CN101634811B - Flexible seal and self-adaption recycling device for immersed photoetching machine - Google Patents
Flexible seal and self-adaption recycling device for immersed photoetching machine Download PDFInfo
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- CN101634811B CN101634811B CN2009101019470A CN200910101947A CN101634811B CN 101634811 B CN101634811 B CN 101634811B CN 2009101019470 A CN2009101019470 A CN 2009101019470A CN 200910101947 A CN200910101947 A CN 200910101947A CN 101634811 B CN101634811 B CN 101634811B
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Abstract
The invention discloses a flexible seal and self-adaption recycling device for an immersed photoetching machine. The device is placed between a projecting lens group and a silicon wafer, comprises an injected liquid recycling component and a following disk piece and is used for restraining the boundary of an immersed liquid flow field. When liquid generates impact on the following disk piece due to the high-speed motion of the silicon wafer, the following disk piece can generate a certain offset along the direction of motion, thereby relieving the pressure of the boundary of the flow field and increasing the quantity of recycling openings to accelerate recycling; conversely, when the high-speed motion of the silicon wafer leads the pressure at one side of the flow field to be reduced, the flexible seal disk piece at the side can generate a certain offset along the direction of motion to carry out pressure compensation and reduce the quantity of the recycling openings and the liquid recycling amount at the same side. The self-adaption recycling of the liquid can be realized by adaptively the contact quantity of the recycling openings and the flow field, the recycling efficiency is effectively improved, and the vibration and the noise brought by recycling are reduced.
Description
Technical field
The present invention relates to the flow field sealing in liquid immersion lithography (Immersion Lithography) system and reclaims the device of control, particularly relates to a kind of flexible sealing and self-adaption recycling device that is used for immersed photoetching machine.
Background technology
Modern lithographic equipment is based on optical lithography, and it utilizes optical system accurately projection and exposing to the silicon chip that was coated with photoresist of the figure on the mask.It comprises a LASER Light Source, an optical system, projection mask version, an alignment system and a silicon chip that scribbles photosensitive photoresist of being made up of graphics chip.
Fill certain liquid in the slit of immersion lithographic system between projecting lens and silicon chip, improve the numerical aperture (NA) of projecting lens, thereby improve the resolution and the depth of focus of photoetching by the refractive index that improves this slit medium.The at present normal scheme that adopts is that liquid is limited in the regional area between the end component of silicon chip top and projection arrangement.In stepping-scan-type lithographic equipment, silicon chip is in the scanning motion of carrying out of exposure process high speed, and this high-speed motion will promptly can cause leak of liquid to filling liquid band gap crack.The liquid that leaks will form the water mark at photoresist or Topcoat surface, have a strong impact on the exposure quality.Therefore, the sealing problem of necessary emphasis solution filling liquid in the immersion lithography.
The hermetically-sealed construction of this scheme generally adopts hermetic seal or liquid sealing member around the gap flow field between projection lens set end component and the silicon chip at present.Between the surface of described containment member and silicon chip, the hermetic seal technology is (for example referring to Chinese patent 200310120944.4, U.S. Pat 10/705816) by applying gases at high pressure, liquid is limited in certain flow field regions forming air curtain around filling the flow field periphery.Liquid sealing technology (for example referring to Chinese patent 200410055065.2, U.S. Pat 60/742885) is then utilized and the immiscible third party's liquid (normally magnetic fluid or mercury etc.) of fill fluid, seals around filling the flow field.
These sealings and liquids recovery element come with some shortcomings:
(1) existing hermetic adopts air curtain to be applied to around the fill fluid, causes the instability at edge, flow field, in stepping of substrate high speed and scanning process, may cause leak of liquid and sealing gas to entrainment in the flow field; Simultaneously, filling liquid and sealing gas will form biphase gas and liquid flow when reclaiming, and cause vibration thus, influence the exposure system steady operation.
(2) the liquid sealing mode has very harsh requirement to seal fluid, when guaranteeing that sealing property requires, also must guarantee seal fluid and dissolving mutually of filling liquid, and photoresist (or Topcoat) and not counterdiffusion mutually of filling liquid.In substrate high-speed motion process, in a single day outside air or seal fluid are involved in or dissolve or be diffused in the filling liquid, all can produce negative influence to the exposure quality.
(3) owing to adopt malleation feed flow, negative pressure to reclaim, the two pressure is difficult for coordinating, and easily causes the fluid field pressure fluctuation to make member produce vibration.
(4) under the silicon chip high-speed motion state, because the effect of molcohesion, the liquid of close silicon chip will move with silicon chip, and cause the flow field border motif to change rapidly thus; This variation is all different in the different boundary position, and the sealing means of all calming the anger that adopts can't carry out adaptive equalization in the stream field border usually.
Summary of the invention
The purpose of this invention is to provide a kind of flexible sealing and self-adaption recycling device that is used for immersed photoetching machine.
For achieving the above object, the technical solution used in the present invention is as follows:
Present invention resides in the liquid flexible sealing and the self-adaption recycling device that are provided with between projection lens set and the substrate.Described liquid flexible sealing and self-adaption recycling device comprise submergence unit upper end cover, submergence unit cavity, submergence cell operation head and at least a slice follower disk sheet form; Wherein:
1) submergence unit upper end cover:
Having provides fluid injection chamber, recycling cavity, first, second gas injection pressure cushion chamber external separately interface channel pipeline;
2) submergence unit cavity:
Outwards have mutual disconnected cavity successively by center pit, first, second gas injection pressure cushion chamber that promptly has step-like fluid injection chamber, recycling cavity and distribute alternately, four cavitys are connected with extraneous water and air supply system by the respective channel of submergence unit upper end cover respectively vertically upward;
3) submergence cell operation head:
The interface channel and the liquids recovery passage of fluid injection chamber in the submergence unit cavity, recycling cavity and four cavitys of first, second gas injection pressure cushion chamber and substrate top surface work space are provided;
Outwards have mutual non-intercommunicating pore array channel successively by center pit, be respectively to have and the corresponding liquid injection hole array of fluid injection chamber number, the accumulator tank of annular, with the intilted recovery holes array of the corresponding upper surface of recycling cavity area, be connected with accumulator tank by the interior recovery approach that leads to the submergence cell operation head outside, distribute alternately with the corresponding second injecting hole array of the second gas injection pressure cushion chamber, with the first gas injection pressure cushion chamber corresponding first and the 3rd injecting hole array, a submergence cell operation lower surface radially have the rolling guide mounting groove with the annular gathering sill in the first vertical servo-actuated disc outside that is connected with the 3rd injecting hole array;
The first, form the liquid injection hole array by even distribution through hole on same radius, the hole is perpendicular to submergence cell operation face, and liquid injection hole array top communicates with the fluid injection chamber;
The second, form the recovery holes array by even distribution through hole on different radii, the hole is perpendicular to submergence cell operation face, and the upper surface of recovery holes array tilts from outside to inside and carries out hydrophobic and handle, and communicates with the fluid injection chamber;
The 3rd, liquid recovery is the annular succeeding vat that is distributed between the inboard liquid injection hole array of the recovery holes array outside, has recovery approach to link to each other with accumulator tank all around, and the accumulator tank edge is lower than the inside edge of recovery holes array upper surface;
The 4th, form the first, the 3rd injecting hole array by even distribution through hole on different radii,
4) servo-actuated disc:
Be annular lamina, upper surface is the plane, and the lower surface that carried out the hydrophobic processing is outwards downward-sloping, and outward flange curves inwardly, and the outward flange outside links to each other with submergence cell operation head by the rolling guide that is installed in the rolling guide mounting groove horizontal by 135 °.
But described servo-actuated disc and the relative motion of submergence cell operation head, the number of servo-actuated disc is relevant with substrate scanning pattern and speed, and the number of the described second gas injection pressure cushion chamber and distribution are relevant with the number and the partitioning boundary of servo-actuated disc.
Described submergence unit upper end cover, submergence unit cavity, submergence cell operation head, the faying face between three partial component is the plane, adopts and coheres or the bolted connection; The servo-actuated disc links to each other with submergence cell operation head by the rolling guide that is installed in the rolling guide mounting groove.
The beneficial effect that the present invention has is:
(1) the inner kapillary withdrawal liquid that adopts of recovery end, its arrangement mode from the inside to the outside forms an annulus, and the upper surface of servo-actuated disc withstands on recovery holes array lower surface, when the flow field local pressure becomes big, increasing recovery holes touches the flow field and reclaims when slowly outwards promoting the servo-actuated disc, so just reduced internal pressure again, the servo-actuated disc is because displacement to the inside takes place in outside gas effect, the recovery holes that touches the flow field reduces, liquid increases again in the flow field, and pressure becomes again greatly, again the servo-actuated disc is pushed away outward, thereby form a mobile equilibrium, can control the flow field internal pressure by the size of regulating outside gaseous tension.
(2) because the border in flow field is that the border contacts with rigid objects by two servo-actuated disc controls, so the flow field borderline phase is very stable for the border, flow field that hermetic seal produces.On the other hand,, reduced and the contacting of gas, therefore can effectively reduce entrainmenting of interface bubble and carry under one's arms because the liquid major part surrounded by the servo-actuated disc.
(3) in substrate high-velocity scanning process, the inhomogeneous attitude of fluid field pressure causes the regional area hypertonia, and at this moment the servo-actuated disc can enlarge this regional volume, forms the buffering of pressure, suppresses the local pressure sudden change.Substrate be tending towards or the process that remains static in, the displacement that the servo-actuated disc takes place will reduce this regional volume.Being equivalent to the border is a relative free surface, and higher causing of liquid injection port pressure can not occur can't fluid injection, and can not occur because the excessive situation that causes liquid to be extruded from the slit of terminal pressure.
(4) in removal process, when the border, flow field did not cover whole recovery hole array, gas will enter recycling cavity by instead of part liquid, has reduced organic efficiency.Recovery holes is covered by liquid or servo-actuated disc always in this self-adaptation way of recycling, can not be exposed in the air, when effectively improving organic efficiency, has reduced vibration and noise.
(5) recovery holes array upper surface slopes inwardly and carries out hydrophobic and handle, and helps withdrawal liquid and converges in the liquid recovery, and can not gather too much liquid in the recovery holes upper end, effectively reduces mechanical vibration.The liquids recovery channel arrangement helps liquid and flows out the submergence unit naturally and reclaim below recovery holes array upper surface, make that reclaiming control becomes simple.
Description of drawings
Fig. 1 rough schematic view that to be the present invention assemble mutually with projection lens set.
Fig. 2 is a blast cross section view of the present invention.
Fig. 3 is a submergence cell operation top view of the present invention.
Fig. 4 is the axis side view that waits of submergence unit cavity.
Fig. 5 is the local amplification profile view that the present invention characterizes flexible sealing control.
Fig. 6 is that the present invention characterizes the local amplification profile view that reclaims control.
Among the figure: 1, projection lens set, 2, liquid flexible sealing and self-adaption recycling device, 2A, the servo-actuated disc, 2B, the servo-actuated disc, 2C, submergence cell operation head, 2D, submergence unit cavity, 2E, submergence unit upper end cover, 3, substrate, 4A, rolling guide, 4B, rolling guide, 5A, the fluid injection chamber, 5B, the liquid injection hole array, 6A, recycling cavity, 6B, the recovery holes array, 7A, the first gas injection pressure cushion chamber, 7B, the first injecting hole array, 7C, the 3rd injecting hole array, 8A, the second gas injection pressure cushion chamber, 8B, the second injecting hole array, 9, gathering sill, 10, accumulator tank, 11, recovery approach, 12, gap flow field, 13, the rolling guide mounting groove.
Embodiment
Describe specific implementation process of the present invention in detail below in conjunction with drawings and Examples.
As Fig. 1-shown in Figure 6, present invention resides in the liquid flexible sealing and the self-adaption recycling device 2 that are provided with between projection lens set 1 and the substrate 3.Described liquid flexible sealing and self-adaption recycling device comprise submergence unit upper end cover 2E, submergence unit cavity 2D, a submergence cell operation 2C and at least a slice follower disk sheet form; Wherein:
1) submergence unit upper end cover 2E:
Having provides fluid injection chamber 5A, recycling cavity 6A, first, second gas injection pressure cushion chamber 7A, 8A external separately interface channel pipeline;
2) submergence unit cavity 2D:
Outwards have mutual disconnected cavity successively by center pit, first, second gas injection pressure cushion chamber 7A, the 8A that promptly have step-like fluid injection chamber 5A, recycling cavity 6A and distribute alternately, four cavitys are connected with extraneous water and air supply system by the respective channel of submergence unit upper end cover 2E respectively vertically upward;
3) a submergence cell operation 2C:
Interface channel and the liquids recovery passage of fluid injection chamber 5A, recycling cavity 6A and first, second gas injection pressure cushion chamber 7A, four cavitys of 8A and substrate top surface work space among the submergence unit cavity 2D are provided;
Outwards have mutual non-intercommunicating pore array channel successively by center pit, be respectively to have and the corresponding liquid injection hole array of fluid injection chamber 5A number 5B, the accumulator tank 10 of annular, with the intilted recovery holes array of the corresponding upper surface of recycling cavity 6A area 6B, be connected with accumulator tank 10 by the interior recovery approach 11 that leads to submergence cell operation the 2C outside, distribute alternately with the corresponding second injecting hole array 8B of the second gas injection pressure cushion chamber 8A, with the first gas injection pressure cushion chamber 7A corresponding first and the 3rd injecting hole array 7B, 7C, a submergence cell operation 2C lower surface radially have rolling guide mounting groove 13 and with the first and the 3rd injecting hole array 7B, the annular gathering sill 9 in the vertical servo-actuated disc outside that 7C is connected;
The first, form liquid injection hole array 5B by even distribution through hole on same radius, the hole is perpendicular to submergence cell operation face, and liquid injection hole array 5B top communicates with fluid injection chamber 5A;
The second, form recovery holes array 6B by even distribution through hole on different radii, the hole is perpendicular to submergence cell operation face, and the upper surface of recovery holes array 6B tilts from outside to inside and carries out hydrophobic and handle, and 6A communicates with the fluid injection chamber;
The 3rd, liquid recovery 10 is the annular succeeding vats that are distributed between the inboard liquid injection hole array of the recovery holes array outside, has recovery approach 11 to link to each other with accumulator tank 10 all around, and accumulator tank 10 edges are lower than the inside edge of recovery holes array 6B upper surface;
The 4th, form the first, the 3rd injecting hole array 7B, 7C by even distribution through hole on different radii, the direction in hole is perpendicular to submergence cell operation face, injecting hole array 8B lower surface communicates with gathering sill 9, this gathering sill 9 is 45 with submergence cell operation face, and injecting hole array 7B, 7C upper surface communicate with the first gas injection pressure cushion chamber 7A;
The 5th, form the second injecting hole array 8B by even distribution through hole on different radii, the direction in hole is perpendicular to submergence cell operation face, injecting hole array 8B lower surface communicates with gathering sill 9, this gathering sill 9 is 45 with submergence cell operation face, and injecting hole array 8B upper surface communicates with the second gas injection pressure cushion chamber 8A;
4) servo-actuated disc:
Be annular lamina, upper surface is the plane, and the lower surface that carried out the hydrophobic processing is outwards downward-sloping, and outward flange curves inwardly, the outward flange outside links to each other with a submergence cell operation 2C by the rolling guide that is installed in the rolling guide mounting groove 13 horizontal by 135 °.
But described servo-actuated disc and the relative motion of submergence cell operation head, its number is relevant with substrate scanning pattern and speed, and the number of the described second gas injection pressure cushion chamber 8A and distribution are relevant with the number and the partitioning boundary of servo-actuated disc.
Described submergence unit upper end cover 2E, submergence unit cavity 2D, a submergence cell operation 2C, the faying face between three partial component is the plane, adopts and coheres or the bolted connection; The servo-actuated disc links to each other with a submergence cell operation 2C by the rolling guide that is installed in the rolling guide mounting groove 13.Servo-actuated disc and rolling guide quantity can suitably increase according to the operating mode needs, and the servo-actuated disc is one to be a special case of the present invention when surrounding gap flow field whole.Adopt two servo-actuated discs reasonable effect all to be arranged generally speaking for static and one-dimensional high-speed scanning process;
Fig. 1 has schematically shown the liquid flexible sealing of embodiment of the present invention and the assembling of self-adaption recycling device 2 and projection lens set 1, and this device can used in substep repetition or step-scan formula lithographic equipment.In exposure process, the light (as KrF or argon fluoride excimer laser) that sends from light source (not providing the figure) is by slot field 12 between mask (not providing among the figure), the projection lens set 1 of aiming at and lens-substrate of being full of immersion liquid, and the photoresist on substrate 3 surfaces is exposed.Submergence unit upper end cover 2E, submergence unit cavity 2D, a submergence cell operation 2C, the faying face between three partial component is the plane, connected mode adopts bonding or bolted according to concrete working condition requirement.Be connected by rolling guide 4A, 4B between servo-actuated disc 2A, 2B and the submergence cell operation 2C, the type of drive of servo-actuated disc 2A, 2B according to concrete working condition requirement adopt spring or serial cylinders etc. all can, adopt gas-powered in the present embodiment.
