GB1311424A - Brightening compounds and their use in electrolytic tin plating - Google Patents

Brightening compounds and their use in electrolytic tin plating

Info

Publication number
GB1311424A
GB1311424A GB1338471*[A GB1338471A GB1311424A GB 1311424 A GB1311424 A GB 1311424A GB 1338471 A GB1338471 A GB 1338471A GB 1311424 A GB1311424 A GB 1311424A
Authority
GB
United Kingdom
Prior art keywords
furfural
crotonaldehyde
alkali
tin plating
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1338471*[A
Inventor
S P Valayil
F Passal
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M&T Chemicals Inc
Original Assignee
M&T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M&T Chemicals Inc filed Critical M&T Chemicals Inc
Publication of GB1311424A publication Critical patent/GB1311424A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin
    • C25D3/32Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D307/00Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
    • C07D307/02Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
    • C07D307/34Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D307/38Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with substituted hydrocarbon radicals attached to ring carbon atoms
    • C07D307/40Radicals substituted by oxygen atoms
    • C07D307/46Doubly bound oxygen atoms, or two oxygen atoms singly bound to the same carbon atom

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Abstract

1311424 Furfural-crotonaldehyde reaction products M & T CHEMICALS Inc 5 May 1971 [6 May 1970] 13384/71 Heading C2C [Also in Division C7] Furfural-crotonaldehyde reaction products are obtained by reacting furfural with crotonaldehyde in equimolar quantities or up to a 15% molar excess of furfural, at a temperature of from -5 to 50‹ C. in the presence of an alkali as catalyst, acidifying the product and separating the reaction product from the reaction zone. The alkali is suitably sodium hydroxide and the acid is suitably glacial acetic. The mixture of products theoretically contains 2 - furylacrolein, 2 - furylpentadienal, 2 - (1- hydroxy) - 3 - (2 - furyl) - acrolein and acetaldehyde. The novel mixture may be used as a primary brightener in aqueous acid bright tin electroplating baths.
GB1338471*[A 1970-05-06 1971-05-05 Brightening compounds and their use in electrolytic tin plating Expired GB1311424A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3526170A 1970-05-06 1970-05-06

Publications (1)

Publication Number Publication Date
GB1311424A true GB1311424A (en) 1973-03-28

Family

ID=21881579

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1338471*[A Expired GB1311424A (en) 1970-05-06 1971-05-05 Brightening compounds and their use in electrolytic tin plating

Country Status (11)

Country Link
US (1) US3634212A (en)
JP (1) JPS5524512B1 (en)
BR (1) BR7102639D0 (en)
CA (1) CA988452A (en)
DE (1) DE2122263C2 (en)
ES (1) ES390675A1 (en)
FR (1) FR2088388B1 (en)
GB (1) GB1311424A (en)
NL (1) NL7106161A (en)
SE (1) SE375340B (en)
ZA (1) ZA712389B (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4844780A (en) * 1988-02-17 1989-07-04 Maclee Chemical Company, Inc. Brightener and aqueous plating bath for tin and/or lead
US5750017A (en) * 1996-08-21 1998-05-12 Lucent Technologies Inc. Tin electroplating process
US6670071B2 (en) * 2002-01-15 2003-12-30 Quallion Llc Electric storage battery construction and method of manufacture
US6838114B2 (en) * 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US6821347B2 (en) * 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US6955725B2 (en) 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US6818249B2 (en) * 2003-03-03 2004-11-16 Micron Technology, Inc. Reactors, systems with reaction chambers, and methods for depositing materials onto micro-device workpieces
US7335396B2 (en) * 2003-04-24 2008-02-26 Micron Technology, Inc. Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
US7344755B2 (en) * 2003-08-21 2008-03-18 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
US7235138B2 (en) * 2003-08-21 2007-06-26 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
US7422635B2 (en) 2003-08-28 2008-09-09 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
US7056806B2 (en) * 2003-09-17 2006-06-06 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
US7282239B2 (en) * 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
US7323231B2 (en) * 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7581511B2 (en) * 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US7647886B2 (en) * 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
US7258892B2 (en) * 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
US7906393B2 (en) * 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
US7584942B2 (en) * 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US20050249873A1 (en) * 2004-05-05 2005-11-10 Demetrius Sarigiannis Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices
US8133554B2 (en) * 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) * 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US7156470B1 (en) * 2004-06-28 2007-01-02 Wright James P Wheel trim hub cover
US20060165873A1 (en) * 2005-01-25 2006-07-27 Micron Technology, Inc. Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
US20060237138A1 (en) * 2005-04-26 2006-10-26 Micron Technology, Inc. Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1544726A (en) * 1924-08-28 1925-07-07 Us Smelting Refining & Mining Electrolytic refining of metals
FR1392257A (en) * 1964-04-29 1965-03-12 Friedr Blasberg G M B H Brightening agent for the electrolytic separation of high-gloss tin deposits from acidic aqueous solutions of tin salts, and its use
NL128321C (en) * 1965-02-13

Also Published As

Publication number Publication date
US3634212A (en) 1972-01-11
NL7106161A (en) 1971-11-09
JPS5524512B1 (en) 1980-06-30
FR2088388B1 (en) 1975-07-04
DE2122263C2 (en) 1981-12-03
FR2088388A1 (en) 1972-01-07
ES390675A1 (en) 1974-03-16
DE2122263A1 (en) 1971-12-09
ZA712389B (en) 1972-01-26
SE375340B (en) 1975-04-14
BR7102639D0 (en) 1973-04-19
CA988452A (en) 1976-05-04

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee