DE69318239T2 - Halbleiterbauelement mit planarer Grenzfläche - Google Patents

Halbleiterbauelement mit planarer Grenzfläche

Info

Publication number
DE69318239T2
DE69318239T2 DE69318239T DE69318239T DE69318239T2 DE 69318239 T2 DE69318239 T2 DE 69318239T2 DE 69318239 T DE69318239 T DE 69318239T DE 69318239 T DE69318239 T DE 69318239T DE 69318239 T2 DE69318239 T2 DE 69318239T2
Authority
DE
Germany
Prior art keywords
layer
region
breakdown voltage
semiconductor region
closest
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69318239T
Other languages
German (de)
English (en)
Other versions
DE69318239D1 (de
Inventor
Hideo Hitachi-shi Kobayashi
Mutsuhiro Hitachi-Shi Mori
Yasunori Hitachi-Shi Nakano
Yasumichi Hitachi-Shi Yasuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69318239D1 publication Critical patent/DE69318239D1/de
Publication of DE69318239T2 publication Critical patent/DE69318239T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801—DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7802—Vertical DMOS transistors, i.e. VDMOS transistors
    • H01L29/7813—Vertical DMOS transistors, i.e. VDMOS transistors with trench gate electrode, e.g. UMOS transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
    • H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
    • H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
    • H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
    • H01L29/0619—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE] with a supplementary region doped oppositely to or in rectifying contact with the semiconductor containing or contacting region, e.g. guard rings with PN or Schottky junction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
    • H01L29/0688—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions characterised by the particular shape of a junction between semiconductor regions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/402—Field plates
    • H01L29/404—Multiple field plate structures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/408—Electrodes ; Multistep manufacturing processes therefor with an insulating layer with a particular dielectric or electrostatic property, e.g. with static charges or for controlling trapped charges or moving ions, or with a plate acting on the insulator potential or the insulator charges, e.g. for controlling charges effect or potential distribution in the insulating layer, or with a semi-insulating layer contacting directly the semiconductor surface
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P27/00—Arrangements or methods for the control of AC motors characterised by the kind of supply voltage
    • H02P27/04—Arrangements or methods for the control of AC motors characterised by the kind of supply voltage using variable-frequency supply voltage, e.g. inverter or converter supply voltage
    • H02P27/06—Arrangements or methods for the control of AC motors characterised by the kind of supply voltage using variable-frequency supply voltage, e.g. inverter or converter supply voltage using dc to ac converters or inverters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Bipolar Transistors (AREA)
  • Thyristors (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Integrated Circuits (AREA)
DE69318239T 1992-09-17 1993-09-15 Halbleiterbauelement mit planarer Grenzfläche Expired - Lifetime DE69318239T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4247547A JP2812093B2 (ja) 1992-09-17 1992-09-17 プレーナ接合を有する半導体装置

Publications (2)

Publication Number Publication Date
DE69318239D1 DE69318239D1 (de) 1998-06-04
DE69318239T2 true DE69318239T2 (de) 1998-10-22

Family

ID=17165123

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69318239T Expired - Lifetime DE69318239T2 (de) 1992-09-17 1993-09-15 Halbleiterbauelement mit planarer Grenzfläche

Country Status (5)

Country Link
US (1) US5804868A (ja)
EP (1) EP0588320B1 (ja)
JP (1) JP2812093B2 (ja)
KR (1) KR940007968A (ja)
DE (1) DE69318239T2 (ja)

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JP3111827B2 (ja) * 1994-09-20 2000-11-27 株式会社日立製作所 半導体装置及びそれを使った電力変換装置
DE19606983C2 (de) * 1996-02-24 2000-01-20 Semikron Elektronik Gmbh Leistungshalbleiterbauelement mit planarem Aufbau
JPH1032313A (ja) * 1996-07-17 1998-02-03 Toshiba Corp 半導体装置とその製造方法
KR100415189B1 (ko) * 1997-01-10 2004-03-19 페어차일드코리아반도체 주식회사 전계제한환을 가지는 바이폴라트랜지스터
FR2784801B1 (fr) * 1998-10-19 2000-12-22 St Microelectronics Sa Composant de puissance portant des interconnexions
FR2785090B1 (fr) 1998-10-23 2001-01-19 St Microelectronics Sa Composant de puissance portant des interconnexions
GB2373634B (en) * 2000-10-31 2004-12-08 Fuji Electric Co Ltd Semiconductor device
US6927988B2 (en) * 2002-05-28 2005-08-09 Ballard Power Systems Corporation Method and apparatus for measuring fault diagnostics on insulated gate bipolar transistor converter circuits
US8093652B2 (en) * 2002-08-28 2012-01-10 Ixys Corporation Breakdown voltage for power devices
DE102004017723B4 (de) 2003-04-10 2011-12-08 Fuji Electric Co., Ltd In Rückwärtsrichtung sperrendes Halbleiterbauteil und Verfahren zu seiner Herstellung
JP4469584B2 (ja) 2003-09-12 2010-05-26 株式会社東芝 半導体装置
JP4202970B2 (ja) * 2004-06-10 2008-12-24 株式会社東芝 半導体装置及びその製造方法、半導体装置の欠陥検出方法
EP1722423B1 (en) * 2005-05-12 2016-07-06 Ixys Corporation Stable diodes for low and high frequency applications
JP5225549B2 (ja) * 2006-03-15 2013-07-03 日本碍子株式会社 半導体素子
US8110888B2 (en) 2007-09-18 2012-02-07 Microsemi Corporation Edge termination for high voltage semiconductor device
JP5381420B2 (ja) * 2008-07-22 2014-01-08 富士電機株式会社 半導体装置
JP5477681B2 (ja) 2008-07-29 2014-04-23 三菱電機株式会社 半導体装置
JP5195186B2 (ja) * 2008-09-05 2013-05-08 三菱電機株式会社 半導体装置の製造方法
US8350352B2 (en) * 2009-11-02 2013-01-08 Analog Devices, Inc. Bipolar transistor
JP5543758B2 (ja) 2009-11-19 2014-07-09 ルネサスエレクトロニクス株式会社 半導体装置
JP5719167B2 (ja) 2010-12-28 2015-05-13 ルネサスエレクトロニクス株式会社 半導体装置
JP5660959B2 (ja) * 2011-03-31 2015-01-28 本田技研工業株式会社 受光装置
JP5635937B2 (ja) 2011-03-31 2014-12-03 本田技研工業株式会社 固体撮像装置
JP5635938B2 (ja) 2011-03-31 2014-12-03 本田技研工業株式会社 固体撮像装置
JP5829036B2 (ja) 2011-03-31 2015-12-09 本田技研工業株式会社 単位画素の信号加算方法
CN102354703B (zh) * 2011-10-19 2013-01-23 扬州杰利半导体有限公司 一种平面结构型超高压二极管芯片
CN102956685B (zh) * 2011-10-19 2015-05-20 扬州杰利半导体有限公司 一种耐高温平面结构型超高压二极管芯片
CN102610635B (zh) * 2012-03-26 2014-04-02 大连理工大学 一种高密度缓变场限环结构及其制造工艺
JP6089733B2 (ja) * 2013-01-30 2017-03-08 富士電機株式会社 半導体装置
DE112013006681B4 (de) * 2013-02-15 2022-01-20 Denso Corporation Halbleitervorrichtung
CN104332403A (zh) * 2013-07-22 2015-02-04 无锡华润上华半导体有限公司 半导体功率器件及其制造方法
DE102016120300A1 (de) * 2016-10-25 2018-04-26 Infineon Technologies Austria Ag Hochspannungsabschlussstruktur einer Leistungshalbleitervorrichtung
JP6637012B2 (ja) * 2016-11-10 2020-01-29 ローム株式会社 半導体装置
WO2018095870A1 (en) * 2016-11-24 2018-05-31 Abb Schweiz Ag Power semiconductor device with floating field ring termination
CN107579057A (zh) * 2017-09-14 2018-01-12 全球能源互联网研究院 能进行终端横向耐压测试的igbt版图
WO2020231304A1 (en) * 2019-05-14 2020-11-19 Prismatic Sensors Ab X-ray sensor having a field limiting ring configuration
JPWO2023120715A1 (ja) * 2021-12-23 2023-06-29

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Also Published As

Publication number Publication date
JPH0697469A (ja) 1994-04-08
EP0588320A3 (en) 1994-09-21
KR940007968A (ko) 1994-04-28
US5804868A (en) 1998-09-08
EP0588320A2 (en) 1994-03-23
JP2812093B2 (ja) 1998-10-15
DE69318239D1 (de) 1998-06-04
EP0588320B1 (en) 1998-04-29

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