DE68927140T2 - Photolackzusammensetzung - Google Patents

Photolackzusammensetzung

Info

Publication number
DE68927140T2
DE68927140T2 DE68927140T DE68927140T DE68927140T2 DE 68927140 T2 DE68927140 T2 DE 68927140T2 DE 68927140 T DE68927140 T DE 68927140T DE 68927140 T DE68927140 T DE 68927140T DE 68927140 T2 DE68927140 T2 DE 68927140T2
Authority
DE
Germany
Prior art keywords
photoresist composition
photoresist
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68927140T
Other languages
English (en)
Other versions
DE68927140D1 (de
Inventor
Yasunori Uetani
Makoto Hanabata
Hirotoshi Nakanishi
Koji Kuwana
Yukio Hanamoto
Fumio Oi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Application granted granted Critical
Publication of DE68927140D1 publication Critical patent/DE68927140D1/de
Publication of DE68927140T2 publication Critical patent/DE68927140T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE68927140T 1988-06-13 1989-06-12 Photolackzusammensetzung Expired - Fee Related DE68927140T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14649888 1988-06-13

Publications (2)

Publication Number Publication Date
DE68927140D1 DE68927140D1 (de) 1996-10-17
DE68927140T2 true DE68927140T2 (de) 1997-04-30

Family

ID=15408983

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68927140T Expired - Fee Related DE68927140T2 (de) 1988-06-13 1989-06-12 Photolackzusammensetzung

Country Status (7)

Country Link
US (1) US5059507A (de)
EP (1) EP0346808B1 (de)
JP (1) JP2629356B2 (de)
KR (1) KR0131768B1 (de)
CA (1) CA1337625C (de)
DE (1) DE68927140T2 (de)
MX (1) MX169700B (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2715480B2 (ja) * 1988-10-13 1998-02-18 住友化学工業株式会社 ポジ型レジスト用組成物
CA2023791A1 (en) * 1989-08-24 1991-02-25 Ayako Ida Radiation-sensitive positive resist composition
US5322757A (en) * 1989-09-08 1994-06-21 Ocg Microelectronic Materials, Inc. Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present
JP2629988B2 (ja) * 1989-12-14 1997-07-16 住友化学工業株式会社 ポジ型レジスト組成物
JP2715327B2 (ja) * 1990-01-19 1998-02-18 富士写真フイルム株式会社 感光性樹脂組成物
JP2715328B2 (ja) * 1990-01-19 1998-02-18 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
EP0525185B1 (de) * 1991-01-11 1997-07-16 Sumitomo Chemical Company Limited Positivresistzusammensetzung
JP3070116B2 (ja) * 1991-03-25 2000-07-24 住友化学工業株式会社 多価フェノール化合物およびそれを用いてなるポジ型レジスト組成物
JP2976597B2 (ja) * 1991-04-17 1999-11-10 住友化学工業株式会社 キノンジアジドスルホン酸エステルの製造方法
EP0510670B1 (de) * 1991-04-26 1996-09-25 Sumitomo Chemical Company, Limited Positivarbeitende Resistzusammensetzung
JP3139088B2 (ja) * 1991-04-26 2001-02-26 住友化学工業株式会社 ポジ型レジスト組成物
MX9201930A (es) * 1991-04-26 1992-11-01 Sumitomo Chemical Co Composicion de capa protectora positiva (caso 516303).
JP3064595B2 (ja) * 1991-04-26 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
EP0658807B1 (de) * 1993-12-17 2000-04-05 Fuji Photo Film Co., Ltd. Positiv-arbeitende Fotolackzusammensetzung
JPH0859530A (ja) * 1994-06-15 1996-03-05 Sumitomo Chem Co Ltd ポリヒドロキシ化合物及びそれを含有するポジ型レジスト組成物
JP3444562B2 (ja) * 1995-03-28 2003-09-08 東京応化工業株式会社 レジスト溶液の調製方法
JP3427562B2 (ja) * 1995-05-09 2003-07-22 住友化学工業株式会社 ポジ型レジスト組成物
US6040107A (en) * 1998-02-06 2000-03-21 Olin Microelectronic Chemicals, Inc. Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl ether-containing phenolics and their use in radiation sensitive mixtures
US6653043B1 (en) * 1999-11-01 2003-11-25 Kansai Research Institute, Inc. Active particle, photosensitive resin composition, and process for forming pattern
US20030033252A1 (en) * 2001-08-09 2003-02-13 Buttridge Kelly A. Methods and systems for check processing using blank checks at a point-of-sale
WO2006013697A1 (ja) 2004-08-02 2006-02-09 Fujifilm Corporation 着色硬化性組成物、カラーフィルタ及びその製造方法
JP5247093B2 (ja) 2007-09-14 2013-07-24 富士フイルム株式会社 アゾ化合物、硬化性組成物、カラーフィルタ及びその製造方法
JP5473239B2 (ja) 2008-03-25 2014-04-16 富士フイルム株式会社 金属フタロシアニン染料混合物、硬化性組成物、カラーフィルタおよびカラーフィルタの製造方法
JP5315267B2 (ja) 2009-03-26 2013-10-16 富士フイルム株式会社 着色硬化性組成物、カラーフィルタ及びその製造方法、並びに、キノフタロン色素
JP5791874B2 (ja) 2010-03-31 2015-10-07 富士フイルム株式会社 着色組成物、インクジェット用インク、カラーフィルタ及びその製造方法、固体撮像素子、並びに表示装置
CN103086859B (zh) * 2011-11-08 2015-11-11 清华大学 2,4-二羟基-5,6-取代-1-卤代苯衍生物、其合成方法及其应用
JP2017171837A (ja) * 2016-03-25 2017-09-28 住友化学株式会社 レゾルシンとアセトンとの縮合物の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL78797C (de) * 1949-07-23
US3046119A (en) * 1950-08-01 1962-07-24 Azoplate Corp Light sensitive material for printing and process for making printing plates
JPS55139375A (en) * 1979-04-18 1980-10-31 Sumitomo Chem Co Ltd Production of hydroxyflavan
JPS5651470A (en) * 1979-09-13 1981-05-09 Wellcome Found Flavan derivative
JPS6197278A (ja) * 1984-10-16 1986-05-15 Mitsubishi Chem Ind Ltd ナフトキノンジアジド系化合物及び該化合物を含有するポジ型フオトレジスト組成物
JPH0814696B2 (ja) * 1987-09-17 1996-02-14 富士写真フイルム株式会社 感光性樹脂組成物

Also Published As

Publication number Publication date
JPH0284650A (ja) 1990-03-26
EP0346808A2 (de) 1989-12-20
MX169700B (es) 1993-07-19
US5059507A (en) 1991-10-22
KR0131768B1 (ko) 1998-04-13
EP0346808A3 (de) 1991-04-03
JP2629356B2 (ja) 1997-07-09
CA1337625C (en) 1995-11-28
KR900000727A (ko) 1990-01-31
EP0346808B1 (de) 1996-09-11
DE68927140D1 (de) 1996-10-17

Similar Documents

Publication Publication Date Title
DE68926516D1 (de) Lichtempfindliche Zusammensetzung
DE68915148D1 (de) Fotoresist-zusammensetzung.
DE68927140D1 (de) Photolackzusammensetzung
BR8905204A (pt) Composicao colutoria
DE68921867D1 (de) Photopolymerisierbare Zusammensetzung.
DE68921146D1 (de) Lichtempfindliche Zusammensetzung.
DE69129955T2 (de) Photolackzusammensetzung
DE68914176D1 (de) Photopolymerisierbare Zusammensetzung.
DE69301999D1 (de) Photoresist Zusammensetzung
BR8906787A (pt) Composicao
KR900007237A (ko) 투영장치
DE69031785T2 (de) Lichtempfindliche Zusammensetzung
DE69032715T2 (de) Lichtempfindliche Zusammensetzung
DE69123873D1 (de) Photoresistzusammensetzung
KR900006817A (ko) 레지스트 조성물
DE68919102D1 (de) Photopolymerisierbare Zusammensetzung.
DE69029222T2 (de) Lichtempfindliche Zusammensetzung
BR8902491A (pt) Composicao
DE68922901D1 (de) Photoresistzusammensetzung.
TR26099A (tr) Islah edilmis pestisid terkip
BR8907528A (pt) Composicao crio-protetora
DE69124865T2 (de) Photolackzusammensetzung
DE68911786D1 (de) Lichtempfindliche Zusammensetzung.
DE69033790T2 (de) Photolackzusammensetzung
DK163414C (da) Mund-til-mund-genoplivelses-maske

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee