DE602005017598D1 - Optische elementeinheit für belichtungsprozesse - Google Patents

Optische elementeinheit für belichtungsprozesse

Info

Publication number
DE602005017598D1
DE602005017598D1 DE602005017598T DE602005017598T DE602005017598D1 DE 602005017598 D1 DE602005017598 D1 DE 602005017598D1 DE 602005017598 T DE602005017598 T DE 602005017598T DE 602005017598 T DE602005017598 T DE 602005017598T DE 602005017598 D1 DE602005017598 D1 DE 602005017598D1
Authority
DE
Germany
Prior art keywords
optical element
element unit
exposure processes
exposure
processes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005017598T
Other languages
English (en)
Inventor
Bernhard Gellrich
Jens Kugler
Guido Limbach
Julian Kaller
Hans Juergen Scherle
Dieter Schmerek
Detlev Mueller
Thomas Schletterer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of DE602005017598D1 publication Critical patent/DE602005017598D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Optical Couplings Of Light Guides (AREA)
DE602005017598T 2004-04-13 2005-04-13 Optische elementeinheit für belichtungsprozesse Active DE602005017598D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004018659A DE102004018659A1 (de) 2004-04-13 2004-04-13 Abschlussmodul für eine optische Anordnung
PCT/EP2005/003875 WO2005101121A2 (en) 2004-04-13 2005-04-13 Optical element unit for exposure processes

Publications (1)

Publication Number Publication Date
DE602005017598D1 true DE602005017598D1 (de) 2009-12-24

Family

ID=34966990

Family Applications (2)

Application Number Title Priority Date Filing Date
DE102004018659A Ceased DE102004018659A1 (de) 2004-04-13 2004-04-13 Abschlussmodul für eine optische Anordnung
DE602005017598T Active DE602005017598D1 (de) 2004-04-13 2005-04-13 Optische elementeinheit für belichtungsprozesse

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE102004018659A Ceased DE102004018659A1 (de) 2004-04-13 2004-04-13 Abschlussmodul für eine optische Anordnung

Country Status (5)

Country Link
US (1) US7545483B2 (de)
EP (1) EP1735666B1 (de)
JP (2) JP4881853B2 (de)
DE (2) DE102004018659A1 (de)
WO (1) WO2005101121A2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7072021B2 (en) * 2004-05-17 2006-07-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060001851A1 (en) 2004-07-01 2006-01-05 Grant Robert B Immersion photolithography system
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070004182A1 (en) * 2005-06-30 2007-01-04 Taiwan Semiconductor Manufacturing Company, Ltd. Methods and system for inhibiting immersion lithography defect formation
DE102006016533A1 (de) 2006-04-07 2007-11-15 Carl Zeiss Smt Ag Haltevorrichtung für optisches Element
JP5183955B2 (ja) * 2006-04-07 2013-04-17 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学エレメントのための保持デバイス
DE102006021797A1 (de) * 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
DE102006023876A1 (de) * 2006-05-19 2007-11-22 Carl Zeiss Smt Ag Optische Abbildungseinrichtung
US8027023B2 (en) 2006-05-19 2011-09-27 Carl Zeiss Smt Gmbh Optical imaging device and method for reducing dynamic fluctuations in pressure difference
DE102006050653A1 (de) 2006-10-24 2008-04-30 Carl Zeiss Smt Ag Verfahren und Vorrichtung zum stoffschlüssigen Verbinden eines optischen Elementes mit einer Fassung
EP2034363A2 (de) 2007-06-22 2009-03-11 Carl Zeiss SMT AG Optische Baugruppe, Projektionsbelichtungsanlage für die Halbleiterlithogaphie und Projektionsobjektiv
NL1035757A1 (nl) 2007-08-02 2009-02-03 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5026199B2 (ja) * 2007-08-28 2012-09-12 日立マクセル株式会社 レンズユニット、レンズモジュール及びカメラモジュール
NL1035908A1 (nl) 2007-09-25 2009-03-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
DE102007047186B4 (de) * 2007-10-02 2014-01-09 Carl Zeiss Sms Gmbh Aufnahmevorrichtung zur Aufnahme einer Photolithographiemaske
NL2003392A (en) 2008-09-17 2010-03-18 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
DE102008056491B4 (de) * 2008-11-06 2012-02-16 Jenoptik Laser, Optik, Systeme Gmbh Verfahren zum reproduzierbaren Einstellen einer Nenn-Positionierung eines ersten Elementes eines optischen Systems sowie optisches System
NL2004497A (en) 2009-05-01 2010-11-02 Asml Netherlands Bv Lithographic apparatus and a method of operating the apparatus.
DE102009030124A1 (de) * 2009-06-24 2010-12-30 Carl Zeiss Sms Gmbh Hochstabile Optik und Verfahren zu deren Herstellung
DE102010022934A1 (de) * 2010-06-04 2011-12-08 Carl Zeiss Ag Optische Baugruppe
DE102011075316A1 (de) * 2011-05-05 2012-11-08 Carl Zeiss Smt Gmbh Optisches Modul mit einer Messeinrichtung
CN108227105B (zh) * 2016-12-22 2021-07-30 台湾东电化股份有限公司 镜头模块
DE102019112224A1 (de) * 2019-05-10 2020-11-12 Carl Zeiss Smt Gmbh Abstützung eines optischen Elements
US11345281B2 (en) * 2020-02-17 2022-05-31 GM Global Technology Operations LLC Shape changing mirror
WO2021244808A1 (en) * 2020-06-04 2021-12-09 Asml Netherlands B.V. A fluid purging system, projection system, illumination system, lithographic apparatus, and method
DE102022123731A1 (de) * 2022-09-16 2024-03-21 TRUMPF Werkzeugmaschinen SE + Co. KG Laserbearbeitungskopf mit einer Scannereinheit oder einer Scanneranordnung
DE102023204744A1 (de) 2023-05-22 2024-05-16 Carl Zeiss Smt Gmbh Optisches system und projektionsbelichtungsanlage

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4733945A (en) * 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
US6284397B1 (en) * 1998-05-29 2001-09-04 Ballard Power Systems Inc. Rotary piston blower for supplying an oxidant stream to a fuel cell
US6023380A (en) * 1998-09-22 2000-02-08 Zenith Electronics Corporation Two piece curved projection lens method and apparatus
AU4459701A (en) * 2000-03-31 2001-10-15 Nikon Corporation Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method
DE10030005A1 (de) * 2000-06-17 2001-12-20 Zeiss Carl Objektiv, insbesondere Projektionsobjektiv in der Halbleiter-Lithographie
DE10042844C1 (de) * 2000-08-17 2002-04-04 Jenoptik Jena Gmbh Radial justierbare Linsenfassung
EP1312965B1 (de) * 2000-08-18 2007-01-17 Nikon Corporation Haltevorrichtung für optisches Element
AU2002214269A1 (en) * 2000-11-10 2002-05-21 Nikon Corporation Optical device, exposure device and device manufacturing method
JPWO2002065183A1 (ja) * 2001-02-14 2004-06-17 株式会社ニコン 鏡筒及び露光装置並びにデバイスの製造方法
DE10139805C1 (de) * 2001-08-13 2002-10-10 Jenoptik Laser Optik Sys Gmbh Spannungsarme Linsenfassung
DE10140608A1 (de) * 2001-08-18 2003-03-06 Zeiss Carl Vorrichtung zur Justage eines optischen Elements
JP4565261B2 (ja) * 2002-06-24 2010-10-20 株式会社ニコン 光学素子保持機構、光学系鏡筒及び露光装置
JP2005064045A (ja) * 2003-08-13 2005-03-10 Nikon Corp 光学装置、露光装置、並びにデバイス製造方法
JP2005166922A (ja) * 2003-12-02 2005-06-23 Nikon Corp 支持装置、光学装置、露光装置、及びデバイスの製造方法

Also Published As

Publication number Publication date
US20080192215A1 (en) 2008-08-14
WO2005101121A3 (en) 2006-07-06
JP2011176346A (ja) 2011-09-08
EP1735666B1 (de) 2009-11-11
EP1735666A2 (de) 2006-12-27
JP5567521B2 (ja) 2014-08-06
JP2007533148A (ja) 2007-11-15
WO2005101121A2 (en) 2005-10-27
JP4881853B2 (ja) 2012-02-22
DE102004018659A1 (de) 2005-11-03
US7545483B2 (en) 2009-06-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE