DE602005010860D1 - Modifizierte metallform zur verwendung bei druckprozessen - Google Patents
Modifizierte metallform zur verwendung bei druckprozessenInfo
- Publication number
- DE602005010860D1 DE602005010860D1 DE602005010860T DE602005010860T DE602005010860D1 DE 602005010860 D1 DE602005010860 D1 DE 602005010860D1 DE 602005010860 T DE602005010860 T DE 602005010860T DE 602005010860 T DE602005010860 T DE 602005010860T DE 602005010860 D1 DE602005010860 D1 DE 602005010860D1
- Authority
- DE
- Germany
- Prior art keywords
- metal mold
- phosphoric acid
- acid derivative
- fluorinated alkyl
- base metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/60—Deposition of organic layers from vapour phase
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C33/00—Moulds or cores; Details thereof or accessories therefor
- B29C33/56—Coatings, e.g. enameled or galvanised; Releasing, lubricating or separating agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/185—Processes for applying liquids or other fluent materials performed by dipping applying monomolecular layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Magnetic Record Carriers (AREA)
- Laminated Bodies (AREA)
- Micromachines (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US52158704P | 2004-05-28 | 2004-05-28 | |
EP04445064A EP1600811A1 (de) | 2004-05-28 | 2004-05-28 | Modifizierte Metallformen für Imprint-Verfahren |
PCT/EP2005/052423 WO2005119360A1 (en) | 2004-05-28 | 2005-05-27 | Modified metal mold for use in imprinting processes |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005010860D1 true DE602005010860D1 (de) | 2008-12-18 |
Family
ID=34969147
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005010860T Active DE602005010860D1 (de) | 2004-05-28 | 2005-05-27 | Modifizierte metallform zur verwendung bei druckprozessen |
Country Status (9)
Country | Link |
---|---|
US (2) | US7717693B2 (de) |
EP (1) | EP1759245B1 (de) |
JP (1) | JP2008500914A (de) |
KR (1) | KR101257881B1 (de) |
CN (1) | CN101010632A (de) |
AT (1) | ATE413632T1 (de) |
DE (1) | DE602005010860D1 (de) |
ES (1) | ES2317246T3 (de) |
WO (1) | WO2005119360A1 (de) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE602005010860D1 (de) * | 2004-05-28 | 2008-12-18 | Obducat Ab | Modifizierte metallform zur verwendung bei druckprozessen |
DE102004037902A1 (de) * | 2004-08-05 | 2006-03-16 | Robert Bosch Gmbh | Verfahren zur Abscheidung einer Anti-Haftungsschicht |
JP4584754B2 (ja) * | 2005-04-06 | 2010-11-24 | 株式会社日立産機システム | ナノプリント金型、その製造方法及びこの金型を用いたナノプリント装置並びにナノプリント方法 |
JPWO2006118348A1 (ja) * | 2005-04-28 | 2008-12-18 | ソニー株式会社 | 潤滑剤組成物およびそれを塗布してなる物品、光ディスク用基板の成形スタンパ、光ディスク用基板の成形金型装置、光ディスク用基板の成形方法ならびに潤滑膜の形成方法 |
EP1959299B1 (de) | 2005-06-10 | 2012-12-26 | Obducat AB | Musterreplikation mit Zwischenstempel |
US7854873B2 (en) | 2005-06-10 | 2010-12-21 | Obducat Ab | Imprint stamp comprising cyclic olefin copolymer |
KR101264673B1 (ko) * | 2005-06-24 | 2013-05-20 | 엘지디스플레이 주식회사 | 소프트 몰드를 이용한 미세 패턴 형성방법 |
JP4973089B2 (ja) * | 2006-09-25 | 2012-07-11 | 凸版印刷株式会社 | 熱インプリント用モールド |
US8337959B2 (en) * | 2006-11-28 | 2012-12-25 | Nanonex Corporation | Method and apparatus to apply surface release coating for imprint mold |
US20080173994A1 (en) * | 2007-01-24 | 2008-07-24 | International Business Machines Corporation | Method of making release coatings for composite materials |
JP5456465B2 (ja) * | 2007-06-04 | 2014-03-26 | 丸善石油化学株式会社 | 微細加工品およびその製造方法 |
EP2205521A4 (de) * | 2007-09-06 | 2013-09-11 | 3M Innovative Properties Co | Werkzeug zur herstellung von mikrostrukturierten artikeln |
EP2199854B1 (de) | 2008-12-19 | 2015-12-16 | Obducat AB | Hybridpolymerform für nanoimprintverfahren und verfahren zu seiner herstellung |
EP2199855B1 (de) | 2008-12-19 | 2016-07-20 | Obducat | Verfahren und Prozesse zur Modifizierung von Polymermaterialoberflächeninteraktionen |
US8585954B2 (en) * | 2009-11-10 | 2013-11-19 | Massachusetts Institute Of Technology | Method and apparatus for embossing a deformable body |
WO2011060102A1 (en) * | 2009-11-10 | 2011-05-19 | Massachusetts Institute Of Technology | Method and apparatus for embossing a deformable body |
US8747092B2 (en) | 2010-01-22 | 2014-06-10 | Nanonex Corporation | Fast nanoimprinting apparatus using deformale mold |
US9526883B2 (en) | 2010-04-28 | 2016-12-27 | Kimberly-Clark Worldwide, Inc. | Composite microneedle array including nanostructures thereon |
US8524134B2 (en) * | 2010-07-12 | 2013-09-03 | Graham J. Hubbard | Method of molding polymeric materials to impart a desired texture thereto |
JP5653769B2 (ja) * | 2011-01-19 | 2015-01-14 | 富士フイルム株式会社 | ナノインプリント方法 |
CN103906549A (zh) | 2011-10-27 | 2014-07-02 | 金伯利-克拉克环球有限公司 | 用于递送生物活性剂的可植入装置 |
US10108086B2 (en) | 2013-03-15 | 2018-10-23 | Nanonex Corporation | System and methods of mold/substrate separation for imprint lithography |
US10105883B2 (en) | 2013-03-15 | 2018-10-23 | Nanonex Corporation | Imprint lithography system and method for manufacturing |
CN104190859A (zh) * | 2014-06-26 | 2014-12-10 | 芜湖市鸿坤汽车零部件有限公司 | 一种消失模铸造用醇基铸造涂料及其制作方法 |
JP5788577B2 (ja) * | 2014-08-27 | 2015-09-30 | Hoya株式会社 | コピーモールドの製造方法 |
CN104399871A (zh) * | 2014-11-08 | 2015-03-11 | 芜湖市鸿坤汽车零部件有限公司 | 一种沥青/草木灰复合的醇基铸造涂料及其制作方法 |
CN115724421A (zh) * | 2021-08-23 | 2023-03-03 | 中国科学院苏州纳米技术与纳米仿生研究所 | 一种定向碳纳米管阵列结构及其制备方法与应用 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3972924A (en) * | 1975-03-24 | 1976-08-03 | The United States Of America As Represented By The Secretary Of Agriculture | 1-(1H,1H-perfluorooctyl)-1,3-trimethylenediphosphonic tetrachloride |
US4118235A (en) | 1975-09-18 | 1978-10-03 | Daikin Kogyo Co., Ltd. | Mold release agent |
US5277788A (en) | 1990-10-01 | 1994-01-11 | Aluminum Company Of America | Twice-anodized aluminum article having an organo-phosphorus monolayer and process for making the article |
JPH0818336B2 (ja) * | 1991-02-06 | 1996-02-28 | 松下電器産業株式会社 | 成形用部材およびその製造方法 |
JPH08120178A (ja) | 1994-10-21 | 1996-05-14 | Daikin Ind Ltd | 離型剤、該離型剤から得られる硬化皮膜および該離型剤を用いた成形方法 |
US6309580B1 (en) | 1995-11-15 | 2001-10-30 | Regents Of The University Of Minnesota | Release surfaces, particularly for use in nanoimprint lithography |
US6048623A (en) * | 1996-12-18 | 2000-04-11 | Kimberly-Clark Worldwide, Inc. | Method of contact printing on gold coated films |
US5820678A (en) * | 1997-05-30 | 1998-10-13 | The Regents Of The University Of California | Solid source MOCVD system |
EP1257878B1 (de) * | 2000-01-21 | 2006-07-05 | Obducat Aktiebolag | Form zur nanobedruckung |
US6380101B1 (en) * | 2000-04-18 | 2002-04-30 | International Business Machines Corporation | Method of forming patterned indium zinc oxide and indium tin oxide films via microcontact printing and uses thereof |
US6852266B2 (en) | 2001-01-19 | 2005-02-08 | Korry Electronics Co. | Ultrasonic assisted deposition of anti-stick films on metal oxides |
US6824882B2 (en) * | 2002-05-31 | 2004-11-30 | 3M Innovative Properties Company | Fluorinated phosphonic acids |
AU2003239022A1 (en) * | 2002-06-20 | 2004-01-06 | Obducat Ab | Mold tool method of manufacturing a mold tool and storage medium formed by use of the mold tool |
US6806809B2 (en) * | 2003-01-03 | 2004-10-19 | General Motors Corporation | Trailer tongue length estimation using a hitch angle sensor |
US7189479B2 (en) * | 2003-08-21 | 2007-03-13 | 3M Innovative Properties Company | Phototool coating |
DE602005010860D1 (de) * | 2004-05-28 | 2008-12-18 | Obducat Ab | Modifizierte metallform zur verwendung bei druckprozessen |
-
2005
- 2005-05-27 DE DE602005010860T patent/DE602005010860D1/de active Active
- 2005-05-27 US US11/597,570 patent/US7717693B2/en active Active
- 2005-05-27 JP JP2007513944A patent/JP2008500914A/ja active Pending
- 2005-05-27 WO PCT/EP2005/052423 patent/WO2005119360A1/en active Application Filing
- 2005-05-27 EP EP05749153A patent/EP1759245B1/de active Active
- 2005-05-27 ES ES05749153T patent/ES2317246T3/es active Active
- 2005-05-27 AT AT05749153T patent/ATE413632T1/de not_active IP Right Cessation
- 2005-05-27 KR KR1020067027741A patent/KR101257881B1/ko active IP Right Grant
- 2005-05-27 CN CNA2005800173052A patent/CN101010632A/zh active Pending
-
2010
- 2010-03-31 US US12/751,239 patent/US8119197B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US7717693B2 (en) | 2010-05-18 |
JP2008500914A (ja) | 2008-01-17 |
EP1759245B1 (de) | 2008-11-05 |
KR20070028468A (ko) | 2007-03-12 |
WO2005119360A1 (en) | 2005-12-15 |
KR101257881B1 (ko) | 2013-04-24 |
ES2317246T3 (es) | 2009-04-16 |
US8119197B2 (en) | 2012-02-21 |
CN101010632A (zh) | 2007-08-01 |
US20100227051A1 (en) | 2010-09-09 |
ATE413632T1 (de) | 2008-11-15 |
EP1759245A1 (de) | 2007-03-07 |
US20070166557A1 (en) | 2007-07-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |