DE3575498D1 - Halbleiter-fotodetektorvorrichtung. - Google Patents

Halbleiter-fotodetektorvorrichtung.

Info

Publication number
DE3575498D1
DE3575498D1 DE8585308283T DE3575498T DE3575498D1 DE 3575498 D1 DE3575498 D1 DE 3575498D1 DE 8585308283 T DE8585308283 T DE 8585308283T DE 3575498 T DE3575498 T DE 3575498T DE 3575498 D1 DE3575498 D1 DE 3575498D1
Authority
DE
Germany
Prior art keywords
semiconductor photodetector
photodetector device
semiconductor
photodetector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8585308283T
Other languages
English (en)
Inventor
Motoo Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Application granted granted Critical
Publication of DE3575498D1 publication Critical patent/DE3575498D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/112—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor
    • H01L31/113—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor
    • H01L31/1136—Devices sensitive to infrared, visible or ultraviolet radiation characterised by field-effect operation, e.g. junction field-effect phototransistor being of the conductor-insulator-semiconductor type, e.g. metal-insulator-semiconductor field-effect transistor the device being a metal-insulator-semiconductor field-effect transistor

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
DE8585308283T 1984-11-16 1985-11-14 Halbleiter-fotodetektorvorrichtung. Expired - Fee Related DE3575498D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59241978A JPS61120466A (ja) 1984-11-16 1984-11-16 半導体光検出素子

Publications (1)

Publication Number Publication Date
DE3575498D1 true DE3575498D1 (de) 1990-02-22

Family

ID=17082418

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585308283T Expired - Fee Related DE3575498D1 (de) 1984-11-16 1985-11-14 Halbleiter-fotodetektorvorrichtung.

Country Status (5)

Country Link
US (1) US4841349A (de)
EP (1) EP0182610B1 (de)
JP (1) JPS61120466A (de)
KR (1) KR890004476B1 (de)
DE (1) DE3575498D1 (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2857397B2 (ja) * 1988-08-05 1999-02-17 シャープ株式会社 光駆動型半導体装置の製造方法
US5021849A (en) * 1989-10-30 1991-06-04 Motorola, Inc. Compact SRAM cell with polycrystalline silicon diode load
US5241575A (en) * 1989-12-21 1993-08-31 Minolta Camera Kabushiki Kaisha Solid-state image sensing device providing a logarithmically proportional output signal
IL96623A0 (en) * 1989-12-26 1991-09-16 Gen Electric Low capacitance,large area semiconductor photodetector and photodetector system
US5151387A (en) 1990-04-30 1992-09-29 Sgs-Thomson Microelectronics, Inc. Polycrystalline silicon contact structure
US5117113A (en) * 1990-07-06 1992-05-26 Thompson And Nielson Electronics Ltd. Direct reading dosimeter
US6013565A (en) 1991-12-16 2000-01-11 Penn State Research Foundation High conductivity thin film material for semiconductor device
JPH05219443A (ja) * 1992-02-05 1993-08-27 Minolta Camera Co Ltd 固体撮像装置
US5557114A (en) * 1995-01-12 1996-09-17 International Business Machines Corporation Optical fet
US6144366A (en) * 1996-10-18 2000-11-07 Kabushiki Kaisha Toshiba Method and apparatus for generating information input using reflected light image of target object
US6936849B1 (en) 1997-07-29 2005-08-30 Micron Technology, Inc. Silicon carbide gate transistor
US6965123B1 (en) 1997-07-29 2005-11-15 Micron Technology, Inc. Transistor with variable electron affinity gate and methods of fabrication and use
US6794255B1 (en) 1997-07-29 2004-09-21 Micron Technology, Inc. Carburized silicon gate insulators for integrated circuits
US7154153B1 (en) 1997-07-29 2006-12-26 Micron Technology, Inc. Memory device
US7196929B1 (en) 1997-07-29 2007-03-27 Micron Technology Inc Method for operating a memory device having an amorphous silicon carbide gate insulator
US6746893B1 (en) 1997-07-29 2004-06-08 Micron Technology, Inc. Transistor with variable electron affinity gate and methods of fabrication and use
US6031263A (en) 1997-07-29 2000-02-29 Micron Technology, Inc. DEAPROM and transistor with gallium nitride or gallium aluminum nitride gate
US6046466A (en) * 1997-09-12 2000-04-04 Nikon Corporation Solid-state imaging device
JPH11274466A (ja) 1998-03-20 1999-10-08 Nikon Corp 固体撮像装置及びこれを備えたカメラ
US6545333B1 (en) 2001-04-25 2003-04-08 International Business Machines Corporation Light controlled silicon on insulator device
US6936895B2 (en) * 2003-10-09 2005-08-30 Chartered Semiconductor Manufacturing Ltd. ESD protection device
US8477125B2 (en) * 2005-12-21 2013-07-02 Samsung Display Co., Ltd. Photo sensor and organic light-emitting display using the same
US8476709B2 (en) * 2006-08-24 2013-07-02 Infineon Technologies Ag ESD protection device and method
JP2008288499A (ja) * 2007-05-21 2008-11-27 Panasonic Corp 半導体装置及びその製造方法
JP5196963B2 (ja) * 2007-11-09 2013-05-15 株式会社ジャパンディスプレイウェスト 表示装置および表示制御方法ならびに電子機器
US9070784B2 (en) 2011-07-22 2015-06-30 Taiwan Semiconductor Manufacturing Company, Ltd. Metal gate structure of a CMOS semiconductor device and method of forming the same
CN109920895B (zh) * 2019-03-12 2024-02-09 中国科学院微电子研究所 可控发光位置的二极管器件、制造方法、电压控制方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3207926A (en) * 1962-07-06 1965-09-21 Bell Telephone Labor Inc Stabilized timing network
GB1136569A (en) * 1965-12-22 1968-12-11 Mullard Ltd Insulated gate field effect transistors
US3459944A (en) * 1966-01-04 1969-08-05 Ibm Photosensitive insulated gate field effect transistor
US3648258A (en) * 1969-07-01 1972-03-07 Sperry Rand Corp Optical memory circuit
US4057819A (en) * 1976-08-05 1977-11-08 Alan Ernest Owen Semiconductor device
US4099196A (en) * 1977-06-29 1978-07-04 Intel Corporation Triple layer polysilicon cell
JPS5850030B2 (ja) * 1979-03-08 1983-11-08 日本放送協会 光電変換装置およびそれを用いた固体撮像板
JPS55156371A (en) * 1979-05-24 1980-12-05 Toshiba Corp Non-volatile semiconductor memory device
US4236831A (en) * 1979-07-27 1980-12-02 Honeywell Inc. Semiconductor apparatus
JPS5737888A (en) * 1980-08-19 1982-03-02 Mitsubishi Electric Corp Photo detector
US4419586A (en) * 1981-08-27 1983-12-06 Motorola, Inc. Solid-state relay and regulator
JPS5922360A (ja) * 1982-07-28 1984-02-04 Matsushita Electric Works Ltd 光入力モス型トランジスタ
US4564770A (en) * 1983-03-29 1986-01-14 Rca Corporation Solid state relay with fast turnoff

Also Published As

Publication number Publication date
EP0182610A3 (en) 1986-09-17
KR890004476B1 (ko) 1989-11-04
EP0182610A2 (de) 1986-05-28
JPS61120466A (ja) 1986-06-07
US4841349A (en) 1989-06-20
KR860004479A (ko) 1986-06-23
EP0182610B1 (de) 1990-01-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee