DE60143682D1 - Herstellungsverfahren für Resonatorbauelemente mit piezoelektrischen Filmen - Google Patents
Herstellungsverfahren für Resonatorbauelemente mit piezoelektrischen FilmenInfo
- Publication number
- DE60143682D1 DE60143682D1 DE60143682T DE60143682T DE60143682D1 DE 60143682 D1 DE60143682 D1 DE 60143682D1 DE 60143682 T DE60143682 T DE 60143682T DE 60143682 T DE60143682 T DE 60143682T DE 60143682 D1 DE60143682 D1 DE 60143682D1
- Authority
- DE
- Germany
- Prior art keywords
- production method
- piezoelectric films
- resonator components
- resonator
- components
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/964—Roughened surface
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/502,868 US6329305B1 (en) | 2000-02-11 | 2000-02-11 | Method for producing devices having piezoelectric films |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60143682D1 true DE60143682D1 (de) | 2011-02-03 |
Family
ID=23999743
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60143682T Expired - Lifetime DE60143682D1 (de) | 2000-02-11 | 2001-01-29 | Herstellungsverfahren für Resonatorbauelemente mit piezoelektrischen Filmen |
Country Status (5)
Country | Link |
---|---|
US (2) | US6329305B1 (de) |
EP (1) | EP1124269B1 (de) |
JP (1) | JP4917711B2 (de) |
KR (1) | KR100859674B1 (de) |
DE (1) | DE60143682D1 (de) |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6376971B1 (en) * | 1997-02-07 | 2002-04-23 | Sri International | Electroactive polymer electrodes |
US6953977B2 (en) | 2000-02-08 | 2005-10-11 | Boston Microsystems, Inc. | Micromechanical piezoelectric device |
US6329305B1 (en) * | 2000-02-11 | 2001-12-11 | Agere Systems Guardian Corp. | Method for producing devices having piezoelectric films |
DE10035421A1 (de) * | 2000-07-20 | 2002-02-07 | Infineon Technologies Ag | Verfahren zur Herstellung eines Halbleiterbauelements mit einer Schichtenfolge zum ineinander Umwandeln von akustischen oder thermischen Signalen und elektrischen Spannungsänderungen |
JP2005236337A (ja) * | 2001-05-11 | 2005-09-02 | Ube Ind Ltd | 薄膜音響共振器及びその製造方法 |
US6975182B2 (en) * | 2001-08-14 | 2005-12-13 | Koninklijke Philips Electronics N.V. | Filter system with bulk wave resonator having a reflection layer composition that varies with the layer thickness |
KR20030032401A (ko) * | 2001-10-18 | 2003-04-26 | 한국쌍신전기주식회사 | 압전박막형 공진기 및 그 제조방법 |
JP2004048639A (ja) * | 2002-05-17 | 2004-02-12 | Murata Mfg Co Ltd | 圧電共振子及びその製造方法等 |
US6906451B2 (en) | 2002-01-08 | 2005-06-14 | Murata Manufacturing Co., Ltd. | Piezoelectric resonator, piezoelectric filter, duplexer, communication apparatus, and method for manufacturing piezoelectric resonator |
JP2004221622A (ja) * | 2002-01-08 | 2004-08-05 | Murata Mfg Co Ltd | 圧電共振子、圧電フィルタ、デュプレクサ、通信装置および圧電共振子の製造方法 |
US20040164291A1 (en) * | 2002-12-18 | 2004-08-26 | Xingwu Wang | Nanoelectrical compositions |
KR20020029882A (ko) * | 2002-03-02 | 2002-04-20 | 주식회사 에이엔티 | 엘시엠피 공정법에 의한 탄성파소자의 제작방법 |
US6740588B1 (en) * | 2002-03-29 | 2004-05-25 | Silicon Magnetic Systems | Smooth metal semiconductor surface and method for making the same |
JP2004072715A (ja) * | 2002-06-11 | 2004-03-04 | Murata Mfg Co Ltd | 圧電薄膜共振子、圧電フィルタ、およびそれを有する電子部品 |
