DE69321274T2 - Positiv arbeitende Resistzusammensetzung - Google Patents

Positiv arbeitende Resistzusammensetzung

Info

Publication number
DE69321274T2
DE69321274T2 DE69321274T DE69321274T DE69321274T2 DE 69321274 T2 DE69321274 T2 DE 69321274T2 DE 69321274 T DE69321274 T DE 69321274T DE 69321274 T DE69321274 T DE 69321274T DE 69321274 T2 DE69321274 T2 DE 69321274T2
Authority
DE
Germany
Prior art keywords
resist composition
positive resist
positive
composition
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69321274T
Other languages
English (en)
Other versions
DE69321274D1 (de
Inventor
Haruyoshi Osaki
Hiroshi Moriuma
Yasunori Uetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE69321274D1 publication Critical patent/DE69321274D1/de
Application granted granted Critical
Publication of DE69321274T2 publication Critical patent/DE69321274T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69321274T 1992-03-05 1993-03-04 Positiv arbeitende Resistzusammensetzung Expired - Fee Related DE69321274T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4048438A JPH05249666A (ja) 1992-03-05 1992-03-05 ポジ型レジスト組成物

Publications (2)

Publication Number Publication Date
DE69321274D1 DE69321274D1 (de) 1998-11-05
DE69321274T2 true DE69321274T2 (de) 1999-02-18

Family

ID=12803359

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69321274T Expired - Fee Related DE69321274T2 (de) 1992-03-05 1993-03-04 Positiv arbeitende Resistzusammensetzung

Country Status (8)

Country Link
US (1) US5326665A (de)
EP (1) EP0559204B1 (de)
JP (1) JPH05249666A (de)
KR (1) KR100247825B1 (de)
CA (1) CA2089634A1 (de)
DE (1) DE69321274T2 (de)
MX (1) MX9301211A (de)
TW (1) TW296440B (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0660186A1 (de) * 1993-12-20 1995-06-28 Mitsubishi Chemical Corporation Lichtempfindliche Harzzusammensetzung und Verfahren zur Bildherstellung damit
JPH07281428A (ja) * 1994-04-07 1995-10-27 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP3424341B2 (ja) * 1994-04-11 2003-07-07 住友化学工業株式会社 感光性樹脂組成物
JP3230925B2 (ja) * 1994-04-12 2001-11-19 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP3427562B2 (ja) * 1995-05-09 2003-07-22 住友化学工業株式会社 ポジ型レジスト組成物
US5985507A (en) * 1998-02-18 1999-11-16 Olin Microelectronic Chemicals, Inc. Selected high thermal novolaks and positive-working radiation-sensitive compositions
WO2004020492A1 (ja) 2002-08-30 2004-03-11 Asahi Organic Chemicals Industry Co., Ltd. ノボラック型フェノール樹脂の製造方法
KR101020164B1 (ko) 2003-07-17 2011-03-08 허니웰 인터내셔날 인코포레이티드 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법
EP2651015B1 (de) 2010-12-07 2019-12-18 Mitsubishi Electric Corporation Motor mit eingebetteter leistungsumwandlungsschaltung, flüssigkeitspumpe mit diesem motor mit eingebetteter leistungsumwandlungsschaltung, klimaanlage, in dem diese flüssigkeitspumpe installiert ist, wassererhitzer, in dem dieses flüssigkeitspumpe installiert ist, und anlage mit installiertem motor mit eingebetteter leistungsumwandlungsschaltung
CN108139674B (zh) * 2015-10-19 2021-09-28 日产化学工业株式会社 含有含长链烷基的酚醛清漆的抗蚀剂下层膜形成用组合物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
EP0239423B1 (de) * 1986-03-28 1996-03-20 Japan Synthetic Rubber Co., Ltd. Positiv arbeitende photoempfindliche Kunststoffzusammensetzung
DE3811040A1 (de) * 1988-03-31 1989-10-19 Ciba Geigy Ag Im nahen uv hochaufloesende positiv-fotoresists
US5177172A (en) * 1988-05-31 1993-01-05 Ocg Microelectronic Materials, Inc. Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions
CA1337626C (en) * 1988-07-07 1995-11-28 Haruyoshi Osaki Radiation-sensitive positive resist composition
US5200293A (en) * 1989-02-23 1993-04-06 Ciba-Geigy Corporation Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
JPH02272457A (ja) * 1989-04-13 1990-11-07 Fuji Photo Film Co Ltd 感電離放射線性樹脂組成物
CA2023791A1 (en) * 1989-08-24 1991-02-25 Ayako Ida Radiation-sensitive positive resist composition
JPH087435B2 (ja) * 1989-12-28 1996-01-29 日本ゼオン株式会社 ポジ型レジスト組成物
JPH0450851A (ja) * 1990-06-14 1992-02-19 Sumitomo Chem Co Ltd ポジ型感放射線性レジスト組成物
US5413896A (en) * 1991-01-24 1995-05-09 Japan Synthetic Rubber Co., Ltd. I-ray sensitive positive resist composition

Also Published As

Publication number Publication date
DE69321274D1 (de) 1998-11-05
CA2089634A1 (en) 1993-09-06
MX9301211A (es) 1993-09-30
JPH05249666A (ja) 1993-09-28
TW296440B (de) 1997-01-21
EP0559204A1 (de) 1993-09-08
KR100247825B1 (ko) 2000-06-01
EP0559204B1 (de) 1998-09-30
KR930020225A (ko) 1993-10-19
US5326665A (en) 1994-07-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee