DE69013790T2 - Verfahren und Vorrichtung zur Positionsbestimmung. - Google Patents
Verfahren und Vorrichtung zur Positionsbestimmung.Info
- Publication number
- DE69013790T2 DE69013790T2 DE69013790T DE69013790T DE69013790T2 DE 69013790 T2 DE69013790 T2 DE 69013790T2 DE 69013790 T DE69013790 T DE 69013790T DE 69013790 T DE69013790 T DE 69013790T DE 69013790 T2 DE69013790 T2 DE 69013790T2
- Authority
- DE
- Germany
- Prior art keywords
- determining position
- determining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1203053A JP2791120B2 (ja) | 1989-08-04 | 1989-08-04 | 位置検出装置及び方法 |
JP2136827A JP2874284B2 (ja) | 1990-05-25 | 1990-05-25 | 間隔測定装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69013790D1 DE69013790D1 (de) | 1994-12-08 |
DE69013790T2 true DE69013790T2 (de) | 1995-05-04 |
Family
ID=26470322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69013790T Expired - Fee Related DE69013790T2 (de) | 1989-08-04 | 1990-08-03 | Verfahren und Vorrichtung zur Positionsbestimmung. |
Country Status (3)
Country | Link |
---|---|
US (1) | US5114236A (de) |
EP (1) | EP0411966B1 (de) |
DE (1) | DE69013790T2 (de) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5319444A (en) * | 1988-02-16 | 1994-06-07 | Canon Kabushiki Kaisha | Position detecting method and apparatus |
EP0488798B1 (de) * | 1990-11-30 | 1998-07-08 | Canon Kabushiki Kaisha | Verfahren zur Positionsdetektion |
JP2796899B2 (ja) * | 1991-02-16 | 1998-09-10 | 住友重機械工業株式会社 | 色収差2重焦点装置における帯域光および複色光照明方法 |
JPH0540013A (ja) * | 1991-08-05 | 1993-02-19 | Canon Inc | ずれ測定方法及びこの方法を用いた露光装置 |
JP3187093B2 (ja) * | 1991-09-27 | 2001-07-11 | キヤノン株式会社 | 位置ずれ測定装置 |
JPH0590126A (ja) * | 1991-09-27 | 1993-04-09 | Canon Inc | 位置検出装置 |
CA2078732A1 (en) * | 1991-09-27 | 1993-03-28 | Koichi Sentoku | Displacement measuring device and displacement measuring method |
JP3008654B2 (ja) * | 1992-02-21 | 2000-02-14 | キヤノン株式会社 | 位置検出装置 |
JP2833908B2 (ja) * | 1992-03-04 | 1998-12-09 | 山形日本電気株式会社 | 露光装置における位置決め装置 |
US5585923A (en) * | 1992-11-14 | 1996-12-17 | Canon Kabushiki Kaisha | Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means |
US5455679A (en) * | 1993-02-22 | 1995-10-03 | Canon Kabushiki Kaisha | Position detecting system |
JPH06311315A (ja) * | 1993-04-26 | 1994-11-04 | Canon Inc | 画像読取装置 |
JP3428705B2 (ja) * | 1993-10-20 | 2003-07-22 | キヤノン株式会社 | 位置検出装置及びそれを用いた半導体素子の製造方法 |
US5625453A (en) * | 1993-10-26 | 1997-04-29 | Canon Kabushiki Kaisha | System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating |
JP3379200B2 (ja) * | 1994-03-25 | 2003-02-17 | 株式会社ニコン | 位置検出装置 |
US5469263A (en) * | 1994-07-01 | 1995-11-21 | Motorola, Inc. | Method for alignment in photolithographic processes |
KR0132269B1 (ko) * | 1994-08-24 | 1998-04-11 | 이대원 | 노광장비에서의 자동초점과 자동수평 조절장치 및 조절방법 |
JPH0886612A (ja) * | 1994-09-19 | 1996-04-02 | Canon Inc | 光ヘテロダイン干渉を利用した位置ずれ検出装置 |
JPH1022213A (ja) * | 1996-06-28 | 1998-01-23 | Canon Inc | 位置検出装置及びそれを用いたデバイスの製造方法 |
JPH11241908A (ja) * | 1997-12-03 | 1999-09-07 | Canon Inc | 位置検出装置及びそれを用いたデバイスの製造方法 |
US5939611A (en) * | 1998-02-24 | 1999-08-17 | Data I/O Corporation | Method and system for calibrating a device handler |
US6130902A (en) * | 1998-05-26 | 2000-10-10 | Shimoji; Yutaka | Solid state laser chip |
US6312373B1 (en) * | 1998-09-22 | 2001-11-06 | Nikon Corporation | Method of manufacturing an optical system |
JP3019095B1 (ja) * | 1998-12-22 | 2000-03-13 | 日本電気株式会社 | 有機薄膜elデバイスの製造方法 |
JP2003007601A (ja) * | 2001-06-26 | 2003-01-10 | Canon Inc | 2つの物体の間隔測定方法とそれを用いた半導体露光方法、および間隔測定装置、半導体露光装置 |
DE10151216A1 (de) * | 2001-10-16 | 2003-04-24 | Zeiss Carl Jena Gmbh | Verfahren zur optischen Erfassung von charakteristischen Größen einer beleuchteten Probe |
CN100337089C (zh) * | 2002-09-20 | 2007-09-12 | Asml荷兰有限公司 | 器件检验 |
CN100390502C (zh) * | 2003-03-12 | 2008-05-28 | 中国科学院沈阳自动化研究所 | 一种精密平行度测量方法 |
EP1630857A4 (de) * | 2003-05-28 | 2008-04-16 | Nikon Corp | Positions-informationsmessverfahren und -einrichtung und belichtungsverfahren und -system |
US7247952B2 (en) * | 2003-10-30 | 2007-07-24 | Hewlett-Packard Development Company, L.P. | Optical targets |
US7573580B2 (en) | 2003-11-17 | 2009-08-11 | Asml Holding N.V. | Optical position measuring system and method using a low coherence light source |
US8422027B2 (en) * | 2010-06-08 | 2013-04-16 | Nikon Corporation | Imaging optical system for producing control information regarding lateral movement of an image plane or an object plane |
DE102012221566A1 (de) * | 2012-11-26 | 2014-05-28 | Dr. Johannes Heidenhain Gmbh | Optische Positionsmesseinrichtung |
JP2014220263A (ja) * | 2013-04-30 | 2014-11-20 | キヤノン株式会社 | リソグラフィ装置、及び物品の製造方法 |
WO2015008365A1 (ja) * | 2013-07-18 | 2015-01-22 | ギガフォトン株式会社 | 露光装置 |
FR3014212B1 (fr) * | 2013-12-04 | 2017-05-26 | Fogale Nanotech | Dispositif et procede de positionnement de masque de photolithographie par methode optique sans contact |
US10592080B2 (en) | 2014-07-31 | 2020-03-17 | Microsoft Technology Licensing, Llc | Assisted presentation of application windows |
US10678412B2 (en) | 2014-07-31 | 2020-06-09 | Microsoft Technology Licensing, Llc | Dynamic joint dividers for application windows |
US10254942B2 (en) | 2014-07-31 | 2019-04-09 | Microsoft Technology Licensing, Llc | Adaptive sizing and positioning of application windows |
US9423360B1 (en) * | 2015-02-09 | 2016-08-23 | Microsoft Technology Licensing, Llc | Optical components |
US11086216B2 (en) | 2015-02-09 | 2021-08-10 | Microsoft Technology Licensing, Llc | Generating electronic components |
US9429692B1 (en) | 2015-02-09 | 2016-08-30 | Microsoft Technology Licensing, Llc | Optical components |
US9827209B2 (en) | 2015-02-09 | 2017-11-28 | Microsoft Technology Licensing, Llc | Display system |
US9513480B2 (en) | 2015-02-09 | 2016-12-06 | Microsoft Technology Licensing, Llc | Waveguide |
US9372347B1 (en) | 2015-02-09 | 2016-06-21 | Microsoft Technology Licensing, Llc | Display system |
US10317677B2 (en) | 2015-02-09 | 2019-06-11 | Microsoft Technology Licensing, Llc | Display system |
US10018844B2 (en) | 2015-02-09 | 2018-07-10 | Microsoft Technology Licensing, Llc | Wearable image display system |
US9535253B2 (en) | 2015-02-09 | 2017-01-03 | Microsoft Technology Licensing, Llc | Display system |
US9823061B2 (en) * | 2015-06-15 | 2017-11-21 | Zygo Corporation | Displacement measurement of deformable bodies |
JP6686564B2 (ja) * | 2016-03-11 | 2020-04-22 | コニカミノルタ株式会社 | 画像読取装置 |
WO2017167637A1 (en) | 2016-03-30 | 2017-10-05 | Asml Netherlands B.V. | Substrate edge detection |
CN116830155A (zh) * | 2020-05-11 | 2023-09-29 | 康耐视公司 | 用于从三维图像中提取轮廓的方法和装置 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4037969A (en) * | 1976-04-02 | 1977-07-26 | Bell Telephone Laboratories, Incorporated | Zone plate alignment marks |
US4326805A (en) * | 1980-04-11 | 1982-04-27 | Bell Telephone Laboratories, Incorporated | Method and apparatus for aligning mask and wafer members |
US4355892A (en) * | 1980-12-18 | 1982-10-26 | Censor Patent- Und Versuchs-Anstalt | Method for the projection printing |
US4398824A (en) * | 1981-04-15 | 1983-08-16 | Bell Telephone Laboratories, Incorporated | Wafer tilt compensation in zone plate alignment system |
JPS5979527A (ja) * | 1982-10-29 | 1984-05-08 | Hitachi Ltd | パタ−ン検出装置 |
US4514858A (en) * | 1983-03-15 | 1985-04-30 | Micronix Partners | Lithography system |
JPH0732109B2 (ja) * | 1983-10-07 | 1995-04-10 | 株式会社日立製作所 | 光露光方法 |
US4748333A (en) * | 1986-03-31 | 1988-05-31 | Nippon Kogaku K. K. | Surface displacement sensor with opening angle control |
FR2598797B1 (fr) * | 1986-05-07 | 1990-05-11 | Nippon Telegraph & Telephone | Procede de mesure et/ou d'ajustement du deplacement d'un objet et appareil pour la mise en oeuvre de ce procede |
US4814829A (en) * | 1986-06-12 | 1989-03-21 | Canon Kabushiki Kaisha | Projection exposure apparatus |
JPS63220521A (ja) * | 1987-03-10 | 1988-09-13 | Canon Inc | 焦点合せ装置 |
JPS6441805A (en) * | 1987-08-07 | 1989-02-14 | Sumitomo Heavy Industries | Position detecting apparatus of two bodies, which are separated by minute distance |
US4857744A (en) * | 1987-07-29 | 1989-08-15 | Hitachi, Ltd. | Optical projection printing apparatus wherein wafer mark has a grating pitch in the sagittal plane of the first optical system |
US4988197A (en) * | 1987-12-28 | 1991-01-29 | Kabushiki Kaisha Toshiba | Method and apparatus for aligning two objects, and method and apparatus for providing a desired gap between two objects |
-
1990
- 1990-08-03 DE DE69013790T patent/DE69013790T2/de not_active Expired - Fee Related
- 1990-08-03 US US07/562,656 patent/US5114236A/en not_active Expired - Lifetime
- 1990-08-03 EP EP90308601A patent/EP0411966B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0411966A2 (de) | 1991-02-06 |
US5114236A (en) | 1992-05-19 |
EP0411966A3 (en) | 1991-04-17 |
DE69013790D1 (de) | 1994-12-08 |
EP0411966B1 (de) | 1994-11-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |