DE68924024D1 - Verfahren und Vorrichtung zur zweidimensionalen Positionsdetektion. - Google Patents

Verfahren und Vorrichtung zur zweidimensionalen Positionsdetektion.

Info

Publication number
DE68924024D1
DE68924024D1 DE68924024T DE68924024T DE68924024D1 DE 68924024 D1 DE68924024 D1 DE 68924024D1 DE 68924024 T DE68924024 T DE 68924024T DE 68924024 T DE68924024 T DE 68924024T DE 68924024 D1 DE68924024 D1 DE 68924024D1
Authority
DE
Germany
Prior art keywords
position detection
dimensional position
dimensional
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68924024T
Other languages
English (en)
Other versions
DE68924024T2 (de
Inventor
Hironobu Kitajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE68924024D1 publication Critical patent/DE68924024D1/de
Application granted granted Critical
Publication of DE68924024T2 publication Critical patent/DE68924024T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE68924024T 1988-09-12 1989-09-11 Verfahren und Vorrichtung zur zweidimensionalen Positionsdetektion. Expired - Fee Related DE68924024T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63227759A JPH07119574B2 (ja) 1988-09-12 1988-09-12 二次元位置検出方法

Publications (2)

Publication Number Publication Date
DE68924024D1 true DE68924024D1 (de) 1995-10-05
DE68924024T2 DE68924024T2 (de) 1996-05-09

Family

ID=16865932

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68924024T Expired - Fee Related DE68924024T2 (de) 1988-09-12 1989-09-11 Verfahren und Vorrichtung zur zweidimensionalen Positionsdetektion.

Country Status (4)

Country Link
US (1) US4998823A (de)
EP (1) EP0359170B1 (de)
JP (1) JPH07119574B2 (de)
DE (1) DE68924024T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4943560A (en) * 1988-04-06 1990-07-24 Regents Of The University Of Minnesota Solvent system for chronic vascular infusion of hydrophobic drugs
DE4002743A1 (de) * 1990-01-31 1991-08-08 Fraunhofer Ges Forschung Vorrichtung zum messen der position eines filamentbuendels
JPH0447222A (ja) * 1990-06-13 1992-02-17 Olympus Optical Co Ltd 高精度位置比較装置
WO2005106385A1 (ja) * 2004-04-27 2005-11-10 Sumitomo Heavy Industries, Ltd. 検出装置及びステージ装置
US7825972B2 (en) * 2004-10-08 2010-11-02 Cooper Allan J Processing method device and system to produce a focused image signal from an unfocused image
CN103635758B (zh) 2011-03-14 2017-08-01 日光储备技术有限公司 用于使光源指向瞄准的设备和方法
AU2012229999B2 (en) 2011-03-14 2018-07-05 Solarreserve Technology, Llc Optical proxy for sensing and pointing of light sources
US8604413B2 (en) * 2011-06-13 2013-12-10 Mitutoyo Corporation Optical encoder including displacement sensing normal to the encoder scale grating surface
AU2013212133B2 (en) * 2012-01-24 2016-05-12 Solarreserve Technology, Llc Compound optical proxy for sensing and pointing of light sources
US9910156B2 (en) 2012-06-30 2018-03-06 Solarreserve Technology, Llc Using optical proxy light to aim redirected light at a target using heliostats
US10021372B2 (en) 2016-09-16 2018-07-10 Qualcomm Incorporated Systems and methods for improved depth sensing

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
US4405238A (en) * 1981-05-20 1983-09-20 Ibm Corporation Alignment method and apparatus for x-ray or optical lithography
FR2538923A1 (fr) * 1982-12-30 1984-07-06 Thomson Csf Procede et dispositif d'alignement optique de motifs dans deux plans rapproches dans un appareil d'exposition comprenant une source de rayonnement divergent
JPH0810126B2 (ja) * 1986-09-16 1996-01-31 株式会社ニコン アライメント方法
US4815854A (en) * 1987-01-19 1989-03-28 Nec Corporation Method of alignment between mask and semiconductor wafer

Also Published As

Publication number Publication date
JPH0275903A (ja) 1990-03-15
EP0359170A3 (de) 1991-06-12
EP0359170A2 (de) 1990-03-21
US4998823A (en) 1991-03-12
EP0359170B1 (de) 1995-08-30
JPH07119574B2 (ja) 1995-12-20
DE68924024T2 (de) 1996-05-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee