CN203474963U - 一种用于生产碳化硅外延片的化学气相沉积设备 - Google Patents
一种用于生产碳化硅外延片的化学气相沉积设备 Download PDFInfo
- Publication number
- CN203474963U CN203474963U CN201320397113.0U CN201320397113U CN203474963U CN 203474963 U CN203474963 U CN 203474963U CN 201320397113 U CN201320397113 U CN 201320397113U CN 203474963 U CN203474963 U CN 203474963U
- Authority
- CN
- China
- Prior art keywords
- silicon carbide
- equipment
- catch ring
- epitaxial wafer
- carbide epitaxial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Abstract
Description
Point | 1 | 2 | 3 | 4 | 5 | 6 | 7 | 8 | 9 | 10 | 均匀性 | mean | 标准偏差 |
传统 | 7.86 | 7.81 | 7.8 | 7.75 | 7.74 | 7.68 | 7.65 | 7.57 | 7.5 | 7.41 | 2.95% | 7.677 | 0.145 |
实施例1 | 7.87 | 7.86 | 7.84 | 7.81 | 7.79 | 7.76 | 7.71 | 7.7 | 7.69 | 7.69 | 1.16% | 7.772 | 0.072 |
实施例2 | 7.88 | 7.87 | 7.84 | 7.82 | 7.78 | 7.75 | 7.69 | 7.67 | 7.66 | 7.66 | 1.42% | 7.762 | 0.088 |
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320397113.0U CN203474963U (zh) | 2013-07-04 | 2013-07-04 | 一种用于生产碳化硅外延片的化学气相沉积设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320397113.0U CN203474963U (zh) | 2013-07-04 | 2013-07-04 | 一种用于生产碳化硅外延片的化学气相沉积设备 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN203474963U true CN203474963U (zh) | 2014-03-12 |
Family
ID=50223324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201320397113.0U Expired - Lifetime CN203474963U (zh) | 2013-07-04 | 2013-07-04 | 一种用于生产碳化硅外延片的化学气相沉积设备 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN203474963U (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103603048A (zh) * | 2013-07-04 | 2014-02-26 | 国家电网公司 | 一种用于生产碳化硅外延片的化学气相沉积设备 |
CN104386698A (zh) * | 2014-11-06 | 2015-03-04 | 清华大学 | 一种碳化硅纳米线的流化床化学气相沉积制备方法 |
CN104818527A (zh) * | 2015-04-08 | 2015-08-05 | 上海晶盟硅材料有限公司 | 外延片生产设备 |
CN112877775A (zh) * | 2020-12-30 | 2021-06-01 | 华灿光电(浙江)有限公司 | 金属有机化学气相沉积设备的反应器 |
CN113078050A (zh) * | 2021-03-30 | 2021-07-06 | 芜湖启迪半导体有限公司 | 一种C面SiC外延结构及外延沟槽的填充方法 |
CN115537768A (zh) * | 2022-12-01 | 2022-12-30 | 浙江晶越半导体有限公司 | 一种碳化硅化学气相沉积方法及多热源水平壁热式反应器 |
CN115613139A (zh) * | 2022-12-01 | 2023-01-17 | 浙江晶越半导体有限公司 | 用于外延生长碳化硅薄膜的化学气相沉积反应器及方法 |
-
2013
- 2013-07-04 CN CN201320397113.0U patent/CN203474963U/zh not_active Expired - Lifetime
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103603048A (zh) * | 2013-07-04 | 2014-02-26 | 国家电网公司 | 一种用于生产碳化硅外延片的化学气相沉积设备 |
CN104386698A (zh) * | 2014-11-06 | 2015-03-04 | 清华大学 | 一种碳化硅纳米线的流化床化学气相沉积制备方法 |
CN104818527A (zh) * | 2015-04-08 | 2015-08-05 | 上海晶盟硅材料有限公司 | 外延片生产设备 |
CN112877775A (zh) * | 2020-12-30 | 2021-06-01 | 华灿光电(浙江)有限公司 | 金属有机化学气相沉积设备的反应器 |
CN113078050A (zh) * | 2021-03-30 | 2021-07-06 | 芜湖启迪半导体有限公司 | 一种C面SiC外延结构及外延沟槽的填充方法 |
CN113078050B (zh) * | 2021-03-30 | 2023-03-10 | 安徽长飞先进半导体有限公司 | 一种C面SiC外延结构及外延沟槽的填充方法 |
CN115537768A (zh) * | 2022-12-01 | 2022-12-30 | 浙江晶越半导体有限公司 | 一种碳化硅化学气相沉积方法及多热源水平壁热式反应器 |
CN115613139A (zh) * | 2022-12-01 | 2023-01-17 | 浙江晶越半导体有限公司 | 用于外延生长碳化硅薄膜的化学气相沉积反应器及方法 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN203474963U (zh) | 一种用于生产碳化硅外延片的化学气相沉积设备 | |
CN103715069B (zh) | 一种减少碳化硅外延薄膜中缺陷的方法 | |
CN103603048B (zh) | 一种用于生产碳化硅外延片的化学气相沉积设备 | |
US9633840B2 (en) | Method of manufacturing silicon carbide semiconductor substrate and method of manufacturing silicon carbide semiconductor device | |
KR101321424B1 (ko) | 반도체 소자의 표면 처리 및 박막 성장 방법, 그리고 이를 구현하는 표면 처리 및 박막 성장 장치 | |
JP6245416B1 (ja) | 炭化珪素エピタキシャルウエハの製造方法及び炭化珪素半導体装置の製造方法 | |
CN103556219B (zh) | 一种碳化硅外延生长装置 | |
CN105714380A (zh) | 一种碳化硅外延生长装置及方法 | |
CN103290374B (zh) | 一种晶体硅太阳能电池片镀膜工艺 | |
CN116844940A (zh) | 一种改善SiC外延片浓度均匀性的制备方法 | |
CN205711042U (zh) | 一种碳化硅外延生长装置 | |
US9711353B2 (en) | Method for manufacturing compound semiconductor epitaxial substrates including heating of carrier gas | |
CN112885709B (zh) | 一种碳化硅外延结构的制备方法及半导体设备 | |
CN103820768A (zh) | 4H-SiC衬底上同质快速外延生长4H-SiC外延层的方法 | |
JP6786939B2 (ja) | 炭化珪素半導体基板および炭化珪素半導体基板の製造方法 | |
JP2014232799A (ja) | 炭化珪素半導体基板の製造方法 | |
JP2014027028A (ja) | SiCエピタキシャル基板製造装置、SiCエピタキシャル基板の製造方法、SiCエピタキシャル基板 | |
WO2013104200A1 (zh) | 用ald设备生长氮化镓薄膜的方法 | |
JP2014103363A (ja) | 炭化珪素半導体基板の製造方法 | |
CN110117814A (zh) | 具有低密度c空位缺陷的碳化硅外延的制备方法 | |
JP2011044744A (ja) | 炭化珪素半導体 | |
US20150311069A1 (en) | Method for manufacturing silicon carbide semiconductor substrate | |
CN118028973A (zh) | 一种瞬态电压抑制器用重掺杂衬底硅外延片的制备方法 | |
CN203559154U (zh) | 一种碳化硅外延生长装置 | |
Tillack et al. | Silicon–germanium (SiGe) crystal growth using chemical vapor deposition |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: 100031 Xicheng District West Chang'an Avenue, No. 86, Beijing Co-patentee after: GLOBAL ENERGY INTERCONNECTION Research Institute Patentee after: State Grid Corporation of China Address before: 100031 Xicheng District West Chang'an Avenue, No. 86, Beijing Co-patentee before: STATE GRID SMART GRID Research Institute Patentee before: State Grid Corporation of China |
|
CP01 | Change in the name or title of a patent holder | ||
TR01 | Transfer of patent right |
Effective date of registration: 20171031 Address after: 102211 Beijing city Changping District future science and Technology City Binhe Road No. 18 Co-patentee after: State Grid Corporation of China Patentee after: GLOBAL ENERGY INTERCONNECTION Research Institute Co-patentee after: STATE GRID ZHEJIANG ELECTRIC POWER Co. Address before: 100031 Xicheng District West Chang'an Avenue, No. 86, Beijing Co-patentee before: GLOBAL ENERGY INTERCONNECTION RESEARCH INSTITUTE Patentee before: State Grid Corporation of China |
|
TR01 | Transfer of patent right | ||
CX01 | Expiry of patent term |
Granted publication date: 20140312 |
|
CX01 | Expiry of patent term |