MX9301211A - Composicion de capa protectora de tipo positiva. - Google Patents
Composicion de capa protectora de tipo positiva.Info
- Publication number
- MX9301211A MX9301211A MX9301211A MX9301211A MX9301211A MX 9301211 A MX9301211 A MX 9301211A MX 9301211 A MX9301211 A MX 9301211A MX 9301211 A MX9301211 A MX 9301211A MX 9301211 A MX9301211 A MX 9301211A
- Authority
- MX
- Mexico
- Prior art keywords
- protective layer
- layer composition
- positive type
- type protective
- alkali
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
La presente invención se refiere a una composición de capa protectora, de tipo positivo, que comprende una resina soluble en alcali y un compuesto de quinondiazida, en donde la resina soluble en alcali contiene resina (A), se obtiene a través de una reacción de condensación con al menos un compuesto fenol.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4048438A JPH05249666A (ja) | 1992-03-05 | 1992-03-05 | ポジ型レジスト組成物 |
Publications (1)
Publication Number | Publication Date |
---|---|
MX9301211A true MX9301211A (es) | 1993-09-30 |
Family
ID=12803359
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX9301211A MX9301211A (es) | 1992-03-05 | 1993-03-04 | Composicion de capa protectora de tipo positiva. |
Country Status (8)
Country | Link |
---|---|
US (1) | US5326665A (es) |
EP (1) | EP0559204B1 (es) |
JP (1) | JPH05249666A (es) |
KR (1) | KR100247825B1 (es) |
CA (1) | CA2089634A1 (es) |
DE (1) | DE69321274T2 (es) |
MX (1) | MX9301211A (es) |
TW (1) | TW296440B (es) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0660186A1 (en) * | 1993-12-20 | 1995-06-28 | Mitsubishi Chemical Corporation | Photosensitive resin composition and method for forming a pattern using the composition |
JPH07281428A (ja) * | 1994-04-07 | 1995-10-27 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
JP3424341B2 (ja) * | 1994-04-11 | 2003-07-07 | 住友化学工業株式会社 | 感光性樹脂組成物 |
JP3230925B2 (ja) * | 1994-04-12 | 2001-11-19 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JP3427562B2 (ja) * | 1995-05-09 | 2003-07-22 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
US5985507A (en) * | 1998-02-18 | 1999-11-16 | Olin Microelectronic Chemicals, Inc. | Selected high thermal novolaks and positive-working radiation-sensitive compositions |
WO2004020492A1 (ja) | 2002-08-30 | 2004-03-11 | Asahi Organic Chemicals Industry Co., Ltd. | ノボラック型フェノール樹脂の製造方法 |
EP1649322A4 (en) | 2003-07-17 | 2007-09-19 | Honeywell Int Inc | PLANARIZATION FILMS FOR ADVANCED MICROELECTRONIC DEVICES AND APPLICATIONS AND METHODS FOR PRODUCING SAID FILMS |
EP2651015B1 (en) | 2010-12-07 | 2019-12-18 | Mitsubishi Electric Corporation | Motor with embedded power conversion circuit, liquid pump in which this motor with embedded power conversion circuit is installed, air conditioner in which this liquid pump is installed, water heater in which this liquid pump is installed, and equipment in which motor with embedded power conversion circuit is installed |
US20180314154A1 (en) * | 2015-10-19 | 2018-11-01 | Nissan Chemical Industries, Ltd. | Resist underlayer film-forming composition containing long chain alkyl group-containing novolac |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0654384B2 (ja) * | 1985-08-09 | 1994-07-20 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
DE3751743T2 (de) * | 1986-03-28 | 1996-11-14 | Japan Synthetic Rubber Co Ltd | Positiv arbeitende photoempfindliche Kunststoffzusammensetzung |
DE3811040A1 (de) * | 1988-03-31 | 1989-10-19 | Ciba Geigy Ag | Im nahen uv hochaufloesende positiv-fotoresists |
US5177172A (en) * | 1988-05-31 | 1993-01-05 | Ocg Microelectronic Materials, Inc. | Selected methylol-substituted trihydroxybenzophenones and their use in phenolic resin compositions |
CA1337626C (en) * | 1988-07-07 | 1995-11-28 | Haruyoshi Osaki | Radiation-sensitive positive resist composition |
US5200293A (en) * | 1989-02-23 | 1993-04-06 | Ciba-Geigy Corporation | Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound |
JPH02272457A (ja) * | 1989-04-13 | 1990-11-07 | Fuji Photo Film Co Ltd | 感電離放射線性樹脂組成物 |
CA2023791A1 (en) * | 1989-08-24 | 1991-02-25 | Ayako Ida | Radiation-sensitive positive resist composition |
JPH087435B2 (ja) * | 1989-12-28 | 1996-01-29 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
JPH0450851A (ja) * | 1990-06-14 | 1992-02-19 | Sumitomo Chem Co Ltd | ポジ型感放射線性レジスト組成物 |
US5413896A (en) * | 1991-01-24 | 1995-05-09 | Japan Synthetic Rubber Co., Ltd. | I-ray sensitive positive resist composition |
-
1992
- 1992-03-05 JP JP4048438A patent/JPH05249666A/ja active Pending
-
1993
- 1993-02-16 CA CA002089634A patent/CA2089634A1/en not_active Abandoned
- 1993-03-01 US US08/024,499 patent/US5326665A/en not_active Expired - Fee Related
- 1993-03-03 KR KR1019930003062A patent/KR100247825B1/ko not_active IP Right Cessation
- 1993-03-04 EP EP93103508A patent/EP0559204B1/en not_active Expired - Lifetime
- 1993-03-04 MX MX9301211A patent/MX9301211A/es not_active IP Right Cessation
- 1993-03-04 DE DE69321274T patent/DE69321274T2/de not_active Expired - Fee Related
- 1993-03-04 TW TW082101582A patent/TW296440B/zh active
Also Published As
Publication number | Publication date |
---|---|
DE69321274T2 (de) | 1999-02-18 |
CA2089634A1 (en) | 1993-09-06 |
EP0559204B1 (en) | 1998-09-30 |
EP0559204A1 (en) | 1993-09-08 |
KR930020225A (ko) | 1993-10-19 |
TW296440B (es) | 1997-01-21 |
US5326665A (en) | 1994-07-05 |
DE69321274D1 (de) | 1998-11-05 |
KR100247825B1 (ko) | 2000-06-01 |
JPH05249666A (ja) | 1993-09-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG | Grant or registration | ||
MM | Annulment or lapse due to non-payment of fees |