method of preparing a coating solution and a corresponding use of the coating solution for coating a substrate |
JP2008205048A (ja) * | 2007-02-16 | 2008-09-04 | Seiko Epson Corp | 圧電素子の製造方法及び液体噴射ヘッドの製造方法 |
US7758171B2 (en) * | 2007-03-19 | 2010-07-20 | Eastman Kodak Company | Aerodynamic error reduction for liquid drop emitters |
DE102007029600A1 (de) * | 2007-06-27 | 2009-01-02 | Siemens Ag | Bleizirkonattitanat mit Scandium-Wolfram-Dotierung, Verfahren zum Herstellen eines piezokeramischen Bauteils unter Verwendung des Bleizirkonattitanats und Verwendung des piezokeramischen Bauteils |
DE102007029613A1 (de) * | 2007-06-27 | 2009-01-02 | Siemens Ag | Bleizirkonattitanat mit Nickel-Wolfram-Dotierung, Verfahren zum Herstellen eines piezokeramischen Bauteils unter Verwendung des Bleizirkonattitanats und Verwendung des piezokeramischen Bauteils |
JP2009054618A (ja) * | 2007-08-23 | 2009-03-12 | Seiko Epson Corp | 圧電素子の製造方法、誘電体層の製造方法、およびアクチュエータの製造方法 |
JP2008153674A (ja) * | 2007-12-25 | 2008-07-03 | Seiko Epson Corp | インクジェット式記録ヘッド及び圧電体素子 |
KR101669953B1 (ko) * | 2010-03-26 | 2016-11-09 | 삼성전자 주식회사 | 산화물 박막, 산화물 박막의 형성 방법 및 산화물 박막을 포함하는 전자 소자 |
JP5974485B2 (ja) * | 2011-09-16 | 2016-08-23 | 株式会社リコー | 電気機械変換素子の製造方法 |
US9162454B2 (en) | 2013-04-11 | 2015-10-20 | Eastman Kodak Company | Printhead including acoustic dampening structure |
US9168740B2 (en) | 2013-04-11 | 2015-10-27 | Eastman Kodak Company | Printhead including acoustic dampening structure |
US10411183B2 (en) | 2014-03-27 | 2019-09-10 | Mitsubishi Materials Corporation | Composition for forming Mn-doped PZT-based piezoelectric film and Mn-doped PZT-based piezoelectric film |
KR102330630B1 (ko) * | 2014-03-28 | 2021-11-23 | 미쓰비시 마테리알 가부시키가이샤 | Mn 및 Nb 도프의 PZT 계 압전체막 형성용 조성물 |
US20150279671A1 (en) * | 2014-03-28 | 2015-10-01 | Industry-Academic Cooperation Foundation, Yonsei University | Method for forming oxide thin film and method for fabricating oxide thin film transistor employing germanium doping |
US9199462B1 (en) | 2014-09-19 | 2015-12-01 | Eastman Kodak Company | Printhead with print artifact supressing cavity |
US20160138182A1 (en) * | 2014-11-18 | 2016-05-19 | Wisconsin Alumni Research Foundation | Methods for forming mixed metal oxide epitaxial films |
JP6891734B2 (ja) * | 2017-08-29 | 2021-06-18 | セイコーエプソン株式会社 | 圧電素子および液体吐出ヘッド |
RU2673444C1 (ru) * | 2017-12-19 | 2018-11-26 | Акционерное общество "Научно-исследовательский институт "Элпа" с опытным производством" | Способ получения пористой пьезокерамики с анизотропией диэлектрической проницаемости и ряда других параметров |
WO2020097594A1 (en) * | 2018-11-09 | 2020-05-14 | Mems Drive, Inc. | Piezo actuator fabrication method |
CN110752286B (zh) * | 2019-10-25 | 2023-04-07 | 业成科技(成都)有限公司 | 压电薄膜及其制备方法和压电薄膜传感器 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4820586A (en) * | 1980-07-23 | 1989-04-11 | Minnesota Mining And Manufacturing Company | Pyroelectric and isotropic piezoelectric polymer blends |
US4946710A (en) * | 1987-06-02 | 1990-08-07 | National Semiconductor Corporation | Method for preparing PLZT, PZT and PLT sol-gels and fabricating ferroelectric thin films |
JPH04506791A (ja) * | 1989-04-21 | 1992-11-26 | アルキャン インターナショナル リミテッド | ゾル・ゲル処理による薄膜セラミックの製造 |
WO1990013149A1 (en) * | 1989-04-27 | 1990-11-01 | Queen's University At Kingston | SOL GEL PROCESS FOR PREPARING Pb(Zr,Ti)O3 THIN FILMS |
US5265315A (en) * | 1990-11-20 | 1993-11-30 | Spectra, Inc. | Method of making a thin-film transducer ink jet head |
US5500988A (en) * | 1990-11-20 | 1996-03-26 | Spectra, Inc. | Method of making a perovskite thin-film ink jet transducer |
JPH04259380A (ja) * | 1991-02-13 | 1992-09-14 | Mitsubishi Materials Corp | Pzt強誘電体薄膜の結晶配向性制御方法 |
US5271956A (en) * | 1991-12-30 | 1993-12-21 | Eastman Kodak Company | Method of forming ternary metal fluoride films by the decomposition of metallo-organic compounds in the presence of a fluorinating agent |
US5271955A (en) * | 1992-04-06 | 1993-12-21 | Motorola, Inc. | Method for making a semiconductor device having an anhydrous ferroelectric thin film |
US5825121A (en) * | 1994-07-08 | 1998-10-20 | Seiko Epson Corporation | Thin film piezoelectric device and ink jet recording head comprising the same |
US5683614A (en) * | 1996-08-16 | 1997-11-04 | Sandia Corporation | Sol-gel type synthesis of Bi2 (Sr,Ta2)O9 using an acetate based system |
US5873154A (en) * | 1996-10-17 | 1999-02-23 | Nokia Mobile Phones Limited | Method for fabricating a resonator having an acoustic mirror |
-
1996
- 1996-02-20 EP EP19960102532 patent/EP0727832B1/de not_active Expired - Lifetime
- 1996-02-20 JP JP03234696A patent/JP3405498B2/ja not_active Expired - Fee Related
- 1996-02-20 DE DE69617288T patent/DE69617288T2/de not_active Expired - Lifetime
-
1997
- 1997-02-28 US US08/807,724 patent/US6543107B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69617288T2 (de) | 2002-05-23 |
JP3405498B2 (ja) | 2003-05-12 |
EP0727832A1 (de) | 1996-08-21 |
US6543107B1 (en) | 2003-04-08 |
EP0727832B1 (de) | 2001-11-28 |
JPH09223830A (ja) | 1997-08-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |