DE2122263C2 - Verfahren zur Herstellung eines primären Glänzers für saure galvanische Verzinnungsbäder und dessen Verwendung - Google Patents

Verfahren zur Herstellung eines primären Glänzers für saure galvanische Verzinnungsbäder und dessen Verwendung

Info

Publication number
DE2122263C2
DE2122263C2 DE2122263A DE2122263A DE2122263C2 DE 2122263 C2 DE2122263 C2 DE 2122263C2 DE 2122263 A DE2122263 A DE 2122263A DE 2122263 A DE2122263 A DE 2122263A DE 2122263 C2 DE2122263 C2 DE 2122263C2
Authority
DE
Germany
Prior art keywords
reaction
primary
carried out
solution
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2122263A
Other languages
German (de)
English (en)
Other versions
DE2122263A1 (de
Inventor
Frank Detroit Mich. Passal
Silvester Paul Valayil
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M&T Chemicals Inc
Original Assignee
M&T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M&T Chemicals Inc filed Critical M&T Chemicals Inc
Publication of DE2122263A1 publication Critical patent/DE2122263A1/de
Application granted granted Critical
Publication of DE2122263C2 publication Critical patent/DE2122263C2/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D307/40—Radicals substituted by oxygen atoms
    • C07D307/46—Doubly bound oxygen atoms, or two oxygen atoms singly bound to the same carbon atom

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
DE2122263A 1970-05-06 1971-05-05 Verfahren zur Herstellung eines primären Glänzers für saure galvanische Verzinnungsbäder und dessen Verwendung Expired DE2122263C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3526170A 1970-05-06 1970-05-06

Publications (2)

Publication Number Publication Date
DE2122263A1 DE2122263A1 (de) 1971-12-09
DE2122263C2 true DE2122263C2 (de) 1981-12-03

Family

ID=21881579

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2122263A Expired DE2122263C2 (de) 1970-05-06 1971-05-05 Verfahren zur Herstellung eines primären Glänzers für saure galvanische Verzinnungsbäder und dessen Verwendung

Country Status (11)

Country Link
US (1) US3634212A (ja)
JP (1) JPS5524512B1 (ja)
BR (1) BR7102639D0 (ja)
CA (1) CA988452A (ja)
DE (1) DE2122263C2 (ja)
ES (1) ES390675A1 (ja)
FR (1) FR2088388B1 (ja)
GB (1) GB1311424A (ja)
NL (1) NL7106161A (ja)
SE (1) SE375340B (ja)
ZA (1) ZA712389B (ja)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4844780A (en) * 1988-02-17 1989-07-04 Maclee Chemical Company, Inc. Brightener and aqueous plating bath for tin and/or lead
US5750017A (en) * 1996-08-21 1998-05-12 Lucent Technologies Inc. Tin electroplating process
US6670071B2 (en) * 2002-01-15 2003-12-30 Quallion Llc Electric storage battery construction and method of manufacture
US6838114B2 (en) * 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US6821347B2 (en) * 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US6818249B2 (en) * 2003-03-03 2004-11-16 Micron Technology, Inc. Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces
US7335396B2 (en) * 2003-04-24 2008-02-26 Micron Technology, Inc. Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
US7344755B2 (en) * 2003-08-21 2008-03-18 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
US7235138B2 (en) 2003-08-21 2007-06-26 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
US7422635B2 (en) 2003-08-28 2008-09-09 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
US7056806B2 (en) * 2003-09-17 2006-06-06 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
US7282239B2 (en) * 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
US7323231B2 (en) * 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7581511B2 (en) * 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US7647886B2 (en) * 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
US7258892B2 (en) * 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
US7906393B2 (en) * 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
US7584942B2 (en) * 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US20050249873A1 (en) * 2004-05-05 2005-11-10 Demetrius Sarigiannis Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices
US8133554B2 (en) * 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) * 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US7156470B1 (en) * 2004-06-28 2007-01-02 Wright James P Wheel trim hub cover
US20060165873A1 (en) * 2005-01-25 2006-07-27 Micron Technology, Inc. Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
US20060237138A1 (en) * 2005-04-26 2006-10-26 Micron Technology, Inc. Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1544726A (en) * 1924-08-28 1925-07-07 Us Smelting Refining & Mining Electrolytic refining of metals
FR1392257A (fr) * 1964-04-29 1965-03-12 Friedr Blasberg G M B H Agent de brillantage pour la séparation électrolytique de dépôts d'étain à haut brillant à partir de solutions aqueuses acides de sels d'étain, et son utilisation
NL128321C (ja) * 1965-02-13

Also Published As

Publication number Publication date
NL7106161A (ja) 1971-11-09
JPS5524512B1 (ja) 1980-06-30
SE375340B (ja) 1975-04-14
CA988452A (en) 1976-05-04
DE2122263A1 (de) 1971-12-09
GB1311424A (en) 1973-03-28
US3634212A (en) 1972-01-11
FR2088388B1 (ja) 1975-07-04
ZA712389B (en) 1972-01-26
ES390675A1 (es) 1974-03-16
BR7102639D0 (pt) 1973-04-19
FR2088388A1 (ja) 1972-01-07

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Legal Events

Date Code Title Description
OD Request for examination
D2 Grant after examination
8339 Ceased/non-payment of the annual fee