DE602005012128D1 - Filmbildendes material und herstellung von oberfläturen durch bestrahlung eines films aus dem material - Google Patents
Filmbildendes material und herstellung von oberfläturen durch bestrahlung eines films aus dem materialInfo
- Publication number
- DE602005012128D1 DE602005012128D1 DE602005012128T DE602005012128T DE602005012128D1 DE 602005012128 D1 DE602005012128 D1 DE 602005012128D1 DE 602005012128 T DE602005012128 T DE 602005012128T DE 602005012128 T DE602005012128 T DE 602005012128T DE 602005012128 D1 DE602005012128 D1 DE 602005012128D1
- Authority
- DE
- Germany
- Prior art keywords
- film
- polyelectrolyte
- photosensitive
- photoreaction
- undergo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229920000867 polyelectrolyte Polymers 0.000 abstract 3
- 150000001875 compounds Chemical class 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 238000007699 photoisomerization reaction Methods 0.000 abstract 1
- 230000008707 rearrangement Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/001—Phase modulating patterns, e.g. refractive index patterns
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/04—Acids, Metal salts or ammonium salts thereof
- C08F20/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/02—Polyamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
- C08L101/02—Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/02—Polyamines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/22—Compounds containing nitrogen bound to another nitrogen atom
- C08K5/23—Azo-compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/45—Heterocyclic compounds having sulfur in the ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/542—Dye sensitized solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04020997A EP1632520A1 (de) | 2004-09-03 | 2004-09-03 | Filmbildendes Material und Herstellung von Oberflächenrelief- und optisch anisotropen Strukturen durch Bestrahlen eines Films des fimbildenden Materials |
EP04029262 | 2004-12-09 | ||
PCT/EP2005/009346 WO2006024500A1 (en) | 2004-09-03 | 2005-08-30 | Film forming material and preparation of surface relief and optically anisotropic structures by irradiating a film of the said material |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005012128D1 true DE602005012128D1 (de) | 2009-02-12 |
Family
ID=35159871
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005012128T Active DE602005012128D1 (de) | 2004-09-03 | 2005-08-30 | Filmbildendes material und herstellung von oberfläturen durch bestrahlung eines films aus dem material |
Country Status (9)
Country | Link |
---|---|
US (1) | US8026021B2 (de) |
EP (1) | EP1794236B1 (de) |
JP (1) | JP2008511702A (de) |
KR (1) | KR20070102983A (de) |
AT (1) | ATE419308T1 (de) |
DE (1) | DE602005012128D1 (de) |
ES (1) | ES2318529T3 (de) |
TW (1) | TW200619235A (de) |
WO (1) | WO2006024500A1 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200624479A (en) * | 2004-12-09 | 2006-07-16 | Fraunhofer Ges Forschung | Film forming material and preparation of surface relief and optically anisotropic structures by irradiating a film of the said material |
EP1720163A1 (de) * | 2005-05-05 | 2006-11-08 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Filmformende lichtempfindliche Materialien für die von Licht eingeführte Erzeugung optischer Anisotropie |
CN100386388C (zh) * | 2006-03-21 | 2008-05-07 | 宁波大学 | 茜素黄稀土铬染料制备方法 |
KR100764403B1 (ko) * | 2006-05-11 | 2007-10-05 | 삼성전기주식회사 | 아조벤젠기 폴리머를 이용한 미세 패터닝 방법을 이용한 질화물계 반도체 발광소자의 제조방법 |
KR100735470B1 (ko) * | 2006-05-19 | 2007-07-03 | 삼성전기주식회사 | 질화물계 반도체 발광소자의 제조방법 |
DE102006062457A1 (de) * | 2006-12-28 | 2008-07-03 | Bayer Innovation Gmbh | Optische Speichermedien und Verfahren zu deren Herstellung |
DE102008059756A1 (de) * | 2008-12-01 | 2010-06-10 | Tesa Se | Verfahren zum Markieren oder Beschriften eines Werkstücks |
EP2455786A1 (de) * | 2009-07-16 | 2012-05-23 | JX Nippon Oil & Energy Corporation | Diffraktionsgitter, organisches el-element damit und verfahren zur herstellung dieses diffraktionsgitters und des organischen el-elements |
US8450028B2 (en) * | 2011-03-29 | 2013-05-28 | Sabic Innovative Plastics Ip B.V. | Holographic storage method |
WO2016020630A2 (en) | 2014-08-08 | 2016-02-11 | Milan Momcilo Popovich | Waveguide laser illuminator incorporating a despeckler |
AU2014227157B2 (en) * | 2013-03-06 | 2016-09-22 | Jx Nippon Oil And Energy Corporation | Method of manufacturing member having relief structure, and member having relief structure manufactured thereby |
US10179952B2 (en) * | 2013-03-08 | 2019-01-15 | Rutgers, The State University Of New Jersey | Patterned thin films by thermally induced mass displacement |
CN103204460B (zh) * | 2013-03-21 | 2016-03-02 | 北京工业大学 | 基于激光干涉诱导交联反应的金属微纳结构的制备方法 |
WO2016042283A1 (en) | 2014-09-19 | 2016-03-24 | Milan Momcilo Popovich | Method and apparatus for generating input images for holographic waveguide displays |
CN107873086B (zh) | 2015-01-12 | 2020-03-20 | 迪吉伦斯公司 | 环境隔离的波导显示器 |
CN104914493A (zh) * | 2015-06-02 | 2015-09-16 | 苏州大学 | 一种全息制作平面闪耀光栅的方法 |
WO2017060665A1 (en) | 2015-10-05 | 2017-04-13 | Milan Momcilo Popovich | Waveguide display |
TWI821234B (zh) | 2018-01-09 | 2023-11-11 | 美商康寧公司 | 具光改變特徵之塗覆製品及用於製造彼等之方法 |
JP2022520472A (ja) | 2019-02-15 | 2022-03-30 | ディジレンズ インコーポレイテッド | 統合された格子を使用してホログラフィック導波管ディスプレイを提供するための方法および装置 |
KR20220054386A (ko) | 2019-08-29 | 2022-05-02 | 디지렌즈 인코포레이티드. | 진공 브래그 격자 및 이의 제조 방법 |
US20220011478A1 (en) | 2020-07-09 | 2022-01-13 | Corning Incorporated | Textured region of a substrate to reduce specular reflectance incorporating surface features with an elliptical perimeter or segments thereof, and method of making the same |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2787614A (en) * | 1953-10-01 | 1957-04-02 | Bayer Ag | Yellow substantive azo dyestuffs and process of making the same |
JPS58143340A (ja) * | 1982-02-22 | 1983-08-25 | Toshiba Corp | ホトレジスト組成物 |
JPH03211531A (ja) * | 1990-01-17 | 1991-09-17 | Sumitomo Electric Ind Ltd | 非線形高分子材料 |
WO1998021283A1 (fr) * | 1996-11-13 | 1998-05-22 | Seiko Epson Corporation | Composition d'encre contenant une resine cationique hydrosoluble |
JP2002071959A (ja) * | 2000-08-31 | 2002-03-12 | Hitachi Chem Co Ltd | ホログラフィーによる光制御素子作製方法および光制御素子 |
JP3695398B2 (ja) * | 2002-01-30 | 2005-09-14 | 富士ゼロックス株式会社 | 光学式エンコーダ及びエンコーダ用スケール |
EP2069026B1 (de) | 2006-09-19 | 2013-01-23 | Hypro, LLC | Sprühkopf mit abdeckungen |
-
2005
- 2005-08-30 WO PCT/EP2005/009346 patent/WO2006024500A1/en active Application Filing
- 2005-08-30 JP JP2007528769A patent/JP2008511702A/ja active Pending
- 2005-08-30 DE DE602005012128T patent/DE602005012128D1/de active Active
- 2005-08-30 US US11/574,672 patent/US8026021B2/en not_active Expired - Fee Related
- 2005-08-30 AT AT05784051T patent/ATE419308T1/de not_active IP Right Cessation
- 2005-08-30 KR KR1020077007638A patent/KR20070102983A/ko not_active Application Discontinuation
- 2005-08-30 ES ES05784051T patent/ES2318529T3/es active Active
- 2005-08-30 TW TW094129590A patent/TW200619235A/zh unknown
- 2005-08-30 EP EP05784051A patent/EP1794236B1/de not_active Not-in-force
Also Published As
Publication number | Publication date |
---|---|
ES2318529T3 (es) | 2009-05-01 |
US20090001632A1 (en) | 2009-01-01 |
JP2008511702A (ja) | 2008-04-17 |
TW200619235A (en) | 2006-06-16 |
US8026021B2 (en) | 2011-09-27 |
ATE419308T1 (de) | 2009-01-15 |
EP1794236A1 (de) | 2007-06-13 |
WO2006024500A1 (en) | 2006-03-09 |
EP1794236B1 (de) | 2008-12-31 |
KR20070102983A (ko) | 2007-10-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |