CN1937102A - Uv-light irradiation device and light cleaning apparatus - Google Patents
Uv-light irradiation device and light cleaning apparatus Download PDFInfo
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- CN1937102A CN1937102A CNA2006101265147A CN200610126514A CN1937102A CN 1937102 A CN1937102 A CN 1937102A CN A2006101265147 A CNA2006101265147 A CN A2006101265147A CN 200610126514 A CN200610126514 A CN 200610126514A CN 1937102 A CN1937102 A CN 1937102A
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- inert gas
- ultraviolet light
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K5/00—Irradiation devices
- G21K5/04—Irradiation devices with beam-forming means
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- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Cleaning In General (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Provided is an ultraviolet light irradiation device capable of appropriately managing the concentration of ozone and active oxygen, and to provide an optical cleaning equipment using the device, while controlling the attenuation of vacuum ultraviolet light when vacuum ultraviolet light is irradiated at a work in the atmosphere. The ultraviolet light irradiation device (UVE) is provided with an excimer discharge lamp (EXL) for generating vacuum ultraviolet light; a high frequency lighting circuit (HFI) for turning on the excimer discharge lamp; an inert gas atmosphere formation means (IGB) for forming a rich inert gas atmosphere in the circumference of work (W) toward a vacuum ultraviolet light irradiation direction of the excimer discharge lamp; and an oxygen gas atmosphere formation means O2<B> for forming oxygen gas rich atmosphere in the circumference of the work toward the vacuum ultraviolet light irradiation direction of the excimer discharge lamp, in a position estranged from the inert gas atmosphere formation position along with the movement direction of the work.
Description
Technical field
The light cleaning apparatus that the present invention relates to a kind of UV curing apparatus and used this device.
Background technology
It is dielectric barrier discharge that halogenide that makes rare gas such as xenon or rare gas etc. carries out voltolising, thereby produce the excimers discharge lamp of the radiation that is bordering on intrinsic monochrome, dielectric barrier discharge lamp just is documented in a lot of documents and is known by people all the time.In dielectric barrier discharge, flow through the electric current of pulse type.Electron stream and stopping period that the electric current of this pulse type has at a high speed are many, and the temporary transient bonding of material that therefore makes xenon etc. send ultraviolet light is molecular state (an excimers state), emit effectively to absorb few short wave ultraviolet light again when it returns base state.And under the situation of xenon, carrying out with 172nm is the mulecular luminescence of half value spoke broad of centre wavelength.Its energy of the ultraviolet ray of wavelength 172nm is bigger than the ultraviolet ray of wavelength 185nm that obtains from Cooper-Hewitt lamp and 254nm, and the energy than the key of the organic compound that will decompose is big simultaneously.Therefore, utilize the ultraviolet ray of illumination wavelength 172nm, can cut off the key of above-mentioned organic compound, thereby it is decomposed removal.And by carry out the UV-irradiation of wavelength 172nm in atmospheric environment, the oxygen in the atmosphere decomposes the generation active oxygen, is cut off the organic compound and the reactive oxygen species of key, generates carbon dioxide (CO
2) and water (H
2O) etc., so remove organic compound easily.So dielectric barrier discharge lamp is as the vacuum-ultraviolet light irradiation unit and use the light source effect of light cleaning apparatus of this device remarkable.
As dielectric barrier discharge lamp, known a kind of dielectric barrier discharge lamp (with reference to Patent Document 1) that carries out dielectric barrier discharge with the gas-tight container of elongated tubular product such.Patent Document 1 described dielectric barrier discharge lamp is to constitute like this, promptly, form luminotron, this luminotron has elongated gas-tight container, internal electrode that extends on the direction of principal axis in this gas-tight container and the excimers that are sealed in the gas-tight container generate gas, and will have the cooling function and for the lamp body of the aluminum that is recessed to form with a part of tabling of the outside of gas-tight container, touch outside as outer electrode at gas-tight container, thereby produce equal dielectric barrier discharge along the tube axial direction of gas-tight container, luminescence efficiency is maintained higher state thereby the heat that produces from luminotron is promptly dispersed.In addition, closely contact mutually with gas-tight container for making outer electrode, with both crimping.
Under the situation of carrying out the ultraviolet ray irradiation with above-mentioned existing this dielectric barrier discharge lamp, developed the dielectric barrier discharge lamp of longer size along with the large tracts of landization of shone thing, brought into use the dielectric barrier discharge lamp of its effectively long 1m of surpassing.Use the dielectric barrier discharge lamp of this long size, can make multiple commercial Application such as the sclerosis of ashing, photosensitive resin of large-area liquid crystal printed circuit board (PCB) for example and sterilization become possibility.
It is now also known that a kind of to have used the light irradiation device of elongated dielectric barrier discharge lamp be UV curing apparatus (for example, referring to Patent Document 2).This UV curing apparatus is to constitute like this, promptly the lower aperture portion at the body housing is provided with light taking-up window, make the combination of dielectric barrier discharge lamp and metal parts and be accommodated in inside, inert gases such as internal circulation nitrogen at the body housing are also lighted dielectric barrier discharge lamp simultaneously, thereby suppress the decay of vacuum-ultraviolet light.And UV curing apparatus light source as light cleaning apparatus etc. in atmosphere uses.
(Patent Document 1) TOHKEMY 2003-197152 communique
(Patent Document 2) TOHKEMY 2002-168999 communique
Summary of the invention
UV curing apparatus in the past can suppress the decay of vacuum-ultraviolet light in the body housing.But, between ultraviolet illumination injection device and the workpiece that utilizes the irradiation vacuum-ultraviolet light to handle, have atmosphere, so during vacuum-ultraviolet light this section before shining workpiece, be attended by by atmospheric decay.Because this decay has reduced the effect of vacuum-ultraviolet light irradiation, is the problem that can not ignore.
In addition, carry out organic decomposition, preferably suitably manage the concentration of ozone and active oxygen in order to improve its light cleaning performance thereby light cleaning apparatus is used for that workpiece is shone vacuum-ultraviolet light.
But, use light cleaning apparatus in the past owing to be difficult to carry out above-mentioned management, therefore also there is the problem of the light cleaning that can not carry out workpiece effectively.
The objective of the invention is to, a kind of decay that can be in the atmosphere to suppress to the workpiece irradiation vacuum ultraviolet light time vacuum-ultraviolet light is provided, suitably manages the UV curing apparatus of concentration of ozone and active oxygen and the light cleaning apparatus that has used this device simultaneously.
UV curing apparatus of the present invention is characterised in that to have: the excimers discharge lamp that produces vacuum-ultraviolet light; Light the high-frequency lighting circuit of excimers discharge lamp; Inert gas environment forms device, and this inert gas environment forms device and shines direction and form the dense environment of inert gas around workpiece towards the vacuum-ultraviolet light of excimers discharge lamp; Oxygen atmosphere forms device, this oxygen atmosphere forms device and is forming along workpiece movement direction and inert gas environment on the position that the position is separated, and forms the dense environment of oxygen towards the vacuum-ultraviolet light irradiation direction of excimers discharge lamp on every side at workpiece.
Light cleaning apparatus of the present invention is characterised in that, has the light cleaning apparatus body and is provided in above-mentioned ultraviolet lamp on the light cleaning apparatus body.
In the present invention, inert gas environment forms device and oxygen atmosphere forms device owing to have, so utilizing inert gas environment to form device in the dense environment of the inert gas that forms around the workpiece, the strong vacuum-ultraviolet light that the irradiation decay is few, utilizing oxygen atmosphere formation device in the dense environment of the oxygen of the concentration of suitably having managed ozone and active oxygen that forms around the workpiece, to shine vacuum-ultraviolet light in addition, thereby the light cleaning performance improve.
Therefore, if utilize the present invention, can provide a kind of and suppress the decay of vacuum-ultraviolet light and suitably manage the light cleaning apparatus that the concentration of ozone and active oxygen all is easy to the ultraviolet illumination injection device and uses this device.
Description of drawings
Fig. 1 is the 1st form concept figure that expression is used to implement UV curing apparatus of the present invention and light cleaning apparatus.
Fig. 2 is a part of sectional front view of same UV curing apparatus.
Fig. 3 is the front view that cuts a part of same luminotron.
Fig. 4 is the front view and the left and right sides view of the same luminotron of expression and its support sector and power supply.
Fig. 5 compares the light cleaning performance among the present invention and the figure that shows with the light cleaning performance of comparative example.
Fig. 6 is the concept map of UV curing apparatus and the light cleaning apparatus with this device, and expression is used to implement the 2nd form of UV curing apparatus of the present invention and light cleaning apparatus.
Fig. 7 is the concept map of UV curing apparatus and the light cleaning apparatus with this device, and expression is used to implement the 3rd form of UV curing apparatus of the present invention and light cleaning apparatus.
Fig. 8 is the 4th form of having represented to be used for implementing UV curing apparatus UVE of the present invention and light cleaning apparatus LW, the important document front view of dielectric barrier discharge lamp EXL.
Label declaration
BC...... the conveyance direction of body housing, D...... workpiece W, EXL...... dielectric barrier discharge lamp, HFI...... high-frequency lighting circuit, IGB...... inert gas environment form device, LT...... luminotron, LW...... light cleaning apparatus, O
2B...... oxygen atmosphere forms device, MB...... light cleaning apparatus body, OE...... outer electrode oxygen blowing out device, dense dense environmental area, SM...... supporting mechanism, TM...... work transporting mechanism, UVE...... UV curing apparatus, the W...... workpiece of environmental area, R2...... oxygen of R1...... inert gas
Embodiment
It is following that explanation is used to implement the 1st form of the present invention with reference to drawing.
Fig. 1 to Fig. 4 has represented to be used to implement the 1st form of UV curing apparatus of the present invention and light cleaning apparatus, Fig. 1 is a concept map, Fig. 2 is a part of sectional front view of UV curing apparatus, Fig. 3 is the local disrumpent feelings front view of luminotron, and Fig. 4 is front view and a left and right sides view of having represented luminotron and its support sector and power supply.
In this form, UV curing apparatus UVE has dielectric barrier discharge lamp EXL, high-frequency lighting circuit HFI, inert gas environment forms device IGB and oxygen atmosphere forms device O
2B.In addition, light cleaning apparatus LW is made of light cleaning apparatus body MB and UV curing apparatus UVE.
＜UV curing apparatus UVE 〉
(about dielectric barrier discharge lamp EXL) UV curing apparatus UVE, the vacuum-ultraviolet light of light requirement in order to produce can have the dielectric barrier discharge lamp EXL of desirable number.Under situation with a plurality of dielectric barrier discharge lamp EXL, can arrange them with desirable sample attitude, if for example be configured to the tubular axis sample attitude arranged side by side, then a plurality of dielectric barrier discharge lamp EXL can be set in minimum area in abutting connection with ground.
Dielectric barrier discharge lamp EXL has gas-tight container 1, excimers form gas, internal electrode 2 and outer electrode OE.And gas-tight container 1, excimers formation gas and internal electrode 2 are combined in advance and constitute incorporate luminotron LT.On luminotron LT, as shown in Figure 3, a pair of power supply 3A, 3B and a pair of support sector 5,5 are installed at its two ends.
Gas-tight container 1 is made by the material of ultraviolet (uv) transmission, forms elongated discharge space 1a in inside.The two ends that for example can be arranged to elongated tubular are sealed and form the structure of columned discharge space 1a in inside.In addition as after the 2nd form described in, also can be by seal up 2 layers elongated tubular two ends and form the structure of elongated discharge space 1a ' cylindraceous in inside.As the material of ultraviolet (uv) transmission, generally make of synthetic silex glass.But in the present invention, so long as have transmittance with respect to the ultraviolet ray of the wavelength that will utilize, constituting with any material can.
In addition, gas-tight container 1 is in order to allow a plurality of dielectric barrier discharge lamp EXL that are used to guarantee required ultraviolet ray amount with the configuration of narrow spacing parallel arranging ground, and the good straight tube of rectilinearity preferably is even still have some bendings also to have no relations.In fact, when forming elongated tubular, be easy to generate some bendings, for example be about 1200mm and can form bending below the maximum 1mm degree with respect to total length.But the bending of this degree almost can be used as straight tube, allows.
Can use one or more mixing of xenon (Xe), krypton (Kr), argon (Ar) or helium rare gas such as (He), or the halogenide of rare gas for example XeCl, KrCl etc., be used as excimers and generate gas.And be encapsulated under the situation of inert gas halide, also can be encapsulated into rare gas and fluorine (F), chlorine (Cl), bromine (Br) or iodine halogens such as (I), generating halogenide in the inside of gas-tight container 1.In addition, except excimers generate gas, mix do not generate excimers gas for example neon this situations such as (Ne) also allow.
Internal electrode 2 is with across the wall of gas-tight container 1 and the mode relative with outer electrode OE is provided with.But internal electrode 2 both can be the sample attitude that is sealed in the mode in the discharge space 1a that is exposed to gas-tight container 1, also can be the sample attitude of the outside of the inboard that for example is arranged on gas-tight container 1, discharge space 1a.Under the situation of a kind of sample attitude in back, for example gas-tight container 1 is 2 layers of pipe structure, and internal electrode 2 is along the tubular wall setting of the central shaft side that is formed at gas-tight container 1.So in the present invention, internal electrode 2 is construed as the electrode that relatively is arranged on the inboard of gas-tight container 1 under the situation of seeing gas-tight container 1 from the outside.
As understandable from above explanation, in the present invention, internal electrode 2, so long as be all effective lengths ground of lamp electrode of producing the mode of dielectric barrier discharge and setting, long electrode on tube axial direction more preferably in the inside of gas-tight container 1 with the almost total length that spreads all over this tube axial direction, then no matter all the other are that what kind of structure can.In Fig. 2 and Fig. 4, omitted the diagram of internal electrode 2.
The preferred structure example of internal electrode shown in Figure 32 is described.Promptly, this internal electrode 2 has such structure: at a plurality of independently latticed part 2b of the direction of principal axis decentralized configuration of gas-tight container 1, and being formed on every side is situated between respectively the latticed of structure that free unoccupied place sets, thereby the structure that connects becoming one simultaneously by coupling part 2a is set with the state of the inside that is inserted into gas-tight container 1.By using such internal electrode 2, can produce more relatively ultraviolet growing amount.And, latticed part 2b circumferencial direction can be continuous also can be interrupted.
Therefore, in the present invention, form under the latticed situation at internal electrode 2, its latticed part 2b specifically can form for example ring-type, spiral fashion, coiled type or mesh.
Next support structure and power supply structure when internal electrode 2 is provided in the inside of the gas-tight container 1 that is made of silex glass are described.When being encapsulated into internal electrode 2 in the gas-tight container 1, as shown in Figure 3, can adopt the seal construction that has used sealing metal paper tinsel 1b1.That is to say, the end 2c of the linearity that will be prolonged by the two ends of the coupling part 2a of internal electrode 2 and form is connected in sealing metal paper tinsel 1b1 by the welding grade, internal electrode 2 is inserted in the gas-tight container 1, the silex glass of heated end portion forms soft state then, carries out collapsed seal (ピ Application チ シ one Le) afterwards on sealing metal paper tinsel 1b1.Thereby form the position that sealing 1b internal electrode 2 is supported at regulation in the end of gas-tight container 1 like this.
A pair of lid 5a, 5a ' surrounds the both ends of luminotron LT.And the lid 5a on right side has inserting hole among Fig. 4, and this inserting hole is used for inserting logical by supply lines 4 insulation that ceramic chamber lining 5a1 will be connected in this lid 5a bottom on the internal electrode 2 with concerning.Lid 5a ' only be used for supporting luminotron LT Fig. 1 the left part and surround the end of luminotron LT.And lid 5a, 5a ' can be formed by in metal and the insulator any, perhaps also can adopt the metallic article of inner face liner insulator as required.
Clamping ring 5b is arranged at the openend separately of lid 5a, 5a ', lid 5a, 5a ' is fixed in the end of gas-tight container 1.
A pair of installing handle 5c, 5c ', from the side of lid 5a outstanding upward in the drawings and with bolt in support sector, on lid 5a, touch under the state of looking on the arm 8 shown in Figure 2 and luminotron LT be installed in the fixed part that figure does not show with installing handle 5c.Installing handle 5c is installed on lid 5a with the insulation relation.And, look for an arm 8 as shown in Figure 2, the end direction from the tube axial direction two ends of outer electrode OE to gas-tight container 1 extends, thereby comes the installation site of the installation site regulation gas-tight container 1 of regulation luminotron LT.In addition, installing handle 5c can be formed by in metal and the insulator any, thus be situated between in the middle of also can being made as required in addition have the structure of insulant to make it and the installation site between insulate.
Terminal strip is held concurrently mount pad 5e when luminotron LT is installed, distolaterally on the right side is connected with supply lines 4, is used for terminal strip.
Like this, because lid 5a, 5a ' are the metallic of insulation system or liner insulator, perhaps make between installing handle 5c, 5c ' and the installation site and insulating, perhaps order is looked for an arm 8 itself to insulate or is made this look for insulation between an arm 8 and the support sector 5, therefore between power supply 3A, 3B, produce corona discharge, thereby suppress to reduce from the ultra violet radiation that dielectric barrier discharge lamp obtains.
Outer electrode OE is on the part of effective length of lamp at least, in the mode of the outside that closely is contacted with gas-tight container 1 along its tube axial direction or the mode that keeps suitable the gap and extend set, and it is relative with internal electrode 2, utilize the cooperation of outer electrode OE and internal electrode 2, play a role as follows, that is, generation is dielectric dielectric barrier discharge with a wall of gas-tight container 1 at least in the discharge space 1a of gas-tight container 1.
In addition, outer electrode OE can be that the structure with rigidity also can be to have flexible structure.Under the former situation, form the big outer electrode OE as shown in the figure that is bulk of thermal capacitance that forms by conductive metal.Therefore the parts that in the past were called lamp body directly can be used as outer electrode OE as required.In the case, can adopt the structure of externally seizing employed in the past aluminum thin plate A1 on both sides by the arms between the electrode OE and gas-tight container 1.In addition, in order to cool off gas-tight container 1 part in the zone that produces dielectric barrier discharge, externally electrode OE is provided with cooling device (figure does not show).In this case, cooling device can be to constitute arbitrarily, but preferably will have the cooling water channel of refrigerant to be placed on formation on the outer electrode OE, the perhaps formation that forms in inside at internal circulation.And outer electrode OE can be continuous planar state, also can be latticed state.What is called is latticed to be formed by mesh, punching shape, clathrate etc.
(high-frequency lighting circuit HFI) high-frequency lamp circuit HFI is additional high voltage between the internal electrode 2 of dielectric barrier discharge lamp EXL and outer electrode OE, lights a lamp thereby dielectric barrier discharge lamp EXL is applied effect.In addition, high-frequency lighting circuit HFI constitutes based on parallel connection converter, its high frequency is output as, and the high potential side is attached on a pair of power supply 3B of the luminotron LT among the dielectric barrier discharge lamp EXL by supply lines 4,4 respectively, and the low potential side is attached on the outer electrode OE in addition.
In addition, high-frequency lighting circuit HFI contains the high frequency generation device, produces HF voltage and supplies with its required high frequency power of lighting a lamp to dielectric barrier discharge lamp EXL.And high frequency is the pulse voltage of the alternative frequency number of above, the preferred 100kHz～2MHz of 10kHz.Under the situation of high-frequency lighting circuit HFI voltage pulse output, can obtain the pulse of square wave by using square wave output translator for example.
(forming device IGB about inert gas environment) inert gas environment forms device IGB, be by around the workpiece W that is subjected to the vacuum-ultraviolet light irradiation, forming the dense environmental area R1 of inert gas, carry out the vacuum-ultraviolet light irradiation of high illumination, thereby improve the device of the cleansing power of workpiece W.Inert gas can use rare gas such as nitrogen or argon.
In addition, accept in the process of being transported continuously at workpiece under the situation of the such formation of the irradiation of vacuum-ultraviolet light, as long as constitute in the mode that forms the dense environmental area R1 of inert gas in advance in the position of regulation.Like this, be transported and when entering in the dense environmental area R1 of inert gas, will around workpiece W, form the dense environment of inert gas at workpiece W.
The dense environment of inert gas is the environment that the concentration of inert gas is higher than atmosphere, can use proper device to form this environment.For example, use inert gas blowoff or inert gas sealed in unit to wait and form the dense environment of inert gas.
And the concentration of the inert gas in the dense environment of the inert gas decay of high vacuum ultraviolet light more is few more, so can carry out the vacuum-ultraviolet light irradiation of high illumination, is perfect condition therefore.But, as long as inert gas concentration is higher than the inert gas concentration in the atmosphere, the decay of comparing vacuum-ultraviolet light with the situation of carrying out the vacuum-ultraviolet light irradiation in atmosphere is lowered, thus can carry out the vacuum-ultraviolet light irradiation of high relatively illumination, so be resultful.
In the form of Fig. 1, inert gas environment forms device and is made of the inert gas blowoff.Utilize this device, needn't be especially separate with atmosphere, for example only need preferably from the nozzle of the top that is arranged at workpiece etc. just can to form the dense environmental area R1 of inert gas to workpiece W ejection inert gas with dividing plate etc.
In addition, inert gas environment forms device IGB and dielectric barrier discharge lamp EXL can become one, and also can separate.Inert gas environment forms device IGB and is provided with under the situation of inert gas ejiction opening, and it also can be a plurality of that this ejiction opening can be one.
And, in the part of above-mentioned range of exposures, form the dense environmental area R1 of inert gas.The dense environmental area R1 ratio all with respect to above-mentioned range of exposures of inert gas is not particularly limited.For example shown in Figure 1, can be only about half of degree.But can be over half or below half as required, according to circumstances can change.
(form device O about oxygen atmosphere
2B) oxygen atmosphere forms device O
2B is to form the dense environmental area R2 of oxygen around workpiece W, and under the vacuum-ultraviolet light irradiation, the concentration of management ozone and active oxygen makes it increase to the device of desirable degree.And, form device O by utilizing oxygen atmosphere at the vacuum-ultraviolet light that irradiates from dielectric barrier discharge lamp EXL
2During the dense environmental area R2 of the oxygen that B forms, generate ozone or active oxygen thereby make oxygen molecule decompose bonding, performance utilizes UV curing apparatus UVE to improve the effect of the cleansing power of workpiece W thus.
In its formation is that workpiece W accepts in the process of being transported continuously under the situation of vacuum-ultraviolet light irradiation, gets final product so long as constitute in the mode that forms the dense environmental area R2 of oxygen in advance in the position of regulation.Like this, be transported and when entering in the dense environmental area R2 of oxygen, just around workpiece W, form the dense environment of oxygen at workpiece W.
Utilize oxygen atmosphere to form device O
2Oxygen in the dense environment of the oxygen that B forms, at the near surface of workpiece W oxygen 100% just, also can mixed inert gas.But,, carry out the desirable concentration management of ozone and active oxygen easily by making oxygen concentration than air height.
In order to form the dense environmental area R2 of oxygen, can constitute oxygen atmosphere with proper device and form device O
2B.
In addition, oxygen atmosphere forms device O
2B and dielectric barrier discharge lamp EXL can become one, and also can separate.Oxygen atmosphere forms device O
2It also can be a plurality of that the oxygen ejiction opening of B can be one.
And the dense environmental area R2 ratio all with respect to above-mentioned range of exposures of oxygen is not particularly limited.For example, as shown in Figure 1, can be only about half of degree.But, can be that half is following or over half as required, according to circumstances can change.
In addition, oxygen atmosphere forms device O
2B preferably be arranged at the vacuum-ultraviolet light irradiation scope of workpiece W relative terminal part side, be the downstream of inert gas blowoff IGB.But, also can be as required and described opposite setting.In addition, inert gas environment forms device IGB and oxygen atmosphere forms device O
2B can be provided with a plurality of respectively, also can alternately dispose along the moving direction of workpiece W.
(about other structures of UV curing apparatus UVE) are as other structures of UV curing apparatus UVE, can have body housing BC, above-mentioned illustrated dielectric barrier discharge lamp EXL, inert gas environment are formed device IGB to this body housing BC and oxygen atmosphere forms device O
2B is accommodated in inside, and keeps these each key elements with the position relation of regulation.And high-frequency lighting circuit HFI can be arranged on the position that is separated with these other structural elements.But certainly be accommodated in the body housing BC etc., be arranged on the structural element position together with other.
＜light cleaning apparatus LW 〉
(about light cleaning apparatus body MB) light cleaning apparatus body MB represents to remove rest parts behind the UV curing apparatus UVE from light cleaning apparatus LW.And light cleaning apparatus body MB can contain for example SM of supporting mechanism and TM of work transporting mechanism and the control panel etc. of UV curing apparatus UVE.
The SM of supporting mechanism is gone up by the workpiece W of conveyance and UV curing apparatus UVE is supported in device on the assigned position for vacuum-ultraviolet light is shone.In addition, the SM of supporting mechanism preferably so that the moving direction quadrature of the tube axial direction of the dielectric barrier discharge lamp EXL of UV curing apparatus UVE and workpiece W towards supporting.Dielectric barrier discharge lamp EXL applies the Illumination Distribution of comparison homogeneous easily at its tube axial direction, thus by along above-mentioned towards supporting UV curing apparatus UVE, can easily shine vacuum-ultraviolet light equably to workpiece W.
The TM of work transporting mechanism is used to make workpiece W relatively to move to shine the mobile device of vacuum-ultraviolet light with respect to UV curing apparatus UVE.In the form shown in Figure 1, utilize the cylinder transport mechanism to constitute.
It is all that console panel (figure does not show) is controlled light cleaning apparatus LW as required.
The work of＜UV curing apparatus UVE and light cleaning apparatus LW 〉
UV curing apparatus UVE works as follows.That is, dielectric barrier discharge lamp EXL is connected with a side of the high-frequency output terminal of high-frequency lighting circuit HFI, and for example the output terminal power supply 3B that derives to the outside via supply lines 4 and electrode 2 internally in high-pressure side is connected.And for example low pressure (ground connection) side output terminal is connected with the end of outer electrode OE.
So behind the input power connection that do not show of figure, high-frequency lighting circuit HFI produces high-frequency pulse voltage, this high-frequency pulse voltage is attached to internal electrode 2 and across the wall of gas-tight container 1 and between the outer electrode OE relative with it.Consequently produce dielectric barrier discharge in the inside of gas-tight container 1.By this dielectric barrier discharge, being produced with 172nm by the excimers of xenon is the vacuum-ultraviolet light of centre wavelength.Vacuum-ultraviolet light penetrates the wall of gas-tight container 1 and derives to the outside.The vacuum-ultraviolet light of deriving to the outside for example can shine workpiece W etc., can utilize according to purpose separately.
In addition, UV curing apparatus UVE is except the irradiation of vacuum-ultraviolet light, by form device IGB and oxygen atmosphere formation device O from inert gas environment
2B sprays inert gas, oxygen respectively, thereby in the irradiation area of vacuum-ultraviolet light, along forming dense environmental area R1 and the dense environmental area R2 of oxygen of inert gas with the work transporting direction shown in the arrow D in the position that is separated from each other.
In the dense environmental area R1 of inert gas,, therefore utilize the cleaning performance of high illumination vacuum-ultraviolet light irradiation enhancement workpiece W owing to suppressed the decay of vacuum-ultraviolet light effectively.
Next, when workpiece W further by conveyance during to the dense environmental area R2 of oxygen, this time this region R 2 in because oxygen is accepted vacuum-ultraviolet light shines, thereby oxygen molecule forms ozone or generates active oxygen by decomposition, bonding, so can manage ozone amount and the active oxygen amount reaches required higher value by the control oxygen concentration, thereby improve the cleaning performance of workpiece W.
Owing to above effect, can improve the radiation response of the vacuum-ultraviolet light of UV curing apparatus UVE and light cleaning apparatus LW.In addition, owing to added the cleaning performance that brings by ozone and active oxygen, so can improve the light cleaning performance.
Next, with reference to the compare explanation of Fig. 5 to light cleaning performance among the present invention and comparative example.
Fig. 5 has represented the light cleaning performance among the present invention and the chart of comparing of comparative example.In the drawings, transverse axis is represented the rayed time (second), the longitudinal axis represent contact angle (°).In addition, the curve A among the figure is represented the present invention, and curve B is represented comparative example.And comparative example is the situation of carrying out the vacuum-ultraviolet light irradiation in atmosphere.
As can be seen from the figure, in the present invention, irradiation time in the time of 5 seconds contact angle be reduced to 5 °.Relative therewith, in comparative example, contact angle is reduced to the rayed that 5 ° of needs carried out for 8 seconds.
Below, other form of UV curing apparatus of the present invention and light cleaning apparatus is described with reference to Fig. 6 to Fig. 8.In addition, in each figure, the part identical with Fig. 1 to Fig. 4 used identical label and omitted explanation.
Fig. 6 is the concept map of UV curing apparatus and the light cleaning apparatus with this device, has represented to be used to implement the 2nd form of UV curing apparatus of the present invention and light cleaning apparatus.
In this form, the inert gas environment of UV curing apparatus UVE formation device IGB is made of the inert gas sealed in unit of shielding structure type.The inert gas sealed in unit has the device of encirclement E except that blowoff.Surrounding device E is the structure that forms dividing plate, promptly so that the inert gas that sprays from the inert gas blowoff does not separate itself and space outerpace shielding the still discrepancy of allowing workpiece W to the mode that the outside spills.And, dividing plate for example be the curtain shape that hangs down from body housing BC or hang down tabular, thereby surround the dense environmental area R1 of inert gas.
In addition, surrounding device E is such formation, promptly stop for spilling as far as possible of gas medium, but the discrepancy of allowing workpiece W.Surrounding device E is under the situation of curtain shape, surrounds device E when workpiece W comes in and goes out because its flexibility distortion.In addition, under for the tabular situation that hangs down, can make encirclement device E move up and down the degree that workpiece W is come in and gone out that reaches in linkage, perhaps can form the gap of workpiece W discrepancy usefulness in advance in the bottom with the discrepancy of workpiece W.
Like this, utilize this form,, in the use amount that suppresses inert gas, also improve inert gas concentration easily owing to have the device of encirclement E.
Fig. 7 is the concept map of UV curing apparatus and the light cleaning apparatus with this device, has represented to be used to implement the 3rd form of UV curing apparatus of the present invention and light cleaning apparatus.
In this form, the inert gas environment of UV curing apparatus UVE forms device IGB and is made of container structure.Container structure, it is in the sealed chamber SC that the dense environmental area R1 of inert gas is formed on container.Sealed chamber SC is full of inert gas and with the outside higher bubble-tight structure is arranged for its inside.And, dielectric barrier discharge lamp EXL is set in inside.In addition, little gateway (figure does not show) is set, and this gateway utilizes and is constituted as and can be sealed by gate with the degree of the discrepancy of allowing workpiece W.
And inert gas is supplied in the sealed chamber SC from the inert gas supply source by proper device.In illustrated form, its formation is that inert gas passes through the supply of inert gas blowoff.
Fig. 8 is the 4th form that expression is used for implementing UV curing apparatus UVE of the present invention and light cleaning apparatus LW, the important document front view of dielectric barrier discharge lamp EXL.
This form in the oxidation of the connecting portion of hold concurrently for the terminal strip that prevents dielectric barrier discharge lamp EXL mount pad 5e and supply lines 4, and has on this point of inert gas blowoff IGS, and is different with the 1st form.In dielectric barrier discharge lamp EXL and since its when lighting the hold concurrently temperature of connecting portion of mount pad 5e and supply lines 4 of terminal strip become higher temperature, thereby oxidation conducting variation easily.So, in this form,, inert gas blowoff IGS being set in order to prevent the oxidation at above-mentioned position, the above-mentioned position ejection inert gas when lighting is nitrogen for example.
Claims (2)
1. UV curing apparatus is characterized in that having:
Produce the excimers discharge lamp of vacuum-ultraviolet light;
Light the high-frequency lighting circuit of excimers discharge lamp;
Inert gas environment forms device, and this inert gas environment forms device and forms the dense environment of inert gas towards the vacuum-ultraviolet light irradiation direction of excimers discharge lamp around workpiece; With
Oxygen atmosphere forms device, this oxygen atmosphere forms device and is forming along workpiece movement direction and inert gas environment on the position that the position is separated, and forms the dense environment of oxygen towards the vacuum-ultraviolet light irradiation direction of excimers discharge lamp on every side at workpiece.
2. light cleaning apparatus is characterized in that having:
The light cleaning apparatus body; With
Be provided in the described ultraviolet lamp of claim 1 on the light cleaning apparatus body.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005273181A JP2007088116A (en) | 2005-09-21 | 2005-09-21 | Ultraviolet light irradiation device and optical cleaning equipment |
| JP273181/2005 | 2005-09-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1937102A true CN1937102A (en) | 2007-03-28 |
Family
ID=37954536
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2006101265147A Pending CN1937102A (en) | 2005-09-21 | 2006-08-25 | Uv-light irradiation device and light cleaning apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP2007088116A (en) |
| KR (1) | KR20070033249A (en) |
| CN (1) | CN1937102A (en) |
| TW (1) | TWI322435B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102671891A (en) * | 2011-03-15 | 2012-09-19 | 优志旺电机株式会社 | Light irradiating device |
| CN103203305A (en) * | 2012-12-11 | 2013-07-17 | 高峰 | Ultraviolet cleaning method for metal ultraviolet (UV) plate |
| CN103415338A (en) * | 2010-09-29 | 2013-11-27 | 新技术水液规划公司 | Excimer light source |
| CN108212950A (en) * | 2018-01-04 | 2018-06-29 | 京东方科技集团股份有限公司 | A kind of extreme ultraviolet cleaning equipment and base material cleaning method |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5077173B2 (en) * | 2008-09-27 | 2012-11-21 | 株式会社Ｇｓユアサ | UV irradiation treatment equipment |
| US8394203B2 (en) * | 2008-10-02 | 2013-03-12 | Molecular Imprints, Inc. | In-situ cleaning of an imprint lithography tool |
| CN102861739A (en) * | 2012-08-06 | 2013-01-09 | 华为终端有限公司 | Method for cleaning screen of electronic equipment and electronic equipment |
| JP6984206B2 (en) * | 2017-07-19 | 2021-12-17 | ウシオ電機株式会社 | Light irradiation device |
-
2005
- 2005-09-21 JP JP2005273181A patent/JP2007088116A/en active Pending
-
2006
- 2006-08-09 TW TW095129229A patent/TWI322435B/en not_active IP Right Cessation
- 2006-08-16 KR KR1020060077018A patent/KR20070033249A/en not_active Application Discontinuation
- 2006-08-25 CN CNA2006101265147A patent/CN1937102A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103415338A (en) * | 2010-09-29 | 2013-11-27 | 新技术水液规划公司 | Excimer light source |
| CN102671891A (en) * | 2011-03-15 | 2012-09-19 | 优志旺电机株式会社 | Light irradiating device |
| CN102671891B (en) * | 2011-03-15 | 2016-01-20 | 优志旺电机株式会社 | Light irradiation device |
| CN103203305A (en) * | 2012-12-11 | 2013-07-17 | 高峰 | Ultraviolet cleaning method for metal ultraviolet (UV) plate |
| CN108212950A (en) * | 2018-01-04 | 2018-06-29 | 京东方科技集团股份有限公司 | A kind of extreme ultraviolet cleaning equipment and base material cleaning method |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070033249A (en) | 2007-03-26 |
| TW200727309A (en) | 2007-07-16 |
| TWI322435B (en) | 2010-03-21 |
| JP2007088116A (en) | 2007-04-05 |
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Open date: 20070328 |