CN201017176Y - Liquid supplying and recycling seal control device in immersed photolithography system - Google Patents
Liquid supplying and recycling seal control device in immersed photolithography system Download PDFInfo
- Publication number
- CN201017176Y CN201017176Y CNU200720107284XU CN200720107284U CN201017176Y CN 201017176 Y CN201017176 Y CN 201017176Y CN U200720107284X U CNU200720107284X U CN U200720107284XU CN 200720107284 U CN200720107284 U CN 200720107284U CN 201017176 Y CN201017176 Y CN 201017176Y
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- Prior art keywords
- gas
- liquid
- submergence
- cushion chamber
- control device
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- 239000007788 liquid Substances 0.000 title claims abstract description 71
- 238000004064 recycling Methods 0.000 title description 5
- 238000000206 photolithography Methods 0.000 title description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 27
- 238000011084 recovery Methods 0.000 claims abstract description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 25
- 239000010703 silicon Substances 0.000 claims description 25
- 238000002347 injection Methods 0.000 claims description 24
- 239000007924 injection Substances 0.000 claims description 24
- 238000007654 immersion Methods 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 14
- 239000012530 fluid Substances 0.000 claims description 6
- 238000000671 immersion lithography Methods 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 230000010349 pulsation Effects 0.000 abstract description 3
- 238000001459 lithography Methods 0.000 abstract 2
- 230000000717 retained effect Effects 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 34
- 238000007789 sealing Methods 0.000 description 11
- 230000009977 dual effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000003139 buffering effect Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 2
- 230000003321 amplification Effects 0.000 description 2
- 238000003199 nucleic acid amplification method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 206010010254 Concussion Diseases 0.000 description 1
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000009514 concussion Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 208000001491 myopia Diseases 0.000 description 1
- 230000004379 myopia Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
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Abstract
The utility model discloses a seal control device of liquid supply and recovery in an immerging-type lithography system, which is that the seal control device of liquid supply and recovery is installed between a projection lens group and the silicon chips for exposing in the immerging-type lithography system. The seal control device of liquid supply and recovery consists of an external-pipeline joint body of an immerging unit, a cavity of the immerging unit and a working face of the immerging unit. The modes of a double gas curtain seal and a double multi-hole medium recovery is adopted, and a seal gas inpouring pipeline and a gas-liquid mixing pipeline are all provided with a buffer structure and a pressure balancing structure. An airflow curtain with a stable fluxion and an average pressure difference can be obtained at a flow field boundary of a gap, which prevents the liquid leakage during a step-and-scan stroke. At the same time, at a liquid recovery section, an increased effective working area reduces the retained liquid on the surfaces of the silicon chips. At the same time, a strong pulsation ability of anti-gas source supply is provided. The thickness of a seal gas curtain is thin; a gas source input has a small power and a high efficiency, and a whole backpressure of the silicon chips is reduced.
Description
Technical field
The utility model relates to the seal control device that the liquid in submergence examination photoetching (Immersion Lithography) system is supplied with and reclaimed, particularly relate in a kind of slit between projection lens set (Lens) myopia end member spare and silicon chip (Wafer) and carry liquid, and guarantee that the leak free liquid of liquid transmits and seal control device.
Background technology
Modern lithographic equipment is based on optical lithography, it utilize optical system the figure on the mask accurately projection exposure to the silicon chip that was coated with photoresist.It comprises a ultraviolet source, an optical system, projection mask version, an alignment system and a silicon chip that covers photosensitive photoresist of being made up of graphics chip.Immersion lithographic system is full of certain liquid in the slit between projecting lens and silicon chip, improves the numerical aperture (NA) of projecting lens by the refractive index (n) that improves this slit medium, thereby improves the resolution and the depth of focus of photoetching.In stepping-scan-type lithographic equipment, silicon chip carries out scanning motion on exposure process high speed ground, and this high-speed motion will promptly can cause leak of liquid the filling liquid band from going out the slit.The liquid that leaks will cause some parts of lithographic equipment can't operate as normal, such as, the interferometer of monitoring wafer position.Therefore, the sealing problem of necessary emphasis solution filling liquid in the immersion lithography.
The hermetically-sealed construction of immersion lithographic system generally adopts a hermetic seal member around the slot field between projection lens set end component and the silicon chip at present.Hermetic seal is formed between the surface of described hermetic seal member and silicon chip, with the liquid in the airtight slot field.But in the various hermetic seal structures that propose, there is following problem:
(1) phenomenon inhomogeneous, that pressure is concentrated flows on the air seal border.The inhomogeneous one side of air-flow is unfavorable for hydraulic seal, and causes leakage in stepping and scanning process, may produce the fracture phenomena of slit flow liquid film on the other hand, causes bubble to enter exposure field between projecting lens and silicon chip, thereby influences image quality.
(2) hermetic seal work poor effect, the working surface liquid holdup is too much.Effective perform region of liquids recovery part is little, and timely withdrawal liquid in the movement travel of stepping and scanning causes a large amount of delays.
(3) gas demand the during work of hermetic seal is excessive.The excessive rear end origin is supplied with of gas demand requires height, should not guarantee continuous pulse free, under the high-speed motion, is unfavorable for silicon chip surface static pressure homogeneity and reduces the silicon chip surface back pressure simultaneously, influences image quality.
Summary of the invention
The purpose of this utility model provides the seal control device that the liquid in a kind of immersion lithographic system is supplied with and reclaimed.
For achieving the above object, the technical solution adopted in the utility model is as follows:
The seal control device that liquid in the immersion lithographic system is supplied with and reclaimed is the projection lens set in immersion lithography system and wait to expose the seal control device that liquid is supplied with and reclaimed is housed between the silicon chip; The seal control device that described liquid is supplied with and reclaimed is made up of submergence unit external pipeline connector, submergence unit cavity and submergence cell operation face; Wherein:
1) submergence unit external pipeline connector:
Having provides the gas injection pressure cushion chamber, and gas-liquid mixture reclaims cushion chamber, the external interface channel pipeline in fluid injection chamber;
2) submergence unit cavity:
This part by five by the outside nested successively cylindrical cavity of ring-shaped continuous separately in center, be that fluid injection chamber, gas-liquid mixture reclaim cushion chamber, gas injection pressure cushion chamber, gas-liquid mixture recovery cushion chamber and gas injection pressure cushion chamber successively, five difference are connected with extraneous water and air supply system by the corresponding interface of submergence unit external pipeline connector vertically upward;
3) submergence cell operation face:
This part provides five interface channels that cushion cavity and silicon chip upper surface work space in the submergence unit cavity:
The first, the injecting hole array is along the circumferential direction arranged, and the direction in hole is perpendicular to submergence cell operation face, and the injecting hole array upwards communicates with the gas injection pressure cushion chamber;
The second, the injecting hole array is along the circumferential direction arranged, and the direction in hole is perpendicular to submergence cell operation face, and the injecting hole array upwards communicates with the gas injection pressure cushion chamber;
The 3rd, the ring-like succeeding vat at porous medium place upwards reclaims cushion chamber with gas-liquid mixture and communicates;
The 4th, the ring-like succeeding vat at porous medium place upwards reclaims cushion chamber with gas-liquid mixture and communicates.
Described submergence unit external pipeline connector, submergence unit cavity, submergence cell operation face, the faying face between three partial component is the plane, connected mode adopts bonding or bolted.
The beneficial effect that the utlity model has is:
(1) adopts dual gas curtain sealing and dual porous medium way of recycling, sealing gas injects and the gas-liquid mixed reclaim line all has buffering and equal laminated structure, obtain the mobile pressure reduction uniform airflow curtain of stablizing on the gap flow field border, stoped leak of liquid in stepping and the swash width, in the liquids recovery part, effective working area of increase has reduced the delay liquid of silicon chip surface simultaneously.Can form the gap flow field sealing gas curtain of stable homogeneous at silicon chip surface, have stronger anti-source of the gas to supply with the pulsation ability simultaneously.Sealing gas curtain thickness is little, and the source of the gas power input is little, the efficient height, and the overall back pressure of silicon chip reduces.
(2) can reclaim the immersion liquid of injection effectively, reduce the liquid holdup in stepping and scanning motion stroke, for the tolerances height of speed and acceleration.
(3) device no-movable part, number of parts is few, and the dismounting wearing and tearing are little, and installation accuracy guarantees easily.
Description of drawings
Fig. 1 rough schematic view that to be the utility model assemble mutually with projection lens set;
Fig. 2 is a blast cross section view of the present utility model;
Fig. 3 is the upward view on submergence cell operation of the present utility model surface;
The P1-P1 cross section view of the submergence unit cavity that Fig. 4 is;
Fig. 5 is the local amplification profile view that the utility model characterizes individual layer sealing control loop;
Fig. 6 is the local amplification profile view that the utility model characterizes high pressure isolating seal band.
Among the figure: 1, projection lens set, 2, seal control device, 2A, submergence cell operation face, 2B, submergence unit cavity, 2C, submergence unit external pipeline connector, 3, silicon chip, 4A, porous medium, 4B, porous medium, 5A, gas injection pressure cushion chamber, 5B, gas injection pressure cushion chamber, 6A, gas-liquid mixture reclaim cushion chamber, and 6B, gas-liquid mixture reclaim cushion chamber, 7, groove, 8A, injecting hole array, 8B, injecting hole array, 9, fluid injection chamber, 10, gap flow field.
Embodiment
Describe embodiment of the present utility model in detail below in conjunction with drawings and Examples.
Fig. 1 has schematically shown the seal control device of the utility model embodiment and the assembling of projection lens set, and this device can be used in substep repetition or step-scan formula lithographic equipment.In exposure process, the light (as KrF or argon fluoride excimer laser) that sends from light source (not providing the figure) is by slot field between mask (not providing among the figure), the projection lens set 1 of aiming at and lens-silicon chip of being full of immersion liquid, and the photoresist on silicon chip 3 surfaces is exposed.Submergence unit external pipeline connector 2C, submergence unit cavity 2B, submergence cell operation face 2A, the faying face between three partial component is the plane, connected mode adopts bonding or bolted according to concrete working condition requirement.
Fig. 1, Fig. 2, shown in Figure 3, the immersion liquid unit is made up of submergence cell operation face 2A, submergence unit cavity 2B, submergence unit external pipeline connector 2C three parts.Immersion liquid is entered by fluid injection chamber 9 and is full of gap flow field 10 between lens combination 1 and the silicon chip 3, pass through the recovery of two-layer porous medium 4A and 4B on the way, gas curtain that the two-layer injecting hole array 8A of circumference closure and 8B form is arranged simultaneously as hermetic seal, guaranteed to reclaim effectively immersion liquid, reduced residually, strengthened the adaptability of motion state.
Fig. 4, shown in Figure 5, gases at high pressure from the source of the gas pipeline can be through continuous gas injection pressure cushion chamber 5A, the 5B of circumference before injecting hole array 8A, 8B, the pipeline circuit positions is between immersion liquid unit gas source inlet 2C and injecting hole array 8A, the 8B, and at the distribute frame mode of annular sealed air chamber of immersion liquid unit circumferencial direction.Gas injection pressure cushion chamber 5A, 5B can balanced in a circumferential direction high pressure gas field pressure when suppressing the source of the gas pulsation, make injecting hole array 8A, 8B obtain more consistent initial injection pressure.The gas that injecting hole array 8A, 8B blow out forms gas curtain and in the shunting of silicon chip 3 near surfaces, wherein a part is reclaimed by porous medium 4A, 4B.Immersion liquid in the gap flow field 10 part entering before recycling cavity 6A, the 6B, will be passed through porous medium 4A, 4B zone from the sealing gas of gas curtain shunting earlier.Closely be parallel to closed porous medium 4A, the 4B that distributes of injecting hole array 8A, 8B and circumference in a circumferential direction, reduced the numerical aperture of reclaim line effectively, suppressed bubble in the removal process and break to wait and destroy gap flow field 10 stable concussions and originate.The suitable increase of the size of the radial direction of porous medium 4A, 4B distributed areas can increase the tolerances of seal control device 2 for speed in stepping and the scanning process and acceleration effectively.
Gas curtain shown in Figure 6, that injecting hole array 8A, 8B form, on the circumferencial direction of the radii fixus of immersion liquid cell operation face 2A, a large amount of little radius through holes that distribute (such as, aperture 0.5mm, pitch-row 1.5mm).Gases at high pressure blow to silicon chip surface through the air passing hole array, form the hermetic seal curtain of circumference closure.Between the porous medium 4A recovery zone of hermetic seal perform region of endothecium structure (injecting hole array 8B) and layer structure, having an xsect is the groove 7 of trapezoidal circle distribution, under the duty, the hermetic seal meeting forms the high pressure isolation strip in this groove 7, further prevent the leakage of liquid.Adopt dual injecting hole array 8A, 8B formation gas curtain sealing and dual porous medium 4A, 4B way of recycling, sealing gas injection and gas-liquid mixed reclaim line have buffering and the equal laminated structure of gas injection pressure cushion chamber 5A, 5B and gas-liquid mixture recovery cushion chamber 6A, 6B respectively, obtain the mobile pressure reduction uniform airflow curtain of stablizing on gap flow field 10 borders, stoped leak of liquid in stepping and the swash width, in the liquids recovery part, effective working area that porous medium 4A, 4B increase has reduced the delay liquid of silicon chip surface simultaneously.Described porous medium 4A, 4B recovery zone, in a circumferential direction closely (such as 2mm) is parallel to injecting hole array and closed porous medium 4A, the 4B that distributes of circumference, its pipeline circuit positions is in gap flow field 10 and reclaims between cushion chamber 6A, the 6B, has the size (such as 8mm) of the radial direction of suitable porous medium 4A, 4B distributed areas.Described gas-liquid mixture reclaims cushion chamber 6A, 6B, and the pipeline circuit positions is between submergence unit external pipeline connector 2C and the gap flow field 10, and at the distribute frame mode of annular sealed air chamber of immersion liquid unit circumferencial direction.
In sum, the utility model is different from the air seal control structure of existing liquid flow field in the document, the seal control device that provides the liquid-liquid in a kind of immersion lithography system to supply with and reclaim.Adopt dual gas curtain sealing and dual porous medium way of recycling, sealing gas injects and the gas-liquid mixed reclaim line all has buffering and equal laminated structure, obtain the mobile pressure reduction uniform airflow curtain of stablizing on the gap flow field border, stoped leak of liquid in stepping and the swash width, in the liquids recovery part, effective working area of increase has reduced the delay liquid of silicon chip surface simultaneously.
Claims (2)
1. the seal control device supplying with and reclaim of the liquid in the immersion lithographic system, be that the seal control device that liquid is supplied with and reclaimed is housed between projection lens set (1) in immersion lithography system and the silicon chip to be exposed (3), it is characterized in that: the seal control device (2) that described liquid is supplied with and reclaimed, form by submergence unit external pipeline connector (2C), submergence unit cavity (2B) and submergence cell operation face (2A); Wherein:
1) submergence unit external pipeline connector (2C):
Having provides gas injection pressure cushion chamber (5A, 5B), and gas-liquid mixture reclaims cushion chamber (6A, 6B), and fluid injection chamber (9) are the interface channel pipeline externally;
2) submergence unit cavity (2B):
This part by five by the outside nested successively cylindrical cavity of ring-shaped continuous separately in center, be that fluid injection chamber (9), gas-liquid mixture reclaim cushion chamber (6B), gas injection pressure cushion chamber (5B), gas-liquid mixture recovery cushion chamber (6A) and gas injection pressure cushion chamber (5A) successively, five difference are connected with extraneous water and air supply system by the corresponding interface of submergence unit external pipeline connector (2C) vertically upward;
3) submergence cell operation face (2A):
This part provides five interface channels that cushion cavity and silicon chip (3) upper surface work space in the submergence unit cavity (2B):
The first, injecting hole array (8A) is along the circumferential direction arranged, and the direction in hole is perpendicular to submergence cell operation face (2A), and injecting hole array (8A) upwards communicates with gas injection pressure cushion chamber (5A);
The second, injecting hole array (8B) is along the circumferential direction arranged, and the direction in hole is perpendicular to submergence cell operation face (2A), and injecting hole array (8B) upwards communicates with gas injection pressure cushion chamber (5B);
The 3rd, the ring-like succeeding vat at porous medium (4A) place upwards reclaims cushion chamber (6A) with gas-liquid mixture and communicates;
The 4th, the ring-like succeeding vat at porous medium (4B) place upwards reclaims cushion chamber (6B) with gas-liquid mixture and communicates.
2. the seal control device that the liquid in a kind of immersion lithographic system according to claim 1 is supplied with and reclaimed, it is characterized in that: described submergence unit external pipeline connector (2C), submergence unit cavity (2B), submergence cell operation face (2A), faying face between three partial component is the plane, and connected mode adopts bonding or bolted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200720107284XU CN201017176Y (en) | 2007-03-15 | 2007-03-15 | Liquid supplying and recycling seal control device in immersed photolithography system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU200720107284XU CN201017176Y (en) | 2007-03-15 | 2007-03-15 | Liquid supplying and recycling seal control device in immersed photolithography system |
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| Publication Number | Publication Date |
|---|---|
| CN201017176Y true CN201017176Y (en) | 2008-02-06 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU200720107284XU Expired - Fee Related CN201017176Y (en) | 2007-03-15 | 2007-03-15 | Liquid supplying and recycling seal control device in immersed photolithography system |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100462848C (en) * | 2007-03-15 | 2009-02-18 | 浙江大学 | Liquid supply and recovery seal controller in immersion type photoetching system |
| CN102024675B (en) * | 2009-11-20 | 2012-09-05 | 沈阳芯源微电子设备有限公司 | System for discharging and recovering multiple chemicals according to classification |
| CN105045046A (en) * | 2015-08-03 | 2015-11-11 | 浙江大学 | Air-tight sealing and horizontal and vertical liquid injection and recovery device for immersion lithography machine |
| CN112255135A (en) * | 2020-09-30 | 2021-01-22 | 华中科技大学 | Device and method for testing liquid film evaporation power |
-
2007
- 2007-03-15 CN CNU200720107284XU patent/CN201017176Y/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100462848C (en) * | 2007-03-15 | 2009-02-18 | 浙江大学 | Liquid supply and recovery seal controller in immersion type photoetching system |
| CN102024675B (en) * | 2009-11-20 | 2012-09-05 | 沈阳芯源微电子设备有限公司 | System for discharging and recovering multiple chemicals according to classification |
| CN105045046A (en) * | 2015-08-03 | 2015-11-11 | 浙江大学 | Air-tight sealing and horizontal and vertical liquid injection and recovery device for immersion lithography machine |
| CN105045046B (en) * | 2015-08-03 | 2017-03-29 | 浙江大学 | A kind of hermetic seal and horizontal and vertical fluid injection retracting device for immersed photoetching machine |
| CN112255135A (en) * | 2020-09-30 | 2021-01-22 | 华中科技大学 | Device and method for testing liquid film evaporation power |
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| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| COR | Change of bibliographic data |
Free format text: CORRECT: CO-PATENTEE TO: SHANGHAI MICROELECTRONIC EQUIPMENT CO., LTD. ^ |
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| CU01 | Correction of utility model patent |
Correction item: Co-patentee Correct: Shanghai microelectronic equipment Co., Ltd. Number: 06 Page: The title page Volume: 24 |
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| CU03 | Correction of utility model patent gazette |
Correction item: Co-patentee Correct: Shanghai microelectronic equipment Co., Ltd. Number: 06 Volume: 24 |
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| ERR | Gazette correction |
Free format text: CORRECT: CO-PATENTEE; FROM: NONE ^ TO: SHANGHAI MICROELECTRONIC EQUIPMENT CO., LTD. ^ |
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| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080206 Termination date: 20100315 |