CN103176368B - Gas-seal and gas-liquid vibration damping recovery device used in immersion lithographic machine - Google Patents
Gas-seal and gas-liquid vibration damping recovery device used in immersion lithographic machine Download PDFInfo
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- CN103176368B CN103176368B CN201310070625.0A CN201310070625A CN103176368B CN 103176368 B CN103176368 B CN 103176368B CN 201310070625 A CN201310070625 A CN 201310070625A CN 103176368 B CN103176368 B CN 103176368B
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Abstract
The invention discloses a gas-seal and gas-liquid vibration damping recovery device used in an immersion lithographic machine. The gas-seal and gas-liquid vibration damping recovery device is arranged between a projection lens group of the immersion lithographic machine and a silicon wafer; the gas-seal and gas-liquid vibration damping recovery device comprises a sealing and injected liquid recovery device, and a porous medium. The sealing and injected liquid recovery device is composed of an immersion unit upper end cap, an immersion unit middle body, an immersion unit lower end cap, and immersion unit lower end cap parts. The device provided by the invention is used for accomplishing functions of sealing and injected liquid recovery of a gap flow field of an immersion lithographic system, such that gap flow field continuous and stable renewing can be realized. The gas seal structure is adopted in the edge of the gap flow field, such that liquid leakage is prevented; with the gas-liquid vibration damping recovery structure, gas and liquid recovery are realized; under a condition of low speed, the appearance of a gas-liquid two-phase flow is avoided; under a condition of high speed, vibration caused by gas-liquid two-phase flow is reduced; no matter what direction the silicon moves in, with a buffering cavity structure, the gap flow field has a self-adaptive adjusting function.
Description
Technical field
The present invention relates to the sealing of a kind of flow field and retracting device, particularly relate to a kind of hermetic seal for immersed photoetching machine and gas-liquid vibration damping retracting device.
Background technology
Litho machine is to manufacture one of most crucial equipment of VLSI (very large scale integrated circuit), and modern litho machine optical lithography is main, and it utilizes optical system, and the figure on mask plate, accurately projection exposure had been coated with on the silicon chip of photoresist.It comprises a LASER Light Source, an optical system, a projection mask being comprised of graphics chip, an alignment system and a silicon chip that scribbles photosensitive photoresist.
Liquid immersion lithography (Immersion Lithography) equipment is by the end filling the liquid of certain high index of refraction between a slice projection objective and silicon chip, the dry lithography machine that is gas with respect to intermediate medium, improve the numerical aperture (NA) of projection objective, thereby improved resolution and the depth of focus of lithographic equipment.In the litho machine of future generation having proposed, liquid immersion lithography is changed minimum to existing equipment, present dry lithography facility are had to good inheritance.The normal scheme adopting is local immersion method at present, is about to liquid and is limited in the regional area between silicon chip top and the lower surface of last a slice projection objective, and keep the liquid flow of steady and continuous.In stepping-scan-type lithographic equipment, silicon chip carries out scanning motion at a high speed in exposure process, and this athletic meeting takes away flow field by the liquid in exposure area, thereby causes leakage, and the liquid of leakage can form water mark on photoresist, impact exposure quality.Therefore, the sealing problem of necessary emphasis solution gap flow field in immersion lithography.In current existing solution, there are two kinds of hermetic seal or liquid sealings.Dry-gas Sealing Technology is around filling on the periphery in flow field, by applying gases at high pressure, forms annular air curtain, and filling liquid is limited in certain border circular areas.Liquid sealing technology is to utilize and the inconsistent third party's liquid of filling liquid (normally magnetic fluid or mercury etc.), around filling flow field, seals.But in these encapsulation scheme, have the following disadvantages:
(1) liquid sealing mode has very harsh requirement to seal fluid, when guaranteeing that sealing property requires, also must guarantee that seal fluid and filling liquid do not dissolve mutually, and photoresist (or Topcoat) and not phase counterdiffusion of filling liquid.In substrate high-speed motion process, once outside air or seal fluid be involved in or dissolve or be diffused in filling liquid, all can be on exposure mass formation negative impact.
(2) existing hermetic adopts air curtain to be applied to around fill fluid, causes the instability at edge, flow field, in the stepping of substrate high speed and scanning process, may cause leak of liquid and sealing gas to entrainment in flow field; Meanwhile, when filling liquid and sealing gas reclaim together, will form biphase gas and liquid flow, cause thus vibration, affect the steady operation of exposure system.
In existing solution, with hermetic seal, for well, all there is the problem of biphase gas and liquid flow in right existing gas sealing mechanism in removal process, and both are put together to reclaim will cause the vibration of pipeline, thereby has a strong impact on exposure quality.Therefore, adopt the submergence unit of hermetic seal should solve the vibration problem that biphase gas and liquid flow causes.
Summary of the invention
The object of the present invention is to provide a kind of hermetic seal for immersed photoetching machine and gas-liquid vibration damping retracting device, at edge, flow field use air-tight structure, prevent the leakage of liquid, the vibration causing to reduce biphase gas and liquid flow at the filling porous medium of liquids recovery mouth.
The technical solution used in the present invention is as follows:
The hermetic seal and the gas-liquid vibration damping retracting device that between the projection objective group of the present invention in immersed photoetching machine and silicon chip, are equipped with; It is characterized in that: described hermetic seal and gas-liquid vibration damping retracting device comprise sealing and fluid injection retracting device, porous medium; Sealing and fluid injection retracting device are comprised of submergence unit upper end cover, submergence unit intermediate, submergence unit bottom end cover and submergence unit bottom end cover accessory; Wherein:
1) submergence unit upper end cover:
In submergence unit, upper end cover has central through hole, on outside six concentric circless of the central through hole of submergence unit upper end cover, have successively respectively two symmetrical fluid injection grooves, two symmetrical dashpots, two liquid recovery, two interior sealed gas-filling grooves, two middle sealed gas-filling grooves, two external seal gas injection grooves;
Two fluid injection grooves, two liquid recovery, two interior sealed gas-filling grooves, two middle sealed gas-filling grooves, two external seal gas injection grooves are connected with duct separately respectively, the mode that each duct is threaded connection is again connected with exterior line, exterior line comprises liquid injecting tube road, liquids recovery pipeline, gas inject pipeline, completes respectively the liquid injection of submergence unit and recovery, gas inject function;
2) submergence unit intermediate:
In submergence unit, intermediate has central through hole, central through hole at submergence unit intermediate outwards has two symmetrical intermediate fluid injection chambeies, submergence unit successively, the one O type circle groove, six symmetrical submergence unit intermediate cushion chambers, two symmetrical intermediate liquids recovery chambeies, submergence unit, the 2nd O type circle groove, sealed gas-filling chamber in six symmetrical submergence unit intermediates, the 3rd O type circle groove, sealed gas-filling chamber in six symmetrical submergence unit intermediates, the 4th O type circle groove, six symmetrical intermediate external seal gas injection chambeies, submergence unit and the 5th O type circle groove, between central through hole and two symmetrical intermediate fluid injection chambeies, submergence unit, there is raised step, between submergence unit intermediate cushion chamber and intermediate liquids recovery chamber, submergence unit, there is an incline bench for projection,
3) submergence unit bottom end cover:
In submergence unit, front end end cover has central through hole, and the central through hole of submergence unit front end end cover outwards has step for fluid injection, the 6th O type groove for circle, submergence unit bottom end cover cushion chamber successively, reclaim with inclined-plane, the 7th O type groove, the interior sealed gas-filling of submergence unit bottom end cover chamber, the 8th O type sealed gas-filling chamber, the 9th O type groove, bottom end cover external seal gas injection chamber, submergence unit (10C) and the tenth O type circle groove for circle in groove, submergence unit bottom end cover for circle circle for; Fluid injection coordinates with raised step and forms bottom end cover fluid injection chamber, submergence unit with step; In submergence unit bottom end cover cushion chamber, have 25 equally distributed kidney grooves; Reclaim with inclined-plane and coordinate formation bottom end cover liquids recovery chamber, submergence unit with protruding incline bench; Sealed gas-filling chamber UNICOM in groove and submergence unit bottom end cover for the 7th O type circle, forms a gaseous tension cushion chamber, has interior injecting hole array in cushion chamber; Sealed gas-filling chamber UNICOM in groove and submergence unit bottom end cover for the 8th O type circle, forms a gaseous tension cushion chamber, has middle injecting hole array in cushion chamber; Groove and bottom end cover external seal gas injection chamber, submergence unit UNICOM for the 9th O type circle, form a gaseous tension cushion chamber, has outer injecting hole array in cushion chamber;
4) submergence unit bottom end cover accessory:
In submergence unit, bottom end cover accessory has central through hole, and the central through hole of submergence unit bottom end cover accessory outwards has a hermetic seal inclined-plane;
Described bottom end cover accessory upper surface and bottom end cover lower surface, submergence unit, bottom end cover upper surface, submergence unit and intermediate lower surface, submergence unit, matching with lower surface, submergence unit upper end cover (2A) in intermediate upper surface, submergence unit, and connects by screw fastening;
3) porous medium:
There is porous medium to be filled in submergence unit bottom end cover cushion chamber.
Two described fluid injection grooves communicate with intermediate fluid injection chamber, submergence unit and bottom end cover fluid injection chamber, submergence unit separately respectively; Two liquid recovery are connected with intermediate liquids recovery chamber, submergence unit, bottom end cover liquids recovery chamber, submergence unit separately respectively, and are finally connected with submergence unit bottom end cover cushion chamber; Two interior sealed gas-filling grooves all communicate with sealed gas-filling chamber in sealed gas-filling chamber, submergence unit bottom end cover in submergence unit intermediate and interior injecting hole array; Two middle sealed gas-filling grooves all communicate with sealed gas-filling chamber in sealed gas-filling chamber, submergence unit bottom end cover in submergence unit intermediate and middle injecting hole array; Two external seal gas injection grooves all communicate with intermediate external seal gas injection chamber, submergence unit, bottom end cover external seal gas injection chamber, submergence unit and outer injecting hole array.
The beneficial effect that the present invention has is:
(1) negative pressure of Dry-gas Sealing Technology and recovery mouth can be limited to gap flow field border between hermetic sealing and dashpot.When silicon chip movement velocity is lower, can effectively prevent the generation of biphase gas and liquid flow.When silicon chip movement velocity is higher, can in liquids recovery process, introduce biphase gas and liquid flow, cause the vibration of immersion system and the fluctuation in flow field, the optics consistance of immersion liquid is caused and had a strong impact on, therefore filling porous medium in dashpot, can weaken the vibration that biphase gas and liquid flow brings.The liquid reclaiming flows into external pipeline by liquid recovery, realizes the recovery of liquid.
(2) at silicon chip, carry out in high-velocity scanning process, due to the traction action to liquid, must cause the liquid level in silicon chip direction of motion to raise, and the liquid level of opposite side reduces.If reclaim not in time at the position that liquid level is high, may cause leak of liquid, if not reducing yield, the low position of liquid level can not make liquid level lower, even air amount.The design of introducing cushion chamber, flows the liquid of liquid level eminence voluntarily to liquid level lower, reach the object that reduces fluctuation.The present invention has been used for sealing and the fluid injection of gap flow field in immersion lithographic system and has reclaimed function, realizes the renewal of gap flow field continous-stable.Gap flow field edge is used air-tight structure to prevent leak of liquid, adopts gas-liquid vibration damping recovery structure to realize the recovery of gas and liquid, in low speed situation, has avoided the generation of biphase gas and liquid flow, under high-speed case, has weakened the vibration that biphase gas and liquid flow brings.No matter silicon chip is toward which direction motion, and cushion chamber structure makes gap flow field have self-adaptation regulatory function.
Accompanying drawing explanation
Fig. 1 rough schematic view that to be the present invention assemble mutually with projection lens set.
Fig. 2 is blast cross section view of the present invention.
Fig. 3 is submergence of the present invention unit intermediate vertical view.
Fig. 4 is that submergence unit intermediate is looked up three-dimensional view.
Fig. 5 is submergence unit bottom end cover vertical view.
Fig. 6 is submergence unit upper end cover three-dimensional view.
Fig. 7 is submergence unit bottom end cover annex three-dimensional view.
In figure: 1, projection lens set, 2, sealing and fluid injection retracting device, 2A, submergence unit upper end cover, 2B, submergence unit intermediate, 2 C, submergence unit bottom end cover, 2D, submergence unit bottom end cover accessory, 3, silicon chip, 4, porous medium, 5A, fluid injection groove, 5B, intermediate fluid injection chamber, submergence unit, 6A, dashpot, 6B, submergence unit intermediate cushion chamber, 6C, submergence unit bottom end cover cushion chamber, 7A, liquid recovery, 7B, intermediate liquids recovery chamber, submergence unit, 7C, bottom end cover liquids recovery chamber, submergence unit, 8A, interior sealed gas-filling groove, 8B, sealed gas-filling chamber in submergence unit intermediate, 8C, sealed gas-filling chamber in submergence unit bottom end cover, 9A, middle sealed gas-filling groove, 9B, sealed gas-filling chamber in submergence unit intermediate, 9C, sealed gas-filling chamber in submergence unit bottom end cover, 10A, external seal gas injection groove, 10B, intermediate external seal gas injection chamber, submergence unit, 10C, bottom end cover external seal gas injection chamber, submergence unit, 11B, the one O type circle groove, 11C, the 6th O type circle groove, 12B, the 2nd O type circle groove, 12C, the 7th O type circle groove, 13B, the 3rd O type circle groove, 13C, the 8th O type circle groove, 14B, the 4th O type circle groove, 14C, the 9th O type circle groove, 15B, the 5th O type circle groove, 15C, the tenth O type circle groove, 16B, raised step, 17B, incline bench, 18C, fluid injection step, 19C, recovery inclined-plane, 20C, interior injecting hole array, 21C, middle injecting hole array, 22C, outer injecting hole array, 23D, hermetic seal inclined-plane, 24, gap flow field.
Embodiment
Below in conjunction with drawings and Examples, describe specific embodiment of the invention process in detail.
The hermetic seal of being equipped with between the projection objective group 1 in immersed photoetching machine and silicon chip 3 as shown in Figure 1, and gas-liquid vibration damping retracting device; Described hermetic seal and gas-liquid vibration damping retracting device comprise sealing and fluid injection retracting device 2, porous medium 4; Sealing and fluid injection retracting device 2 are by submergence unit upper end cover 2A, submergence unit intermediate 2B, submergence unit bottom end cover 2C and submergence unit bottom end cover accessory 2D; Wherein:
1) submergence unit upper end cover 2A:
As shown in Figure 6, in submergence unit, upper end cover 2A has central through hole, on outside six concentric circless of the central through hole of submergence unit upper end cover (2A), have successively respectively two symmetrical fluid injection groove 5A, two symmetrical dashpot 6A, two liquid recovery 7A, two interior sealed gas-filling groove 8A, two middle sealed gas-filling groove 9A, two external seal gas injection groove 10A;
Two fluid injection groove 5A, two liquid recovery 7A, two interior sealed gas-filling groove 8A, two middle sealed gas-filling groove 9A, two external seal gas injection groove 10A are connected with duct separately respectively, the mode that each duct is threaded connection is again connected with exterior line, exterior line comprises liquid injecting tube road, liquids recovery pipeline, gas inject pipeline, completes respectively liquid injection and recovery, gas inject and the recovery function of submergence unit.
2) submergence unit intermediate 2B:
As Fig. 3, shown in Fig. 4, in the middle of submergence unit, 2B has central through hole, central through hole at submergence unit intermediate 2B outwards has two symmetrical submergence unit intermediate fluid injection chamber 5B successively, the one O type circle groove 11B, six symmetrical submergence unit intermediate cushion chamber 6B, two symmetrical submergence unit intermediate liquids recovery chamber 7B, the 2nd O type circle groove 12B, sealed gas-filling chamber 8B in six symmetrical submergence unit intermediates, the 3rd O type circle groove 13B, sealed gas-filling chamber 9B in six symmetrical submergence unit intermediates, the 4th O type circle groove 14B, six symmetrical submergence unit intermediate external seal gas injection chamber 10B and the 5th O type circle groove 15B, between central through hole and two symmetrical submergence unit intermediate fluid injection chamber 5B, there is raised step 16B, between submergence unit intermediate cushion chamber 6B and submergence unit intermediate liquids recovery chamber 7B, there is an incline bench 17B for projection.
3) submergence unit bottom end cover 2C:
As shown in Figure 5, in submergence unit, front end end cover 2C has central through hole, and the central through hole of submergence unit front end end cover 2C outwards has sealed gas-filling chamber 9C, the 9th O type circle groove 14C, submergence unit bottom end cover external seal gas injection chamber 10C and the tenth O type circle groove 15C in fluid injection step 18C, the 6th O type circle groove 11C, submergence unit bottom end cover cushion chamber 6C, recovery inclined-plane 19C, the 7th O type circle groove 12C, the interior sealed gas-filling chamber 8C of submergence unit bottom end cover, the 8th O type circle groove 13C, submergence unit bottom end cover successively; Fluid injection coordinates with raised step 16B and forms bottom end cover fluid injection chamber, submergence unit with step 18C; In submergence unit bottom end cover cushion chamber 6C, have 25 equally distributed kidney grooves; Reclaim with inclined-plane 19C and coordinate formation submergence unit bottom end cover liquids recovery chamber 7C with protruding incline bench 17B; Sealed gas-filling Qiang8C UNICOM in groove 12C and submergence unit bottom end cover for the 7th O type circle, forms a gaseous tension cushion chamber, has interior injecting hole array 20C in cushion chamber; Sealed gas-filling Qiang9C UNICOM in groove 13C and submergence unit bottom end cover for the 8th O type circle, forms a gaseous tension cushion chamber, has middle injecting hole array 21C in cushion chamber; Groove 14C and submergence unit bottom end cover external seal gas injection Qiang10C UNICOM for the 9th O type circle, form a gaseous tension cushion chamber, has outer injecting hole array 22C in cushion chamber.
4) submergence unit bottom end cover accessory 2D:
As shown in Figure 7, in submergence unit, bottom end cover accessory 2D has central through hole, and the central through hole of submergence unit bottom end cover accessory 2D outwards has hermetic seal inclined-plane 23D.23DYu2C inclined-plane, this inclined-plane boss coordinates the oblique jet chamber of formation, to change gas jet direction.
Described bottom end cover accessory 2D upper surface, submergence unit and bottom end cover 2C lower surface, submergence unit, bottom end cover 2C upper surface, submergence unit and intermediate 2B lower surface, submergence unit, matching with upper end cover 2A lower surface, submergence unit in intermediate 2B upper surface, submergence unit, and connects by screw fastening.
Two described fluid injection groove 5A communicate with submergence unit intermediate fluid injection chamber 5B and bottom end cover fluid injection chamber, submergence unit separately respectively; Two liquid recovery 7A are connected with submergence unit intermediate liquids recovery chamber 7B, submergence unit bottom end cover liquids recovery chamber 7C separately respectively, and are finally connected with submergence unit bottom end cover cushion chamber 6C; Two interior sealed gas-filling groove 8A all communicate with sealed gas-filling chamber 8C in sealed gas-filling chamber 8B, submergence unit bottom end cover in submergence unit intermediate and interior injecting hole array 20C; Two middle sealed gas-filling groove 9A all communicate with sealed gas-filling chamber 9C in sealed gas-filling chamber 9B, submergence unit bottom end cover in submergence unit intermediate and middle injecting hole array 21C; Two external seal gas injection groove 10A all communicate with submergence unit intermediate external seal gas injection chamber 10B, submergence unit bottom end cover external seal gas injection chamber 10C and outer injecting hole array 22C.
Fig. 1 has provided the working position of apparatus of the present invention in immersion lithographic system, and this device can be applied in distribute repetition or step-scan lithographic equipment.In exposure process, the light sending from light source (for example ArF excimer laser) is by mask plate, the projection objective group 1 of aiming at and the gap flow field 24 being formed by immersion liquid filling, be radiated on the photoresist of silicon chip 3, it is carried out to exposure-processed, the figure on mask plate is transferred to accurately on the photoresist of silicon chip.Submergence unit upper end cover 2A fixes with clamping device, clamping device can regulate height and the attitude of submergence unit, faying face between submergence unit upper end cover 2A, submergence unit intermediate 2B, submergence unit bottom end cover 2C and submergence unit this four part of bottom end cover annex 2D is planar annular, and connected mode is screw-driving.
As shown in Fig. 2, Fig. 3, Fig. 4, Fig. 5, Fig. 7, submergence unit is comprised of submergence unit upper end cover 2A, submergence unit intermediate 2B, submergence unit bottom end cover 2C, submergence unit bottom end cover annex 2D and porous medium 4 five parts.
Fluid injection groove 5A on submergence unit upper end cover 2A is connected with liquid injecting tube road by inner duct, immersion liquid injects fluid injection groove 5A by liquid injecting tube road, pass through the fluid injection chamber 5B on submergence unit intermediate 2B on the way, fluid injection coordinates with raised step 16B and forms bottom end cover fluid injection chamber, submergence unit with step 18C, enter rims of the lens, and be finally full of the gap flow field 24 between lens combination 1 and silicon chip 3, in liquid continuous continuous injection process, liquid can flow to the surrounding of gap flow field, guarantee that liquid do not reveal, must there is liquids recovery, and guarantee that the liquid reclaiming equates with the liquid of injection.The waste water reclaiming is first by the dashpot 6C on submergence unit bottom end cover 2C, then successively by porous medium 4, reclaim with inclined-plane 19C and protruding incline bench 17B formation submergence unit bottom end cover recycling cavity 7C, recycling cavity 7B on submergence unit intermediate 2B, liquid recovery 7A on submergence unit upper end cover 2A, finally by crossing duct, liquids recovery pipeline discharge submergence unit, thereby complete injection and the removal process of immersion liquid.
The air-tight structure of submergence unit is comprised of three seals.The high speed priming meeting of silicon chip produces traction action to liquid, thereby may cause the leakage of liquid, affects the normal work of etching system.Therefore in the exterior periphery of gap flow field, add that air-tight structure stops the leakage of liquid.From the gases at high pressure process gas injection pipeline in source of the gas pipeline and the duct of upper end cover 2A inside, submergence unit, enter interior sealed gas-filling groove 8A, middle sealed gas-filling groove 9A, external seal gas injection groove 10A, then enter respectively sealed gas-filling chamber 8B in submergence unit intermediate, sealed gas-filling chamber 9B in submergence unit intermediate, submergence unit intermediate external seal gas injection chamber 10B, enter again sealed gas-filling chamber 8C in submergence unit bottom end cover, sealed gas-filling chamber 9C in submergence unit bottom end cover, submergence unit bottom end cover external seal gas injection chamber 10C, gas is cushioned herein, form in a circumferential direction balanced gas field pressure, make interior injecting hole array 20C, the outer injecting hole array 22C of middle injecting hole array 21C can obtain the comparatively gas injection pressure of homogeneous.
When silicon chip 3 is in high-velocity scanning process, because silicon chip can produce traction action to immersion liquid, gap flow field 24 can a wall pressure uprise, one wall pressure step-down, the thing followed is that in submergence unit, a side liquid increases, a side liquid reduces, a side liquid level raises, and opposite side liquid level reduces.Liquid increases a side and just there will be leakage if do not strengthened yield, and liquid reduces by a side will make this side liquid still less if do not reduced yield, even air amount.The design of cushion chamber, flows the liquid of liquid level eminence voluntarily to liquid level lower, with the loss before compensating, reach the effect of balance.When silicon chip movement velocity is lower, this design can be avoided hermetic seal gas directly to enter and reclaim mouth, formation biphase gas and liquid flow; Higher in silicon chip movement velocity, hermetic seal gas inevitably will enter gap flow field inside, and now, the biphase gas and liquid flow of recovery is due to porous medium 4 effects, and the vibration of its generation will be weakened.
Above-mentioned embodiment is used for the present invention that explains, rather than limits the invention, and in the protection domain of spirit of the present invention and claim, any modification and change that the present invention is made, all fall into protection scope of the present invention.
Claims (2)
1. for hermetic seal and the gas-liquid vibration damping retracting device of immersed photoetching machine, the hermetic seal of being equipped with between the projection objective group (1) in immersed photoetching machine and silicon chip (3) and gas-liquid vibration damping retracting device; It is characterized in that: described hermetic seal and gas-liquid vibration damping retracting device comprise sealing and fluid injection retracting device (2), porous medium (4); Sealing and fluid injection retracting device (2) are comprised of submergence unit upper end cover (2A), submergence unit intermediate (2B), submergence unit bottom end cover (2C) and submergence unit bottom end cover accessory (2D); Wherein:
1) submergence unit upper end cover (2A):
In submergence unit upper end cover (2A), have central through hole, on outside six concentric circless of the central through hole of submergence unit upper end cover (2A), have successively respectively two symmetrical fluid injection grooves (5A), two symmetrical dashpots (6A), two liquid recovery (7A), two interior sealed gas-filling grooves (8A), two middle sealed gas-filling grooves (9A), two external seal gas injection grooves (10A);
Two fluid injection grooves (5A), two liquid recovery (7A), two interior sealed gas-filling grooves (8A), two middle sealed gas-filling grooves (9A), two external seal gas injection grooves (10A) are connected with duct separately respectively, the mode that each duct is threaded connection is again connected with exterior line, exterior line comprises liquid injecting tube road, liquids recovery pipeline, gas inject pipeline, completes respectively the liquid injection of submergence unit and recovery, gas inject function;
2) submergence unit intermediate (2B):
In submergence unit intermediate (2B), have central through hole, central through hole at submergence unit intermediate (2B) outwards has two symmetrical intermediate fluid injection chambeies, submergence unit (5B) successively, the one O type is groove (11B) for circle, six symmetrical submergence unit intermediate cushion chambers (6B), two symmetrical intermediate liquids recovery chambeies, submergence unit (7B), the 2nd O type is groove (12B) for circle, sealed gas-filling chamber (8B) in six symmetrical submergence unit intermediates, the 3rd O type is groove (13B) for circle, sealed gas-filling chamber (9B) in six symmetrical submergence unit intermediates, the 4th O type is groove (14B) for circle, six symmetrical intermediate external seal gas injection chambeies, submergence unit (10B) and the 5th O type groove (15B) for circle, between central through hole and two symmetrical intermediate fluid injection chambeies, submergence unit (5B), there is raised step (16B), between submergence unit intermediate cushion chamber (6B) and intermediate liquids recovery chamber, submergence unit (7B), there is an incline bench (17B) for projection,
3) submergence unit bottom end cover (2C):
In submergence unit front end end cover (2C), have central through hole, the central through hole of submergence unit front end end cover (2C) outwards has step for fluid injection (18C) successively, the 6th O type is groove (11C) for circle, submergence unit bottom end cover cushion chamber (6C), reclaim with inclined-plane (19C), the 7th O type is groove (12C) for circle, sealed gas-filling chamber (8C) in submergence unit bottom end cover, the 8th O type is groove (13C) for circle, in submergence unit bottom end cover sealed gas-filling chamber (9C), the 9th O type is groove (14C) for circle, bottom end cover external seal gas injection chamber, submergence unit (10C) and the tenth O type groove (15C) for circle, step for fluid injection (18C) coordinates formation bottom end cover fluid injection chamber, submergence unit with raised step (16B), in submergence unit bottom end cover cushion chamber (6C), have 25 equally distributed kidney grooves, reclaim with inclined-plane (19C) and coordinate formation bottom end cover liquids recovery chamber, submergence unit (7C) with protruding incline bench (17B), the 7th O type is groove (12C) and the interior sealed gas-filling chamber (8C) of submergence unit bottom end cover UNICOM for circle, forms a gaseous tension cushion chamber, has interior injecting hole array (20C) in cushion chamber, the 8th O type sealed gas-filling chamber (9C) UNICOM in groove (13C) and submergence unit bottom end cover for circle, forms a gaseous tension cushion chamber, has middle injecting hole array (21C) in cushion chamber, the 9th O type is groove (14C) and bottom end cover external seal gas injection chamber, submergence unit (10C) UNICOM for circle, forms a gaseous tension cushion chamber, has outer injecting hole array (22C) in cushion chamber,
4) submergence unit bottom end cover accessory (2D):
In submergence unit bottom end cover accessory (2D), have central through hole, the central through hole of submergence unit bottom end cover accessory (2D) outwards has an inclined-plane for hermetic seal (23 D);
Described bottom end cover accessory (2D) upper surface, submergence unit and lower surface, submergence unit bottom end cover (2C), bottom end cover (2C) upper surface, submergence unit and lower surface, submergence unit intermediate (2B), matching with lower surface, submergence unit upper end cover (2A) in upper surface, submergence unit intermediate (2B), and connects by screw fastening;
3) porous medium (4):
There is porous medium (4) to be filled in submergence unit bottom end cover cushion chamber (6C).
2. a kind of hermetic seal for immersed photoetching machine according to claim 1 and gas-liquid vibration damping retracting device, is characterized in that: described two fluid injection grooves (5A) communicate with intermediate fluid injection chamber, submergence unit (5B) and bottom end cover fluid injection chamber, submergence unit separately respectively; Two liquid recovery (7A) are connected with intermediate liquids recovery chamber, submergence unit (7B), bottom end cover liquids recovery chamber, submergence unit (7C) separately respectively, and are finally connected with submergence unit bottom end cover cushion chamber (6C); Two interior sealed gas-filling grooves (8A) all communicate with sealed gas-filling chamber (8C) in sealed gas-filling chamber (8B), submergence unit bottom end cover in submergence unit intermediate and interior injecting hole array (20C); Two middle sealed gas-filling grooves (9A) all communicate with sealed gas-filling chamber (9C) in sealed gas-filling chamber (9B), submergence unit bottom end cover in submergence unit intermediate and middle injecting hole array (21C); Two external seal gas injection grooves (10A) all communicate with intermediate external seal gas injection chamber, submergence unit (10B), bottom end cover external seal gas injection chamber, submergence unit (10C) and outer injecting hole array (22C).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310070625.0A CN103176368B (en) | 2013-03-06 | 2013-03-06 | Gas-seal and gas-liquid vibration damping recovery device used in immersion lithographic machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310070625.0A CN103176368B (en) | 2013-03-06 | 2013-03-06 | Gas-seal and gas-liquid vibration damping recovery device used in immersion lithographic machine |
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| CN103176368A CN103176368A (en) | 2013-06-26 |
| CN103176368B true CN103176368B (en) | 2014-12-10 |
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| CN110658682B (en) * | 2018-06-28 | 2021-04-02 | 上海微电子装备（集团）股份有限公司 | Gas bath cavity structure, gas bath device and photoetching equipment |
| CN112414671B (en) * | 2020-12-02 | 2022-10-11 | 浙江启尔机电技术有限公司 | Fluid system component mechanical property detection device, detection system and detection method |
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| WO2012008620A2 (en) * | 2010-07-16 | 2012-01-19 | Nikon Corporation | Liquid recovery apparatus, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium |
| JP5023231B2 (en) * | 2004-08-19 | 2012-09-12 | エーエスエムエル ネザーランズ ビー．ブイ． | Lithographic apparatus and device manufacturing method |
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| CN100595678C (en) * | 2008-10-21 | 2010-03-24 | 浙江大学 | Immerging liquid recovering damping control device used for mask aligner |
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| WO2012008620A2 (en) * | 2010-07-16 | 2012-01-19 | Nikon Corporation | Liquid recovery apparatus, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium |
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Effective date of registration: 20200716 Address after: No.99 Lixin Road, Qingshanhu street, Lin'an District, Hangzhou City, Zhejiang Province Patentee after: ZHEJIANG QIER ELECTROMECHANICAL TECHNOLOGY Co.,Ltd. Address before: 310027 Hangzhou, Zhejiang Province, Xihu District, Zhejiang Road, No. 38, No. Patentee before: ZHEJIANG University |