CN203562394U - Plasma circular processing device - Google Patents
Plasma circular processing device Download PDFInfo
- Publication number
- CN203562394U CN203562394U CN201320755768.0U CN201320755768U CN203562394U CN 203562394 U CN203562394 U CN 203562394U CN 201320755768 U CN201320755768 U CN 201320755768U CN 203562394 U CN203562394 U CN 203562394U
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- gas
- plasma
- processing device
- box
- reaction chamber
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Abstract
The utility model relates to a plasma circular processing device which comprises a reaction box, a circular box, an electrode component and a plasma generator. The upper portion of the reaction box is communicated with the circular box, the lower portion of the reaction box is communicated with the circular box, an extracting opening used for exhausting is formed in the top of the circulating box, gas inlets used for leading reaction gas in are formed in the bottom of the circular box and the bottom of the reaction box, the electrode component is arranged on the wall body of the reaction box, and the electrode component is in electric connection with the plasma generator. According to the plasma circular processing device, the reaction gas enters the reaction box from the gas inlets and drives powder materials to move upwards, the plasma generator drives the electrode component to form an electric field to carry out ionization of the reaction gas and carry out processing on the surfaces of the powder materials, some powder materials fall in the circular box due to the action of gravity, and the reaction gas at the bottom of the circular box blows the powder materials into the reaction box to carry out circular process, so that the powder materials are more completely and evenly processed, and the processing effect is improved.
Description
Technical field
The utility model relates to plasma processing apparatus, relates in particular to a kind of plasma cyclic processing device.
Background technology
Lower temperature plasma technology is as a kind of new surface modification means, can fast, efficiently, contamination-freely improve the surface property of material, give new feature, do not change again the body feature of material simultaneously, more and more by the researcher of countries in the world, paid attention to, plasma surface treatment is that the plasma that utilizes gas discharge to produce carries out physical and chemical reaction to material surface.What participate in reaction has excited state particle, free radical and an ion, also comprises the ultraviolet effect of plasma resonance.By surface reaction, likely on surface, introduce particular functional group, produce surface active and etching, form cross-linked structure or generate surface free radical.These effects are not generally single, and often certain act as master, and several effects are also deposited.These effects have determined the validity of plasma surface treatment just.
In prior art, to carry out plasma treatment be all disposable to large multipair material, if treatment effect is bad, material has just been wasted or need to again have been processed.
Therefore, need a kind of plasma processing apparatus that can circular treatment badly.
Utility model content
The purpose of this utility model is to overcome the defect that prior art exists, and a kind of plasma cyclic processing device is provided.
The technical scheme that realizes the utility model object is: a kind of plasma cyclic processing device, comprise reaction chamber, circulating box, electrode assemblie and plasma generator, described reaction chamber top is communicated with described circulating box, described reaction chamber bottom is communicated with described circulating box, described circulating box top is provided with the bleeding point for exhaust, described circulating box bottom and described reaction chamber bottom are provided with the gas access for passing into reacting gas, on described reaction chamber wall body, be provided with electrode assemblie, described electrode assemblie is electrically connected with described plasma generator.
Further, described reaction chamber and described circulating box bottom connectivity part are provided with the connector for powder body material circulation.
Further, described connector comprises straight tube and along described straight tube one end, extends the bending tube arranging with horizontal plane angle A.
Further, described included angle A is 10 °～90 °.
Further, described plasma generator comprises power supply and the adaptation being connected with described power supply, and described adaptation is electrically connected with described electrode assemblie.
Further, also comprise the vacuum pump for vacuumizing, described vacuum pump is connected with described bleeding point, between described vacuum pump and described bleeding point, is also provided with cooler bin.
Further, also comprise the source of the gas for reacting gas is provided, described source of the gas is connected with described gas access.
Further, also comprise the gas distribution grid for the reacting gas that distributes, described gas distribution grid is arranged at top, described gas access, is provided with some pores on gas distribution grid.
The utlity model has positive effect: the utility model reacting gas enters in reaction chamber and drives dust material to move upward from gas access, plasma generator drive electrode assembly forms electric field by reacting gas ionization and to dust material surface treatment, because Action of Gravity Field part dust material is dropped in circulating box, the reacting gas of circulating box bottom blows dust material to circular treatment in reaction chamber, make dust material process more completely, more even, improve treatment effect.
Accompanying drawing explanation
For content of the present utility model is more easily expressly understood, according to specific embodiment also by reference to the accompanying drawings, the utility model is described in further detail below, wherein:
Fig. 1 is the structural representation of the utility model the first embodiment;
Fig. 2 is the structural representation of the utility model the second embodiment.
Wherein: 1, gas access, 2, circulating box, 3, reaction chamber, 4, bleeding point, 5, cooler bin, 6, vacuum pump, 7, connector, 8, gas distribution grid, 9, electrode assemblie, 10, adaptation, 11, power supply.
Embodiment
Embodiment 1
As shown in Figure 1, the utility model the first embodiment provides a kind of plasma cyclic processing device, comprise reaction chamber 3, circulating box 2, electrode assemblie 9 and plasma generator, reaction chamber 3 tops are communicated with circulating box 2 tops, reaction chamber 3 bottoms are communicated with circulating box 2 bottoms, circulating box 2 tops are provided with the bleeding point 4 for exhaust, circulating box 2 bottoms and reaction chamber 3 bottoms are provided with the gas access 1 for passing into reacting gas, on reaction chamber 3 wall bodies, be provided with electrode assemblie 9, plasma generator comprises power supply 11 and the adaptation 10 being connected with power supply 11, adaptation 10 is electrically connected with electrode assemblie.
The present embodiment reacting gas enters in reaction chamber 3 and drives dust material to move upward from gas access 1, plasma generator drive electrode assembly 9 forms electric field by reacting gas ionization and to dust material surface treatment, because Action of Gravity Field part dust material is dropped in circulating box 2, the reacting gas of circulating box 2 bottoms blows dust material to circular treatment in reaction chamber 3, make dust material process more completely, more even, improve treatment effect.
As shown in Figure 2, all the other are identical with embodiment 1, difference is, reaction chamber 3 and circulating box 2 bottom connectivity parts that the present embodiment provides are provided with the connector 7 for powder body material circulation, connector 7 comprises straight tube and along straight tube one end, extends the bending tube arranging with horizontal plane angle A, this included angle A is 10 °～90 °, preferably 45 ° of the present embodiment.This connector 7 can prevent that the dust in reaction chamber 3 from directly blowing to circulating box 2, also can make the dust material in circulating box 2 blow to reaction chamber 3.
The present embodiment also comprises vacuum pump 6 for vacuumizing and for the source of the gas (not shown) of reacting gas is provided, source of the gas is connected with gas access 1, vacuum pump 6 is connected with bleeding point 4, between vacuum pump 6 and bleeding point 4, be also provided with cooler bin 5, cooler bin 5 will be discharged by vacuum pump 6 after condensation of gas again, and realization response gas circulation is used.
The present embodiment also comprises the gas distribution grid 8 for the reacting gas that distributes, and gas distribution grid 8 is arranged at 1 top, gas access, is provided with some pores on gas distribution grid 8, makes reacting gas enter reaction chamber 3 and circulating box 2 is more even.
Above-described specific embodiment; the purpose of this utility model, technical scheme and beneficial effect are further described; institute is understood that; the foregoing is only specific embodiment of the utility model; be not limited to the utility model; all within spirit of the present utility model and principle, any modification of making, be equal to replacement, improvement etc., within all should being included in protection range of the present utility model.
Claims (8)
1. a plasma cyclic processing device, it is characterized in that, comprise reaction chamber, circulating box, electrode assemblie and plasma generator, described reaction chamber top is communicated with described circulating box, described reaction chamber bottom is communicated with described circulating box, described circulating box top is provided with the bleeding point for exhaust, described circulating box bottom and described reaction chamber bottom are provided with the gas access for passing into reacting gas, on described reaction chamber wall body, be provided with electrode assemblie, described electrode assemblie is electrically connected with described plasma generator.
2. plasma cyclic processing device according to claim 1, is characterized in that, described reaction chamber and described circulating box bottom connectivity part are provided with the connector for powder body material circulation.
3. plasma cyclic processing device according to claim 2, is characterized in that, described connector comprises straight tube and along described straight tube one end, extends the bending tube arranging with horizontal plane angle A.
4. plasma cyclic processing device according to claim 3, is characterized in that, described included angle A is 10 °～90 °.
5. plasma cyclic processing device according to claim 1, is characterized in that, described plasma generator comprises power supply and the adaptation being connected with described power supply, and described adaptation is electrically connected with described electrode assemblie.
6. according to the arbitrary described plasma cyclic processing device of claim 1-5, it is characterized in that, also comprise the vacuum pump for vacuumizing, described vacuum pump is connected with described bleeding point, between described vacuum pump and described bleeding point, is also provided with cooler bin.
7. plasma cyclic processing device according to claim 6, is characterized in that, also comprises the source of the gas for reacting gas is provided, and described source of the gas is connected with described gas access.
8. plasma cyclic processing device according to claim 7, is characterized in that, also comprises the gas distribution grid for the reacting gas that distributes, and described gas distribution grid is arranged at top, described gas access, is provided with some pores on gas distribution grid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320755768.0U CN203562394U (en) | 2013-11-27 | 2013-11-27 | Plasma circular processing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320755768.0U CN203562394U (en) | 2013-11-27 | 2013-11-27 | Plasma circular processing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203562394U true CN203562394U (en) | 2014-04-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320755768.0U Withdrawn - After Issue CN203562394U (en) | 2013-11-27 | 2013-11-27 | Plasma circular processing device |
Country Status (1)
| Country | Link |
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| CN (1) | CN203562394U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103594318A (en) * | 2013-11-27 | 2014-02-19 | 苏州市奥普斯等离子体科技有限公司 | Plasma circular processing device |
-
2013
- 2013-11-27 CN CN201320755768.0U patent/CN203562394U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103594318A (en) * | 2013-11-27 | 2014-02-19 | 苏州市奥普斯等离子体科技有限公司 | Plasma circular processing device |
| CN103594318B (en) * | 2013-11-27 | 2015-09-16 | 苏州市奥普斯等离子体科技有限公司 | A kind of plasma cyclic processing device |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| AV01 | Patent right actively abandoned |
Granted publication date: 20140423 Effective date of abandoning: 20150916 |
|
| RGAV | Abandon patent right to avoid regrant |