DE2122263C2 - Verfahren zur Herstellung eines primären Glänzers für saure galvanische Verzinnungsbäder und dessen Verwendung - Google Patents
Verfahren zur Herstellung eines primären Glänzers für saure galvanische Verzinnungsbäder und dessen VerwendungInfo
- Publication number
- DE2122263C2 DE2122263C2 DE2122263A DE2122263A DE2122263C2 DE 2122263 C2 DE2122263 C2 DE 2122263C2 DE 2122263 A DE2122263 A DE 2122263A DE 2122263 A DE2122263 A DE 2122263A DE 2122263 C2 DE2122263 C2 DE 2122263C2
- Authority
- DE
- Germany
- Prior art keywords
- reaction
- primary
- carried out
- solution
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/30—Electroplating: Baths therefor from solutions of tin
- C25D3/32—Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/34—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D307/38—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
- C07D307/40—Radicals substituted by oxygen atoms
- C07D307/46—Doubly bound oxygen atoms, or two oxygen atoms singly bound to the same carbon atom
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3526170A | 1970-05-06 | 1970-05-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE2122263A1 DE2122263A1 (de) | 1971-12-09 |
DE2122263C2 true DE2122263C2 (de) | 1981-12-03 |
Family
ID=21881579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE2122263A Expired DE2122263C2 (de) | 1970-05-06 | 1971-05-05 | Verfahren zur Herstellung eines primären Glänzers für saure galvanische Verzinnungsbäder und dessen Verwendung |
Country Status (11)
Country | Link |
---|---|
US (1) | US3634212A (ja) |
JP (1) | JPS5524512B1 (ja) |
BR (1) | BR7102639D0 (ja) |
CA (1) | CA988452A (ja) |
DE (1) | DE2122263C2 (ja) |
ES (1) | ES390675A1 (ja) |
FR (1) | FR2088388B1 (ja) |
GB (1) | GB1311424A (ja) |
NL (1) | NL7106161A (ja) |
SE (1) | SE375340B (ja) |
ZA (1) | ZA712389B (ja) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4844780A (en) * | 1988-02-17 | 1989-07-04 | Maclee Chemical Company, Inc. | Brightener and aqueous plating bath for tin and/or lead |
US5750017A (en) * | 1996-08-21 | 1998-05-12 | Lucent Technologies Inc. | Tin electroplating process |
US6670071B2 (en) * | 2002-01-15 | 2003-12-30 | Quallion Llc | Electric storage battery construction and method of manufacture |
US6838114B2 (en) * | 2002-05-24 | 2005-01-04 | Micron Technology, Inc. | Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces |
US6821347B2 (en) * | 2002-07-08 | 2004-11-23 | Micron Technology, Inc. | Apparatus and method for depositing materials onto microelectronic workpieces |
US6955725B2 (en) | 2002-08-15 | 2005-10-18 | Micron Technology, Inc. | Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
US6818249B2 (en) * | 2003-03-03 | 2004-11-16 | Micron Technology, Inc. | Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces |
US7335396B2 (en) * | 2003-04-24 | 2008-02-26 | Micron Technology, Inc. | Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers |
US7344755B2 (en) * | 2003-08-21 | 2008-03-18 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers |
US7235138B2 (en) | 2003-08-21 | 2007-06-26 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces |
US7422635B2 (en) | 2003-08-28 | 2008-09-09 | Micron Technology, Inc. | Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces |
US7056806B2 (en) * | 2003-09-17 | 2006-06-06 | Micron Technology, Inc. | Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces |
US7282239B2 (en) * | 2003-09-18 | 2007-10-16 | Micron Technology, Inc. | Systems and methods for depositing material onto microfeature workpieces in reaction chambers |
US7323231B2 (en) * | 2003-10-09 | 2008-01-29 | Micron Technology, Inc. | Apparatus and methods for plasma vapor deposition processes |
US7581511B2 (en) * | 2003-10-10 | 2009-09-01 | Micron Technology, Inc. | Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes |
US7647886B2 (en) * | 2003-10-15 | 2010-01-19 | Micron Technology, Inc. | Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers |
US7258892B2 (en) * | 2003-12-10 | 2007-08-21 | Micron Technology, Inc. | Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
US7906393B2 (en) * | 2004-01-28 | 2011-03-15 | Micron Technology, Inc. | Methods for forming small-scale capacitor structures |
US7584942B2 (en) * | 2004-03-31 | 2009-09-08 | Micron Technology, Inc. | Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers |
US20050249873A1 (en) * | 2004-05-05 | 2005-11-10 | Demetrius Sarigiannis | Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices |
US8133554B2 (en) * | 2004-05-06 | 2012-03-13 | Micron Technology, Inc. | Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces |
US7699932B2 (en) * | 2004-06-02 | 2010-04-20 | Micron Technology, Inc. | Reactors, systems and methods for depositing thin films onto microfeature workpieces |
US7156470B1 (en) * | 2004-06-28 | 2007-01-02 | Wright James P | Wheel trim hub cover |
US20060165873A1 (en) * | 2005-01-25 | 2006-07-27 | Micron Technology, Inc. | Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes |
US20060237138A1 (en) * | 2005-04-26 | 2006-10-26 | Micron Technology, Inc. | Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1544726A (en) * | 1924-08-28 | 1925-07-07 | Us Smelting Refining & Mining | Electrolytic refining of metals |
FR1392257A (fr) * | 1964-04-29 | 1965-03-12 | Friedr Blasberg G M B H | Agent de brillantage pour la séparation électrolytique de dépôts d'étain à haut brillant à partir de solutions aqueuses acides de sels d'étain, et son utilisation |
NL128321C (ja) * | 1965-02-13 |
-
1970
- 1970-05-06 US US35261A patent/US3634212A/en not_active Expired - Lifetime
-
1971
- 1971-04-14 ZA ZA712389A patent/ZA712389B/xx unknown
- 1971-04-23 JP JP2662471A patent/JPS5524512B1/ja active Pending
- 1971-04-28 ES ES390675A patent/ES390675A1/es not_active Expired
- 1971-04-30 BR BR2639/71A patent/BR7102639D0/pt unknown
- 1971-05-04 SE SE7105758A patent/SE375340B/xx unknown
- 1971-05-05 DE DE2122263A patent/DE2122263C2/de not_active Expired
- 1971-05-05 NL NL7106161A patent/NL7106161A/xx active Search and Examination
- 1971-05-05 GB GB1338471*[A patent/GB1311424A/en not_active Expired
- 1971-05-05 CA CA112,203A patent/CA988452A/en not_active Expired
- 1971-05-06 FR FR7116345A patent/FR2088388B1/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
NL7106161A (ja) | 1971-11-09 |
JPS5524512B1 (ja) | 1980-06-30 |
SE375340B (ja) | 1975-04-14 |
CA988452A (en) | 1976-05-04 |
DE2122263A1 (de) | 1971-12-09 |
GB1311424A (en) | 1973-03-28 |
US3634212A (en) | 1972-01-11 |
FR2088388B1 (ja) | 1975-07-04 |
ZA712389B (en) | 1972-01-26 |
ES390675A1 (es) | 1974-03-16 |
BR7102639D0 (pt) | 1973-04-19 |
FR2088388A1 (ja) | 1972-01-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OD | Request for examination | ||
D2 | Grant after examination | ||
8339 | Ceased/non-payment of the annual fee |