ATE445031T1 - Zusammensetzung und verfahren zur behandlung der oberflächen von kupferlegierungen, um die haftfähigkeit zwischen der metalloberfläche und dem gebundenen polymerischen material zu verbessern - Google Patents
Zusammensetzung und verfahren zur behandlung der oberflächen von kupferlegierungen, um die haftfähigkeit zwischen der metalloberfläche und dem gebundenen polymerischen material zu verbessernInfo
- Publication number
- ATE445031T1 ATE445031T1 AT06003278T AT06003278T ATE445031T1 AT E445031 T1 ATE445031 T1 AT E445031T1 AT 06003278 T AT06003278 T AT 06003278T AT 06003278 T AT06003278 T AT 06003278T AT E445031 T1 ATE445031 T1 AT E445031T1
- Authority
- AT
- Austria
- Prior art keywords
- polymeric material
- adhesion
- solution
- treating
- composition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/383—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- ing And Chemical Polishing (AREA)
- Chemical Treatment Of Metals (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Weting (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06003278A EP1820884B1 (de) | 2006-02-17 | 2006-02-17 | Zusammensetzung und Verfahren zur Behandlung der Oberflächen von Kupferlegierungen, um die Haftfähigkeit zwischen der Metalloberfläche und dem gebundenen polymerischen Material zu verbessern |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE445031T1 true ATE445031T1 (de) | 2009-10-15 |
Family
ID=36636657
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT06003278T ATE445031T1 (de) | 2006-02-17 | 2006-02-17 | Zusammensetzung und verfahren zur behandlung der oberflächen von kupferlegierungen, um die haftfähigkeit zwischen der metalloberfläche und dem gebundenen polymerischen material zu verbessern |
Country Status (9)
Country | Link |
---|---|
US (3) | US20100288731A1 (de) |
EP (1) | EP1820884B1 (de) |
JP (2) | JP5300135B2 (de) |
CN (1) | CN101379220B (de) |
AT (1) | ATE445031T1 (de) |
DE (1) | DE602006009614D1 (de) |
MY (1) | MY144294A (de) |
TW (2) | TW201529889A (de) |
WO (1) | WO2007093284A1 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009059910A (ja) * | 2007-08-31 | 2009-03-19 | Panasonic Corp | リード、配線部材、パッケージ部品、樹脂付金属部品及び樹脂封止半導体装置、並びにこれらの製造方法 |
JP5620365B2 (ja) † | 2008-03-21 | 2014-11-05 | エンソン インコーポレイテッド | 多官能分子システムを用いた積層体への金属の接着促進 |
JP2009245960A (ja) * | 2008-03-28 | 2009-10-22 | Panasonic Corp | 半導体装置用パッケージ、半導体装置、及びその製造方法 |
ATE513066T1 (de) | 2008-10-13 | 2011-07-15 | Atotech Deutschland Gmbh | Verfahren zur verbesserung der haftung zwischen silberoberflächen und harzmaterialien |
KR101560000B1 (ko) | 2009-02-06 | 2015-10-13 | 동우 화인켐 주식회사 | 액정표시장치용 어레이 기판의 제조방법 |
JP5443863B2 (ja) * | 2009-07-09 | 2014-03-19 | 株式会社Adeka | 銅含有材料用エッチング剤組成物及び銅含有材料のエッチング方法 |
WO2011118506A1 (ja) * | 2010-03-24 | 2011-09-29 | 積水化学工業株式会社 | 接着剤組成物、接着テープ、半導体ウエハの処理方法、及び、tsvウエハの製造方法 |
KR102042940B1 (ko) * | 2010-07-06 | 2019-11-27 | 아토테크 도이칠란드 게엠베하 | 인쇄회로기판 |
KR101366938B1 (ko) * | 2012-01-06 | 2014-02-25 | 삼성전기주식회사 | 에칭액 및 이를 이용한 인쇄 배선 기판의 제조방법 |
JP5219008B1 (ja) | 2012-07-24 | 2013-06-26 | メック株式会社 | 銅のマイクロエッチング剤及びその補給液、並びに配線基板の製造方法 |
CN104674222A (zh) * | 2013-11-27 | 2015-06-03 | 芝普企业股份有限公司 | 可有效减缓贾凡尼效应的刻蚀液 |
JP5792336B2 (ja) * | 2014-02-28 | 2015-10-07 | 芝普企業股▲分▼有限公司 | 有効にガルバノ効果を軽減できるエッチング液 |
EP3159432B1 (de) * | 2015-10-23 | 2020-08-05 | ATOTECH Deutschland GmbH | Oberflächenbehandlungsmittel für kupfer und kupferlegierungsoberflächen |
WO2017153590A1 (en) | 2016-03-11 | 2017-09-14 | Atotech Deutschland Gmbh | Lead-frame structure, lead-frame, surface mount electronic device and methods of producing same |
JP6354086B1 (ja) | 2017-01-21 | 2018-07-11 | メック株式会社 | 被膜形成用組成物、表面処理金属部材の製造方法、および金属‐樹脂複合体の製造方法 |
JP6387543B1 (ja) | 2017-05-11 | 2018-09-12 | メック株式会社 | 被膜形成用組成物、表面処理金属部材の製造方法、および金属‐樹脂複合体の製造方法 |
TWI749287B (zh) * | 2019-01-22 | 2021-12-11 | 達興材料股份有限公司 | 酸性過氧化氫水溶液組成物 |
JP7363105B2 (ja) | 2019-05-31 | 2023-10-18 | 株式会社レゾナック | 感光性樹脂組成物、感光性樹脂フィルム、プリント配線板及び半導体パッケージ、並びにプリント配線板の製造方法 |
EP4279634A1 (de) * | 2022-05-17 | 2023-11-22 | Atotech Deutschland GmbH & Co. KG | Verfahren zum nanoätzen von kupfer- und kupferlegierungsoberflächen |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3645772A (en) | 1970-06-30 | 1972-02-29 | Du Pont | Process for improving bonding of a photoresist to copper |
JPS5221460B1 (de) * | 1971-04-26 | 1977-06-10 | ||
JPH0897559A (ja) | 1994-09-26 | 1996-04-12 | Okuno Chem Ind Co Ltd | 多層プリント配線板の内層用回路板の銅箔処理方法、及び該内層用回路板の銅箔処理液 |
GB9425090D0 (en) | 1994-12-12 | 1995-02-08 | Alpha Metals Ltd | Copper coating |
JP3361680B2 (ja) * | 1995-12-27 | 2003-01-07 | 日本パーオキサイド株式会社 | 銅又は銅合金の表面処理液 |
TW374802B (en) * | 1996-07-29 | 1999-11-21 | Ebara Densan Ltd | Etching composition, method for roughening copper surface and method for producing printed wiring board |
US5869130A (en) | 1997-06-12 | 1999-02-09 | Mac Dermid, Incorporated | Process for improving the adhesion of polymeric materials to metal surfaces |
US6162366A (en) * | 1997-12-25 | 2000-12-19 | Canon Kabushiki Kaisha | Etching process |
TW460622B (en) | 1998-02-03 | 2001-10-21 | Atotech Deutschland Gmbh | Solution and process to pretreat copper surfaces |
TW470785B (en) * | 1998-02-03 | 2002-01-01 | Atotech Deutschland Gmbh | Process for preliminary treatment of copper surfaces |
JP2000064067A (ja) * | 1998-06-09 | 2000-02-29 | Ebara Densan Ltd | エッチング液および銅表面の粗化処理方法 |
US6117250A (en) * | 1999-02-25 | 2000-09-12 | Morton International Inc. | Thiazole and thiocarbamide based chemicals for use with oxidative etchant solutions |
JP4309602B2 (ja) * | 2001-04-25 | 2009-08-05 | メック株式会社 | 銅または銅合金と樹脂との接着性を向上させる方法、ならびに積層体 |
DE10302596A1 (de) * | 2002-01-24 | 2003-08-28 | Shipley Company Marlborough | Behandlung von Metalloberflächen mit einer modifizierten Oxidaustauschmasse |
KR100960687B1 (ko) * | 2003-06-24 | 2010-06-01 | 엘지디스플레이 주식회사 | 구리(또는 구리합금층)를 포함하는 이중금속층을 일괄식각하기위한 식각액 |
US20050067378A1 (en) * | 2003-09-30 | 2005-03-31 | Harry Fuerhaupter | Method for micro-roughening treatment of copper and mixed-metal circuitry |
-
2006
- 2006-02-17 AT AT06003278T patent/ATE445031T1/de active
- 2006-02-17 EP EP06003278A patent/EP1820884B1/de active Active
- 2006-02-17 DE DE602006009614T patent/DE602006009614D1/de active Active
-
2007
- 2007-01-10 TW TW104111778A patent/TW201529889A/zh unknown
- 2007-01-10 TW TW096100950A patent/TWI495759B/zh active
- 2007-01-31 US US12/224,016 patent/US20100288731A1/en not_active Abandoned
- 2007-01-31 CN CN2007800044722A patent/CN101379220B/zh active Active
- 2007-01-31 WO PCT/EP2007/000826 patent/WO2007093284A1/en active Application Filing
- 2007-01-31 JP JP2008554623A patent/JP5300135B2/ja not_active Expired - Fee Related
-
2008
- 2008-08-15 MY MYPI20083112A patent/MY144294A/en unknown
-
2013
- 2013-03-21 JP JP2013057660A patent/JP5710670B2/ja active Active
-
2016
- 2016-02-11 US US15/041,840 patent/US20160168722A1/en not_active Abandoned
- 2016-04-11 US US15/095,645 patent/US20160222523A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
TW201529889A (zh) | 2015-08-01 |
EP1820884B1 (de) | 2009-10-07 |
US20160222523A1 (en) | 2016-08-04 |
MY144294A (en) | 2011-08-29 |
JP2013151757A (ja) | 2013-08-08 |
US20160168722A1 (en) | 2016-06-16 |
JP2009526909A (ja) | 2009-07-23 |
CN101379220B (zh) | 2011-05-11 |
TW200745379A (en) | 2007-12-16 |
WO2007093284A1 (en) | 2007-08-23 |
JP5300135B2 (ja) | 2013-09-25 |
US20100288731A1 (en) | 2010-11-18 |
CN101379220A (zh) | 2009-03-04 |
JP5710670B2 (ja) | 2015-04-30 |
TWI495759B (zh) | 2015-08-11 |
EP1820884A1 (de) | 2007-08-22 |
DE602006009614D1 (de) | 2009-11-19 |
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UEP | Publication of translation of european patent specification |
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