CN202968678U - Vacuum evaporation device - Google Patents
Vacuum evaporation device Download PDFInfo
- Publication number
- CN202968678U CN202968678U CN 201220694165 CN201220694165U CN202968678U CN 202968678 U CN202968678 U CN 202968678U CN 201220694165 CN201220694165 CN 201220694165 CN 201220694165 U CN201220694165 U CN 201220694165U CN 202968678 U CN202968678 U CN 202968678U
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- substrate
- deposition apparatus
- vacuum deposition
- vacuum
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Abstract
The utility model provides a vacuum evaporation device, which can be used for maintaining the efficiency of an ion source, preventing large size of a device, and improving the maintenance. A vacuum evaporation device with high maintenance of an energy particle source is provided in vacuum evaporation devices with an energy particle source comprising irradiation ions or plasma and other energy particles. The vacuum evaporation device comprises a vault type substrate maintaining component (12), a rotation component, an evaporation component (34) and an energy particle source (38), wherein the vault type substrate maintaining component (12) is arranged in a vacuum container (10) and used for maintaining a plurality of substrates (14); the rotation component is used for driving the substrate maintaining component (12) to rotate; the evaporation component (34) is arranged in a mode of being opposite to the substrates (14); and the energy particle source (38) is used for irradiating energy particles to the substrates (14). Under a state that the induction part of energy particles is toward to the direction of the substrates, the energy particle source (38) is arranged in the inner wall surface of a door (10a) of the vacuum container (10).
Description
Technical field
The utility model relates to the vacuum deposition apparatus of film, particularly possesses the vacuum deposition apparatus to the energy grain component of substrate irradiation ion etc.
Background technology
In the past, known have make thin-film material in vacuum vessel when substrate surface evaporates, by the ion assisted deposition device (for example, patent documentation 1) that carries out densification to the evaporation layer irradiation ion that is deposited on substrate.
In such evaporation coating device, utilize ion gun to the more low-energy gaseous ion of substrate irradiation, utilize simultaneously neutralizer in substrate irradiation and electronics (electronics), thus can in and the skew of the electric charge on the substrate that causes of gaseous ion, utilize simultaneously the kinetic energy of gaseous ion to make fine and close film.
Patent documentation 1: No. 4540746 communique of Japan's special permission
But, in the existing ion assisted deposition devices such as patent documentation 1, ion source is equipped on the bottom surface of vacuum vessel or the side beyond door, therefore when carrying out ionogenic part replacement or cleaning etc. and safeguard, the operator need to make health significantly enter in vacuum vessel, so the raising of the workability that expectation is safeguarded.
The utility model content
The utility model is completed in view of above-mentioned problem, and the purpose of this utility model is, is provided in the vacuum deposition apparatus of the energy grain component that possesses irradiation ion or plasma body homenergic particle the vacuum deposition apparatus that the maintainability of energy grain component is high.
Described problem is according to the vacuum deposition apparatus of technical scheme 1, solve in the following way, namely, this vacuum deposition apparatus makes the evaporation material evaporation to substrate in vacuum vessel, wherein, this vacuum deposition apparatus constitutes to be possessed: the substrate holding structure of dome-type, and it is equipped in described vacuum vessel, is used for keeping a plurality of described substrates; Rotating member, it is used for making this substrate holding structure rotation; The evaporation member, it is to arrange with the opposed mode of described substrate; And the energy grain component, it is used for described substrate irradiation energy particle, and described energy grain component induces section under the state of described orientation substrate at energy particle, is installed on the inner-wall surface of the door that sets at described vacuum vessel.
Like this, because the inner-wall surface at door is equipped with the energy grain component, so when safeguarding, the energy grain component just appear at open the door the operator near, the maintenance inspection of energy grain component becomes easily, has improved maintainability.
In addition, described energy grain component can be also ion source.
In addition, preferably, described vacuum deposition apparatus possesses for the neutralizer to described substrate irradiation electronics, and this neutralizer under the state of described orientation substrate, is installed on the inner-wall surface of the door that sets at described vacuum vessel in electronic induction section.
When consisting of as described above, because the inner-wall surface at door is equipped with neutralizer, so when safeguarding, neutralizer just appear at open the door the operator near, the maintenance inspection of neutralizer becomes easily, has improved maintainability.
And, be preferably spiral helicine metal pipe arrangement to the gas pipe arrangement of described ion source supply gas.Due to such formation, the gas pipe arrangement is formed the such shape of metal spring, can have flexible.
In addition, also can be formed by the starting material that have elasticity and have a Restoration to the gas pipe arrangement of described ion source supply gas.
In addition, described starting material with Restoration can be resins.
Owing to consisting of as described above, along with the switching of door, the flexible or deflection of gas pipe arrangement prevents that the gas pipe arrangement from damaging because the switching of door causes metal fatigue etc., thus the component life that can extend the gas pipe arrangement.
According to vacuum deposition apparatus of the present utility model, can improve the maintainability of energy grain component, and can cut down the required time of maintenance of energy grain component, thereby boost productivity.
Description of drawings
Fig. 1 is the concept map of the vacuum deposition apparatus of an embodiment of the present utility model.
Fig. 2 be illustrate an embodiment of the present utility model vacuum vessel the door position explanatory view.
Label declaration
1: vacuum deposition apparatus
10: vacuum vessel
10a: door
12: substrate holder
14: substrate
34: vapor deposition source
34a, 38a: flashboard
38: ion source
40: neutralizer
44: web member
G: hinge
K: end difference
Embodiment
Below, with reference to accompanying drawing, embodiment of the present utility model is described.
In addition, below the parts of explanation, configuration etc. are the examples that utility model is specialized, and are not used in restriction the utility model, certainly can carry out various changes according to aim of the present utility model, and equivalent are contained in interest field also.
Fig. 1 is the summary sectional view of the vacuum deposition apparatus 1 of an embodiment of the present utility model.
And, be equipped with the vapor deposition source 34 as the evaporation member below the inside of vacuum vessel 10.
Utilize not shown vacuum pump to carry out exhaust to the inboard of vacuum vessel 10, make it become predetermined pressure (for example about 3 * 10
-2Pa~10
-4Pa).
As shown in Figure 1, in the present embodiment, be provided with a 10a in the side of vacuum vessel 10, be provided with ion source 38 and neutralizer 40 at the inner-wall surface of described door 10a.
As shown in Figure 2, the side at vacuum vessel 10 is provided with a 10a.
Inner-wall surface at this 10a is equipped with ion source 38 and neutralizer 40.
As shown in Figure 1, be can remain on around the mode that vertical axis rotates the parts of upside, the stainless steel that form dome-shaped in vacuum vessel 10 as the substrate holder 12 of substrate holding structure.The output shaft of the rotating member of substrate holder 12 and not shown motor links.At the lower surface of substrate holder 12, be supported with a plurality of substrates 14 as substrate in the mode of film forming face towards the below.
In the present embodiment, use discoideus parts as substrate 14, but shape being not limited to this, can be also other shapes of lens shape, cylindric, circular, rectangular plate shape and so on for example.
And, being formed with end difference K at the face of vacuum vessel 10 inboards of this 10a, ion source 38 and neutralizer 40 are installed on this end difference K.
End difference K possesses by the scarp that the inboard step-down of vacuum vessel 10 is formed, and the upper surface side on the scarp of this end difference K constitutes with substrate 14 and faces.
Be provided with not shown venting port in vacuum vessel 10, and be connected with not shown vacuum pump via venting port.And, be formed with in vacuum vessel 10 for import the gas introduction tube (not shown) of gas to inside.
Be equipped with above vapor deposition source 34 can opening and closing operations flashboard 34a.
Possess for importing as the gas of the raw material of ion the not shown gas pipe arrangement of vacuum vessel 10 in the vacuum introduction part.The gas pipe arrangement of present embodiment constitutes spiral helicine metal pipe arrangement.
And the gas pipe arrangement is not limited to spiral helicine metal pipe arrangement, also can be formed by the starting material that have elasticity and have a Restoration.For example, can use plastic conduit etc.
In the present embodiment, possess ion source 38 and be used as the energy grain component, but be not limited to this, also can use for producing member etc. to the plasma source of substrate 14 irradiation plasma bodys or for generation of the active specy of active specy.
Neutralizer 40 is towards substrate 14 ejected electron (e
-) device, derive electronics by the plasma inducing of the rare gas such as Ar, and utilize acceleration voltage to accelerate and ejected electron.Utilization neutralizes from the electronics that penetrates here and is attached to the ion on substrate 14 surfaces.
In the vacuum deposition apparatus 1 of present embodiment, neutralizer 40 sets as spaced a predetermined distance from ion source 38.The installation site of neutralizer 40 is so long as can get final product to the position that substrate 14 irradiation electronics neutralize.
Like this, by making the ionic fluid that incides substrate 14 have angle, thereby make the ionic fluid that keeps the kinetic energy state from vergence direction bumped substrate 14 surfaces, can be to the evaporation material effect that is deposited in substrate 14 surfaces larger energy etc., discovery has obtained than in the past higher ion auxiliaring effect.
Claims (6)
1. vacuum deposition apparatus, it makes the evaporation material evaporation to substrate in vacuum vessel, and described vacuum deposition apparatus is characterised in that,
This vacuum deposition apparatus constitutes to be possessed:
The substrate holding structure of dome-type, it is provided in described vacuum vessel, is used for keeping a plurality of described substrates;
Rotating member, it is used for making this substrate holding structure rotation;
The evaporation member, it is to arrange with the opposed mode of described substrate; And
The energy grain component, it is used for described substrate irradiation energy particle,
Described energy grain component induces section under the state of described orientation substrate at energy particle, is installed on the inner-wall surface of the door that sets at described vacuum vessel.
2. vacuum deposition apparatus according to claim 1, is characterized in that,
Described energy grain component is ion source.
3. vacuum deposition apparatus according to claim 1 and 2, is characterized in that,
Described vacuum deposition apparatus possesses for the neutralizer to described substrate irradiation electronics,
This neutralizer under the state of described orientation substrate, is installed on the inner-wall surface of the door that sets at described vacuum vessel in electronic induction section.
4. vacuum deposition apparatus according to claim 2, is characterized in that,
Gas pipe arrangement to described ion source supply gas is spiral helicine metal pipe arrangement.
5. vacuum deposition apparatus according to claim 2, is characterized in that,
Formed by the starting material that have elasticity and have a Restoration to the gas pipe arrangement of described ion source supply gas.
6. vacuum deposition apparatus according to claim 5, is characterized in that,
Described starting material with Restoration are resins.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201220694165 CN202968678U (en) | 2012-12-14 | 2012-12-14 | Vacuum evaporation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201220694165 CN202968678U (en) | 2012-12-14 | 2012-12-14 | Vacuum evaporation device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN202968678U true CN202968678U (en) | 2013-06-05 |
Family
ID=48509778
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 201220694165 Expired - Lifetime CN202968678U (en) | 2012-12-14 | 2012-12-14 | Vacuum evaporation device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN202968678U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106048550A (en) * | 2015-04-16 | 2016-10-26 | 纳卢克斯株式会社 | Deposition apparatus and manufacturing process including film forming step by deposition apparatus |
-
2012
- 2012-12-14 CN CN 201220694165 patent/CN202968678U/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106048550A (en) * | 2015-04-16 | 2016-10-26 | 纳卢克斯株式会社 | Deposition apparatus and manufacturing process including film forming step by deposition apparatus |
CN106048550B (en) * | 2015-04-16 | 2020-03-17 | 纳卢克斯株式会社 | Vapor deposition apparatus and manufacturing method including film forming step by vapor deposition apparatus |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term |
Granted publication date: 20130605 |
|
CX01 | Expiry of patent term |