DE60332500D1 - Halbleitervorrichtung - Google Patents

Halbleitervorrichtung

Info

Publication number
DE60332500D1
DE60332500D1 DE60332500T DE60332500T DE60332500D1 DE 60332500 D1 DE60332500 D1 DE 60332500D1 DE 60332500 T DE60332500 T DE 60332500T DE 60332500 T DE60332500 T DE 60332500T DE 60332500 D1 DE60332500 D1 DE 60332500D1
Authority
DE
Germany
Prior art keywords
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60332500T
Other languages
English (en)
Inventor
Norifumi Tokuda
Shigeru Kusunoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Application granted granted Critical
Publication of DE60332500D1 publication Critical patent/DE60332500D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/47—Schottky barrier electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234—Bipolar junction transistors [BJT]
    • H01L29/66325—Bipolar junction transistors [BJT] controlled by field-effect, e.g. insulated gate bipolar transistors [IGBT]
    • H01L29/66333—Vertical insulated gate bipolar transistors
    • H01L29/66348—Vertical insulated gate bipolar transistors with a recessed gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70—Bipolar devices
    • H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
    • H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
    • H01L29/7395—Vertical transistors, e.g. vertical IGBT
    • H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
    • H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H01L29/872—Schottky diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/083—Anode or cathode regions of thyristors or gated bipolar-mode devices
    • H01L29/0834—Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/30—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by physical imperfections; having polished or roughened surface
    • H01L29/32—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by physical imperfections; having polished or roughened surface the imperfections being within the semiconductor body
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/1015—Shape
    • H01L2924/10155—Shape being other than a cuboid
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/1015—Shape
    • H01L2924/10155—Shape being other than a cuboid
    • H01L2924/10158—Shape being other than a cuboid at the passive surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thyristors (AREA)
DE60332500T 2003-01-20 2003-07-11 Halbleitervorrichtung Expired - Lifetime DE60332500D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2003/000443 WO2004066391A1 (ja) 2003-01-20 2003-01-20 半導体装置
PCT/JP2003/008869 WO2004066394A1 (ja) 2003-01-20 2003-07-11 半導体装置

Publications (1)

Publication Number Publication Date
DE60332500D1 true DE60332500D1 (de) 2010-06-17

Family

ID=32750570

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60332500T Expired - Lifetime DE60332500D1 (de) 2003-01-20 2003-07-11 Halbleitervorrichtung

Country Status (8)

Country Link
US (3) US20050156283A1 (de)
EP (1) EP1601020B1 (de)
JP (1) JPWO2004066394A1 (de)
KR (1) KR100697770B1 (de)
CN (1) CN100414713C (de)
DE (1) DE60332500D1 (de)
TW (1) TWI241634B (de)
WO (2) WO2004066391A1 (de)

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JP2010098189A (ja) * 2008-10-17 2010-04-30 Toshiba Corp 半導体装置
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US8507352B2 (en) 2008-12-10 2013-08-13 Denso Corporation Method of manufacturing semiconductor device including insulated gate bipolar transistor and diode
TWI473270B (zh) * 2009-05-15 2015-02-11 尼克森微電子股份有限公司 半導體元件及其製造方法
JP2011023527A (ja) * 2009-07-15 2011-02-03 Toshiba Corp 半導体装置
JP2011049393A (ja) * 2009-08-27 2011-03-10 Mitsubishi Electric Corp 半導体装置及びその製造方法
KR101058593B1 (ko) * 2009-09-08 2011-08-22 삼성전기주식회사 반도체 소자 및 그 제조 방법
JP5526811B2 (ja) * 2010-01-29 2014-06-18 富士電機株式会社 逆導通形絶縁ゲート型バイポーラトランジスタ
JP5721339B2 (ja) * 2010-04-01 2015-05-20 三菱電機株式会社 半導体装置
GB2479372B (en) * 2010-04-07 2013-07-24 Ge Aviat Systems Ltd Power switches for aircraft
WO2011129443A1 (ja) * 2010-04-15 2011-10-20 富士電機株式会社 半導体装置
CN102064199A (zh) * 2010-11-23 2011-05-18 哈尔滨工程大学 自对准内嵌肖特基结的功率半导体场效应晶体管
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WO2013073623A1 (ja) * 2011-11-15 2013-05-23 富士電機株式会社 半導体装置および半導体装置の製造方法
CN104380470B (zh) * 2012-05-18 2018-01-02 富士电机株式会社 半导体装置
US9281359B2 (en) * 2012-08-20 2016-03-08 Infineon Technologies Ag Semiconductor device comprising contact trenches
CN104285298A (zh) * 2012-09-13 2015-01-14 富士电机株式会社 半导体装置及半导体装置的制造方法
JP2015041638A (ja) * 2013-08-20 2015-03-02 住友電気工業株式会社 炭化珪素半導体装置およびその製造方法
CN104576716B (zh) * 2013-10-24 2017-12-05 上海华虹宏力半导体制造有限公司 集成超势垒整流器的igbt器件及制造方法
US9818837B2 (en) * 2014-12-10 2017-11-14 Semiconductor Components Industries, Llc Process of forming an electronic device having an electronic component
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WO2016207940A1 (ja) * 2015-06-22 2016-12-29 オリンパス株式会社 内視鏡用撮像装置
CN105161530B (zh) * 2015-08-21 2018-05-18 中国东方电气集团有限公司 具有自适应性的场截止电流控制型功率器件
JP2019016738A (ja) * 2017-07-10 2019-01-31 トヨタ自動車株式会社 半導体装置
CN110419111B (zh) 2018-01-16 2023-08-15 艾鲍尔半导体 自对准且稳健的绝缘栅双极晶体管器件
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Also Published As

Publication number Publication date
CN100414713C (zh) 2008-08-27
JPWO2004066394A1 (ja) 2006-05-18
EP1601020A1 (de) 2005-11-30
EP1601020A4 (de) 2008-01-02
TWI241634B (en) 2005-10-11
CN1643698A (zh) 2005-07-20
US20100038707A1 (en) 2010-02-18
TW200425275A (en) 2004-11-16
KR100697770B1 (ko) 2007-03-20
EP1601020B1 (de) 2010-05-05
WO2004066391A1 (ja) 2004-08-05
US7635892B2 (en) 2009-12-22
KR20040095284A (ko) 2004-11-12
US20070075332A1 (en) 2007-04-05
US20050156283A1 (en) 2005-07-21
WO2004066394A1 (ja) 2004-08-05

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