ATE324600T1 - Reflexionsminderungsbeschichtungen und zugehörige verfahren - Google Patents
Reflexionsminderungsbeschichtungen und zugehörige verfahrenInfo
- Publication number
- ATE324600T1 ATE324600T1 AT02779284T AT02779284T ATE324600T1 AT E324600 T1 ATE324600 T1 AT E324600T1 AT 02779284 T AT02779284 T AT 02779284T AT 02779284 T AT02779284 T AT 02779284T AT E324600 T1 ATE324600 T1 AT E324600T1
- Authority
- AT
- Austria
- Prior art keywords
- lambd0
- layer
- deposited
- optical
- coating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
- G02B1/116—Multilayers including electrically conducting layers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/945,262 US6589657B2 (en) | 2001-08-31 | 2001-08-31 | Anti-reflection coatings and associated methods |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE324600T1 true ATE324600T1 (de) | 2006-05-15 |
Family
ID=25482863
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02779284T ATE324600T1 (de) | 2001-08-31 | 2002-08-30 | Reflexionsminderungsbeschichtungen und zugehörige verfahren |
Country Status (8)
Country | Link |
---|---|
US (1) | US6589657B2 (de) |
EP (1) | EP1423737B1 (de) |
JP (1) | JP2005502077A (de) |
KR (1) | KR20040044523A (de) |
CN (1) | CN1549936A (de) |
AT (1) | ATE324600T1 (de) |
AU (1) | AU2002342628A1 (de) |
WO (1) | WO2003021305A2 (de) |
Families Citing this family (50)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4298374B2 (ja) * | 2002-11-18 | 2009-07-15 | シャープ株式会社 | 光情報記録媒体、並びに、それを用いた記録方法、再生方法、光情報記録装置、および光情報再生装置 |
JP2005018964A (ja) * | 2003-06-06 | 2005-01-20 | Sharp Corp | 光情報記録媒体、及びそれを用いた再生方法、光情報処理装置 |
JP3832659B2 (ja) * | 2003-06-06 | 2006-10-11 | シャープ株式会社 | 光情報記録媒体、それを用いた記録方法、再生方法、光情報記録装置、および光情報再生装置 |
CN100476457C (zh) | 2004-05-26 | 2009-04-08 | 株式会社腾龙 | 防反射膜 |
KR100536808B1 (ko) * | 2004-06-09 | 2005-12-14 | 동부아남반도체 주식회사 | 반도체 소자 및 그 제조 방법 |
JP4384107B2 (ja) * | 2004-10-25 | 2009-12-16 | キヤノン株式会社 | 有機発光素子アレイ |
CN101031614B (zh) * | 2004-10-28 | 2011-07-27 | 陶氏康宁公司 | 传导性可固化组合物 |
US20060260938A1 (en) * | 2005-05-20 | 2006-11-23 | Petrach Philip M | Module for Coating System and Associated Technology |
US20060278164A1 (en) * | 2005-06-10 | 2006-12-14 | Petrach Philip M | Dual gate isolating maintenance slit valve chamber with pumping option |
EP1963891B1 (de) * | 2005-12-23 | 2016-04-27 | Essilor International (Compagnie Generale D'optique) | Optischer artikel mit einer antistatischen antireflexbeschichtung und herstellungsverfahern dafür |
US20070256934A1 (en) * | 2006-05-08 | 2007-11-08 | Perata Michael R | Apparatus and Method for Coating Substrates With Approximate Process Isolation |
KR100628033B1 (ko) * | 2006-06-23 | 2006-09-27 | (주)화인졸테크 | 중공 불화마그네슘 입자와 제조방법 그리고 이를 이용한반사방지용 코팅액 |
US7692855B2 (en) * | 2006-06-28 | 2010-04-06 | Essilor International Compagnie Generale D'optique | Optical article having a temperature-resistant anti-reflection coating with optimized thickness ratio of low index and high index layers |
US20080302414A1 (en) * | 2006-11-02 | 2008-12-11 | Den Boer Willem | Front electrode for use in photovoltaic device and method of making same |
US8203073B2 (en) * | 2006-11-02 | 2012-06-19 | Guardian Industries Corp. | Front electrode for use in photovoltaic device and method of making same |
US20080105299A1 (en) * | 2006-11-02 | 2008-05-08 | Guardian Industries Corp. | Front electrode with thin metal film layer and high work-function buffer layer for use in photovoltaic device and method of making same |
US20080105298A1 (en) * | 2006-11-02 | 2008-05-08 | Guardian Industries Corp. | Front electrode for use in photovoltaic device and method of making same |
US20080178932A1 (en) * | 2006-11-02 | 2008-07-31 | Guardian Industries Corp. | Front electrode including transparent conductive coating on patterned glass substrate for use in photovoltaic device and method of making same |
US8076571B2 (en) * | 2006-11-02 | 2011-12-13 | Guardian Industries Corp. | Front electrode for use in photovoltaic device and method of making same |
US7964788B2 (en) * | 2006-11-02 | 2011-06-21 | Guardian Industries Corp. | Front electrode for use in photovoltaic device and method of making same |
US20080105293A1 (en) * | 2006-11-02 | 2008-05-08 | Guardian Industries Corp. | Front electrode for use in photovoltaic device and method of making same |
US8012317B2 (en) * | 2006-11-02 | 2011-09-06 | Guardian Industries Corp. | Front electrode including transparent conductive coating on patterned glass substrate for use in photovoltaic device and method of making same |
JP5245251B2 (ja) * | 2006-12-27 | 2013-07-24 | ソニー株式会社 | 光学的素子及び光学装置、並びに光学的素子の製造方法 |
US8334452B2 (en) | 2007-01-08 | 2012-12-18 | Guardian Industries Corp. | Zinc oxide based front electrode doped with yttrium for use in photovoltaic device or the like |
US20080169021A1 (en) * | 2007-01-16 | 2008-07-17 | Guardian Industries Corp. | Method of making TCO front electrode for use in photovoltaic device or the like |
US20080223430A1 (en) * | 2007-03-14 | 2008-09-18 | Guardian Industries Corp. | Buffer layer for front electrode structure in photovoltaic device or the like |
US20080308145A1 (en) * | 2007-06-12 | 2008-12-18 | Guardian Industries Corp | Front electrode including transparent conductive coating on etched glass substrate for use in photovoltaic device and method of making same |
US20080308146A1 (en) * | 2007-06-14 | 2008-12-18 | Guardian Industries Corp. | Front electrode including pyrolytic transparent conductive coating on textured glass substrate for use in photovoltaic device and method of making same |
US7888594B2 (en) * | 2007-11-20 | 2011-02-15 | Guardian Industries Corp. | Photovoltaic device including front electrode having titanium oxide inclusive layer with high refractive index |
US20090194157A1 (en) * | 2008-02-01 | 2009-08-06 | Guardian Industries Corp. | Front electrode having etched surface for use in photovoltaic device and method of making same |
US20090194155A1 (en) * | 2008-02-01 | 2009-08-06 | Guardian Industries Corp. | Front electrode having etched surface for use in photovoltaic device and method of making same |
US8022291B2 (en) * | 2008-10-15 | 2011-09-20 | Guardian Industries Corp. | Method of making front electrode of photovoltaic device having etched surface and corresponding photovoltaic device |
IT1392502B1 (it) * | 2008-12-31 | 2012-03-09 | St Microelectronics Srl | Sensore comprendente almeno un fotodiodo a doppia giunzione verticale integrato su substrato semiconduttore e relativo processo di integrazione |
US20100163759A1 (en) * | 2008-12-31 | 2010-07-01 | Stmicroelectronics S.R.L. | Radiation sensor with photodiodes being integrated on a semiconductor substrate and corresponding integration process |
US20110186120A1 (en) * | 2009-11-05 | 2011-08-04 | Guardian Industries Corp. | Textured coating with various feature sizes made by using multiple-agent etchant for thin-film solar cells and/or methods of making the same |
US8502066B2 (en) * | 2009-11-05 | 2013-08-06 | Guardian Industries Corp. | High haze transparent contact including insertion layer for solar cells, and/or method of making the same |
US20110168252A1 (en) * | 2009-11-05 | 2011-07-14 | Guardian Industries Corp. | Textured coating with etching-blocking layer for thin-film solar cells and/or methods of making the same |
US8939606B2 (en) | 2010-02-26 | 2015-01-27 | Guardian Industries Corp. | Heatable lens for luminaires, and/or methods of making the same |
JP2012008297A (ja) * | 2010-06-24 | 2012-01-12 | Nikon Corp | 光学素子および光学装置 |
US8693097B2 (en) * | 2010-09-03 | 2014-04-08 | Guardian Industries Corp. | Temperable three layer antireflective coating, coated article including temperable three layer antireflective coating, and/or method of making the same |
US9796619B2 (en) | 2010-09-03 | 2017-10-24 | Guardian Glass, LLC | Temperable three layer antirefrlective coating, coated article including temperable three layer antirefrlective coating, and/or method of making the same |
US8445111B2 (en) * | 2010-10-14 | 2013-05-21 | Guardian Industries Corp. | Gadolinium oxide-doped zirconium oxide overcoat and/or method of making the same |
US8668990B2 (en) | 2011-01-27 | 2014-03-11 | Guardian Industries Corp. | Heat treatable four layer anti-reflection coating |
US20120200816A1 (en) * | 2011-02-04 | 2012-08-09 | Guardian Industries Corp. | Electronic devices having reduced susceptibility to newton rings, and/or methods of making the same |
JP2014167620A (ja) * | 2013-01-29 | 2014-09-11 | Nitto Denko Corp | 反射防止フィルムおよびその製造方法 |
JP6673629B2 (ja) * | 2013-01-29 | 2020-03-25 | 日東電工株式会社 | 反射防止フィルムおよびその製造方法 |
CN103148956B (zh) * | 2013-01-31 | 2015-10-28 | 中国人民解放军国防科学技术大学 | 一种基于涂覆微纳光纤进行温度测量的装置及方法 |
CN104280792A (zh) * | 2013-07-03 | 2015-01-14 | 上海舒曼光学有限公司 | 一种眼镜片减反射膜层及其制备方法 |
US20200194319A1 (en) * | 2018-12-17 | 2020-06-18 | Applied Materials, Inc. | Backside coating for transparent substrate |
CN115725936A (zh) * | 2021-08-31 | 2023-03-03 | 宁波激智科技股份有限公司 | 一种减反射膜 |
Family Cites Families (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2281474A (en) | 1939-03-20 | 1942-04-28 | Research Corp | Treating surfaces of light-transmitting articles, and the treated products |
US2478385A (en) | 1946-12-07 | 1949-08-09 | Libbey Owens Ford Glass Co | Multilayer low light reflecting film |
US2782676A (en) | 1952-03-01 | 1957-02-26 | American Optical Corp | Reflection reduction coatings and method for coating same |
AT221835B (de) | 1961-04-21 | 1962-06-25 | Reichert Optische Werke Ag | Entspiegelungsbelag |
US3185020A (en) | 1961-09-07 | 1965-05-25 | Optical Coating Laboratory Inc | Three layer anti-reflection coating |
US3432225A (en) | 1964-05-04 | 1969-03-11 | Optical Coating Laboratory Inc | Antireflection coating and assembly having synthesized layer of index of refraction |
US3463574A (en) | 1967-06-26 | 1969-08-26 | Perkin Elmer Corp | Multilayer antireflection coating for low index materials |
US3712711A (en) * | 1969-01-10 | 1973-01-23 | Itek Corp | Triple-layer anti-reflection coating design |
US3604784A (en) | 1969-01-21 | 1971-09-14 | Bausch & Lomb | Antireflection coatings |
US3761160A (en) | 1972-05-31 | 1973-09-25 | Optical Coating Laboratory Inc | Wide band anti-reflection coating and article coated therewith |
US3781090A (en) | 1972-11-06 | 1973-12-25 | Minolta Camera Kk | Four layer anti-reflection coating |
US4166018A (en) | 1974-01-31 | 1979-08-28 | Airco, Inc. | Sputtering process and apparatus |
US4046659A (en) | 1974-05-10 | 1977-09-06 | Airco, Inc. | Method for coating a substrate |
US4313647A (en) | 1975-12-23 | 1982-02-02 | Mamiya Koki Kabushiki Kaisha | Nonreflective coating |
US4128303A (en) | 1976-04-05 | 1978-12-05 | Kabushiki Kaisha Hoya Lens | Anti reflection coating with a composite middle layer |
US4356073A (en) | 1981-02-12 | 1982-10-26 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
US4422916A (en) | 1981-02-12 | 1983-12-27 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
DE3300589A1 (de) | 1983-01-11 | 1984-07-12 | Schott Glaswerke, 6500 Mainz | Verfahren zur herstellung von indiumoxid-zinnoxid-schichten |
GB8621468D0 (en) | 1986-09-05 | 1986-10-15 | Philips Nv | Display device |
US4921760A (en) | 1986-09-26 | 1990-05-01 | Minolta Camera Kabushiki Kaisha | Anti-reflection coating of optical part made of synthetic resin |
DE3906453A1 (de) | 1989-03-01 | 1990-09-06 | Leybold Ag | Verfahren zum beschichten von substraten aus durchscheinendem werkstoff, beispielsweise aus floatglas |
US5047131A (en) | 1989-11-08 | 1991-09-10 | The Boc Group, Inc. | Method for coating substrates with silicon based compounds |
US5091244A (en) | 1990-08-10 | 1992-02-25 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
