CN204925614U - Graphical device is received a little to large tracts of land - Google Patents
Graphical device is received a little to large tracts of land Download PDFInfo
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- CN204925614U CN204925614U CN201520784255.1U CN201520784255U CN204925614U CN 204925614 U CN204925614 U CN 204925614U CN 201520784255 U CN201520784255 U CN 201520784255U CN 204925614 U CN204925614 U CN 204925614U
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Abstract
The utility model discloses a graphical device is received a little to large tracts of land, holds piece platform, substrate, impression material, soft mode utensil, gyro wheel, ultraviolet ray light source, impression mechanism, vacuum line, pressure piping at the device frame, workstation. The workstation is fixed in the frame, hold on the removal mesa that the piece platform is fixed in the workstation, vacuum adsorption the substrate directly over holding the piece platform, evenly scribble on the substrate and spread liquid ultra -violet curing type impression material, the mode that the soft mode utensil passes through vacuum adsorption is attached to the gyro wheel surface. Through the close cooperation of gyro wheel, soft mode utensil, workstation and gas circuit system, accomplish the large tracts of land impression and drawing of patterns operation. The realization is high -efficient on rigid substrate or breakable substrate are leveled to large size, non -, low -cost scale manufacturing declines nanostructured by a large scale, has solved meter level yardstick large size rigid substrate's the micro -nano graphical difficult problem of large tracts of land. Have the characteristics that structure and simple process, efficient, with low costs, impression figure precision height and defect rate are low.
Description
Technical field
The utility model relates to a kind of efficient, device that low cost mass manufactures large area micro-nano rice structure, particularly relate to one and assist the large area composite Nano imprinting apparatus with soft mold based on roller (roller), realize oversize substrate (meter level yardstick), non-smooth substrate or frangible substrate large area micro-nano rice graphical, belong to technical field of micro-nano manufacture.
Background technology
, in order to improve performance and the quality of product, there is very huge industry demand in the fields such as high definition flat pannel display, high performance solar panels, antireflection and self-cleaning glass, LED are graphical, wafer scale micronano optical device for large area micro-nano pattern technology.Its common trait of these products is that needs (hard substrate or substrate) in the non-smooth rigid substrate of large scale are efficient, low cost produces large area complex three-dimensional micro nano structure.Such as LED industry receives the characteristic feature of graphic sapphire (NPSS) substrate: need to produce large area complex three-dimensional nanostructure at non-smooth sapphire substrate surface, the shape of figure is generally the shapes such as semisphere, taper, pyramid, and the minimum feature size of figure is at 200nm.Antireflection (antireflection) and self-cleaning glass can cut down the reflection of glass itself effectively, and the transmitance adding glass (namely reduces the entire spectrum reflection of incident light, increases transmission, enhance the transparency; Reduce the mirror effect of glass surface, there is anti-dazzle function), and there is antipollution and self-cleaning advantage.Massachusetts Institute Technology develops a kind of glass surface nanostructured almost can eliminate reflection completely, and the surface nano-structure of glass is the nano-cone array of high 1000 nanometers, wide 200 nanometers of substrate.Existing various micro-nano manufacturing technology (such as beamwriter lithography, optical lithography, laser interference lithography, holographic lithography, self assembly etc.) no matter at technological layer (non-smooth substrate large area micro-nano graphical, complex three-dimensional micro-nano structure manufacture), or is all also difficult to meet the actual requirement that industrial scaleization produces in patterned production cost, efficiency, consistance, yield etc.
Nano-imprint lithography (NanoimprintLithography, NIL) as a kind of micro-nano manufacturing technology completely newly, than existing projection lithography and Next Generation Lithography, there is high resolution, Ultra Low Cost (a NIL order of magnitude at least lower than traditional optical projection photoetching of the equal production technique of internal authority organization evaluation) and large-duty feature, and its most significant advantage is large area, the ability of complex three-dimensional micro-nano structure manufacture and the graphical of non-smooth substrate, especially soft ultraviolet nanometer imprint process also has non-smooth (bending, warpage or step), curved surface, frangible substrate upper base realizes the potential of wafer scale nano impression, and roll row graph ability specific to imprint process.In addition, NIL realizes it graphically based on impression materials stress deformation, do not relate to the use of various high energy beam, the damage for substrate is less, and this application for many photoelectrons, quantum device is extremely important.The minimum feature size of current nano impression reaches 2.4nm.
Although nano-imprint lithography has very outstanding advantage and potential in large area micro-nano is graphical, but existing various nano-imprint process is at graphical area, impression cost, efficiency, the aspects such as consistance also also exist many deficiencies, especially the full-size for rigid substrate (hard substrate) full wafer impression is also confined to less than 8 inches, for large format, the large-area graphsization of meter level yardstick rigid substrate is also difficult to realize, have a strong impact on and constrained large-area nano and be stamped in large scale high definition flat pannel display of new generation, high performance solar panels, high-performance glass curtain wall, large scale LED is graphical, the widespread use of large scale wafer scale micronano optical product etc.
Current large-area nano impression mainly contains three kinds of techniques: (1) full wafer wafer impresses; (2) roll plane impression (be divided into again and use roller die and exert pressure based on the roller of flat plate mold); (3) roll contour roll forming impression (Roll-to-Rollimprinting).Current full wafer wafer impression (also known as wafer-level stamping) main policies realizes wafer scale nano impression in conjunction with gas additional pressure applicator peace slab type mold, the area of current maximum impression is limited to less than 8 inches wafers, faces the reluctant problem of many challenges (such as very large force of impression, large area bringing into conformal contact, many difficult problems such as Large-Area-Uniform is exerted pressure, bubble is eliminated, large area gets out of trouble for larger wafer size impression.If the such as force of impression of 8 inches of Integral wafer nano-imprinting applying 2Bar, the force of impression that full wafer wafer will bear just reaches 628kgf/cm
2, the pressure of gas chamber may more than 1400kgf/cm
2, and along with the further increase of imprint area, force of impression becomes geometry multiple to increase.Many problems such as the distortion of soft mold and the realization of imprint process are caused to be very difficult to process), more the full wafer impression of large scale wafer, especially also almost cannot realize at present for the graphical of meter level yardstick rigid substrate.Large area row graph can be realized to contour roll forming impression although roll, but be mainly applicable to flexible substrate (base material), hard rigid substrate micro-nano graph is not suitable for, especially almost cannot realizes for the non-smooth rigid substrate of large scale that it is graphical.Rolling plane impression on the one hand to rigid substrate flatness requirement high (being difficult to process warpage, non-smooth substrate impression) based on roller die, roller die manufactures difficulty on the other hand, especially for receiving the manufacture of the seamless roller type mould of yardstick, existing technology almost also cannot solve.Roll based on the flat plate mold roller type of exerting pressure and only can realize impression work step (mainly only utilizing roller to apply even force of impression) to plane impression, place the operation such as mould and the demoulding also to need to arrange special mechanism, and stripping result is poor, production efficiency is low, and equipment is complicated and cost is high.Imprint area is yet limited to less area at present, and the large area micro-nano that cannot realize large scale hard substrate is graphical.
Therefore; existing various minute manufacturing technological process control is also difficult to meet the requirement of large scale (more than 8 inches), non-smooth rigid substrate and the large-scale production of frangible substrate large-area graphs chemical industry level; have a strong impact on and constrained large area functional surface nano-structure and nano-structured coating in the application of the industries such as high-performance glass, high performance solar panels, high definition flat pannel display of new generation, large scale LED be graphical and popularization, become the bottleneck of these new technology spreads of restriction and application.Therefore; in the urgent need to developing the apparatus and method of new overlarge area nano patterning; realize meter level yardstick oversize substrate, non-smooth substrate, frangible substrate large area micro-nano graphical, solve efficient on oversize, non-smooth rigid substrate, frangible substrate, that low-coat scaleization manufactures a large area micro-nano rice structure difficult problem.
Utility model content
The purpose of this utility model is for overcoming above-mentioned the deficiencies in the prior art; there is provided one to be applicable to efficient on oversize, non-smooth rigid substrate (hard substrate or substrate), frangible substrate, that low-coat scaleization manufactures large area micro-nano rice structure device, the large area micro-nano rice realizing meter level yardstick oversize rigid substrate is graphical.
The utility model proposes a kind of roller (being also called cylinder, roller or cylinder) auxiliary soft (mould) ultraviolet nanometer impression new technology, it combines the advantage of plate impression and roller type impression, can realize that oversize, non-smooth, frangible substrate are efficient, low-cost large-area micro-nano graph.Its ultimate principle: moulding process utilizes wheels side face diameter to arranging air intake opening negative pressure and malleation order conversion successively, and rotate and the moving horizontally of substrate working platform in conjunction with roller, the elasticity soft mold be adsorbed at first on roller is tiled to gradually on the substrate of coating impression materials, simultaneously under swing roller linear contact lay (the micro-contact of the order is exerted pressure) effect of evenly exerting pressure, use very little force of impression just can realize mould and the complete bringing into conformal contact of non-smooth substrate large area, evenly exert pressure, guarantee the consistance of large area imprinting figure, avoiding large-area nano to impress needs very large force of impression to cause soft mold to be out of shape, the micro-contact method of order is easy to eliminate air blister defect simultaneously, but also solve the problem introducing particulate pollutant in large area imprinting process, the demoulding utilizes wheels side face diameter to arranging the order conversion successively of air intake opening negative pressure, and in conjunction with roller reverse rotation (corresponding with impression) and oppositely the moving horizontally (corresponding with moulding process) of substrate working platform, soft mold is sequentially adsorbed on roller outside surface gradually successively, realize similar " open-type " demoulding continuously, adopt very little knockout press just can realize the continuous open-type demoulding of large area based on the method, and the soft mold after the demoulding is absorbed and fixed in roller surface, the knockout press obtaining uniformity can be guaranteed, demoulding area does not limit, stripping operation is simple, production efficiency is high, but also effectively prevent the large area demoulding and cause mould to damage, the problem that coining pattern defect is many.Based on the new impression of proposition and demoulding strategy and method; the utility model achieve realize meter level yardstick oversize substrate, non-smooth substrate, frangible substrate large area micro-nano graphical, solve efficient on oversize, non-smooth rigid substrate, frangible substrate, that low-coat scaleization manufactures a large area micro-nano rice structure difficult problem.
For achieving the above object, the utility model adopts following technical proposals:
The patterned device of a kind of large area micro-nano, it comprises: frame, worktable, wafer-supporting platform, substrate, impression materials, soft mold, roller, ultraviolet source, eindruckwerk, vacuum line and pressure piping; Wherein, worktable is fixed in frame; Described wafer-supporting platform is fixed on the mobile table top of worktable; Directly over described wafer-supporting platform, vacuum suction substrate; Described substrate is evenly coated with the liquid ultraviolet curing type impression materials of paving; Soft mold is attached to roller outside surface by the mode of vacuum suction; Roller is fixed on eindruckwerk, and roller is positioned at types of flexure; Ultraviolet source is fixed on eindruckwerk, and is placed in the side that roller completes stamping structure, and ultraviolet source is positioned at directly over substrate; Described vacuum line and pressure piping are all communicated with the air intake opening of wafer-supporting platform, and vacuum line and pressure piping are all communicated with the air intake opening of roller.
The external cylindrical surface of described roller evenly lays several adsorption tanks, and several air admission holes are evenly laid in the side of described roller, and be provided with several radial holes to roller inside at the bottom of described adsorption tank, air admission hole is connected with adsorption tank by radial hole; The adsorption tank that roller utilizes external cylindrical surface to arrange, and changed by the order successively of malleation and negative pressure, realize the gradually order absorption of soft mold in roller surface and fix and be separated.
The quantity of described air admission hole is no less than 8.Set air admission hole and the adsorption tank quantity of roller outside surface more, the effect of impression and the demoulding is better.
Preferably, the outside surface of described roller wraps up one deck resilient material, as silicon rubber, elastomer polyurethane, rubber etc., forms flexible elastomeric roller.
The motor that described driving rolls rotates comprises servomotor, stepper motor.
Described worktable is one dimension or two-dimentional motorized precision translation stage, by the close fit with roller and soft mold, realizes impression and demoulding work step, and the replacing of substrate.Motorized precision translation stage can adopt servomotor, linear electric motors or driving stepper motor.
Preferably, described worktable is conveyer structure, and conveyer structure places multiple substrates, realizes substrate row graph.Immediately below described conveyer structure, corresponding scroll wheel positions place is provided with supplemental support running roller, can improve the homogeneity of impression.
Described eindruckwerk comprises drive unit, guide pole and support, and drive unit driving arm moves up and down along Z axis; Described support connects roller and be fixedly connected with frame and ultraviolet source link; Described guide pole is placed on four angles of support, and quantity is four, and the connection of guide pole and support adopts linear bearing.Drive roller to move downward along Z axis by drive unit driving arm, realize the fine adjustment of roller pressure, and move to printing station from initial station.Drive unit is servomotor (or electric cylinder or stepper motor).
Described ultraviolet source is ultraviolet LED lamp array.
Preferably, described roller is that transparent material is made, and now described ultraviolet source is placed in the cavity at roller center.Directly pass through ultraviolet photoetching at the impression point of roller, impression materials is impressed simultaneously and solidifies.
Described wafer-supporting platform is provided with vacuum cup, for vacuum suction stationary substrate.
Described wafer-supporting platform is also provided with electric heater unit (electrically heated rod or electric heating sheets), for the even auxiliary heating of impression materials.
Described impression materials is ultraviolet curing type liquid organic polymer material, and have very low viscosity, quick-setting characteristic, its viscosity is lower than 100mpa.s.
Described soft mold is transparent membrane compound soft mold, and it comprises graph layer and supporting layer, and graph layer is positioned on supporting layer, and graph layer comprises the micro-nano feature structure that will copy; Wherein graph layer has extremely low surface energy, high elastic modulus and transparent characteristic, and supporting layer has the characteristic of transparent, highly flexible and membrane structure.Graph layer can adopt h-PDMS, low-surface-energy and high elastic modulus fluoropolymer sill, ETFE etc.; Supporting layer can adopt the high resiliency such as PDMS, PET, PC and high transparency material.
The thickness range of described graph layer is 10-50 micron, and the thickness range of supporting layer is 100-500 micron.Described supporting layer carries out surface modification treatment, or the coupling agent material of coating layer of transparent.
The working range of described pressure piping is: 0-1bar; Described vacuum line working range is <-0.2bar; The force of impression that described eindruckwerk way roller applies is 50N-500N.
Notable feature of the present utility model and beneficial effect are:
(1) advantage of plate nano impression and roller type nano-imprint process is fully combined, utilize the close fit of roller, soft mold, worktable and air-channel system, collaborative work, efficiently automatically complete large area imprinting and the open-type demoulding, realize the large area micro-nano rice of oversize rigid substrate graphical.Have the advantages that Structure and energy is simple, production efficiency is high, cost is low, coining pattern precision is high and defect is low.
(2) New Type Large Area method for stamping: will the soft mold on roller outside surface be absorbed and fixed at, utilize the rotation of roller, worktable move horizontally and roller air admission hole successively order negative pressure and malleation conversion, realize large area imprinting.
(3) to exert pressure mode in conjunction with compound soft mold and the micro-linear homogeneous that contacts of roller order, solve the problem that in large scale, non-smooth substrate moulding process, mould and the complete bringing into conformal contact of substrate large area, uniformity are exerted pressure.
(4) force of impression is little: in moulding process, roller and soft mold are linear contact lay, and employing is order Microcontact printing mode.Thus, the force of impression of required applying is very little.Compared with impressing with traditional full wafer wafer the force of impression that applies, required force of impression is only the 1/15-50/1 of traditional gas additional pressure applicator.The beneficial effect brought is that the distortion of soft mold is on the one hand little, improves precision and the quality of coining pattern, on the other hand, greatly simplify device structure, reduce cost.In addition, the large area imprinting (large-area nano such as epitaxial wafer, glass impression) of frangible substrate can also be realized.
(5) apply force of impression even: roller and soft mold are linear contact lay, and employing is order Microcontact printing mode.Thus, the force of impression uniformity on soft mold is applied on the one hand.In addition, with the employing of traditional large area imprinting by compared with gas or fluid additional pressure applicator method, this method for stamping has technique and structure is simple, cost is low.
(6) adopt the method for stamping of the micro-contact of gradual order, the bubble be absorbed in large area imprinting process can be discharged the difficult problem solving large-area nano impression bubble and eliminate in time.
(7) compared with the existing roller spinning process based on flat plate mold, the applying of pair of rollers soft mold is that order is launched gradually, thus, the force of impression distribution that roller is applied on mould is more even, avoid the problem occurring the mould covering depth that prior art produces, guarantee the homogeneity that large-area nano impresses, improve the yield of coining pattern.
(8) the utility model adopts the method for impression limit, limit solidification, and production efficiency is high.Overcome after classic flat-plate type nano-imprint process first completes impression, the deficiency that then just can be cured.
(9) the utility model adopts the open-type release method improved; namely the open-type demoulding that roller is auxiliary; soft mold after the demoulding is absorbed and fixed on roller outside surface; the knockout press obtaining uniformity can be guaranteed; realize the continuous demoulding of large area, reduce the defect of the large area demoulding, the area of the demoulding is simultaneously unrestricted; the overlarge area demoulding continuously fast can be realized, greatly boost productivity.
(10) compared with other open-type demoulding implementation methods existing, the stress that the utility model produces based on the demoulding of roller open-type is minimum, can realize the manufacture of large depth-to-width ratio micro nano structure.
(11) the utility model has that technique is simple, efficient, the significant advantage of low cost.
(12) the utility model does not rely on balance that precision optical machinery applies, evenly, the force of impression vertical with surface, simplifies device structure.Connect micro-touch by roller order line to exert pressure mode, the uniformity realized in large area imprinting process is exerted pressure.
(13) requirement of production environment is low, and insensitive for the irregularity degree of substrate or wafer, defect, particle, fitness is high.This is very important in practical application in industry.
The utility model achieves efficient, the manufacture of low cost mass of oversize, non-smooth substrate, frangible substrate large area micro-nano rice structure, and the commercial applications for large area micro-nano rice structure provides a kind of solution of technical grade.
The utility model is suitable for the industrial scaleization such as oversize high definition flat pannel display, high performance solar panels, antireflection and self-cleaning glass, large scale LED are graphical, wafer scale micronano optical device, overlarge area surface micro-nano functional structure and produces.
Accompanying drawing explanation
Fig. 1 is the graphical apparatus structure schematic diagram of the utility model large area micro-nano.
Fig. 2 is the graphical schematic three-dimensional schematic diagram of the utility model large area micro-nano.
Fig. 3 is the utility model roller structure schematic diagram.
Fig. 4 is the utility model soft mold structural representation.
Fig. 5 is the graphical course of work process flow diagram of the utility model large area micro-nano.
Fig. 6 a-Fig. 6 f is the utility model large area micro-nano patterning process step schematic diagram.
Wherein, the air admission hole that the adsorption tank, 703 of 1 frame, 2 worktable, 3 wafer-supporting platforms, 4 substrates, 5 impression materials, 6 soft molds, 7 rollers, 8 ultraviolet sources, 9 eindruckwerks, 10 vacuum lines, 11 pressure pipings, 601 graph layers, 60101 mold feature structures, 602 transparent coupling agent materials, 603 supporting layers, 701 roller side air admission holes, 702 cylinder outer round surface connects the radial hole of air admission holes and adsorption tank, 704 roller matrixes, 705 roller outside surfaces, 70101-70108 roller side are sequentially arranged successively.
Embodiment
Below in conjunction with drawings and Examples, the utility model is further illustrated.
Fig. 1 is the graphical nano-imprinting device structural representation of the utility model large area micro-nano, and it comprises: frame 1, worktable 2, wafer-supporting platform 3, substrate (base material, substrate, substrate or wafer) 4, impression materials 5, soft mold 6, roller (cylinder, running roller or roller) 7, ultraviolet source 8, eindruckwerk 9, vacuum line 10, pressure piping 11; Wherein, frame 1 is for connecting and stationary work-table 2, eindruckwerk 9, pressure piping 11, vacuum line 10 etc.; Worktable 2 is placed in bottom and is fixed in frame 1, worktable 2 is one dimension or two-dimentional electric precise translation stage, by the close fit with roller and soft mold, realize impression and demoulding work step, and the replacing of substrate, motorized precision translation stage can adopt servomotor, linear electric motors or driving stepper motor; Wafer-supporting platform 3 is placed on worktable 2, and is fixed on the mobile table top of worktable 2; Substrate 4 is placed on wafer-supporting platform 3, and is fixed on wafer-supporting platform 3 by vacuum suction mode; Liquid ultraviolet curing type impression materials 5 is evenly coated with and is layered on substrate 4; Soft mold 6 is fixed on the outside surface (original state) of roller 7 by vacuum suction mode; Roller 7 is fixed on eindruckwerk 9, and is placed in the top being coated with and being covered with impression materials 5 substrate 4; Ultraviolet source 8 is placed in the side (be placed in the side impressed, the present embodiment is placed on the left of roller) of roller 7, directly over substrate 4; Eindruckwerk 9 is connected with ultraviolet source 8 with roller 7, and is fixed in frame 1; Vacuum line 10 is connected (also can only be connected vacuum line 10) with pressure piping 11 with the air intake opening of wafer-supporting platform 3, each air intake opening that vacuum line 10 is arranged with pressure piping 11 and roller side is connected, and (the utility model embodiment roller side arranges 8 air intake openings, only illustrates that providing an air intake opening is connected with pressure piping 11 with vacuum line 10 in Fig. 1.All the other air intake openings all need to be connected with pressure piping 11 with vacuum line 10).Fig. 2 is the graphical schematic three-dimensional schematic diagram of the utility model large area micro-nano.
Worktable 2 also can adopt conveyer structure, places multiple substrates 4 thereon, realizes substrate row graph.For this kind of mode, in order to improve the homogeneity of impression, can a supplemental support roller (back of the body roller) be set immediately below roller opposite position travelling belt.
The horizontal movement velocity of worktable 2, the rotational speed of roller 7, each air intake opening of roller time that order malleation and negative pressure are changed successively must keep strict synchronized relation.The order moving horizontally direction, the sense of rotation of roller, each air intake opening of roller malleation and negative pressure conversion successively of worktable is consistent.Guarantee that moulding process is that knockout course is separated gradually with stamping structure by the soft mold tiled after impression and is sequentially sequentially adsorbed onto (the open-type demoulding) on roller outside surface by the tiling of the soft mold be adsorbed on roller outside surface order to (soft mold is sequentially open and flat gradually to pave) on the impression materials of substrate.
Fig. 3 is the utility model roller 7 structural representation, and it comprises: the adsorption tank 702 of roller side air admission hole 701, cylinder outer round surface, connect radial hole 703, roller matrix 704, the roller outside surface 705 of air admission hole and adsorption tank, the roller side air admission hole 701 wherein arranged is uniformly distributed, quantity is no less than 8, and (the utility model embodiment roller side arranges 8 air intake openings, be followed successively by 70101, 70102, 70103, 70104, 70105, 70106, 70107, 70108), roller side air admission hole 701 is connected with the radial hole 703 of adsorption tank 702 by connecting air admission hole 701 with the adsorption tank 702 of corresponding cylinder outer round surface, for vacuum line 10 negative-pressure gas and pressure piping 11 pressure piping barotropic gas being transported to the adsorption tank 702 of cylinder outer round surface, changed by the order successively of malleation and negative pressure, realize adsorbing fixing to soft mold 6 being sequentially separated gradually and wrapping up on the outer round surface 705 of roller 7.Set air admission hole (groove of roller outside surface) quantity is more, and the effect of impression and the demoulding is better.The outside surface of roller 7 can also wrap up (coated) one deck resilient material, as silicon rubber, elastomer polyurethane, rubber etc., forms flexible elastomeric roller (encapsulate roller, rubber roll, rubber tire).The motor that driving rolls rotates comprises servomotor, stepper motor etc.
Fig. 4 is soft mold 6 structural representation described in the utility model, soft mold 6 is transparent membrane compound soft mold, it comprises graph layer 601 and supporting layer 603, wherein graph layer 601 has extremely low surface energy, high elastic modulus and transparent characteristic, comprise the micro-nano feature structure (figure) 60101 that will copy, supporting layer 603 has the characteristic of transparent, highly flexible and membrane structure, and wherein graph layer 601 is positioned on supporting layer 603.Graph layer 601 can adopt h-PDMS, low-surface-energy and high elastic modulus fluoropolymer sill, ETFE etc.; Supporting layer 603 can adopt the high resiliency such as PDMS, PET, PC and high transparency material.The thickness range of graph layer 601 is 10-50 microns, and supporting layer 603 thickness range is 100-500 micron.Described supporting layer 603 carries out surface modification treatment, or the coupling agent material 602 of coating layer of transparent.The soft mold 6 of the present embodiment adopts the PET film of transparent high-elasticity to be supporting layer 603, thickness 150 microns, clear, colorless KH-550 is coupling agent material 602, and clear fluoropolymer TeflonAF1600 is graph layer (feature structure layer) 601, thickness 15 microns.
The utility model with the Integral wafer nano-imprinting of 8 English inch (diameter about 200 millimeters) GaN base photonic crystal LED (LED nano patterning) for embodiment, in conjunction with the graphical course of work process flow diagram (Fig. 5) of large area micro-nano and large area micro-nano patterning process step schematic diagram (Fig. 6 a-Fig. 6 f), describe the patterned principle of large area micro-nano and concrete technology step in detail.
In embodiment, some design parameters of substrate 4, soft mold 6 and patterning process arrange as follows: substrate 4 is 8 English inch GaN base epitaxial wafers, need to impress out photon crystal structure at p type semiconductor layer, wherein the geometric parameter of photonic crystal is: grating constant 600nm, the diameter 200nm of circular hole, the degree of depth in hole is 100nm.Impression materials uses the mr-XNIL26 of Microresisttechnology company, is 300nm at the thickness of GaN base epitaxial wafer spin coating.
As shown in Fig. 5-Fig. 6, specific embodiment comprises:
(1) preprocessing process;
Evenly be coated with the liquid ultraviolet curing type impression materials mr-XNIL26 of paving 300nm on the substrate 4, substrate 4 be placed on wafer-supporting platform 3, and be fixed on wafer-supporting platform 3 by vacuum suction mode; Vacuum line 10 is connected with roller side air admission hole 701, soft mold 6 absorption is wrapped in (roller side arranges some air admission holes and all passes into negative pressure) on the outside surface 705 of roller 7 (vacuum line provides malleation for roller air intake opening, and pressure piping provides negative pressure for roller air intake opening) by the adsorption tank 702 of cylinder outer round surface;
Worktable 2 moves horizontally and drives wafer-supporting platform 3 to move to printing station II from initial station I.Eindruckwerk 9 drives roller 7 and soft mold 6 to move to printing station II from initial station I.Open ultraviolet source 8.
(2) impression and solidification process;
1. servo (or stepping) motor that roller 7 rotates is opened, roller 7 is rotated counterclockwise (be assumed to and rotate forward), the soft mold 6 be simultaneously adsorbed on roller outside surface 705 converts malleation near the air admission hole 70101 located bottom to from negative pressure, soft mold 6 is separated gradually with roller 7, and soft mold 6 is flat to be spread on substrate 4 impression materials 5; Simultaneously worktable 2 and roller 7 rotate equidirectional and move horizontally, and roller 7 linear contact lay is evenly exerted pressure on separated soft mold 6, starts to carry out coining manipulation; As shown in Figure 6 a.
2. along with the rotation of roller 7 and moving horizontally of worktable 2, from roller near the air admission hole 70101 located bottom, negative pressure is converted to malleation by order successively (is sequentially from 70102 successively, 70103, 70104, 70105, 70106, 70107, to 70108), successively the soft mold 6 be adsorbed on roller 7 outside surface 705 successively order is separated with roller 7 gradually, simultaneously under the effect of evenly exerting pressure of roller 7 linear contact lay, realize on flat for whole soft mold 6 impression materials 5 spread on substrate 4, guarantee that soft mold 6 and substrate 4 obtain complete bringing into conformal contact simultaneously, and under the effect of roller 7 force of impression, liquid state pressed impression materials 5 to be expressed in the micro-nano feature structure die cavity 60101 of soft mold 6, by successively order Microcontact printing, realize the large area imprinting to whole substrate 4.Exert pressure while soft mold 6 sprawling soft mold 6 and roller 7 linear contact lay, the ultraviolet source 8 of unlatching carries out uv-exposure through transparent flexible mold 6 pairs of stamping structures and fully solidifies completely; As shown in figs. 6b and 6c.
3. after having impressed, close ultraviolet source 8, close the gas circuit of roller 7 air admission hole 701.
(3) knockout course;
1. eindruckwerk 9 drives roller 7 upwards to raise 100 microns, makes roller 7 have the gap of 100 microns with tiling soft mold 6.
2. roller 7 electric rotating machine is opened, roller 7 is turned clockwise (to be rotated corresponding with impression, be assumed to reverse rotation), pass into negative pressure by near roller 7 air admission hole 70101 bottom simultaneously, soft mold 6 is separated gradually with stamping structure, soft mold 6 is also absorbed and fixed on roller 7 outside surface 701, simultaneously along with worktable 2 oppositely moves (corresponding with moulding process working table movement direction), starts to carry out stripping operation; As shown in fig 6d.
3. along with the rotation of roller 7 and moving horizontally of worktable 2, from the air admission hole 70101 that roller 7 is located bottom, successively order pass into negative pressure (successively order be from 70108,70107,70106,70105,70104,70103, to 70102), soft mold 6 is sequentially adsorbed successively to be fixed on the outside surface 701 of roller 7, realizes similar " open-type " demoulding continuously; As shown in Fig. 6 e and 6f.
4. when whole soft mold 6 is all separated with stamping structure, soft mold 6 is wrapped is absorbed and fixed at after on roller 7 outside surface 701 completely, namely completes demoulding work step.
5. eindruckwerk 9 drives roller 7 and soft mold 6 to move up fast subsequently, turns back to initial station I; Worktable 2 turns back to initial station I from printing station II, unloads the substrate 4 impressed, and places new substrate 4, starts next round working cycle.
(4) last handling process;
1. down etched by conventional anisotropic etch process equal proportion, remove residual layer, impression materials 5 copies the micro-nano feature structure 60101 of mould;
2. follow-up in conjunction with etching technics (wet etching or ICP etching), take coining pattern as mask, feature pattern is transferred on GaN base LED substrate 24, realize the graphical of LED or photonic crystal LED manufacture.
The force of impression that eindruckwerk 9 way roller described in the present embodiment applies is the power 500W of 100N, UV lamp.
Time of each air intake opening of the horizontal movement velocity of worktable, the rotational speed of roller, roller order positive/negative-pressure conversion successively must keep strict synchronous.The translational speed 20mm/s of worktable, roller linear velocity is 20mm/s.
Moulding process also can be adopted with the following method (soft mold is sprawled and is divided into two independent processes with impression):
1. eindruckwerk drives roller and mould to move to printing station from initial station, first spreads on substrate by the soft mold be adsorbed on roller;
2. eindruckwerk drives roller to move to printing station from printing station subsequently, utilizes roller rotation and worktable to move horizontally, completes impression under online contact printing.
Solidification process also can be divided into two steps: estimating and solidifying completely.First precuring (while impression, solidification) is completed according to identical operation above; Subsequently, eindruckwerk drives roller upwards to raise 50-200 micron, and worktable to-and-fro movement once, realizes secondary and solidifies completely.Although two-stage cure reduces throughput rate, the precision of coining pattern and quality (distortion of soft mold can overcome for the impact of stamping structure) can be improved.
By reference to the accompanying drawings embodiment of the present utility model is described although above-mentioned; but the restriction not to the utility model protection domain; one of ordinary skill in the art should be understood that; on the basis of the technical solution of the utility model, those skilled in the art do not need to pay various amendment or distortion that creative work can make still within protection domain of the present utility model.
Claims (10)
1. the patterned device of large area micro-nano, it is characterized in that, it comprises: frame, worktable, wafer-supporting platform, substrate, impression materials, soft mold, roller, ultraviolet source, eindruckwerk, vacuum line and pressure piping; Wherein, worktable is fixed in frame; Described wafer-supporting platform is fixed on the mobile table top of worktable; Directly over described wafer-supporting platform, vacuum suction substrate; Described substrate is evenly coated with the liquid ultraviolet curing type impression materials of paving; Soft mold is attached to roller outside surface by the mode of vacuum suction; Roller is fixed on eindruckwerk, and roller is positioned at types of flexure; Ultraviolet source is fixed on eindruckwerk, and is placed in the side that roller completes stamping structure, and ultraviolet source is positioned at directly over substrate; Described vacuum line and pressure piping are all communicated with the air intake opening of wafer-supporting platform, and vacuum line and pressure piping are all communicated with the air intake opening of roller;
The external cylindrical surface of described roller evenly lays several adsorption tanks, and several air admission holes are evenly laid in the side of described roller, and be provided with several radial holes to roller inside at the bottom of described adsorption tank, air admission hole is connected with adsorption tank by radial hole;
Described eindruckwerk comprises drive unit, guide pole and support, and drive unit driving arm moves up and down along Z axis; Described support connects roller and be fixedly connected with frame and ultraviolet source link; Described guide pole is placed on four angles of support, and guide pole and support adopt linear bearing to be connected.
2. the patterned device of large area micro-nano as claimed in claim 1, it is characterized in that, the quantity of described air admission hole is no less than 8; The outside surface of described roller wraps up one deck resilient material, forms flexible elastomeric roller.
3. the patterned device of large area micro-nano as claimed in claim 1, it is characterized in that, described worktable is one dimension or two-dimentional motorized precision translation stage.
4. the patterned device of large area micro-nano as claimed in claim 1, it is characterized in that, described worktable is conveyer structure, and conveyer structure places multiple substrates, and immediately below described conveyer structure, corresponding scroll wheel positions place is provided with supplemental support running roller.
5. the patterned device of large area micro-nano as claimed in claim 1, it is characterized in that, described ultraviolet source is ultraviolet LED lamp array.
6. the patterned device of large area micro-nano as claimed in claim 1, it is characterized in that, described wafer-supporting platform is provided with vacuum cup; Described wafer-supporting platform is also provided with electric heater unit.
7. the patterned device of large area micro-nano as claimed in claim 1, it is characterized in that, described impression materials is ultraviolet curing type liquid organic polymer material.
8. the patterned device of large area micro-nano as claimed in claim 1, it is characterized in that, described soft mold is transparent membrane compound soft mold, and it comprises graph layer and supporting layer, and graph layer is positioned on supporting layer, and graph layer comprises the micro-nano feature structure that will copy.
9. the patterned device of large area micro-nano as claimed in claim 8, it is characterized in that, the thickness range of described graph layer is 10-50 micron, and the thickness range of supporting layer is 100-500 micron.
10. the patterned device of large area micro-nano as claimed in claim 8, it is characterized in that, described supporting layer carries out surface modification treatment, or the coupling agent material of coating layer of transparent.
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| CN201520784255.1U CN204925614U (en) | 2015-10-10 | 2015-10-10 | Graphical device is received a little to large tracts of land |
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| CN201520784255.1U CN204925614U (en) | 2015-10-10 | 2015-10-10 | Graphical device is received a little to large tracts of land |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017059745A1 (en) * | 2015-10-10 | 2017-04-13 | 青岛理工大学 | Large-area micro-nano patterning apparatus and method |
| CN106918987A (en) * | 2017-02-21 | 2017-07-04 | 青岛理工大学 | A kind of composite Nano stamping and photoetching machine and method of work |
| CN108267930A (en) * | 2018-01-17 | 2018-07-10 | 南开大学 | A kind of curing nano imprinting apparatus |
| WO2022217954A1 (en) * | 2021-04-16 | 2022-10-20 | 深圳先进技术研究院 | Method and device for manufacturing micro-nano structure |
-
2015
- 2015-10-10 CN CN201520784255.1U patent/CN204925614U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017059745A1 (en) * | 2015-10-10 | 2017-04-13 | 青岛理工大学 | Large-area micro-nano patterning apparatus and method |
| CN106918987A (en) * | 2017-02-21 | 2017-07-04 | 青岛理工大学 | A kind of composite Nano stamping and photoetching machine and method of work |
| CN106918987B (en) * | 2017-02-21 | 2019-12-06 | 青岛理工大学 | Composite nano-imprint lithography machine and working method |
| DE112018000010B4 (en) | 2017-02-21 | 2021-12-30 | Qingdao Bona Optical Electric Equipment Co., Ltd. | Verbund nanoimprint lithograph and its operation |
| CN108267930A (en) * | 2018-01-17 | 2018-07-10 | 南开大学 | A kind of curing nano imprinting apparatus |
| CN108267930B (en) * | 2018-01-17 | 2020-08-18 | 南开大学 | Solidified nano-imprinting device |
| WO2022217954A1 (en) * | 2021-04-16 | 2022-10-20 | 深圳先进技术研究院 | Method and device for manufacturing micro-nano structure |
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