Fig. 1, Fig. 2, shown in Figure 3, the submergence unit is made up of servo-actuated disc 2A, 2B, a submergence cell operation 2C, submergence unit cavity 2D and submergence unit upper end cover 2E four parts.Immersion liquid by fluid injection chamber 5A, 5B enters and be full of lens combination 1 and substrate 3 between gap flow field 12, the recovery holes array 6B through forming by kapillary on the way, inflow is lower than the accumulator tank 10 of recovery holes array 6B upper surface, and recovery approach 11 reclaims.Gas sprays from the first, the 3rd injecting hole array 7B, 7C by the first gas injection pressure cushion chamber 7A simultaneously, promote servo-actuated disc 2A, 2B moves to the submergence unit center along rolling guide 4A, 4B along gathering sill 9 from outside gas injection, thereby gap flow field 12 is included in two servo-actuated disc 2A, 2B, played sealing effectiveness.
Fig. 3, shown in Figure 4, gases at high pressure from the source of the gas pipeline can be through the first continuous gas injection pressure cushion chamber 7A of circumference before passing through the first, the 3rd injecting hole array 7B, 7C, the first gas injection pressure cushion chamber 7A is when suppressing the source of the gas pulsation, can balanced in a circumferential direction high pressure gas field pressure, make win, the 3rd injecting hole array 7B, 7C obtain more consistent initial injection pressure.The first, the gas that blows out of the 3rd injecting hole array 7B, 7C makes servo-actuated disc 2A, 2B be subjected to pointing to the power of submergence unit center by being 45 ° the vertical edges that act on servo-actuated disc 2A, 2B, gathering sill 9 backs with horizontal direction.Another strand suppressed the source of the gas pulsation from the gases at high pressure of source of the gas pipeline after by the second gas injection pressure cushion chamber 8A, and making the second injecting hole array 8B obtain more consistent gas injection pressure, the gas that blows out from the second injecting hole array 8B is equally also through being 45 ° gathering sill 9 with horizontal direction.The second injecting hole array 8B distribution diametrically is more than the first, the 3rd injecting hole array 7B, 7C, and gathering sill 9 all has the gathering sill of increasing quantity on the position corresponding with the second injecting hole array 8B.Prevent that liquid from flowing out from both sides because the gas that blows out is mainly used in after servo-actuated disc 2A, 2B are strutted owing to fluid field pressure is too high from the second injecting hole array 8B, so the pressure of gas injection is also relatively large.In addition, the gas that blows out in the outside gathering sill 9 can reduce the liquid of substrate 3 surface detentions.
Shown in Figure 5, liquid enters into from liquid injection hole array 5B in the lower surface and the slit between the substrate 3 of a submergence cell operation 2C, fills the bottom of full projection lens set 1 and the gap between the substrate 3, forms gap flow field 12.Gap flow field 12 constantly expands outwardly, and when the border, flow field contacted with recovery holes array 6B, liquid was constantly sucked in the submergence unit from the inboard beginning of recovery holes array 6B.Because the recovery holes quantity that contact with gap flow field 12 is fewer, for the injection rate IR of gap flow field 12 the liquid yield greater than liquid, gap flow field 12 still maintenance expands outwardly trend.The border of gap flow field 12 contacts with servo-actuated disc 2A, 2B, servo-actuated disc 2A, 2B have been given an outside power in the horizontal direction, by regulating pressure in the recycling cavity 6A to increase yield, and act on the acting force on servo-actuated disc 2A, the 2B from the first, the 3rd injecting hole array 7B, 7C blow gas by regulating, can make the flow field be in a kind of mobile equilibrium.Handle through hydrophobic because servo-actuated disc 2A, 2B are inboard, though have the slit between substrate 3 and servo-actuated disc 2A, the 2B, because the surface tension effects of liquid, under pressure is not very big situation, the border, flow field can keep certain camber line, can not leak.When substrate 3 carries out the high-velocity scanning process along direction shown in the arrow, can be with a part of liquid in the gap flow field 12 along the arrow high-speed motion, because servo-actuated disc 2A, 2B have inhibition in flow field direction of motion.If servo-actuated disc 2A, 2B maintain static, will certainly produce partial high pressure in a side so, opposite side produces local depression, and too high speed of related movement and pressure will tear the border, flow field, and it is broken, and make liquid flow out from the slit.And in the present invention,, the high-velocity scanning campaign of substrate 3 is had certain buffer action because servo-actuated disc 2A, 2B can have certain relative motion along rolling guide 4A, 4B on the direction of motion of substrate 3, make the flow field local pressure be unlikely to too high.When the high-velocity scanning campaign of silicon chip 3 finished, servo-actuated disc 2A, 2B were returned to the flow field submergence unit center again owing to the effect of gathering sill blow gas, thereby had realized the flow field sealing in the silicon chip high-velocity scanning process.
Fig. 5, shown in Figure 6, as previously mentioned, when substrate 3 in the high-velocity scanning process, a wall pressure can occur and uprise, a wall pressure step-down, the thing followed is that a side liquid increases, a side liquid reduces.Liquid increases a side and will occur leaking as not strengthening yield, and liquid reduces by a side will make this side liquid still less as not reducing yield, even sucks air.In the present invention, servo-actuated disc 2A, 2B upper surface directly contact the size of may command yield with recovery holes array 6B.Substrate 3 can make a side servo-actuated disc outwards move when direction is moved as shown, and more recovery holes contacts with gap flow field 12, the yield increase; Opposite side servo-actuated disc inwardly moves, and the recovery holes quantity that contacts with gap flow field 12 reduces, and yield has reduced.Because the upper surface of recovery holes array 6B slopes inwardly, and has carried out the hydrophobic processing, can come down in torrents to the inside during the upper end of the liquid arrival recovery holes of recovery, enter accumulator tank 10, finally flow out the submergence unit by recovery approach 11.What are relevant for liquid in the inlet pressure of recovery approach 11 and the accumulator tank, thereby the flow in the adaptive adjusting recovery approach 11 has been realized the self-adaptation under the silicon chip high-velocity scanning situation is reclaimed.This in addition structure has realized the separation of gas-liquid two-phase effectively, has reduced the vibration and the noise that duck in drink and break and bring owing to gas.
In sum, the present invention is different from the air seal control structure and the hydraulic seal control structure of existing liquid flow field in the document, and a kind of flexible sealing and self-adaptation recovery control device that is used for immersed photoetching machine is provided.By by the relative motion between servo-actuated disc 2A, 2B and the submergence unit, cushioned the influence that the instantaneous high-velocity scanning stream field of silicon chip brings effectively.Servo-actuated disc 2A, the 2B adaptive quantity that contacts that increases or reduce recovery holes and gap flow field in the high-velocity scanning process is carried out self-adaptation and is reclaimed, recovery holes array 6B upper surface slopes inwardly and makes liquid because action of gravity flows into accumulator tank 10, what are relevant for liquid in the inlet pressure of recovery approach 11 and the accumulator tank, thus the flow in the adaptive adjusting recovery approach 11.
Claims (3)
1. a flexible sealing and a self-adaption recycling device that is used for immersed photoetching machine is included in the liquid flexible sealing and the self-adaption recycling device (2) that are provided with between projection lens set (1) and the substrate (3); It is characterized in that: described liquid flexible sealing and self-adaption recycling device comprise submergence unit upper end cover (2E), submergence unit cavity (2D), submergence cell operation head (2C) and at least a slice follower disk sheet form; Wherein:
1) submergence unit upper end cover (2E):
Having provides fluid injection chamber (5A), recycling cavity (6A), first, second gas injection pressure cushion chamber (7A, 8A) external separately interface channel pipeline;
2) submergence unit cavity (2D):
Outwards have mutual disconnected cavity successively by center pit, first, second gas injection pressure cushion chamber (7A, 8A) that promptly has step-like fluid injection chamber (5A), recycling cavity (6A) and distribute alternately, four cavitys are connected with extraneous water and air supply system by the respective channel of submergence unit upper end cover (2E) respectively vertically upward;
3) submergence cell operation head (2C):
The interface channel and the liquids recovery passage of fluid injection chamber (5A), recycling cavity (6A) and four cavitys of first, second gas injection pressure cushion chamber (7A, 8A) and substrate top surface work space in the submergence unit cavity (2D) are provided;
Outwards have mutual non-intercommunicating pore array channel successively by center pit, be respectively to have and fluid injection chamber (5A) the corresponding liquid injection hole array of number (5B), the accumulator tank (10) of annular, with recycling cavity (6A) the area intilted recovery holes array of corresponding upper surface (6B), be connected with accumulator tank (10) by the interior recovery approach (11) that leads to submergence cell operation head (2C) outside, distribute alternately with the corresponding second injecting hole array (8B) of the second gas injection pressure cushion chamber (8A), with the first gas injection pressure cushion chamber (7A) corresponding first and the 3rd injecting hole array (7B, 7C), submergence cell operation head (2C) lower surface radially have rolling guide mounting groove (13) and with the first and the 3rd injecting hole array (7B, the annular gathering sill (9) in the vertical servo-actuated disc outside that 7C) is connected;
The first, form liquid injection hole array (5B) by even distribution through hole on same radius, the hole is perpendicular to submergence cell operation face, and liquid injection hole array (5B) top communicates with fluid injection chamber (5A);
The second, form recovery holes array (6B) by even distribution through hole on different radii, the hole is perpendicular to submergence cell operation face, and the upper surface of recovery holes array (6B) tilts from outside to inside and carries out hydrophobic and handle, and (6A) communicates with the fluid injection chamber;
The 3rd, liquid recovery (10) is the annular succeeding vat that is distributed between the inboard liquid injection hole array of the recovery holes array outside, have recovery approach (11) to link to each other with accumulator tank (10) all around, accumulator tank (10) edge is lower than the inside edge of recovery holes array (6B) upper surface;
The 4th, form the first, the 3rd injecting hole array (7B, 7C) by even distribution through hole on different radii, the direction in hole is perpendicular to submergence cell operation face, injecting hole array (8B) lower surface communicates with gathering sill (9), this gathering sill (9) is 45 with submergence cell operation face, and injecting hole array (7B, 7C) upper surface communicates with the first gas injection pressure cushion chamber (7A);
The 5th, form the second injecting hole array (8B) by even distribution through hole on different radii, the direction in hole is perpendicular to submergence cell operation face, injecting hole array (8B) lower surface communicates with gathering sill (9), this gathering sill (9) is 45 with submergence cell operation face, and injecting hole array (8B) upper surface communicates with the second gas injection pressure cushion chamber (8A);
4) servo-actuated disc:
Be annular lamina, upper surface is the plane, and the lower surface that carried out the hydrophobic processing is outwards downward-sloping, and outward flange curves inwardly, the outward flange outside links to each other with submergence cell operation head (2C) by the rolling guide that is installed in the rolling guide mounting groove (13) horizontal by 135 °.
2. immersion liquid flexible sealing and self-adaption recycling device in the immersed photoetching machine according to claim 1 system, it is characterized in that: but described servo-actuated disc and the relative motion of submergence cell operation head, the number of servo-actuated disc is relevant with substrate scanning pattern and speed, and the number of the described second gas injection pressure cushion chamber (8A) and distribution are relevant with the number and the partitioning boundary of servo-actuated disc.
3. immersion liquid flexible sealing and self-adaption recycling device in the immersed photoetching machine according to claim 1 system, it is characterized in that: described submergence unit upper end cover (2E), submergence unit cavity (2D), submergence cell operation head (2C), faying face between three partial component is the plane, adopts and coheres or the bolted connection; The servo-actuated disc links to each other with submergence cell operation head (2C) by the rolling guide that is installed in the rolling guide mounting groove (13).
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| CN2009101019470A CN101634811B (en) | 2009-08-20 | 2009-08-20 | Flexible seal and self-adaption recycling device for immersed photoetching machine |
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| CN2009101019470A CN101634811B (en) | 2009-08-20 | 2009-08-20 | Flexible seal and self-adaption recycling device for immersed photoetching machine |
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| CN101634811B true CN101634811B (en) | 2011-04-06 |
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| CN103149672B (en) * | 2013-04-09 | 2014-12-03 | 福州大学 | Gap flow control device of immersion microscope |
| CN109856922B (en) * | 2017-11-30 | 2020-11-13 | 上海微电子装备（集团）股份有限公司 | Immersion fluid control device, immersion lithography system and recovery control method |
| CN112305867B (en) * | 2019-07-31 | 2022-03-08 | 上海微电子装备（集团）股份有限公司 | Immersion liquid is retrieved and is prevented disturbance device, immersion head gas-liquid circulation system and lithography apparatus |
-
2009
- 2009-08-20 CN CN2009101019470A patent/CN101634811B/en not_active Expired - Fee Related
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| CN101634811A (en) | 2010-01-27 |
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