US7276994B2 (en) * | 2002-05-23 | 2007-10-02 | Murata Manufacturing Co., Ltd. | Piezoelectric thin-film resonator, piezoelectric filter, and electronic component including the piezoelectric filter |
JP4240445B2 (ja) | 2002-05-31 | 2009-03-18 | 独立行政法人産業技術総合研究所 | 超高配向窒化アルミニウム薄膜を用いた圧電素子とその製造方法 |
US6944922B2 (en) | 2002-08-13 | 2005-09-20 | Trikon Technologies Limited | Method of forming an acoustic resonator |
JP3947443B2 (ja) * | 2002-08-30 | 2007-07-18 | Tdk株式会社 | 電子デバイス用基板および電子デバイス |
KR100483340B1 (ko) * | 2002-10-22 | 2005-04-15 | 쌍신전자통신주식회사 | 체적탄성파 소자 및 그 제조방법 |
DE10301261B4 (de) * | 2003-01-15 | 2018-03-22 | Snaptrack, Inc. | Mit akustischen Volumenwellen arbeitendes Bauelement und Verfahren zur Herstellung |
GB0308249D0 (en) * | 2003-04-10 | 2003-05-14 | Trikon Technologies Ltd | Method of depositing piezoelectric films |
US7227292B2 (en) | 2003-04-10 | 2007-06-05 | Aviza Technologies, Inc. | Methods of depositing piezoelectric films |
JP2005033379A (ja) * | 2003-07-09 | 2005-02-03 | Tdk Corp | 薄膜バルク波振動子およびその製造方法 |
JP4657660B2 (ja) * | 2003-09-12 | 2011-03-23 | パナソニック株式会社 | 薄膜バルク音響共振器、その製造方法、フィルタ、複合電子部品および通信機器 |
JP2005136115A (ja) * | 2003-10-30 | 2005-05-26 | Tdk Corp | 電子デバイス及びその製造方法 |
JP2005252069A (ja) | 2004-03-05 | 2005-09-15 | Tdk Corp | 電子デバイス及びその製造方法 |
JP4737375B2 (ja) * | 2004-03-11 | 2011-07-27 | セイコーエプソン株式会社 | アクチュエータ装置の製造方法及び液体噴射ヘッドの製造方法並びに液体噴射装置の製造方法 |
DE102004026654B4 (de) * | 2004-06-01 | 2009-07-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Mikromechanisches HF-Schaltelement sowie Verfahren zur Herstellung |
JP2006019935A (ja) | 2004-06-30 | 2006-01-19 | Toshiba Corp | 薄膜圧電共振器及びその製造方法 |
JP2006186831A (ja) * | 2004-12-28 | 2006-07-13 | Kyocera Kinseki Corp | 圧電薄膜デバイス及びその製造方法 |
JP4693407B2 (ja) * | 2004-12-28 | 2011-06-01 | 京セラキンセキ株式会社 | 圧電薄膜デバイス及びその製造方法 |
US7450352B2 (en) * | 2005-06-28 | 2008-11-11 | Wisconsin Alumni Research Foundation | Fabrication of magnetic tunnel junctions with epitaxial and textured ferromagnetic layers |
WO2009006318A1 (en) | 2007-06-29 | 2009-01-08 | Artificial Muscle, Inc. | Electroactive polymer transducers for sensory feedback applications |
EP2239793A1 (de) | 2009-04-11 | 2010-10-13 | Bayer MaterialScience AG | Elektrisch schaltbarer Polymerfilmaufbau und dessen Verwendung |
JP2012015304A (ja) * | 2010-06-30 | 2012-01-19 | Sumitomo Electric Ind Ltd | 半導体装置 |
US9553254B2 (en) | 2011-03-01 | 2017-01-24 | Parker-Hannifin Corporation | Automated manufacturing processes for producing deformable polymer devices and films |
TW201250288A (en) | 2011-03-22 | 2012-12-16 | Bayer Materialscience Ag | Electroactive polymer actuator lenticular system |
US9876160B2 (en) | 2012-03-21 | 2018-01-23 | Parker-Hannifin Corporation | Roll-to-roll manufacturing processes for producing self-healing electroactive polymer devices |
US9761790B2 (en) | 2012-06-18 | 2017-09-12 | Parker-Hannifin Corporation | Stretch frame for stretching process |
US9590193B2 (en) | 2012-10-24 | 2017-03-07 | Parker-Hannifin Corporation | Polymer diode |
JP2016029430A (ja) * | 2014-07-25 | 2016-03-03 | セイコーエプソン株式会社 | 電気光学装置、電気光学装置の製造方法、及び電子機器 |
US10069472B2 (en) | 2015-04-10 | 2018-09-04 | Samsung Electro-Mechanics Co., Ltd. | Bulk acoustic wave resonator and filter including the same |
KR101901696B1 (ko) * | 2015-04-10 | 2018-09-28 | 삼성전기 주식회사 | 체적 음향 공진기 및 이를 포함하는 필터 |
CN109160485B (zh) * | 2018-08-09 | 2020-09-15 | 南京邮电大学 | 一种声栅-反射面压电超声能量收集器及其制备方法 |
KR20200076125A (ko) | 2018-12-19 | 2020-06-29 | 삼성전기주식회사 | 체적 음향 공진기 |
US11990885B2 (en) | 2021-06-29 | 2024-05-21 | Qorvo Us, Inc. | Method for manufacturing acoustic devices with improved performance |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4692653A (en) * | 1984-03-23 | 1987-09-08 | Hitachi, Ltd. | Acoustic transducers utilizing ZnO thin film |
US5373268A (en) * | 1993-02-01 | 1994-12-13 | Motorola, Inc. | Thin film resonator having stacked acoustic reflecting impedance matching layers and method |
JPH06350371A (ja) * | 1993-06-10 | 1994-12-22 | Matsushita Electric Ind Co Ltd | 圧電デバイスの製造方法 |
US5741961A (en) * | 1993-08-18 | 1998-04-21 | Sandia Corporation | Quartz resonator fluid density and viscosity monitor |
US5867074A (en) | 1994-03-02 | 1999-02-02 | Seiko Epson Corporation | Surface acoustic wave resonator, surface acoustic wave resonator unit, surface mounting type surface acoustic wave resonator unit |
WO1995027318A1 (fr) | 1994-03-31 | 1995-10-12 | Nihon Dengyo Kosaku Co., Ltd. | Cavite resonante et filtre utilisant cet element |
JPH08148968A (ja) * | 1994-11-24 | 1996-06-07 | Mitsubishi Electric Corp | 薄膜圧電素子 |
US5903087A (en) * | 1997-06-05 | 1999-05-11 | Motorola Inc. | Electrode edge wave patterns for piezoelectric resonator |
JP3813740B2 (ja) * | 1997-07-11 | 2006-08-23 | Tdk株式会社 | 電子デバイス用基板 |
US5936150A (en) * | 1998-04-13 | 1999-08-10 | Rockwell Science Center, Llc | Thin film resonant chemical sensor with resonant acoustic isolator |
US6060818A (en) * | 1998-06-02 | 2000-05-09 | Hewlett-Packard Company | SBAR structures and method of fabrication of SBAR.FBAR film processing techniques for the manufacturing of SBAR/BAR filters |
US6329305B1 (en) * | 2000-02-11 | 2001-12-11 | Agere Systems Guardian Corp. | Method for producing devices having piezoelectric films |
US6342134B1 (en) * | 2000-02-11 | 2002-01-29 | Agere Systems Guardian Corp. | Method for producing piezoelectric films with rotating magnetron sputtering system |
KR100963040B1 (ko) * | 2009-08-06 | 2010-06-10 | 이용규 | 건설용 가설재 파이프 이송장치 |
-
2000
- 2000-02-11 US US09/502,868 patent/US6329305B1/en not_active Expired - Lifetime
-
2001
- 2001-01-29 DE DE60143682T patent/DE60143682D1/de not_active Expired - Lifetime
- 2001-01-29 EP EP01300740A patent/EP1124269B1/de not_active Expired - Lifetime
- 2001-02-08 JP JP2001032114A patent/JP4917711B2/ja not_active Expired - Fee Related
- 2001-02-12 KR KR1020010006759A patent/KR100859674B1/ko active IP Right Grant
- 2001-05-21 US US09/861,839 patent/US6475931B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6329305B1 (en) | 2001-12-11 |
JP4917711B2 (ja) | 2012-04-18 |
JP2001313535A (ja) | 2001-11-09 |
EP1124269B1 (de) | 2010-12-22 |
US6475931B2 (en) | 2002-11-05 |
EP1124269A3 (de) | 2005-04-06 |
US20010026981A1 (en) | 2001-10-04 |
EP1124269A2 (de) | 2001-08-16 |
KR100859674B1 (ko) | 2008-09-23 |
KR20010082140A (ko) | 2001-08-29 |
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