CN102707580B - Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine - Google Patents
Hermetic sealing and gas-liquid separation and recovery device for immersed photoetching machine Download PDFInfo
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- CN102707580B CN102707580B CN201210172953.7A CN201210172953A CN102707580B CN 102707580 B CN102707580 B CN 102707580B CN 201210172953 A CN201210172953 A CN 201210172953A CN 102707580 B CN102707580 B CN 102707580B
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Abstract
The invention discloses a hermetic sealing and gas-liquid separation and recovery device for an immersed photoetching machine, which is installed between a projection objective group of the immersed photoetching machine and a silicon wafer, and comprises a seal and injected liquid recovery device, a gas-liquid separation sheet group and a liquid recovery sheet group, wherein the seal and injected liquid recovery device is composed of an immersion unit front end cover and an immersion unit rear end cover. The hermetic seal and gas-liquid separation and recovery device is used for completing the functions of seal and injected liquid recovery in a slit flow field of the immersed photoetching system, so as to achieve continuous and stable updating of the slit flow field. A hermetic sealing structure is used at the edge of the slit flow field to prevent liquid leakage, a gas-liquid separation and recovery structure is adopted to achieve separation and respective recovery of gas and liquid, and generation of gas-liquid two-phase flow is avoided, so that the pipeline vibration problem caused by simultaneous recovery of gas-liquid two-phase flow is avoided. No matter which direction the silicon wafer moves to, the gas-liquid separation and recovery structure can dynamically adjust the height of the liquid level in the device.
Description
Technical field
The present invention relates to the sealing of a kind of flow field and retracting device, particularly relate to a kind of hermetic seal for immersed photoetching machine and gas-liquid separating and reclaiming device.
Background technology
Litho machine is to manufacture one of most crucial equipment of VLSI (very large scale integrated circuit), and modern litho machine optical lithography is main, and it utilizes optical system, and the figure on mask plate, accurately projection exposure had been coated with on the silicon chip of photoresist.It comprises a LASER Light Source, an optical system, a projection mask being comprised of graphics chip, an alignment system and a silicon chip that scribbles photosensitive photoresist.
Liquid immersion lithography (Immersion Lithography) equipment is by the end filling the liquid of certain high index of refraction between a slice projection objective and silicon chip, the dry lithography machine that is gas with respect to intermediate medium, improve the numerical aperture (NA) of projection objective, thereby improved resolution and the depth of focus of lithographic equipment.In the litho machine of future generation having proposed, liquid immersion lithography is changed minimum to existing equipment, present dry lithography facility are had to good inheritance.The normal scheme adopting is local immersion method at present, is about to liquid and is limited in the regional area between silicon chip top and the lower surface of last a slice projection objective, and keep the liquid flow of steady and continuous.In stepping-scan-type lithographic equipment, silicon chip carries out scanning motion at a high speed in exposure process, and this athletic meeting takes away flow field by the liquid in exposure area, thereby causes leakage, and the liquid of leakage can form water mark on photoresist, impact exposure quality.All there is the problem of biphase gas and liquid flow in existing gas sealing mechanism, both are put together to reclaim will cause the vibration of pipeline, thereby has a strong impact on exposure quality in removal process.Therefore, in immersion lithography, must solve the vibration problem being caused by biphase gas and liquid flow in removal process by emphasis.
In current existing solution, the problem that emphasis solves is the sealing problem of filling liquid, adopts hermetic seal or liquid sealing member around the gap flow field between projection objective group end element and silicon chip.Dry-gas Sealing Technology is around filling on the periphery in flow field, by applying gases at high pressure, forms annular air curtain, and filling liquid is limited in certain border circular areas.Liquid sealing technology is to utilize and the inconsistent third party's liquid of filling liquid (normally magnetic fluid or mercury etc.), around filling flow field, seals.But in these encapsulation scheme, equal Elastic Vibration problems not, and have the following disadvantages:
(1) liquid sealing mode has very harsh requirement to seal fluid, when guaranteeing that sealing property requires, also must guarantee that seal fluid and filling liquid do not dissolve mutually, and photoresist (or Topcoat) and not phase counterdiffusion of filling liquid.In substrate high-speed motion process, once outside air or seal fluid be involved in or dissolve or be diffused in filling liquid, all can be on exposure mass formation negative impact.
(2) existing hermetic adopts air curtain to be applied to around fill fluid, causes the instability at edge, flow field, in the stepping of substrate high speed and scanning process, may cause leak of liquid and sealing gas to entrainment in flow field; Meanwhile, when filling liquid and sealing gas reclaim together, will form biphase gas and liquid flow, cause thus vibration, affect the steady operation of exposure system.
Summary of the invention
In order to solve the flow field sealing problem in local immersion lithography, the object of the present invention is to provide a kind of hermetic seal for immersed photoetching machine and gas-liquid separating and reclaiming device, at edge, flow field, use air-tight structure to prevent the leakage of liquid.
The technical solution used in the present invention is as follows:
The hermetic seal and the gas-liquid separating and reclaiming device that between the projection objective group of the present invention in immersed photoetching machine and silicon chip, are equipped with; Described hermetic seal and gas-liquid separating and reclaiming device comprise sealing and fluid injection retracting device, gas-liquid separation sheet group and liquids recovery sheet group; Sealing and fluid injection retracting device are comprised of submergence unit front end end cover and submergence unit rear end cap; Wherein:
1) submergence unit rear end cap:
In submergence unit, rear end cap has central through hole, on outside seven concentric circless of the central through hole of submergence unit rear end cap, have successively respectively the fluid injection groove of four deciles, two liquid recovery, two gas accumulator tanks, two interior sealed gas-filling grooves, two interior sealing gas accumulator tanks, two external seal gas accumulator tanks and two external seal gas injection grooves;
2) submergence unit front end end cover:
In submergence unit, front end end cover has central through hole, the central through hole of submergence unit front end end cover is outwards nested with five continuous ring-type cylindrical cavities separately successively, five ring-type cylindrical cavities are outwards followed successively by recovery vestibule, internal layer gas injection pressure cushion chamber, internal layer gas recycling cavity, outer gas recycling cavity and outer gas injection pressure cushion chamber, on the end face annulus of the submergence unit front end end cover between front end end cover central through hole and recovery vestibule, have four uniform identical fluid injection chambeies of Central Symmetry, in four fluid injection chambeies, all have the liquid injection hole array of along the circumferential direction arranging, reclaim on vestibule inner bottom surface and have recovery holes array, in internal layer gas injection pressure cushion chamber, have the internal layer injecting hole array of along the circumferential direction arranging, in outer gas injection pressure cushion chamber, have the outer injecting hole array of along the circumferential direction arranging, in internal layer gas recycling cavity and outer gas recycling cavity, all have 12 uniform grooves of Central Symmetry, recovery holes array is comprised of the micropore evenly gathering,
Described front end end cover upper end, submergence unit and the faying face of rear end cap lower end, submergence unit are plane, and connect by screw fastening;
3) gas-liquid separation sheet group:
By the gas-liquid separation sheet of seven annulars, be stacked together and form gas-liquid separation sheet group, the outside of seven gas-liquid separation sheets is close to the lateral wall that reclaims vestibule, on seven gas-liquid separation sheets, have that correspondence communicates and even densely covered micropore, the inner side that is positioned at six gas-liquid separation sheets below in seven gas-liquid separation sheets has the inclined-plane towards submergence unit rear end cap continuously, seven gas-liquid separation sheets are positioned at a nethermost gas-liquid separation sheet and contact with the recovery vestibule inner bottom surface of front end end cover, corresponding the communicating of micropore of the micropore having on seven gas-liquid separation sheets and recovery holes array, the multiple tracks microtubule road being formed by micropore on seven gas-liquid separation sheets communicates with gas accumulator tank,
4) liquids recovery sheet group:
By the liquids recovery sheet of seven annulars, be stacked together and form liquids recovery sheet group; The inner side of seven liquids recovery sheets is close to the madial wall that reclaims vestibule, on seven liquids recovery sheets, have that correspondence communicates and even densely covered micropore, the outside that seven liquids recovery sheets are positioned at nethermost two liquids recovery sheets has the inclined-plane towards silicon chip continuously, seven liquids recovery sheets are positioned at a nethermost liquids recovery sheet and contact with the recovery vestibule inner bottom surface of front end end cover, corresponding the communicating of micropore of the micropore having on seven liquids recovery sheets and recovery holes array, the multiple tracks microtubule road being formed by micropore on seven liquids recovery sheets communicates with liquid recovery.
Four described fluid injection grooves communicate with fluid injection chamber separately respectively, two interior sealed gas-filling grooves all communicate with internal layer gas injection pressure cushion chamber, two interior sealing gas accumulator tanks all communicate with internal layer gas recycling cavity, external seal gas accumulator tank all communicates with outer gas recycling cavity, and two external seal gas injection grooves all communicate with outer gas injection pressure cushion chamber.
Described liquid injection hole array, internal layer injecting hole array and outer injecting hole array form by the micropore of along the circumferential direction arranging.
The beneficial effect that the present invention has is:
(1) recovery end adopts the pipeline that micropore forms, arrangement mode from inside to outside forms multiple tracks annulus pipeline array, continuous immersion liquid is reclaimed in position contacting with recovery holes array in liquids recovery sheet group, contact site does not have inclined-plane, so that the liquid after gas-liquid separation is reclaimed.The liquid reclaiming flows into external pipeline by liquid recovery, realizes the recovery of liquid.
(2) Dry-gas Sealing Technology can be introduced biphase gas and liquid flow in liquids recovery process, cause the vibration of immersion system and the fluctuation in flow field, the optics consistance of immersion liquid is caused and had a strong impact on, the gas-liquid separation sheet group of utilizing gas-liquid separation sheet to be formed by stacking, imitates porous medium with the microtubule road of circle distribution and reduces vibration.
(3) in the chamber forming at gas-liquid separation sheet group, submergence unit front end end cover, submergence unit rear end cap, add negative pressure, when liquid exceeds the inclined-plane of gas-liquid separation sheet group, liquid flows to the bottom of recovery structure under Action of Gravity Field, and gas flows to external pipeline by gas accumulator tank, thereby gas is separated.Realize the separated of gas and liquid and reclaim respectively, thereby the vibration problem having caused while having avoided biphase gas and liquid flow to reclaim together can obviously reduce the vibration of immersion system and the fluctuation in flow field.
(4) at silicon chip, carry out in high-velocity scanning process, due to the traction action to liquid, must cause the liquid level in silicon chip direction of motion to raise, and the liquid level of opposite side reduces.If reclaim not in time at the position that liquid level is high, may cause leak of liquid, if not reducing yield, the low position of liquid level can not make liquid level lower, even air amount.Pipeline and the ramp structure of gas-liquid separation sheet group and liquids recovery sheet group are circle distribution, in silicon chip motion, ramp structure has the function of automatic regulating liquid surface height, when a side liquid level raises, the part that exceeds inclined-plane is returned from inclined-plane and is flowed down, and flows to the position that liquid withdrawal system and liquid level are low; When opposite side liquid level reduces, liquid level is lower than inclined-plane, and fluid preservation, in the pipeline of gas-liquid separation sheet group, makes the liquid level of filling liquid have dynamic self-adapting regulatory function.
Accompanying drawing explanation
Fig. 1 rough schematic view that to be the present invention assemble mutually with projection lens set.
Fig. 2 is blast cross section view of the present invention.
Fig. 3 is submergence of the present invention unit front end end cover upward view.
Fig. 4 is submergence unit front end end cover three-dimensional view.
Fig. 5 is submergence unit rear end cap three-dimensional view.
Fig. 6 is liquids recovery sheet group three-dimensional view.
Fig. 7 is gas-liquid separation sheet group three-dimensional view.
Fig. 8 is cross section view of the present invention.
Fig. 9 is the partial cross sectional views that the present invention characterizes gas-liquid separation part.
In figure: 1, projection lens set, 2, sealing and fluid injection retracting device, 2A, submergence unit front end end cover, 2B, submergence unit rear end cap, 3, silicon chip, 4, gas-liquid separation sheet group, 4A, the first gas-liquid separation sheet, 4B, the second gas-liquid separation sheet, 4C, the 3rd gas-liquid separation sheet, 4D, the 4th gas-liquid separation sheet, 4E, the 5th gas-liquid separation sheet, 4F, the 6th gas-liquid separation sheet, 4G, the 7th gas-liquid separation sheet, 5, liquids recovery sheet group, 5A, first liquid reclaims sheet, 5B, second liquid reclaims sheet, 5C, the 3rd liquids recovery sheet, 5D, the 4th liquids recovery sheet, 5E, the 5th liquids recovery sheet, 5F, the 6th liquids recovery sheet, 5G, the 7th liquids recovery sheet, 6A, fluid injection chamber, 6B, fluid injection groove, 6C, liquid injection hole array, 7, recovery holes array, 7A, liquid recovery, 7B, gas accumulator tank, 8A, internal layer gas injection pressure cushion chamber, 8B, interior sealed gas-filling groove, 8C, internal layer injecting hole array, 9A, internal layer gas recycling cavity, 9B, interior sealing gas accumulator tank, 10A, outer gas recycling cavity, 10B, external seal gas accumulator tank, 11A, outer gas injection pressure cushion chamber, 11B, external seal gas injection groove, 11C, outer injecting hole array, 12, gap flow field.
Embodiment
Below in conjunction with drawings and Examples, describe specific embodiment of the invention process in detail.
The hermetic seal of being equipped with between the projection objective group 1 in immersed photoetching machine and silicon chip 3 as shown in Figure 1, and gas-liquid separating and reclaiming device; Described hermetic seal and gas-liquid separating and reclaiming device comprise sealing and fluid injection retracting device 2, gas-liquid separation sheet group 4 and liquids recovery sheet group 5; Sealing and fluid injection retracting device 2 are comprised of submergence unit front end end cover 2A and submergence unit rear end cap 2B; Wherein:
1) submergence unit rear end cap 2B:
As shown in Figure 5, in submergence unit, rear end cap 2B has central through hole, projection objective group 1 is passed from central through hole, on outside seven concentric circless of the central through hole of submergence unit rear end cap 2B, have successively respectively the fluid injection groove 6B of four deciles, two liquid recovery 7A, two gas accumulator tank 7B, two interior sealed gas-filling groove 8B, two interior sealing gas accumulator tank 9B, two external seal gas accumulator tank 10B and two external seal gas injection groove 11B;
Four fluid injection groove 6B, two liquid recovery 7A, two gas accumulator tank 7B, two interior sealed gas-filling groove 8B, two interior sealing gas accumulator tank 9B, two external seal gas accumulator tank 10B and two external seal gas injection groove 11B respectively duct by are separately connected with exterior line, the inside at submergence unit rear end cap 2B is opened in duct, non-cross between duct, the side at submergence unit rear end cap 2B is all opened in the outlet in duct, duct inwardly communicates with groove separately, the mode being outwards threaded connection is connected with exterior line, duct has the function that connects submergence unit rear end cap 2B interior groove and exterior line.Exterior line comprises liquid injecting tube road, liquids recovery pipeline, gas inject pipeline, gas recovery pipe road, completes respectively liquid injection and recovery, gas inject and the recovery function of submergence unit.
2) submergence unit front end end cover 2A:
As Fig. 2, Fig. 3, shown in Fig. 4, in submergence unit, front end end cover 2A has central through hole, projection objective group 1 is passed from central through hole, the central through hole of submergence unit front end end cover 2A is outwards nested with five continuous ring-type cylindrical cavities separately successively, five ring-type cylindrical cavities are outwards followed successively by recovery vestibule, internal layer gas injection pressure cushion chamber 8A, internal layer gas recycling cavity 9A, outer gas recycling cavity 10A and outer gas injection pressure cushion chamber 11A, on the end face annulus of the submergence unit front end end cover 2A between front end end cover central through hole and recovery vestibule, have four uniform identical fluid injection chamber 6A of Central Symmetry, in four fluid injection chamber 6A, all have the liquid injection hole array 6C along the circumferential direction arranging, reclaim on vestibule inner bottom surface and have recovery holes array 7, in internal layer gas injection pressure cushion chamber 8A, have the internal layer injecting hole array 8C along the circumferential direction arranging, in outer gas injection pressure cushion chamber 11A, have the outer injecting hole array 11C along the circumferential direction arranging, in internal layer gas recycling cavity 9A and outer gas recycling cavity 10A, all have 12 uniform grooves of Central Symmetry, recovery holes array 7 is comprised of the micropore evenly gathering, the faying face of described front end end cover 2A upper end, submergence unit and rear end cap 2B lower end, submergence unit is planar annular, and connects by screw fastening,
3) gas-liquid separation sheet group 4:
As shown in Figure 7, by the gas-liquid separation sheet of seven annulars, be stacked together and form gas-liquid separation sheet group 4, seven gas-liquid separation sheets are followed successively by the first gas-liquid separation sheet 4A, the second gas-liquid separation sheet 4B, the 3rd gas-liquid separation sheet 4C, the 4th gas-liquid separation sheet 4D, the 5th gas-liquid separation sheet 4E, the 6th gas-liquid separation sheet 4F and the 7th gas-liquid separation sheet 4G from top to bottom, the outside of seven gas-liquid separation sheets is close to the lateral wall that reclaims vestibule, on seven gas-liquid separation sheets, have that correspondence communicates and even densely covered micropore, these micropores are stacked together and form the microtubule road perpendicular with submergence cell operation face, the inner side that is positioned at six gas-liquid separation sheets below in seven gas-liquid separation sheets has the inclined-plane towards submergence unit rear end cap 2B continuously, seven gas-liquid separation sheets are positioned at a nethermost gas-liquid separation sheet and contact with the recovery vestibule inner bottom surface of front end end cover 2A, corresponding the communicating of micropore of the micropore having on seven gas-liquid separation sheets and recovery holes array 7, the multiple tracks microtubule road being formed by micropore on seven gas-liquid separation sheets communicates with gas accumulator tank 7B,
4) liquids recovery sheet group 5:
As shown in Figure 6, by the liquids recovery sheet of seven annulars, be stacked together and form liquids recovery sheet group 5, seven liquids recovery sheets are followed successively by from top to bottom first liquid and reclaim sheet 5A, second liquid recovery sheet 5B, the 3rd liquids recovery sheet 5C, the 4th liquids recovery sheet 5D, the 5th liquids recovery sheet 5E, the 6th liquids recovery sheet 5F and the 7th liquids recovery sheet 5G, the inner side of seven liquids recovery sheets is close to the madial wall that reclaims vestibule, on seven liquids recovery sheets, have that correspondence communicates and even densely covered micropore, these micropores are stacked together and form the microtubule road perpendicular with submergence cell operation face, the outside that seven liquids recovery sheets are positioned at nethermost two liquids recovery sheets has the inclined-plane towards silicon chip 3 continuously, seven liquids recovery sheets are positioned at a nethermost liquids recovery sheet and contact with the recovery vestibule inner bottom surface of front end end cover 2A, corresponding the communicating of micropore of the micropore having on seven liquids recovery sheets and recovery holes array 7, the multiple tracks microtubule road being formed by micropore on seven liquids recovery sheets communicates with liquid recovery 7A.
Four described fluid injection groove 6B communicate with fluid injection chamber 6A separately respectively, two interior sealed gas-filling groove 8B all communicate with internal layer gas injection pressure cushion chamber 8A, two interior sealing gas accumulator tank 9B all communicate with internal layer gas recycling cavity 9A, external seal gas accumulator tank 10B all communicates with outer gas recycling cavity 10A, and two external seal gas injection groove 11B all communicate with outer gas injection pressure cushion chamber 11A.
As shown in Figure 3, Figure 4, described liquid injection hole array 6C, internal layer injecting hole array 8C and outer injecting hole array 11C form by the micropore of along the circumferential direction arranging.
Fig. 1 has provided the working position of apparatus of the present invention in immersion lithographic system, and this device can be applied in distribute repetition or step-scan lithographic equipment.In exposure process, the light sending from light source (for example ArF excimer laser) is by mask plate, the projection objective group 1 of aiming at and the gap flow field 12 being formed by immersion liquid filling, be radiated on the photoresist of silicon chip 3, it is carried out to exposure-processed, the figure on mask is transferred to accurately on the photoresist of silicon chip.Submergence unit rear end cap 2B fixes with clamping device, and clamping device can regulate height and the attitude of submergence unit, between submergence unit front end end cover 2A, submergence unit rear end cap 2B two parts faying face be planar annular, connected mode is screw-driving.
Be the blast cross section view of this device as shown in Figure 2, gas-liquid separation sheet group 4 and liquids recovery sheet group 5 are to be formed by stacking by the thin slice with multiple tracks micropore, and micropore aligns separately and forms microtubule road.Wherein gas-liquid separation sheet group 4 is characteristics of the present invention, by six inner sides below, opening bevelled thin slice and one of topmost does not open bevelled thin slice and is superimposed, the 7th gas-liquid separation sheet 4G contacts with submergence unit front end end cover 2A, the first gas-liquid separation sheet 4A contacts with submergence unit rear end cap 2B, micropore aligns separately, thus the perpendicular fine pipeline of formation multiple tracks and submergence cell operation face.Gas-liquid separation sheet group 4 below six gas-liquid separation sector-meetings forms the inclined-plane towards submergence unit rear end cap 2B in inner side, the level and smooth reduction in inclined-plane from outside to inside, thereby guarantee that liquid level all can flow to the bottom at liquids recovery position at which direction rising liquid along inclined-plane, realize the continuous recovery of liquid.The 6th liquids recovery sheet 5F of liquids recovery sheet group and the outside of the 7th liquids recovery sheet 5G are also the inclined-planes that has porous, and are connected with the micropore of liquids recovery sheet above, form the liquids recovery pipeline perpendicular to submergence cell operation face.
As shown in Fig. 2, Fig. 3, Fig. 4, Fig. 5, Fig. 7, Fig. 8, Fig. 9, submergence unit is comprised of submergence unit front end end cover 2A, submergence unit rear end cap 2B, gas-liquid separation sheet group 4 and liquids recovery sheet group 5 four parts.Fluid injection groove 6B on submergence unit rear end cap 2B is connected with liquid injecting tube road by inner duct, immersion liquid injects fluid injection groove 6B by liquid injecting tube road, pass through liquid fluid injection chamber 6A and liquid injection hole array 6C on submergence unit front end end cover 2A on the way, liquid enters and is full of the gap flow field 12 between lens combination 1 and silicon chip 3, in liquid continuous continuous injection process, liquid can flow to the surrounding of gap flow field, therefore need to reclaim immersion liquid.Recovery holes array 7 on submergence unit front end end cover 2A is between fluid-filling structure and air-tight structure, the multiple tracks round that recovery holes array 7 is comprised of micropore, major function has been the recovery of liquids and gases, immersion liquid upwards enters liquids recovery sheet group 5 through recovery holes array 7, the 7th liquids recovery sheet 5G outside has inclined-plane, not opening bevelled planar section contacts with the upper surface of recovery holes array 7, the micropore composition reclaim line of aliging separately, the immersion liquid in continuous recovery gap flow field.On the 7th liquids recovery sheet 5G inclined-plane, also have identical micropore, and form reclaim line with six liquids recovery sheets above, be used for reclaiming the liquid flowing down from gas-liquid separation sheet group 4, the 6th liquids recovery sheet 5F outside also has inclined-plane, the planar section of the 6th liquids recovery sheet 5F bottom contacts with the upper surface of the 7th liquids recovery sheet 5G, for reclaiming the liquid of the 7th liquids recovery sheet 5G micropore, the 6th liquids recovery sheet 5F chamfered portion also has micropore, and form reclaim line with five liquids recovery sheets above, be used for reclaiming the liquid flowing down from the inclined-plane of gas-liquid separation sheet group 4.The first liquid of liquids recovery sheet group 5 reclaims sheet 5A and submergence unit rear end cap 2B, submergence unit front end end cover 2A forms liquids recovery cavity, submergence unit rear end cap 2B has two liquid recovery 7B in inside cavity, liquid recovery 7B is connected with outside liquid reclaim line by opening in the duct of rear end cap 2B inside, submergence unit, on liquids recovery pipeline, add that negative pressure just can be drawn into liquid recovery 7B from the bottom of liquids recovery sheet group 5 by liquid, through duct, liquids recovery pipeline is discharged submergence unit, thereby complete injection and the removal process of immersion liquid.
As shown in Figure 8, the air-tight structure of submergence unit is comprised of two seals.The high speed priming meeting of silicon chip produces traction action to liquid, thereby may cause the leakage of liquid, affects the normal operation of etching system.Therefore in the exterior periphery of gap flow field, add that air-tight structure stops the leakage of liquid.From the gases at high pressure process gas injection pipeline in source of the gas pipeline and the duct of rear end cap 2B inside, submergence unit, enter interior sealed gas-filling groove 8B, external seal gas injection groove 11B, then enter respectively internal layer gas injection pressure cushion chamber 8A, outer gas injection pressure cushion chamber 11A, gas injection pressure cushion chamber is when suppressing source of the gas pulsation, balanced high pressure gas field pressure, makes internal layer injecting hole array 8C, outer injecting hole array 11C obtain more consistent initial gas injection pressure in a circumferential direction.The gas blowing out from internal layer injecting hole array 8C, outer injecting hole array 11C can enter the internal layer gas injection pressure cushion chamber 8A of opposite side, outer gas injection pressure cushion chamber 11A, thereby guarantee to form air curtain before contacting with immersion liquid, realize the circumferential seal of liquid.The recovery of sealing gas is by internal layer gas recycling cavity 9A, outer gas recycling cavity 10A, enter interior sealing gas accumulator tank 9B, the external seal gas accumulator tank 11B of submergence unit rear end cap 2B, interior sealing gas accumulator tank 9B and external seal gas accumulator tank 11B are connected with extraneous gas reclaim line by the duct of rear end cap 2B inside, submergence unit, on gas recovery pipe road, add negative pressure, just can complete the recovery of sealing gas.
As shown in Fig. 2, Fig. 3, Fig. 4, Fig. 6, Fig. 7, Fig. 8, Fig. 9, when silicon chip 3 is in high-velocity scanning process, because silicon chip can produce traction action to immersion liquid, gap flow field 12 can a wall pressure uprise, one wall pressure step-down, the thing followed is that in submergence unit, a side liquid increases, a side liquid reduces, a side liquid level raises, and opposite side liquid level reduces.Liquid increases a side and just there will be leakage if do not strengthened yield, and liquid reduces by a side will make this side liquid still less if do not reduced yield, even air amount.The continuous inclined-plane that gas-liquid separation sheet group 4 is designed to along the circumferential direction distribute, inclined-plane is towards submergence unit rear end cap 2B, and bevel altitude reduces from outside to inside successively.The fine pipeline of multiple tracks ring-type that gas-liquid separation pipeline is comprised of microtubule, gas-liquid separation pipeline, perpendicular to submergence cell operation face, is formed by stacking by seven gas-liquid separation sheets that have micropore.If the liquid level raising exceeds the inclined-plane of gas-liquid separation sheet group 4, liquid flows to the bottom of liquids recovery sheet group 5 under Action of Gravity Field along inclined-plane.In liquids recovery sheet group 5, the 7th liquids recovery sheet 5G and the 6th liquids recovery sheet 5F outside has inclined-plane, is convenient to liquid and can flows to liquids recovery pipeline bottom, is reclaimed, thereby realize the independent recovery of immersion liquid by liquids recovery sheet group 5.And at the low position of opposite side liquid level, liquid level does not exceed inclined-plane, immersion liquid just can not leave inclined-plane and be recovered, thereby has stoped immersion liquid to continue to be recovered.Because ramp structure is circle distribution, no matter silicon chip can be realized above-mentioned functions toward which direction motion, makes this structure have the function of automatic regulating liquid surface height, guarantees that liquids recovery pipeline bottom is all submerged liquid and floods, thereby liquid is reclaimed and non-involvement gas separately.In the cavity simultaneously forming at inclined-plane, liquids recovery sheet group 5 and the submergence unit rear end cap 2B of gas-liquid separation sheet group 4, add negative pressure, on gas accumulator tank 7B, add negative pressure, gas in immersion liquid is separated through the micropore on inclined-plane, isolated gas is discharged from through gas accumulator tank 7B and extraneous gas reclaim line, thereby the gas of having realized recovery section reclaims separately.This kind of structure by liquids and gases separation afterwards the pipeline by separately reclaim separately, thereby the biphase gas and liquid flow having formed while having avoided immersion liquid and sealing gas to reclaim, thereby avoided the pipeline vibration and the flow field fluctuation that cause because of biphase gas and liquid flow.
Above-mentioned embodiment is used for the present invention that explains, rather than limits the invention, and in the protection domain of spirit of the present invention and claim, any modification and change that the present invention is made, all fall into protection scope of the present invention.
Claims (2)
1. for hermetic seal and the gas-liquid separating and reclaiming device of immersed photoetching machine, the hermetic seal and the gas-liquid separating and reclaiming device that between the projection objective group (1) in immersed photoetching machine and silicon chip (3), are equipped with; It is characterized in that: described hermetic seal and gas-liquid separating and reclaiming device comprise sealing and fluid injection retracting device (2), gas-liquid separation sheet group (4) and liquids recovery sheet group (5); Sealing and fluid injection retracting device (2) are comprised of submergence unit front end end cover (2A) and submergence unit rear end cap (2B); Wherein:
1) submergence unit rear end cap (2B):
In submergence unit rear end cap (2B), have central through hole, on outside seven concentric circless of the central through hole of submergence unit rear end cap (2B), have successively respectively the fluid injection groove (6B) of four deciles, two liquid recovery (7A), two gas accumulator tanks (7B), two interior sealed gas-filling grooves (8B), two interior sealing gas accumulator tanks (9B), two external seal gas accumulator tanks (10B) and two external seal gas injection grooves (11B);
2) submergence unit front end end cover (2A):
In submergence unit front end end cover (2A), have central through hole, the central through hole of submergence unit front end end cover (2A) is outwards nested with five continuous ring-type cylindrical cavities separately successively, five ring-type cylindrical cavities are outwards followed successively by recovery vestibule, internal layer gas injection pressure cushion chamber (8A), internal layer gas recycling cavity (9A), outer gas recycling cavity (10A) and outer gas injection pressure cushion chamber (11A), on the end face annulus of the submergence unit front end end cover (2A) between front end end cover central through hole and recovery vestibule, have four uniform identical fluid injection chambeies (6A) of Central Symmetry, in four fluid injection chambeies (6A), all have the liquid injection hole array (6C) of along the circumferential direction arranging, reclaim on vestibule inner bottom surface and have recovery holes array (7), in internal layer gas injection pressure cushion chamber (8A), have the internal layer injecting hole array (8C) of along the circumferential direction arranging, in outer gas injection pressure cushion chamber (11A), have the outer injecting hole array (11C) of along the circumferential direction arranging, in internal layer gas recycling cavity (9A) and outer gas recycling cavity (10A), all have 12 uniform grooves of Central Symmetry, recovery holes array (7) is comprised of the micropore evenly gathering,
Described front end end cover (2A) upper end, submergence unit and the faying face of lower end, submergence unit rear end cap (2B) are plane, and connect by screw fastening;
3) gas-liquid separation sheet group (4):
By the gas-liquid separation sheet of seven annulars, be stacked together and form gas-liquid separation sheet group (4), the outside of seven gas-liquid separation sheets is close to the lateral wall that reclaims vestibule, on seven gas-liquid separation sheets, have that correspondence communicates and even densely covered micropore, the inner side that is positioned at six gas-liquid separation sheets below in seven gas-liquid separation sheets has the inclined-plane towards submergence unit rear end cap (2B) continuously, seven gas-liquid separation sheets are positioned at a nethermost gas-liquid separation sheet and contact with the recovery vestibule inner bottom surface of front end end cover (2A), corresponding the communicating of micropore of the micropore having on seven gas-liquid separation sheets and recovery holes array (7), the multiple tracks microtubule road being formed by micropore on seven gas-liquid separation sheets communicates with gas accumulator tank (7B),
4) liquids recovery sheet group (5):
By the liquids recovery sheet of seven annulars, be stacked together and form liquids recovery sheet group (5), the inner side of seven liquids recovery sheets is close to the madial wall that reclaims vestibule, on seven liquids recovery sheets, have that correspondence communicates and even densely covered micropore, the outside that seven liquids recovery sheets are positioned at nethermost two liquids recovery sheets has the inclined-plane towards silicon chip (3), seven liquids recovery sheets are positioned at a nethermost liquids recovery sheet and contact with the recovery vestibule inner bottom surface of front end end cover (2A), corresponding the communicating of micropore of the micropore having on seven liquids recovery sheets and recovery holes array (7), the multiple tracks microtubule road being formed by micropore on seven liquids recovery sheets communicates with liquid recovery (7A),
Described four fluid injection grooves (6B) communicate with fluid injection chamber (6A) separately respectively, two interior sealed gas-filling grooves (8B) all communicate with internal layer gas injection pressure cushion chamber (8A), two interior sealing gas accumulator tanks (9B) all communicate with internal layer gas recycling cavity (9A), external seal gas accumulator tank (10B) all communicates with outer gas recycling cavity (10A), and two external seal gas injection grooves (11B) all communicate with outer gas injection pressure cushion chamber (11A).
2. a kind of hermetic seal for immersed photoetching machine according to claim 1 and gas-liquid separating and reclaiming device, is characterized in that: described liquid injection hole array (6C), internal layer injecting hole array (8C) and outer injecting hole array (11C) form by the micropore of along the circumferential direction arranging.
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| CN102937777B (en) * | 2012-11-12 | 2014-07-30 | 浙江大学 | Gas-sealing and gas-liquid isolating device for immersed type photoetching machine |
| CN104678712B (en) * | 2013-12-03 | 2017-05-31 | 上海微电子装备有限公司 | A kind of immersion exposure equipment |
| CN104035290B (en) * | 2014-06-24 | 2015-11-25 | 浙江大学 | A kind of hermetic seal for immersed photoetching machine and two-stage porous gas-liquid retracting device |
| CN107861339B (en) * | 2017-12-14 | 2023-09-12 | 浙江启尔机电技术有限公司 | Two-stage gas-liquid separation and recovery device for immersion lithography machine |
| CN113189849B (en) * | 2021-04-22 | 2023-08-11 | 中国科学院光电技术研究所 | Near-field photoetching immersion system, immersion unit and interface module thereof |
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| US7701550B2 (en) * | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7379155B2 (en) * | 2004-10-18 | 2008-05-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7580112B2 (en) * | 2005-08-25 | 2009-08-25 | Nikon Corporation | Containment system for immersion fluid in an immersion lithography apparatus |
| CN100462848C (en) * | 2007-03-15 | 2009-02-18 | 浙江大学 | Liquid supply and recovery seal controller in immersion type photoetching system |
| CN201233505Y (en) * | 2008-07-29 | 2009-05-06 | 浙江大学 | Immersion control device used for photo-etching machine |
| NL2003226A (en) * | 2008-08-19 | 2010-03-09 | Asml Netherlands Bv | Lithographic apparatus, drying device, metrology apparatus and device manufacturing method. |
| CN100595678C (en) * | 2008-10-21 | 2010-03-24 | 浙江大学 | Immerging liquid recovering damping control device used for mask aligner |
| CN202615114U (en) * | 2012-05-30 | 2012-12-19 | 浙江大学 | Gas-tight sealing and gas-liquid separation recovery device for immersion photoetching machine |
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Effective date of registration: 20200715 Address after: No.99 Lixin Road, Qingshanhu street, Lin'an District, Hangzhou City, Zhejiang Province Patentee after: ZHEJIANG QIER ELECTROMECHANICAL TECHNOLOGY Co.,Ltd. Address before: 310027 Hangzhou, Zhejiang Province, Xihu District, Zhejiang Road, No. 38, No. Patentee before: ZHEJIANG University |