DE69124865T2 - Photolackzusammensetzung - Google Patents

Photolackzusammensetzung

Info

Publication number
DE69124865T2
DE69124865T2 DE69124865T DE69124865T DE69124865T2 DE 69124865 T2 DE69124865 T2 DE 69124865T2 DE 69124865 T DE69124865 T DE 69124865T DE 69124865 T DE69124865 T DE 69124865T DE 69124865 T2 DE69124865 T2 DE 69124865T2
Authority
DE
Germany
Prior art keywords
photoresist composition
photoresist
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69124865T
Other languages
English (en)
Other versions
DE69124865D1 (de
Inventor
Akira Matsumura
Katsukiyo Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Paint Co Ltd
Original Assignee
Nippon Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Paint Co Ltd filed Critical Nippon Paint Co Ltd
Application granted granted Critical
Publication of DE69124865D1 publication Critical patent/DE69124865D1/de
Publication of DE69124865T2 publication Critical patent/DE69124865T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69124865T 1990-07-31 1991-07-31 Photolackzusammensetzung Expired - Fee Related DE69124865T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2205678A JPH0488346A (ja) 1990-07-31 1990-07-31 レジスト組成物

Publications (2)

Publication Number Publication Date
DE69124865D1 DE69124865D1 (de) 1997-04-10
DE69124865T2 true DE69124865T2 (de) 1997-07-10

Family

ID=16510882

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69124865T Expired - Fee Related DE69124865T2 (de) 1990-07-31 1991-07-31 Photolackzusammensetzung

Country Status (5)

Country Link
EP (1) EP0469584B1 (de)
JP (1) JPH0488346A (de)
KR (1) KR920003102A (de)
DE (1) DE69124865T2 (de)
TW (1) TW212834B (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04258957A (ja) * 1991-02-14 1992-09-14 Nippon Paint Co Ltd ポジ型感光性電着樹脂組成物
GR1003420B (el) * 1999-05-26 2000-09-01 Υλικα και διεργασιες μικρολιθογραφιας με βαση πολυακρυλικους υδροξυαλκυλεστερες
US7323290B2 (en) 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
US7148265B2 (en) 2002-09-30 2006-12-12 Rohm And Haas Electronic Materials Llc Functional polymer
KR101038621B1 (ko) * 2002-11-15 2011-06-03 이 아이 듀폰 디 네모아 앤드 캄파니 전자 소자 제조에 보호층을 사용하는 방법
US6855738B2 (en) * 2003-06-06 2005-02-15 Dow Global Technologies Inc. Nanoporous laminates
US20120122031A1 (en) * 2010-11-15 2012-05-17 International Business Machines Corporation Photoresist composition for negative development and pattern forming method using thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
EP0366590B2 (de) * 1988-10-28 2001-03-21 International Business Machines Corporation Positiv arbeitende hochempfindliche Photolack-Zusammensetzung

Also Published As

Publication number Publication date
TW212834B (de) 1993-09-11
KR920003102A (ko) 1992-02-29
EP0469584B1 (de) 1997-03-05
DE69124865D1 (de) 1997-04-10
EP0469584A1 (de) 1992-02-05
JPH0488346A (ja) 1992-03-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee