DE602006009614D1 - Zusammensetzung und Verfahren zur Behandlung der Oberflächen von Kupferlegierungen, um die Haftfähigkeit zwischen der Metalloberfläche und dem gebundenen polymerischen Material zu verbessern - Google Patents

Zusammensetzung und Verfahren zur Behandlung der Oberflächen von Kupferlegierungen, um die Haftfähigkeit zwischen der Metalloberfläche und dem gebundenen polymerischen Material zu verbessern

Info

Publication number
DE602006009614D1
DE602006009614D1 DE602006009614T DE602006009614T DE602006009614D1 DE 602006009614 D1 DE602006009614 D1 DE 602006009614D1 DE 602006009614 T DE602006009614 T DE 602006009614T DE 602006009614 T DE602006009614 T DE 602006009614T DE 602006009614 D1 DE602006009614 D1 DE 602006009614D1
Authority
DE
Germany
Prior art keywords
polymeric material
adhesion
solution
treating
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006009614T
Other languages
English (en)
Inventor
Christian Wunderlich
Juergen Barthelmes
Kiyoshi Watanabe
Din-Ghee Neoh
Patrick Lam
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Publication of DE602006009614D1 publication Critical patent/DE602006009614D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/18—Acidic compositions for etching copper or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/383—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12—Using specific substances
    • H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
    • H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • ing And Chemical Polishing (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Laminated Bodies (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Weting (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
DE602006009614T 2006-02-17 2006-02-17 Zusammensetzung und Verfahren zur Behandlung der Oberflächen von Kupferlegierungen, um die Haftfähigkeit zwischen der Metalloberfläche und dem gebundenen polymerischen Material zu verbessern Active DE602006009614D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP06003278A EP1820884B1 (de) 2006-02-17 2006-02-17 Zusammensetzung und Verfahren zur Behandlung der Oberflächen von Kupferlegierungen, um die Haftfähigkeit zwischen der Metalloberfläche und dem gebundenen polymerischen Material zu verbessern

Publications (1)

Publication Number Publication Date
DE602006009614D1 true DE602006009614D1 (de) 2009-11-19

Family

ID=36636657

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006009614T Active DE602006009614D1 (de) 2006-02-17 2006-02-17 Zusammensetzung und Verfahren zur Behandlung der Oberflächen von Kupferlegierungen, um die Haftfähigkeit zwischen der Metalloberfläche und dem gebundenen polymerischen Material zu verbessern

Country Status (9)

Country Link
US (3) US20100288731A1 (de)
EP (1) EP1820884B1 (de)
JP (2) JP5300135B2 (de)
CN (1) CN101379220B (de)
AT (1) ATE445031T1 (de)
DE (1) DE602006009614D1 (de)
MY (1) MY144294A (de)
TW (2) TWI495759B (de)
WO (1) WO2007093284A1 (de)

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JP2009059910A (ja) * 2007-08-31 2009-03-19 Panasonic Corp リード、配線部材、パッケージ部品、樹脂付金属部品及び樹脂封止半導体装置、並びにこれらの製造方法
WO2009117734A1 (en) † 2008-03-21 2009-09-24 Enthone Inc. Adhesion promotion of metal to laminate with a multi-functional compound haftforderung von metall zu laminaten mit einer multifunktionellen
JP2009245960A (ja) * 2008-03-28 2009-10-22 Panasonic Corp 半導体装置用パッケージ、半導体装置、及びその製造方法
ES2365186T3 (es) * 2008-10-13 2011-09-26 Atotech Deutschland Gmbh Procedimiento para mejorar la adherencia entre superficies de plata y materiales de resina.
KR101560000B1 (ko) 2009-02-06 2015-10-13 동우 화인켐 주식회사 액정표시장치용 어레이 기판의 제조방법
JP5443863B2 (ja) * 2009-07-09 2014-03-19 株式会社Ａｄｅｋａ 銅含有材料用エッチング剤組成物及び銅含有材料のエッチング方法
JP4846067B2 (ja) * 2010-03-24 2011-12-28 積水化学工業株式会社 半導体ウエハの処理方法及びｔｓｖウエハの製造方法
CN106879193A (zh) * 2010-07-06 2017-06-20 埃托特克德国有限公司 处理金属表面的方法
KR101366938B1 (ko) * 2012-01-06 2014-02-25 삼성전기주식회사 에칭액 및 이를 이용한 인쇄 배선 기판의 제조방법
JP5219008B1 (ja) 2012-07-24 2013-06-26 メック株式会社 銅のマイクロエッチング剤及びその補給液、並びに配線基板の製造方法
CN104674222A (zh) * 2013-11-27 2015-06-03 芝普企业股份有限公司 可有效减缓贾凡尼效应的刻蚀液
JP5792336B2 (ja) * 2014-02-28 2015-10-07 芝普企業股▲分▼有限公司 有効にガルバノ効果を軽減できるエッチング液
EP3159432B1 (de) * 2015-10-23 2020-08-05 ATOTECH Deutschland GmbH Oberflächenbehandlungsmittel für kupfer und kupferlegierungsoberflächen
US10832997B2 (en) 2016-03-11 2020-11-10 Atotech Deutschland Gmbh Lead-frame structure, lead-frame, surface mount electronic device and methods of producing same
JP6354086B1 (ja) 2017-01-21 2018-07-11 メック株式会社 被膜形成用組成物、表面処理金属部材の製造方法、および金属‐樹脂複合体の製造方法
JP6387543B1 (ja) 2017-05-11 2018-09-12 メック株式会社 被膜形成用組成物、表面処理金属部材の製造方法、および金属‐樹脂複合体の製造方法
TWI749287B (zh) * 2019-01-22 2021-12-11 達興材料股份有限公司 酸性過氧化氫水溶液組成物
JP7363105B2 (ja) 2019-05-31 2023-10-18 株式会社レゾナック 感光性樹脂組成物、感光性樹脂フィルム、プリント配線板及び半導体パッケージ、並びにプリント配線板の製造方法
EP4279634A1 (de) * 2022-05-17 2023-11-22 Atotech Deutschland GmbH & Co. KG Verfahren zum nanoätzen von kupfer- und kupferlegierungsoberflächen

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3645772A (en) 1970-06-30 1972-02-29 Du Pont Process for improving bonding of a photoresist to copper
JPS5221460B1 (de) * 1971-04-26 1977-06-10
JPH0897559A (ja) 1994-09-26 1996-04-12 Okuno Chem Ind Co Ltd 多層プリント配線板の内層用回路板の銅箔処理方法、及び該内層用回路板の銅箔処理液
GB9425090D0 (en) 1994-12-12 1995-02-08 Alpha Metals Ltd Copper coating
JP3361680B2 (ja) * 1995-12-27 2003-01-07 日本パーオキサイド株式会社 銅又は銅合金の表面処理液
TW374802B (en) * 1996-07-29 1999-11-21 Ebara Densan Ltd Etching composition, method for roughening copper surface and method for producing printed wiring board
US5869130A (en) 1997-06-12 1999-02-09 Mac Dermid, Incorporated Process for improving the adhesion of polymeric materials to metal surfaces
US6162366A (en) * 1997-12-25 2000-12-19 Canon Kabushiki Kaisha Etching process
TW460622B (en) * 1998-02-03 2001-10-21 Atotech Deutschland Gmbh Solution and process to pretreat copper surfaces
TW470785B (en) * 1998-02-03 2002-01-01 Atotech Deutschland Gmbh Process for preliminary treatment of copper surfaces
JP2000064067A (ja) * 1998-06-09 2000-02-29 Ebara Densan Ltd エッチング液および銅表面の粗化処理方法
US6117250A (en) * 1999-02-25 2000-09-12 Morton International Inc. Thiazole and thiocarbamide based chemicals for use with oxidative etchant solutions
JP4309602B2 (ja) * 2001-04-25 2009-08-05 メック株式会社 銅または銅合金と樹脂との接着性を向上させる方法、ならびに積層体
DE10302596A1 (de) * 2002-01-24 2003-08-28 Shipley Company Marlborough Behandlung von Metalloberflächen mit einer modifizierten Oxidaustauschmasse
KR100960687B1 (ko) * 2003-06-24 2010-06-01 엘지디스플레이 주식회사 구리(또는 구리합금층)를 포함하는 이중금속층을 일괄식각하기위한 식각액
US20050067378A1 (en) * 2003-09-30 2005-03-31 Harry Fuerhaupter Method for micro-roughening treatment of copper and mixed-metal circuitry

Also Published As

Publication number Publication date
EP1820884A1 (de) 2007-08-22
JP5710670B2 (ja) 2015-04-30
CN101379220A (zh) 2009-03-04
TWI495759B (zh) 2015-08-11
MY144294A (en) 2011-08-29
TW200745379A (en) 2007-12-16
WO2007093284A1 (en) 2007-08-23
CN101379220B (zh) 2011-05-11
JP2009526909A (ja) 2009-07-23
TW201529889A (zh) 2015-08-01
EP1820884B1 (de) 2009-10-07
JP5300135B2 (ja) 2013-09-25
US20160168722A1 (en) 2016-06-16
JP2013151757A (ja) 2013-08-08
US20160222523A1 (en) 2016-08-04
US20100288731A1 (en) 2010-11-18
ATE445031T1 (de) 2009-10-15

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