CN103226288B - A kind of ultra-violet curing micro nano structure makeup device and layout technique - Google Patents
A kind of ultra-violet curing micro nano structure makeup device and layout technique Download PDFInfo
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Abstract
A kind of ultra-violet curing micro nano structure makeup device and layout technique, comprise substrate stage, marking press main body, drive unit and control system, wherein marking press main body comprises pressure roller, light source and nozzle, and on pressure roller, volume is provided with transparent soft pressing mold.Makeup device of the present invention adopts ultraviolet light polymerization working method, does not need heating, gets final product work at normal temperatures.Adopting when impressing roller and substrate to adopt linear contact lay mode, effectively can get rid of the gas between masterplate and layout material, reducing demoulding difficulty.Adopt soft press mold technology, cost is low, and efficiency is high, few to the damage of original stencil.
Description
Technical field
The present invention relates to a kind of micro-nano structure processing unit (plant), specifically a kind of micro nano structure makeup device based on ultraviolet light polymerization, for micro-nano photoelectric device processing technique field.
Background technology
Along with the constantly progress of micro-nano technology technology, the preparation technology of micro-nano structure masterplate is day by day ripe.At present, can be etched on the material such as silicon, quartz and prepare various micro-nano structure with electron beam/ion beam lithography combination.But the preparation of large format micro-nano structure, its technical difficulty is high, and processing charges is still high.The main function of micro-nano structure layout equipment is, is shaped by small breadth micro-nano structure master by pressing mold, composition large format masterplate.Different according to working method, layout equipment is divided into hot pressing and ultraviolet light polymerization two kinds of modes.Hot pressing layout is heated to more than glass temperature base material to be imprinted [being generally the polycarbonate (PC:Polycarbonate) of hardboard type or film-type, Polyvinylchloride (PVC:PolyrinylChloride), polyester (PET:Polyester), acrylic acid (PMMA:PolymethylMethacrylate) or polyene (BOPP:BiaxialOrlentedPlypropylene) etc.] and softens, then master (surface has the nickel sheet of micro-nano structure) is pressed into material to be imprinted, surface micro-nano structure is shifted.Ultraviolet light polymerization layout mode, using ultraviolet-curing resin as impression materials, its macromolecular material crosslinking curing wherein under UV-irradiation, thus form the structure contrary with reticle surface.Compare with hot press working mode, the major advantage of ultraviolet light polymerization layout at room temperature to realize structure transfer, and the force of impression needed for it comparatively hot pressing mode decreases at least one order of magnitude, without the need to High Temperature High Pressure, structure fidelity is high, is thus considered to a kind of better layout mode.MolecularImprintInc. company of the U.S. proposes a kind of equipment based on stepping flash of light (step & flash) working method.(P.Ruchhoeft, M.Colburn, B.Choi, H.Nounu, S.Johnson, T.Bailey, M.Stewart, J.Ekerdt, S.V.Sreenivasan, J.C.Wolfe, C.G.Willson, PatterningCurvedSurfaces:TemplateGenerationbyIonBeamProx imityLithographyandReliefTransferbyStepandFlashImprintLi thographyAmericanVacuumSocietyJ.ofVac.Sci.Technol.B17 (6), pp.2965-2969, 1999.) its workflow is, first in substrate, ultraviolet photoresists are sprayed with an accurate glue spraying head, then the flat working method to blind impression is adopted with transparent masterplate, ultra violet lamp imprinting area, after UV adhesive curing, lift the masterplate demoulding, then platform moves to subsequent work position, repeat above-mentioned steps.The maximum imprint area 26mmx32mm of its unit, whole stencil area 200mmx300mm(model Imprio 300).
Utilize above-mentioned layout technology, by the masterplate of several centimetres of sizes originally, or the some macroscopical figure containing micro-nano structure can be spliced into large format masterplate.At present, the main application of layout equipment is in laser hologram image field.
Traditional contour forging layout equipment is based on hot press working mode, for high-accuracy surface relief striped transfer processing, impression breadth is generally at about 50mmX50mm, there is provided driving pressure by hydraulic system, output pressure reaches MPa level, heating-up temperature more than base plate glass temperature (to carbonic acid polyester material, its glass temperature about 120 DEG C, heating-up temperature need be greater than 150 DEG C), speed of imprint 10-20 second/time, layout area is at more than 800mmX800mm.Its major defect is: 1) apply pressure large, easily cause damage to masterplate.2) working temperature is high, and the work period is long.3) due to the resilience of hot-pressed material, structure fidelity is low.
MolecularImprintInc. the equipment of company is actually a kind of step-by-step movement ultraviolet nanometer marking press, and it is limited in: 1) it is mainly used in the making of 12 inches of following silicon-based devices of breadth; 2) impression adopts plane to the mode of plane.This equipment has two drawbacks: one be due to masterplate and substrate contact area large, the surface micronano structure of masterplate adds to several times again contact area between the two, demoulding difficulty increases, and two is can produce bubble in impression in this working method, destroys layout effect.Therefore, step-by-step movement ultraviolet nanometer marking press is mainly used in the layout preparation of periodically not close arrangement units.
Summary of the invention
In view of this, the object of the invention is to propose a kind of ultra-violet curing micro nano structure makeup device and keyline layout method, not only can carry out the layout of not close arrangement, compact arranged layout operation can be carried out again simultaneously.
A kind of ultra-violet curing micro nano structure makeup device that object according to the present invention proposes, comprise placing the substrate stage waiting to press basement membrane, be arranged at the marking press main body above this substrate stage, for driving the drive unit of relative movement between marking press main body and substrate stage, and above-mentioned all parts is carried out to the control system of electric control, described marking press main body is provided with pressure roller, light source and nozzle, described pressure roller and light source are fixed on a pressure roller telecontrol equipment, described nozzle is fixed on a nozzle movement apparatus, described light source is arranged at the rear of pressure roller its working direction relative, described nozzle is arranged at the front of pressure roller its working direction relative, described roller surface volume is provided with the soft press mold of layer of transparent, one end of this transparent soft press mold is fixed in marking press main body, the other end is fixed on pressure roller, and the one end being fixed on marking press main body is positioned at the opposite side of the relative pressure roller of light source.
Preferably, described transparent soft pressing mold comprises base material and is arranged at the micro-nano structure of substrate surface for impressing.
Preferably, described micro-nano structure can be nanometer grating, nano-dot matrix, microlens array, V-shaped groove, photon crystal structure, or the one in their combination.
Preferably, the top of described transparent soft press mold is also provided with mask, and this mask comprises light transmission part and lightproof part.
Preferably, described transparent soft press mold and mask are provided with witness marker, for the location in each layout.
Preferably, described substrate stage is provided with some stationary installations, presses basement membrane for fixedly waiting.
Preferably, described drive unit comprise move left and right in the horizontal direction X-axis drive unit, be fixed on this X-axis drive unit and along perpendicular to the traversing Y-axis drive unit in paper direction, and being fixed on this Y-axis drive unit and the Z axis drive unit vertically moved up and down, described marking press main body is fixed on this Z axis drive unit.
Preferably, described light source is ultraviolet LED lamp.
Meanwhile, the invention allows for a kind of layout technique using ultraviolet light polymerization micro-nano makeup device as above to carry out, comprise step:
Install and treat pressure basement membrane and transparent soft die arrangement: will treat that pressure basement membrane is fixed on substrate stage, be fixed on pressure roller by one end of transparent soft pressing mold, the other end is fixed in marking press main body;
By control system input layout imprint information;
Pressure roller is displaced downwardly to layout region in the drive of drive unit, and nozzle is to treating that pressure membrane surface sprays appropriate UV glue, and pressure roller presses down, and ultraviolet LED lamp is opened;
Pressure roller rolls under pressure roller telecontrol equipment drives, and be laid in by transparent soft pressing mold and wait to press membrane surface, the accompany movement of ultraviolet LED lamp, by the UV adhesive curing below mask light transmission part;
After roller action completes, pressure roller reverse rolling, rolls again by mask, gets back to enable position, and pressure roller lifts, and ultraviolet LED lamp is closed;
Judged whether all impression layout unit, pressure roller moves to next layout position as unfinished, and repeats above-mentioned imprint step, carries out the impression of next layout unit, if completed, and roller platen zero position.
Preferably, described imprint information comprises platform zero, the position (x, y) of each layout unit, size, each layout unit glue spraying amount and nozzle displacement.
Preferably, described layout technique comprises the not close arrangement layout of micro-nano structure unit, the close-packed arrays layout of micro-nano structure unit and irregular figure layout.
Compared with prior art, principal feature of the present invention is: 1) adopt ultraviolet light polymerization working method, does not need heating, gets final product work at normal temperatures.2) adopt roller and substrate to adopt linear contact lay mode, effectively can get rid of the gas between masterplate and layout material, reduce demoulding difficulty.3) adopt soft press mold technology, cost is low, and efficiency is high, few to the damage of original stencil.4) compact arranged layout between unit can be realized.5) layout of irregular figure can be realized.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the device that the present invention realizes micro-nano structure layout.
Fig. 2 is the transparent soft press mold structural representation under one embodiment of the present invention.
Fig. 3 is the various embodiment schematic diagram of the micro-nano structure on the transparent soft pressing mold of the present invention.
Fig. 4 is the workflow schematic diagram that the present invention realizes ultraviolet light polymerization micro-nano layout technique.
Fig. 5 is the micro-nano structure unit not close layout schematic diagram using layout technique of the present invention to realize.
Fig. 6 is the tight layout schematic diagram of micro-nano structure unit using layout technique of the present invention to realize.
Fig. 7 a-7i is the schematic diagram of the irregular figure layout using layout technique of the present invention to realize.
Embodiment
As described in the background art, in prior art, use the mold pressing layout equipment of hot press working mode, because of in moulding process, need will treat that pressure base material is positioned in high temperature and high pressure environment, easily masterplate and coining pattern be formed and damage.And based on the layout equipment of ultra-violet curing working method, again because it uses flat to flat step-by-step movement method for stamping, easily when processing large area imprinting, there is the problem such as bubble and demoulding difficulty.
In order to overcome the problems referred to above, the micro nano structure makeup device that the present invention proposes a kind of brand-new ultra-violet curing mode and the Fabrication of nanostructures method using this device to carry out.This makeup device adopts the mode of roller impression, realizes making nano-pattern in substrate, and realize the splicing impression of large format nanostructured by the relative movement between pressure roller and substrate platform by equipping soft pressing mold on pressure roller.Owing to being adopt linear contact lay mode between cylinder and substrate, effectively can get rid of the gas between masterplate and layout material, reduce demoulding difficulty.Adopt soft press mold technology in addition, cost is low, and efficiency is high, few to the damage of original stencil, can realize compact arranged layout between each imprinter unit.Meanwhile, the layout utilizing makeup device of the present invention can also realize irregular figure makes.
To be described in detail technical scheme of the present invention below.
Refer to Fig. 1, Fig. 1 is the device that the present invention realizes micro-nano structure layout.As shown in the figure, this makeup device comprises placing the substrate stage 1 waiting to press basement membrane 4, is arranged at the marking press main body 2 above this substrate stage 1, for driving the drive unit 3 of relative movement between marking press main body 2 and substrate stage 1.And above-mentioned all parts is carried out to the control system (not shown) of electric control.
Wherein substrate stage 1 is provided with some in order to fixedly to wait to press the stationary installation 11 of basement membrane 4, and this how dry stationary installation 11 is such as set bolt, snap fit, fixture or compressing tablet etc.Treat that pressure basement membrane 4 is fixed on substrate stage 1 by stationary installation 11.This treats that pressure basement membrane 4 can be the materials such as polyester (Polyethyleneterephthalate, PET), PEN (Polyethylenenaphthalate, PEN), polycarbonate (Polycarbanate, PC).In order to ensure layout precision, treat that pressure basement membrane 4 must ensure to be subjected to displacement by opposing substrate platform 1 in layout process.
Drive unit 3 comprise move left and right in the horizontal direction X-axis drive unit 31, be fixed on this X-axis drive unit 31 and along perpendicular to the traversing Y-axis drive unit 32 in paper direction, and being fixed on this Y-axis drive unit and the Z axis drive unit 33 vertically moved up and down, described marking press main body 2 is fixed on this Z axis drive unit 33.Certainly, the drive unit in these three directions also can design along other arrangement mode, is such as fixed on X-axis drive unit by Z axis drive unit, and to be fixed on by Y-axis drive unit on Z axis drive unit etc.By the driving of this drive unit 3, make marking press main body 2 can complete movement in three directions, thus in imprinting area of the present invention is expanded to coordinate that three drive units can move to, complete the layout of large format imprinted pattern.
Marking press main body 2 is provided with pressure roller 21, light source 22 and nozzle 23.Wherein pressure roller 21 is fixed on pressure roller telecontrol equipment 26, this pressure roller telecontrol equipment 26 is such as the small-sized microscope carrier that one group of edge is arranged at the slide below marking press main body 2, when marking press main body 2 opposing substrate platform 1 leaves standstill, this pressure roller 21 can move back and forth along pressure roller cylindrical shell rotating direction under the drive of pressure roller telecontrol equipment 26.Light source 22 is arranged at the rear of pressure roller 21 its working direction relative, and this light source 22 is fixed on pressure roller telecontrol equipment 26 together with pressure roller 21, and therefore this light source 22 can move together with pressure roller 21.Impression main body handled by the present invention is UV glue, therefore this light source 22 specifically a kind of ultraviolet LED lamp in the present invention, and certainly in the embodiment that other is possible, this light source 22 also can be the illuminated objects of other form.Nozzle 23 is fixed on nozzle movement apparatus 25, and this nozzle 23 is arranged at the front of pressure roller 23 working direction all the time, and thus, the UV glue sprayed by nozzle 23 is impressed by pressure roller 21 after being applied to and treating pressure basement membrane 4.This nozzle movement apparatus 25 can laterally move along the direction perpendicular to paper, to ensure that the scope that UV glue sprays meets the size impressing size.Nozzle 24 before each layout imprinting actions, to treating pressure basement membrane 4 surface spraying a certain amount of UV glue.UV glue component contains matrix resin, light trigger, solvent and the adjuvant for levelling and the demoulding.Under UV-irradiation, in UV glue, component molecular generation cross-linking reaction, makes UV adhesive curing.UV glue quantity for spray is neglected greatly and is treated layout unit figure area and the micro-nano structure degree of depth and determine, and when effective layout area is in 100mm2-100cm2 scope, during constructional depth 10um, glue spraying amount is between 1 milliliter to 100 milliliters.
On the surface of pressure roller 21, volume has established the soft press mold 24 of layer of transparent, one end of this transparent soft press mold 24 is fixed in marking press main body 2 by fixture 27, the other end is fixed on pressure roller 21 by fixture 29, wherein fixture 27 is positioned at the opposite side of the relative pressure roller 21 of light source 22, so, when pressure roller 21 rolls along working direction, the part of transparent soft press mold 24 on pressure roller 21 can be spread out thereupon be treated on pressure basement membrane 4, thus the micro nano structure on transparent soft press mold 24 is transferred on UV glue, and this transparent soft press mold 24 of the light therethrough of light source 22 is irradiated on UV glue and makes it solidification.And when pressure roller 21 rolls along direction of retreat, transparent soft press mold 24 is rolls-up onto on pressure roller 21 again, complete the impression of a unit.
Refer to Fig. 2, Fig. 2 is the transparent soft press mold structural representation under one embodiment of the present invention.As shown in the figure, this transparent soft press mold 24 comprising base material 241, being arranged at the micro-nano structure 242 of base material 241 surface for impressing.Refer to Fig. 3, micro-nano structure 242 can be nanometer grating, nano-dot matrix, microlens array, V-shaped groove, photon crystal structure, or their combination.These micro-nano structures by artificial preparation, also can be obtained by the structure replication of occurring in nature organism surface.Artificial preparation structure can be in the inorganic substrate such as silicon, silicon dioxide, gallium nitride of etching, or is formed on the RF magnetron sputtering such as photoresist by Laser Processing.Base material 241 can be the flexible clear materials such as polyester, polycarbonate, Polyvinylchloride, acrylic acid, polyene.
Further, can also arrange a mask above transparent soft press mold 24, this mask comprises light transmission part 244 and lightproof part 245.The effect of mask is the exposure area and the exposure shape that limit UV glue, accurately can control the degree of accuracy between layout seam like this in layout process.This transparent soft press mold 24 and mask make witness marker 243, in advance for the location in each layout.On mask, lightproof part 245 does not expose in layout, and light transmission part 244 exposes.
Refer to Fig. 4, Fig. 4 is the workflow schematic diagram that the present invention realizes ultraviolet light polymerization micro-nano layout technique.First install and treat pressure basement membrane and transparent soft die arrangement: will treat that pressure basement membrane is fixed on substrate stage, be fixed on pressure roller by one end of transparent soft pressing mold, the other end is fixed in marking press main body.In the starting stage, can consider to treat the action of pressing basement membrane and transparent soft pressing mold to position, can wait to press epilamellar position by specification layout pattern like this.Transparent soft pressing mold by pressure basement membrane making pilot hole in advance at transparent soft pressing mold with treating, accurately can be located by fixture is fixing by concrete location action.
Then, by control system input layout imprint information, comprise platform zero, the position (x, y) of each layout unit, size, each layout unit glue spraying amount and nozzle displacement, makeup device enters automatic running status according to the control program that control system carries.
Enter imprint step: pressure roller is displaced downwardly to layout region in the drive of drive unit, nozzle is to treating that pressure membrane surface sprays appropriate UV glue, and pressure roller presses down, and ultraviolet LED lamp is opened.Pressure roller rolls under pressure roller telecontrol equipment drives, and be laid in by transparent soft pressing mold and wait to press membrane surface, the accompany movement of ultraviolet LED lamp, by the UV adhesive curing below mask light transmission part.After roller action completes, pressure roller reverse rolling, rolls again by mask, gets back to enable position, and pressure roller lifts, and ultraviolet LED lamp is closed.
And then, judged whether all impression layout unit, pressure roller moves to next layout position as unfinished, and repeats above-mentioned imprint step, carries out the impression of next layout unit, if completed, and roller platen zero position.
Refer to Fig. 5, Fig. 5 is the micro-nano structure unit not close layout schematic diagram using layout technique of the present invention to realize.
One of function that method proposed by the invention and equipment will realize is the not close arrangement layout that can realize micro-nano structure unit, as there being the layout mode of textured region in Fig. 5.Its object has two: one to be that little version is combined into large version, facilitates the later stage to copy in enormous quantities; Two is the preparations carrying out array structure.When making the structure of this not close layout, the shaped angles from mask can be considered, when impressing single layout unit, namely the white space of micro-nano structure periphery is impressed out, then layout is done for each layout unit, the effect of formation after completing and the layout structure of not close formula.The angle that also can control from mechanical shift in addition, namely realizes the layout of not close formula by the shift length of accessory drive on XY direction.
Refer to Fig. 6, Fig. 6 is the tight layout schematic diagram of micro-nano structure unit using layout technique of the present invention to realize.
One of function that method proposed by the invention and equipment will realize, being the close-packed arrays layout that can realize micro-nano structure unit, as there being the layout mode of textured region in Fig. 6, small size micro-nano structure unit being spliced some unit in a seamless manner.Its object is that little version is combined into large version, makes continuous masterplate, improves product appearance, improves product yield.
Fig. 7 a-7i is the schematic diagram of the irregular figure layout using layout technique of the present invention to realize.
One of function that method proposed by the invention and equipment will realize to realize irregular figure layout, the layout mode as shown in Fig. 7 a-7i.All soft press molds and mask make witness marker all in advance, and ensure to aim in layout process.First, by the transparent soft press mold of the micro-nano structure of Fig. 7 a and the mask combinations of Fig. 7 b, substrate obtains graphical micro-nano structure as shown in Figure 7 c.Then, by the mask combinations of transparent for the micro-nano structure of Fig. 7 d soft press mold and Fig. 7 e, on the substrate of previous step layout obtain graphical micro-nano structure as depicted in fig. 7f.Finally, with the mask combinations of the transparent soft press mold of the micro-nano structure of Fig. 7 g and Fig. 7 h, on the substrate of previous step, the graphical micro-nano structure as Fig. 7 i is being obtained.Its object is the layout realizing various irregular micro-nano unit, forms complicated figure.
To the above-mentioned explanation of the disclosed embodiments, professional and technical personnel in the field are realized or uses the present invention.To be apparent for those skilled in the art to the multiple amendment of these embodiments, General Principle as defined herein can without departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.To the above-mentioned explanation of the disclosed embodiments, professional and technical personnel in the field are realized or uses the present invention.To be apparent for those skilled in the art to the multiple amendment of these embodiments, General Principle as defined herein can without departing from the spirit or scope of the present invention, realize in other embodiments.Therefore, the present invention can not be restricted to embodiment illustrated herein, but will meet the widest scope consistent with principle disclosed herein and features of novelty.
Claims (10)
1. a ultra-violet curing micro nano structure makeup device, comprise placing the substrate stage waiting to press basement membrane, be arranged at the marking press main body above this substrate stage, for driving the drive unit of relative movement between marking press main body and substrate stage, and above-mentioned all parts is carried out to the control system of electric control, it is characterized in that: described marking press main body is provided with pressure roller, light source and nozzle, described pressure roller and light source are fixed on a pressure roller telecontrol equipment, described nozzle is fixed on a nozzle movement apparatus, described light source is arranged at the rear of pressure roller its working direction relative, described nozzle is arranged at the front of pressure roller its working direction relative, described roller surface volume is provided with the soft press mold of layer of transparent, one end of this transparent soft press mold is fixed in marking press main body, the other end is fixed on pressure roller, and the one end being fixed on marking press main body is positioned at the opposite side of the relative pressure roller of light source, described nozzle is to treating that pressure membrane surface sprays a certain amount of UV glue, described transparent soft press mold comprises base material and is arranged at the micro-nano structure of substrate surface for impressing, pressure roller rolls under pressure roller telecontrol equipment drives, described transparent soft press mold is laid in and waits to press membrane surface.
2. ultra-violet curing micro nano structure makeup device as claimed in claim 1, is characterized in that: described micro-nano structure can be nanometer grating, nano-dot matrix, microlens array, V-shaped groove, photon crystal structure, or the one in their combination.
3. ultra-violet curing micro nano structure makeup device as claimed in claim 1, is characterized in that: the top of described transparent soft press mold is also provided with mask, and this mask comprises light transmission part and lightproof part.
4. ultra-violet curing micro nano structure makeup device as claimed in claim 3, is characterized in that: described transparent soft press mold and mask are provided with witness marker, for the location in each layout.
5. ultra-violet curing micro nano structure makeup device as claimed in claim 1, is characterized in that: described substrate stage is provided with some stationary installations, presses basement membrane for fixedly waiting.
6. ultra-violet curing micro nano structure makeup device as claimed in claim 1, it is characterized in that: described drive unit comprise move left and right in the horizontal direction X-axis drive unit, be fixed on this X-axis drive unit and along perpendicular to the traversing Y-axis drive unit in paper direction, and being fixed on this Y-axis drive unit and the Z axis drive unit vertically moved up and down, described marking press main body is fixed on this Z axis drive unit.
7. ultra-violet curing micro nano structure makeup device as claimed in claim 1, is characterized in that: described light source is ultraviolet LED lamp.
8. the layout technique using the ultra-violet curing micro nano structure makeup device as described in claim 1 to 7 any one to carry out, is characterized in that, comprise step:
Install and treat pressure basement membrane and transparent soft film pressing device: will treat that pressure basement membrane is fixed on substrate stage, be fixed on pressure roller by one end of transparent soft press mold, the other end is fixed in marking press main body;
By control system input layout imprint information;
Pressure roller is displaced downwardly to layout region in the drive of drive unit, and nozzle is to treating that pressure membrane surface sprays appropriate UV glue, and pressure roller presses down, and ultraviolet LED lamp is opened;
Pressure roller rolls under pressure roller telecontrol equipment drives, and be laid in by transparent soft press mold and wait to press membrane surface, the accompany movement of ultraviolet LED lamp, by the UV adhesive curing below mask light transmission part;
After roller action completes, pressure roller reverse rolling, rolls again by mask, gets back to enable position, and pressure roller lifts, and ultraviolet LED lamp is closed;
Judged whether all impression layout unit, pressure roller moves to next layout position as unfinished, and repeats above-mentioned imprint step, carries out the impression of next layout unit, if completed, and roller platen zero position.
9. layout technique as claimed in claim 8, is characterized in that: described imprint information comprises platform zero, the position (x, y) of each layout unit, size, each layout unit glue spraying amount and nozzle displacement.
10. layout technique as claimed in claim 8, is characterized in that: described layout technique comprises the not close arrangement layout of layout unit, the close-packed arrays layout of layout unit and irregular figure layout.
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| CN101168438A (en) * | 2007-11-06 | 2008-04-30 | 西安交通大学 | Large area reverse roller impression method for micro-structure of flexible base macroelectron manufacture |
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Address after: 215123 No. 199 benevolence Road, Suzhou Industrial Park, Jiangsu, China Co-patentee after: SUZHOU SUDAVIG SCIENCE AND TECHNOLOGY GROUP Co.,Ltd. Patentee after: Suzhou University Address before: 215123 No. 199 benevolence Road, Suzhou Industrial Park, Jiangsu, China Co-patentee before: SVG OPTRONICS, Co.,Ltd. Patentee before: Suzhou University |