US5407733A (en) | 1990-08-10 | 1995-04-18 | Viratec Thin Films, Inc. | Electrically-conductive, light-attenuating antireflection coating |
WO1992004185A1 (en) | 1990-08-30 | 1992-03-19 | Viratec Thin Films, Inc. | Dc reactively sputtered optical coatings including niobium oxide |
US5270858A (en) | 1990-10-11 | 1993-12-14 | Viratec Thin Films Inc | D.C. reactively sputtered antireflection coatings |
US5105310A (en) | 1990-10-11 | 1992-04-14 | Viratec Thin Films, Inc. | Dc reactively sputtered antireflection coatings |
US5318830A (en) | 1991-05-29 | 1994-06-07 | Central Glass Company, Limited | Glass pane with reflectance reducing coating |
US5254392A (en) | 1991-06-24 | 1993-10-19 | Ford Motor Company | Anti-iridescence coatings |
US5194990A (en) | 1991-10-07 | 1993-03-16 | Ford Motor Company | Low color purity, anti-reflection coatings for transparent glazings oriented at high angles of incidence |
JPH05188202A (ja) | 1992-01-10 | 1993-07-30 | Canon Inc | 多層光学薄膜 |
US5667880A (en) | 1992-07-20 | 1997-09-16 | Fuji Photo Optical Co., Ltd. | Electroconductive antireflection film |
US5262633A (en) | 1992-08-21 | 1993-11-16 | Santa Barbara Research Center | Wideband anti-reflection coating for indium antimonide photodetector device and method of forming the same |
WO1994019709A1 (en) | 1993-02-19 | 1994-09-01 | Photran Corporation | A light attenuating anti-reflection coating including electrically conductive layers |
FR2704545B1 (fr) * | 1993-04-29 | 1995-06-09 | Saint Gobain Vitrage Int | Vitrage muni d'une couche fonctionnelle conductrice et/ou basse-émissive. |
JPH0781977A (ja) | 1993-07-29 | 1995-03-28 | Central Glass Co Ltd | 反射防止膜およびその製造方法 |
US5362552A (en) | 1993-09-23 | 1994-11-08 | Austin R Russel | Visible-spectrum anti-reflection coating including electrically-conductive metal oxide layers |
US5450238A (en) | 1993-12-10 | 1995-09-12 | Viratec Thin Films, Inc. | Four-layer antireflection coating for deposition in in-like DC sputtering apparatus |
US5579162A (en) | 1994-10-31 | 1996-11-26 | Viratec Thin Films, Inc. | Antireflection coating for a temperature sensitive substrate |
FR2730990B1 (fr) | 1995-02-23 | 1997-04-04 | Saint Gobain Vitrage | Substrat transparent a revetement anti-reflets |
FR2738813B1 (fr) * | 1995-09-15 | 1997-10-17 | Saint Gobain Vitrage | Substrat a revetement photo-catalytique |
JPH10300902A (ja) | 1997-01-20 | 1998-11-13 | Dainippon Printing Co Ltd | 反射防止フィルム及びその製造方法 |
US6074730A (en) | 1997-12-31 | 2000-06-13 | The Boc Group, Inc. | Broad-band antireflection coating having four sputtered layers |
MXPA02007162A (es) * | 2000-01-26 | 2003-09-22 | Sola Int Holdings | Revestimiento antiestatica, antirreflejante. |
DE60122837T2 (de) * | 2000-07-27 | 2007-09-06 | Asahi Glass Co., Ltd. | Mit Antireflexionsfilmen ausgestattetes Substrat und dessen Herstellungsverfahren |
-
2001
- 2001-08-31 US US09/945,262 patent/US6589657B2/en not_active Expired - Fee Related
-
2002
- 2002-08-30 AU AU2002342628A patent/AU2002342628A1/en not_active Abandoned
- 2002-08-30 WO PCT/EP2002/009687 patent/WO2003021305A2/en active IP Right Grant
- 2002-08-30 JP JP2003525334A patent/JP2005502077A/ja not_active Withdrawn
- 2002-08-30 EP EP02779284A patent/EP1423737B1/de not_active Expired - Lifetime
- 2002-08-30 CN CNA028170253A patent/CN1549936A/zh active Pending
- 2002-08-30 AT AT02779284T patent/ATE324600T1/de not_active IP Right Cessation
- 2002-08-30 KR KR10-2004-7003116A patent/KR20040044523A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP1423737A2 (de) | 2004-06-02 |
JP2005502077A (ja) | 2005-01-20 |
EP1423737B1 (de) | 2006-04-26 |
AU2002342628A1 (en) | 2003-03-18 |
US20030064255A1 (en) | 2003-04-03 |
US6589657B2 (en) | 2003-07-08 |
KR20040044523A (ko) | 2004-05-28 |
WO2003021305A2 (en) | 2003-03-13 |
CN1549936A (zh) | 2004-11-24 |
WO2003021305A3 (en) | 2003-11-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |