1322435 Π) 九、發明說明 【發明所屬之技術領域】 本發明係有關紫外光照射裝置及使用該裝置的光洗淨 裝置。 【先前技術】 使氙等之稀有氣體或是稀有氣體的鹵化物等，進行無 聲放電即電介質障壁放電，而產生接近固有之單色放射的 準分子放電燈即電介質障壁放電燈，據知自以往即於多數 記載於文獻中。於電介質障壁放電中，流入脈衝狀電流。 由於該脈衝狀的電流，具有高速的電子流，且休止期間較 多’因此會令射出氙等之紫外光的物質，暫時結合爲分子 狀態（準分子狀態），當該狀態回到基底狀態時，會效率 良好的放出，再吸收較少的短波長紫外光。再者，氙氣時 ，進行中心波長爲172 nm之半値寬度寬大的分子發光。波 長1 72nm的紫外線，係較其電能由低壓水銀燈所獲得之波 長185nm或254nm的紫外線還大，並且較用以分解的有 機化合物之結合電能還大。因此，藉由照射波長172nm的 紫外線’來切斷上述有機化合物的結合，就能予以分解並 去除。進而’藉由在大氣環境中，進行波長172 nm的紫外 光照射’分解大氣中的氧而產生活性氧，且結合被切斷的 有機化合物’與活性氧產生反應，以產生二氧化碳（C02 )或水（H2〇)等，就變得很容易除去有機化合物。因而 ’電介質障壁放電燈’作爲真空紫外光照射裝置及使用該 -4- (2) (2)1322435 裝置的光洗淨裝置用的光源，極爲有效。 電介質障壁放電燈，據知有使用細長管狀的氣密容器 ’進行電介質障壁放電，作爲電介質障壁放電燈（參照專 利文獻1 )。專利文獻1所記載的電介質障壁放電燈，係 形成細長的氣密容器，且具備延設在該氣密容器內之軸向 的內部電極，及封入到氣密容器內的準分子產生氣的發光 管’具有冷卻功能，並且將以嵌合氣密容器之外面的一部 分的方式，以凹窪的鋁製燈體作爲外部電極，抵接在氣密 容器的外面，並沿著氣密容器的管軸方向，使其產生一樣 的電介質障壁放電，並且以使得由發光管所產生的熱快速 的放散，使發光效率維持在較高的狀態所構成。又，爲了 使外部電極與氣密容器，互相密接，因此將兩者以壓接的 方式所構成。 使用上述習知此種電介質障壁放電燈，進行紫外線照 射的時候，成爲隨著被照射物的大面積化，開發出更長的 電介質障壁放電燈，且其有效長超過lm者。如果使用那 麼長的電介質障壁放電燈，例如能多樣應用於大面積液晶 基板的硏磨、感光性樹脂的硬化及殺菌等的工業用途。 據知也有使用細長的電介質障壁放電燈的光照射裝置 即紫外光照射裝置（例如參照日本專利文獻2 )。該紫外 光照射裝置，係以在本體外殼的下面開口部配設光取出窗 ，將電介質障壁放電燈與金屬塊一起組合收納在內部，並 一邊使得氮等之惰性氣體流通到本體外殼的內部、一邊使 電介質障壁放電燈亮燈’來抑制真空紫外光之衰減的方式 -5- (3) 1322435 所構成。而且，以紫外光照射裝置作爲光洗淨裝置等的光 源，在大氣中使用。 〔專利文獻1〕 日本特開第2003 — 197152號公報 〔專利文獻2〕 日本特開第2002 — 168999號公報 φ 【發明內容】 〔發明欲解決的課題〕 習知的紫外光照射裝置，可抑制本體外殼內之真空紫 外光的衰減。但由於與藉由在紫外光照射裝置與照射真空 紫外光照射所處理的工件之間，存在著大氣，因此在真空 紫外光照射到工件前的期間，會因大氣隨著衰減。由於該 衰減’會減低真空紫外光照射的效果，因此有無法忽視的 問題。 φ 又’雖然光洗淨裝置，是使用於爲了對工件照射真空 紫外光，進行有機物的分解，但爲了提高其光洗淨效果， 希望適當的管理臭氧及活性氧的濃度。 可是在習知光洗淨裝置中，由於上述的管理較爲困難 ’因此也有無法效率良好的進行工件之光洗淨的問題。 本發明’其目的在於提供一種在大氣中，對工件照射 真空紫外光之際，抑制真空紫外光衰減，並且能適當管理 臭氧及活性氧之濃度的紫外光照射裝置及使用該裝置的光 洗淨裝置。 -6- (4) (4)1322435 〔用以解決課題的手段〕 本發明之紫外光照射裝置，其特徵爲具備：產生真空 紫外光的準分子放電燈；和使準分子放電燈亮燈的高頻亮 燈電路；和以向著準分子放電燈的真空紫外光照射方向， 在工件的周圍，形成富惰性氣體環境的惰性氣體環境形成 手段；和沿著工件的移動方向，在與惰性氣體環境形成位 置相離的位置，並以向著準分子放電燈的真空紫外光照射 方向，在工件的周圍，形成富氧氣環境的氧氣環境形成手 段。 本發明之光洗淨裝置，其特徵爲具備：光洗淨裝置本 體；和配設在光洗淨裝置本體之申請專利範圍第1項所記 載的紫外線照射裝置。 〔發明效果〕 於本發明中，因具備惰性氣體環境形成手段及氧氣環 境形成手段，故在藉由惰性氣體環境形成手段，形成在工 件之周圍的富惰性氣體環境中，照射衰減少的較強真空紫 外光，又因在藉由氧氣環境形成手段，形成在工件之周圍 的臭氧及活性氧的濃度，受到適當管理的富氧氣環境中， 照射真空紫外光，故光洗淨效果提高。 因而，若藉由本發明，就能提供一種抑制真空紫外光 衰減，並且很容易適當管理臭氧及活性氧之濃度的紫外光 照射裝置及使用該裝置的光洗淨裝置。 (5) (5)1322435 【實施方式】 〔用以實施發明的最佳形態〕 以下，參照圖面’說明用以實施本發明的第1形態。 第1圖至第4圖係表示用以實施本發明之紫外光照射 裝置及光洗淨裝置的第1形態’第1圖係爲槪念圖’第2 圖係紫外光照射裝置的部分剖面正面圖，第3圖係發光管 的部分切缺正面圖，第4圖係表示發光管及其支撐部及供 電部的正面圖及左右側面圖。 於本形態中，紫外光照射裝置UVE ’係具備：電介質 障壁放電燈EXL、高頻亮燈電路HFI、惰性氣體環境形成 手段IGB及氧氣環境形成手段02B。又，光洗淨裝置LW ，係由光洗淨裝置本體MB及紫外光照射裝置UVE所形成 <紫外光照射裝置UVE> (有關電介質障壁放電燈EXL) 紫外光照射裝置UVE，爲了產生所要光量的真空紫外 光，可配備所需要數量的電介質障壁放電燈EXL。配備複 數個電介質障壁放電燈EXL的時候，能以所需要的形態 排列該等’例如只要是以管軸相鄰接的方式所排列的形態 ，就能在最小限的面積中，配置多數個電介質障壁放電燈 EXL。 電介質障壁放電燈EXL，係具備：氣密容器1、準分 子形成氣體、內部電極2、及外部電極0E。再者，氣密容 -8- (6) (6)1322435 器1、準分子形成氣體 '及內部電極2，係事先組裝並構 成一體化的發光管LT。發光管LT，係如第3圖所示，在 其兩端裝配一對供電部3A、3B、及一對支撐部5、5。 氣密容器1 ’係由紫外線透過性的材料所形成，細長 的放電空間la是形成在內部。例如，密封細長管的兩端 ，就能在內部形成圓柱狀之放電空間la的構造。又，如 後述的第2形態’藉由密封雙層細長管的兩端，也能在內 部形成圓柱狀之細長放電空間1 a 的構造。紫外線透過性 的材料’一般是使用合成石英玻璃所製成。但是在本發明 中，只要是對於像利用所形成的波長之紫外線，具有透過 性，不管使用哪種材料都可構成。 又，雖然氣密容器1，爲了可確保所需要的紫外線量 ，容許以較窄的間隔，排列配置多數個電介質障壁放電燈 EXL而使用’以直線性優的直管爲佳，但就能稍微彎曲也 不礙事。實際上，在形成細長管之際，很容易略爲彎曲， 例如對全長約1200mm，可形成最大lmm左右以下的彎曲 。而且，該程度的彎曲，是容許大致形成直管的情形。 準分子產生氣，可使用氙（Xe)、氪（Kr)、氬（Ar )或是氦（He)等之稀有氣體的一種或是複數種的混合$ 是稀有氣體鹵化物，例如XeCl、KrCl等。再者，封入稀 有氣體鹵化物的情形下，也可爲以封入稀有氣體與氟（F )、氯（Cl )、溴（Br )或是碘（I )等的鹵素，在氣_密、 容器1的內部，產生鹵化物的方式所形成。又，除了準分 子產生氣，混合不會產生準分子的氣體，例如氖（Ne) g -9- (7) (7)1322435 ，也因情況而被容許。 內部電極2，係以隔著氣密容器1的壁面，與外部電 極〇E相對向的方式被配設。而且，內部電極2，係以露 出於氣密容器1之放電空間la內的方式被封入的形態， 及例如在氣密容器1的內側，被配設在放電空間1 a之外 部的形態的任何一種形態均可。後者之形態的情形下，例 如氣密容器1爲雙層管構造，內部電極2，係沿著形成在 氣密容器1之中心軸側的筒狀壁面而被配設。因而，於本 發明中，可理解的內部電極2，是指從外部觀看氣密容器 1的情形，相對的被配設在氣密容器1之內側的電極》 由以上說明即可理解，於本發明中，內部電極2，係 在氣密容器1的內部，在其管軸方向的約全長，即燈的有 效長之全體，產生電介質障壁放電的方式被配設的電極， 理想上，只要是在管軸方向爲較長的電極，其餘爲哪種構 成均可。再者，於第2圖及第4圖中，內部電極2圖示予 以省略。 針對第3圖所示的內部電極2的最佳構成例做說明。 即，該內部電極2，係在氣密容器1的軸向分散配置著具 備多數獨立的網狀部分2b，且在周圍，分別形成介設空隙 而配設之構成的網狀，並且成爲透過連結部分2a而連接 成一體化的構造，並以***到氣密容器1之內部的狀態所 配設的構成。藉由使用此種內部電極2，就能相對性增加 紫外線產生量。再者，網狀部分2b，係連續或分斷形成在 周方向均可》 -10- (8) 1322435 因而，於本發明中，內部電極2做成網狀的 其網狀部分2b，具體上例如容許做成環狀、螺旋 圈狀或是網目狀等。 其次，針對配設在內部電極2爲以石英玻璃 氣密容器1之內部的情形下的支撐構造及供電構 。將內部電極2封固定在氣密容器1內，係如第 ’可採用利用封固金屬箔lbl的封固構造。即， 極2之連結部分2a的兩端，拉長延伸而形成的 部2c，利用焊接等連接在封固金屬箔lbl，並將 2***到氣密容器1內之後，加熱端部的石英玻 軟化狀態，並從封固金屬箔lbl的上面壓封。如 ，在氣密容器1的端部形成封止部lb，內部電極 支撐在特定的位置。 供電部3A、3B，係爲構成用以對內部電極2 介質障壁放電所需要之電流的供電端。而且供霄 3B，係分別做成棒狀，內端是焊接於埋設在形成 器1之兩端的封止部lb的鉬箔lbl，基端則由形 容器1之兩端的封止部lb，朝向外部之管軸方向 ，供電部3B，係於後述的支撐部5之內部，分 接於供電線4。可是，供電部3A，雖露出於後 5a >內，但不會受電。再者，供電線4，係連接 高頻亮燈電路HFI的輸出端。 支撐部5，係如第4圖所示，分別具備：一 筒狀的蓋體5a、5a/、緊固環5b、5b'安裝臂 情形下， 狀或是線 所形成的 造做說明 3圖所示 將內部電 直線狀端 內部電極 璃，成爲 果這樣做 2就會被 ，供供電 :部 3A、 於氣密容 成在氣密 突出。又 別緊固連 述的蓋體 於後述的 對有底圓 5 c ' 5c" -11 - (9) (9)1322435 、緩衝彈簧5d、端子板兼安裝件5e及安裝螺栓5f。再者 ，於第4圖中，（a)係部份切缺正面圖，（b)係左側面 圖，（c )係右側面圖。 —對蓋體53、5^ ，係包圍發光管LT的兩端部。而 且，於第4圖中，右側的蓋體5a，係在其底部，具有將連 接於內部電極2的供電線4，透過陶瓷襯套5al而絕緣關 係插通的插通孔。蓋體5a /，係用來支撐發光管LT之第 1圖的左端部，只包圍發光管LT的端部。再者，蓋體5a ' 5 a / ，係以金屬及絕緣體之任一種所形成均可，且也能 因應需要，形成內面爲以絕緣體做內襯的金屬製。 緊固環5b，係配設在蓋體5a、5&>的各個開口端， 將蓋體5a、5a /固定在氣密容器1的端部。 —對安裝臂5 c、5 c /，係以從蓋體5 a的側面，於圖 中，朝向上方突出，利用螺釘固定在支撐部的方式所構成 ’並將發光管LT，在蓋體5a的上面抵接於第2圖所示的 定位臂8的狀態，利用安裝臂5c，安裝於圖未表示的固定 部分。安裝臂5c，是以絕緣關係安裝在蓋體5a。再者， 定位臂8，係如第2圖所示，隨著從外部電極0E的管軸 方向兩端’朝向氣密容器1的端部方向延設的發光管LT ’來限定氣密容器1的安裝位置。又，安裝臂5c，係以金 屬及絕緣體之任一種所形成均可，且也能因應需要，形成 在中間介設著絕緣物的構造，並與安裝位置之間形成絕緣 的構造。 ‘ 緩衝彈簧5d，係介設在安裝臂5c與後述的端子板兼 -12- 1322435 do) 安裝件5e之間，加以緩衝的支撐發光管LT。 端子板兼安裝件5e，係安裝發光管LT，並且在右側 端側連接著供電線4，並兼做端子板。 安裝螺栓5f，係將端子板兼安裝件5e，安裝在固定 位置。 這樣做，蓋體5a、5a /爲絕緣體製，或是以絕緣體爲 內襯的金屬製，或是將安裝臂5c、5c /，與安裝位置之間 形成絕緣的構造，或是將定位臂8本身，或是該臂8與支 撐部5之間予以絕緣，藉此由於在與供電部3 A、3 B之間 ，產生電暈放電，因此就能抑制來自電介質障壁放電燈的 紫外線放射減低。 外部電極OE，係至少在燈之有效長度的部分，以沿 著其管軸方向予以密接，或是保持適度的間隙予以延設的 方式，配設在氣密容器1的外面，並且，相對向於內部電 極2，利用與外部電極OE及內部電極2的偕同作動，並 且以至少在氣密容器1的放電空間1 a內，產生以氣密容 器1的其中一個壁面，作爲電介質之電介質障壁放電的方 式產生作用。 又’外部電極OE，係爲具備剛性的構成，及具備可 動性的構成之任一種均可。前者的情形下，做成由導電性 金屬所形成的熱容量較大的塊狀，即如圖所示的外部電極 OE。因而，根據需要’依然可將以往稱爲燈體的構件，作 爲外部電極使用。此情形下，可採用將以往所用的鋁製薄 板A1，挾持在外部電極OE與氣密容器！之間的構造。又 -13- (11) 1322435 ，爲了冷卻產生電介質障壁放電之區域的氣密容器1部分 ，可在外部電極0E配設冷卻手段（圖未表示）。此情形 下，冷卻手段，雖可爲任何的構成，但將冷媒流通到內部 的冷卻水路，外加在外部電極0E，或是形成一體附設在 內部的爲佳。進而，外部電極0E，係可作成連續的面狀 或是網狀的任一種狀態。再者，網狀，係爲做成網目狀、 冲孔狀、格子狀等。 (高頻亮燈電路HFI ) 高頻亮燈電路HFI，係於電介質障壁放電燈EXL的內 部電極2與外部電極OE之間，施加高頻電壓，推彈電介 質障壁放電燈EXL，而使其亮燈。高頻亮燈電路HFI，係 以並列反相器爲主體所構成，其高頻輸出，係分別以其高 電位側透過供電線4、4，施加於電介質障壁放電燈EXl 之發光管LT的一對供電部3 B，低電位側施加於外部電極 • 0E。 高頻亮燈電路HFI，係包含高頻產生手段，產生高頻 電壓’對電介質障壁放電燈EXL，供應其亮燈所需要的高 頻電力。再者，高頻係爲10kHz以上，最佳爲i〇〇kHz〜 2MHz之反覆頻率的脈衝電壓。高頻亮燈電路HFI輸出爲 脈衝電壓的情形下’例如可藉由使用矩形波輸出的反相器 ，得到矩形波的脈衝。 (針對惰性氣體環境形成手段IGB ) (12) (12)1322435 惰性氣體環境形成手段Ϊ GB ’係爲於照射真空紫外光 之工件W的周圍，形成富惰性氣體的環境區域R 1，以進 行局照度的真空紫外光照射，藉此提高工件W之洗淨能 力的手段。惰性氣體，可使用氮或氬等的稀有氣體類等。 再者’工件在連續移送的過程，受到真空紫外光之照 射的構成情形’係以事先在特定的位置，形成富惰性氣體 之環境區域R1的方式所構成亦可。如果像這樣，當工件 W被移送進入到富惰性氣體的環境區域ri內時，就會在 件W的周圍，形成富惰性氣體的環境。 富惰性氣體的環境，係爲惰性氣體的濃度，比大氣還 高的環境’容許使用適當的手段，形成該環境。例如，可 使用惰性氣體噴出手段或情性氣體圍阻手段等，形成富惰 性氣體的環境。 再者’因富惰性氣體之環境中的惰性氣體濃度愈高， 真空紫外光的衰減愈少，故能進行高照度的真空紫外光照 射’很理想。但是，如果是惰性氣體濃度，比大氣中的惰 性氣體濃度還高，真空紫外光的衰減，比在大氣中進行真 空紫外光照射的情形還要低，因而，相對的能進行高照度 的真空紫外光照射，很有效。 於第1圖的形態中，惰性氣體環境形成手段IGB，係 由惰性氣體噴出手段所形成。若藉由該手段，特別是從大 氣空間，利用分隔壁等隔間，例如從配設在工件之上方的 噴嘴等，最好是只向著工件W，噴出惰性氣體，就能形成 富惰性氣體的環境區域R1。 -15- (13) (13)1322435 又’惰性氣體環境形成手段IGB，係可爲與電介質障 壁放電燈EXL —體化’也可爲分離。在惰性氣體環境形 成手段IGB配設惰性氣體吹出口的情形下，該吹出口可爲 單一個，也可爲複數個。 進而，於上述照射區的一部分，形成富惰性氣體的環 境區域R1。富惰性氣體的環境區域R1，對上述照射區之 全體的比例’並未特別限定。例如，如第1圖所示，大致 可爲一半左右。可是，也能因應需要，形成一半分以上， 或一半分以下，或因情形而變化。 (有關氧氣環境形成手段02B ) 氧氣環境形成手段02B，係爲在工件W的周圍，形成 富氧氣環境的區域R2，在真空紫外光照射中，以臭氧及 活性氧之濃度’大到所需要之程度的方式，進行管理的手 段。而且，由電介質障壁放電燈EXL所照射的真空紫外 光’在通過藉由氧氣環境形成手段02B所形成的富氧之環 境區域R2中時’以藉由使氧分子解離、結合，而產生臭 氧’或者產生活性氧，且藉由紫外光照射裝置UVE提高 工件W之洗淨能力的方式產生作用。 再者’工件W在連續移送的過程，受到真空紫外光 之照射的構成情形，係以事先在特定的位置，形成富氧氣 之環境區域R2的方式所構成亦可。如果像這樣，當工件 W被移送進入到富氧氣的環境區域R2內時，就會在件w 的周圍，形成富氧氣的環境。 -16- (14) (14)1322435 藉由氧氣環境形成手段o2b所形成的富氧之環境中的 氧氣，係在工件W的表面附近，不光是氧100%，也可混 合惰性氣體。可是，氧濃度比空氣還高，藉此臭氧及活性 氧之所需要的濃度就變得很容易管理。 爲了形成富氧氣的環境區域R2，可使用適當的手段 ，來構成氧氣環境形成手段02B。 又，氧氣環境形成手段o2b，係可爲與電介質障壁放 電燈EXL —體化，也可爲分離。氧氣環境形成手段〇2B 的氧氣吹出口，係可爲單一個，也可爲複數個。 進而，富氧氣的環境區域R2，對上述照射區之全體 的比例，並未特別限定。例如，如第1圖所示，大致可爲 一半左右。可是，也能因應需要，形成一半分以上，或一 半分以下，或因情形而變化。 更又，氧氣環境形成手段〇2B，最好配置在工件W之 真空紫外光照射區的相對上的終端部側，即惰性氣體吹出 手段IGB的下流側》可是，也可因應需要，爲上述之相反 的配置。又，也容許分別配設複數個惰性氣體環境形成手 段IGB及氧氣環境形成手段〇2B，且亦能沿著工件W的 移動方向，交互配置。 (有關紫外光照射裝置UVE之其他的構成） 紫外光照射裝置UVE之其他的構成，可具備：將以 上說明的電介質障壁放電燈EXL、惰性氣體環境形成手段 IGB及氧氣環境形成手段〇2B，收納在內部，而將該等的 -17- (15) (15)1322435 各要件，保持在特定之位置關係的本體外殼BC。再者，高 頻亮燈電路HFI，係配置在與其他構成要件相分離的位置。 可是，當然不能配設在，與收納於本體外殼BC內等之其 他構成要件一起的位置。 <光洗淨裝置LW> (有關光洗淨裝置本體MB) 光洗淨裝置本體MB，係從光洗淨裝置LW，刪除紫外 光照射裝置UVE的剩餘部分。而且，例如容許光洗淨裝 置本體MB包含：紫外光照射裝置UVE的支撐機構SM、 及工件搬送機構TM及控制盤等。 支撐機構SM，係以將真空紫外光，照送到被搬送的 工件W的方式，將紫外光照射裝置UVE支撐在特定之位 置的手段。又，支撐機構SM，係朝向對工件W之移動方 向而正交的方向，來支撐紫外光照射裝置UVE的電介質 障壁放電燈EXL的管軸方向爲佳。因電介質障壁放電燈 EXL，很容易賦予該管軸方向，較均勻的照度分布，故藉 由朝向上述的方向，來支撐紫外光照射裝置UVE，就容易 對工件W，均勻的照射真空紫外光。 工件搬送機構TM，係爲使工件W對紫外光照射裝置 UVE做相對性的移動，而使其照射到真空紫外光的移動手 段。於第1圖所示的形態中，係藉由滾輪搬送機構所構成 〇 控制盤（圖未表示），係對光洗淨裝置LW全體，進 18- (16)13224351322435 Π) Description of the Invention [Technical Field of the Invention] The present invention relates to an ultraviolet light irradiation device and a light cleaning device using the same. [Prior Art] A dielectric barrier discharge lamp, which is a quasi-molecular discharge lamp that emits a near-inherent monochromatic emission, such as a rare gas such as helium or a halide of a rare gas, is subjected to a silent discharge, that is, a dielectric barrier discharge. That is, most of them are described in the literature. In the dielectric barrier discharge, a pulse current flows. Since the pulsed current has a high-speed electron flow and a large rest period, the substance that emits ultraviolet light such as helium is temporarily combined into a molecular state (excimer state), and when the state returns to the substrate state, It will release efficiently and absorb less short-wavelength ultraviolet light. Further, in the case of helium, a molecular luminescence having a wide width of half a 中心 at a center wavelength of 172 nm was performed. The ultraviolet light having a wavelength of 1 to 72 nm is larger than the ultraviolet light having a wavelength of 185 nm or 254 nm obtained by a low-pressure mercury lamp, and is larger than the combined electric energy of the organic compound for decomposition. Therefore, the combination of the above organic compounds can be cut by irradiating ultraviolet rays 172 having a wavelength of 172 nm to be decomposed and removed. Further, 'the active oxygen is generated by decomposing oxygen in the atmosphere by irradiating ultraviolet light at a wavelength of 172 nm in an atmospheric environment, and the combined organic compound is reacted with active oxygen to generate carbon dioxide (C02) or Water (H2 〇) or the like becomes easy to remove organic compounds. Therefore, the 'dielectric barrier discharge lamp' is extremely effective as a light source for a vacuum ultraviolet light irradiation device and a light cleaning device using the -4-(2)(2)1322435 device. In a dielectric barrier discharge lamp, it is known that a dielectric barrier discharge is performed using an elongated tubular airtight container as a dielectric barrier discharge lamp (refer to Patent Document 1). The dielectric barrier discharge lamp described in Patent Document 1 is an elongated airtight container, and includes an internal electrode extending in the axial direction of the hermetic container, and an emission of excimer gas generated in the hermetic container. The tube 'has a cooling function, and a recessed aluminum lamp body is used as an external electrode in a manner to fit a part of the outer surface of the airtight container, abutting on the outside of the airtight container, and along the tube of the airtight container The axial direction is such that the same dielectric barrier discharge is generated, and the heat generated by the arc tube is quickly dissipated, so that the luminous efficiency is maintained at a high state. Further, in order to make the external electrode and the airtight container in close contact with each other, the two are formed by pressure bonding. When the above-described conventional dielectric barrier discharge lamp is used for ultraviolet irradiation, a longer dielectric barrier discharge lamp is developed as the size of the object to be irradiated increases, and the effective length exceeds lm. If a long dielectric barrier discharge lamp is used, it can be used for industrial applications such as honing of a large-area liquid crystal substrate, curing of a photosensitive resin, and sterilization. It is known that a light irradiation device using an elongated dielectric barrier discharge lamp, that is, an ultraviolet light irradiation device (see, for example, Japanese Patent Laid-Open Publication No. 2). In the ultraviolet light irradiation device, a light extraction window is disposed in the lower opening of the main body casing, and the dielectric barrier discharge lamp and the metal block are combined and housed therein, and an inert gas such as nitrogen is caused to flow into the inside of the main body casing. The dielectric barrier discharge lamp is turned on to suppress the attenuation of vacuum ultraviolet light -5- (3) 1322435. Further, the ultraviolet light irradiation device is used as a light source such as a light cleaning device in the atmosphere. [Patent Document 1] Japanese Laid-Open Patent Publication No. 2003-197999 (Patent Document 2) Japanese Laid-Open Patent Publication No. 2002-168999 (Summary of the Invention) [Explanation of the Invention] A conventional ultraviolet light irradiation device can suppress Attenuation of vacuum ultraviolet light within the body casing. However, since there is an atmosphere between the workpiece processed by the ultraviolet light irradiation device and the irradiation of the ultraviolet light, the atmosphere is attenuated due to the vacuum ultraviolet light being irradiated to the workpiece. Since this attenuation 'is reduced the effect of vacuum ultraviolet light irradiation, there is a problem that cannot be ignored. φ In addition, the optical cleaning device is used to decompose organic matter in order to irradiate the workpiece with vacuum ultraviolet light. However, in order to improve the light cleaning effect, it is desirable to appropriately manage the concentration of ozone and active oxygen. However, in the conventional light cleaning apparatus, the above-described management is difficult. Therefore, there is a problem that the light cleaning of the workpiece cannot be performed efficiently. The present invention has an object of providing an ultraviolet light irradiation device capable of appropriately controlling the concentration of ozone and active oxygen at the time of irradiating a vacuum ultraviolet light to a workpiece in the atmosphere, and capable of appropriately managing the concentration of ozone and active oxygen, and washing with the light using the device Device. -6- (4) (4) 1322435 [Means for Solving the Problem] The ultraviolet light irradiation device of the present invention is characterized by comprising: an excimer discharge lamp that generates vacuum ultraviolet light; and a light for emitting the excimer discharge lamp a high-frequency lighting circuit; and an inert gas environment forming means for forming an inert gas-rich environment around the workpiece in the direction of the vacuum ultraviolet light toward the excimer discharge lamp; and forming a position in the inert gas environment along the moving direction of the workpiece The position of the separation, and the direction of the vacuum ultraviolet light toward the excimer discharge lamp, forms an oxygen-enriched oxygen environment forming means around the workpiece. The optical cleaning device of the present invention is characterized by comprising: a photo-cleaning device body; and an ultraviolet ray irradiation device described in the first application of the optical cleaning device body. [Effect of the Invention] In the present invention, since the inert gas atmosphere forming means and the oxygen atmosphere forming means are provided, the inert gas atmosphere forming means forms an inert gas atmosphere around the workpiece, and the radiation decay is strong. The vacuum ultraviolet light is also irradiated with vacuum ultraviolet light in an oxygen-rich environment that is properly managed due to the concentration of ozone and active oxygen formed around the workpiece by means of an oxygen environment forming means, so that the light washing effect is improved. Therefore, according to the present invention, it is possible to provide an ultraviolet light irradiation apparatus which suppresses the attenuation of vacuum ultraviolet light and which can easily manage the concentration of ozone and active oxygen, and a light cleaning apparatus using the same. (5) (5) 1322435 [Embodiment] [Best Mode for Carrying Out the Invention] Hereinafter, a first aspect for carrying out the invention will be described with reference to the drawings. Fig. 1 to Fig. 4 show a first aspect of the ultraviolet light irradiation device and the optical cleaning device for carrying out the present invention. Fig. 1 is a schematic view of the second embodiment of the ultraviolet light irradiation device. Fig. 3 is a front view showing a portion of the arc tube, and Fig. 4 is a front view and left and right side views showing the arc tube, its support portion, and the power supply portion. In the present embodiment, the ultraviolet light irradiation device UVE' includes a dielectric barrier discharge lamp EXL, a high-frequency lighting circuit HFI, an inert gas environment forming means IGB, and an oxygen atmosphere forming means 02B. Further, the optical cleaning device LW is formed by the optical cleaning device body MB and the ultraviolet light irradiation device UVE, <ultraviolet light irradiation device UVE> (related to dielectric barrier discharge lamp EXL) ultraviolet light irradiation device UVE, in order to generate a desired amount of light The vacuum ultraviolet light can be equipped with the required number of dielectric barrier discharge lamps EXL. When a plurality of dielectric barrier discharge lamps EXL are provided, they can be arranged in a desired form. For example, as long as the tube axes are arranged adjacent to each other, a plurality of dielectrics can be arranged in a minimum area. Barrier discharge lamp EXL. The dielectric barrier discharge lamp EXL includes an airtight container 1, a quasi-molecular forming gas, an internal electrode 2, and an external electrode OE. Further, the airtight container -8-(6) (6) 1322435, the excimer-forming gas 'and the internal electrode 2 are assembled and formed into an integrated light-emitting tube LT. As shown in Fig. 3, the arc tube LT is provided with a pair of power supply portions 3A and 3B and a pair of support portions 5 and 5 at both ends thereof. The airtight container 1' is formed of an ultraviolet permeable material, and the elongated discharge space la is formed inside. For example, by sealing both ends of the elongated tube, a cylindrical discharge space la can be formed inside. Further, as in the second aspect described later, the structure of the cylindrical elongated discharge space 1 a can be formed inside by sealing both ends of the double-layered elongated tube. The ultraviolet permeable material 'is generally made of synthetic quartz glass. However, in the present invention, any material can be used as long as it is transparent to ultraviolet rays having a wavelength formed by the use. Further, in order to secure the required amount of ultraviolet rays, the airtight container 1 is allowed to arrange a plurality of dielectric barrier discharge lamps EXL at a narrow interval, and it is preferable to use a straight tube excellent in linearity, but it is possible to slightly Bending does not get in the way. In fact, when the elongated tube is formed, it is easy to bend slightly, for example, for a total length of about 1200 mm, a bending of about 1 mm or less can be formed. Moreover, this degree of bending is a case where a straight pipe is almost formed. The excimer generates gas, and one or a mixture of rare gases such as Xe, Kr, Ar or He may be used as a rare gas halide such as XeCl or KrCl. Wait. Further, in the case of encapsulating a rare gas halide, it is also possible to encapsulate a rare gas with a halogen such as fluorine (F), chlorine (Cl), bromine (Br) or iodine (I), in a gas-tight container. The inside of 1 is formed by a method of generating a halide. Further, in addition to quasi-molecular gas generation, mixing does not generate excimer gas, such as 氖(Ne) g -9-(7) (7) 1322435, which is also allowed due to circumstances. The internal electrode 2 is disposed so as to face the external electrode 〇E with the wall surface of the airtight container 1 interposed therebetween. Further, the internal electrode 2 is sealed in such a manner as to be exposed in the discharge space 1a of the airtight container 1, and, for example, any of the forms disposed outside the discharge space 1a inside the airtight container 1 One form is available. In the case of the latter form, for example, the hermetic container 1 has a double tube structure, and the internal electrode 2 is disposed along a cylindrical wall surface formed on the central axis side of the hermetic container 1. Therefore, in the present invention, the inner electrode 2 that can be understood refers to the case where the airtight container 1 is viewed from the outside, and the electrode that is disposed on the inner side of the airtight container 1 is understood from the above description. In the invention, the internal electrode 2 is an electrode disposed inside the hermetic container 1 in such a manner that the entire length in the tube axis direction, that is, the effective length of the lamp, causes the dielectric barrier to be discharged, and ideally, as long as it is The electrode in the tube axis direction is long, and the rest can be configured. Further, in Figs. 2 and 4, the internal electrode 2 is shown omitted. A description will be given of a preferred configuration example of the internal electrode 2 shown in Fig. 3. In other words, the internal electrode 2 has a mesh shape in which a plurality of independent mesh portions 2b are disposed in the axial direction of the airtight container 1, and a space is formed in the periphery thereof, and is configured to be transparently connected. The portion 2a is connected to an integrated structure, and is configured to be inserted into the inside of the airtight container 1. By using such an internal electrode 2, the amount of ultraviolet light generated can be relatively increased. Further, the mesh portion 2b may be formed continuously or in a divided manner in the circumferential direction. -10- (8) 1322435 Thus, in the present invention, the internal electrode 2 is formed into a mesh-like mesh portion 2b, specifically For example, it is allowed to be formed into a ring shape, a spiral ring shape, or a mesh shape. Next, the support structure and the power supply structure in the case where the internal electrode 2 is inside the quartz glass airtight container 1 are disposed. The internal electrode 2 is sealed and fixed in the hermetic container 1, and a sealing structure using the sealing metal foil 1b1 can be employed as the first embodiment. In other words, the both ends of the connecting portion 2a of the pole 2 are elongated and extended, and the portion 2c formed by the extension is joined to the sealing metal foil lb1 by welding or the like, and after the 2 is inserted into the airtight container 1, the quartz glass of the end is heated. The state is softened and sealed from the upper surface of the sealing metal foil lbl. For example, a sealing portion 1b is formed at the end of the airtight container 1, and the internal electrode is supported at a specific position. The power supply portions 3A and 3B are power supply terminals that constitute a current required to discharge the dielectric barrier of the internal electrode 2. Further, the supply port 3B is formed in a rod shape, and the inner end is a molybdenum foil lb1 welded to the sealing portion 1b embedded at both ends of the former 1, and the base end is oriented by the sealing portion lb at both ends of the shape container 1. In the external tube axis direction, the power supply portion 3B is connected to the inside of the support portion 5 to be described later, and is branched to the power supply line 4. However, the power supply unit 3A is exposed to the rear 5a > but does not receive power. Furthermore, the power supply line 4 is connected to the output of the high frequency lighting circuit HFI. As shown in Fig. 4, the support portion 5 includes a cylindrical lid body 5a, 5a/, and a fastening ring 5b, 5b' in the case of a mounting arm, and a shape or a line is formed. As shown in the figure, the inner electrode of the inner end of the linear end is made to be used for power supply: the portion 3A is hermetically sealed to be airtight. Further, the cover body is not fastened to the bottomed circle 5 c ' 5c" -11 - (9) (9) 1322435, the buffer spring 5d, the terminal block-mounting member 5e, and the mounting bolt 5f which will be described later. Furthermore, in Fig. 4, (a) is partially cut away from the front view, (b) is the left side view, and (c) is the right side view. - The cover bodies 53, 5^ surround the both ends of the arc tube LT. Further, in Fig. 4, the lid body 5a on the right side has an insertion hole through which the power supply wire 4 connected to the internal electrode 2 is inserted through the ceramic bush 5a and insulated. The lid body 5a / is used to support the left end portion of the first diagram of the arc tube LT, and surrounds only the end portion of the arc tube LT. Further, the lid body 5a ' 5 a / may be formed of either a metal or an insulator, and the inner surface may be made of a metal lining the insulator if necessary. The fastening ring 5b is disposed at each of the open ends of the lids 5a, 5&>, and the lids 5a, 5a/ are fixed to the end of the airtight container 1. - the pair of mounting arms 5 c and 5 c / are formed from the side surface of the lid body 5 a so as to protrude upward in the drawing, and are fixed by screws to the support portion, and the light-emitting tube LT is placed on the lid body 5a. The upper surface is in contact with the positioning arm 8 shown in Fig. 2, and is attached to a fixed portion not shown by the mounting arm 5c. The mounting arm 5c is attached to the cover 5a in an insulating relationship. Further, as shown in FIG. 2, the positioning arm 8 defines the hermetic container 1 along the light-emitting tube LT' extending from both ends in the tube axis direction of the external electrode OE toward the end portion of the airtight container 1. Installation location. Further, the mounting arm 5c may be formed of any one of a metal and an insulator, and may have a structure in which an insulator is interposed therebetween as needed, and an insulating structure is formed between the mounting position and the mounting position. The 'buffer spring 5d is interposed between the mounting arm 5c and a terminal plate -12-1322435 do to be described later) between the mounting members 5e, and is supported by the light-emitting tube LT. The terminal block and mounting member 5e is provided with an arc tube LT, and a power supply line 4 is connected to the right end side, and also serves as a terminal board. The mounting bolt 5f is attached to the terminal block and mounting member 5e in a fixed position. In this way, the cover 5a, 5a / is an insulating system, or an insulator-lined metal, or a structure in which the mounting arms 5c, 5c / are insulated from the mounting position, or the positioning arm 8 is to be provided. In either case, the arm 8 and the support portion 5 are insulated from each other, whereby corona discharge is generated between the power supply portions 3A and 3B, so that the ultraviolet radiation emission from the dielectric barrier discharge lamp can be suppressed. The external electrode OE is disposed at least in the effective length portion of the lamp so as to be closely adhered along the tube axis direction thereof or to be extended by maintaining a moderate gap, and is disposed outside the airtight container 1 and oppositely The internal electrode 2 is operated by the same function as the external electrode OE and the internal electrode 2, and at least in one of the wall surfaces of the hermetic container 1 in the discharge space 1a of the hermetic container 1, the dielectric barrier is discharged as a dielectric. The way it works. Further, the external electrode OE may have any configuration having rigidity and a configuration having mobility. In the former case, a block shape having a large heat capacity formed of a conductive metal, that is, the external electrode OE as shown in the drawing is formed. Therefore, a member conventionally referred to as a lamp body can be used as an external electrode as needed. In this case, the aluminum sheet A1 used in the past can be held in the external electrode OE and the airtight container! The construction between. Further, -13-(11) 1322435, in order to cool the portion of the hermetic container 1 in the region where the dielectric barrier discharge occurs, a cooling means (not shown) may be disposed on the external electrode 0E. In this case, the cooling means may have any configuration. However, it is preferable that the cooling water flowing through the inside of the refrigerant is applied to the external electrode OE or integrally formed inside. Further, the external electrode OE can be formed in any of a continuous planar shape or a mesh shape. Further, the mesh shape is formed into a mesh shape, a punched shape, a lattice shape, or the like. (High-frequency lighting circuit HFI) The high-frequency lighting circuit HFI is applied between the internal electrode 2 of the dielectric barrier discharge lamp EXL and the external electrode OE, and a high-frequency voltage is applied to push the dielectric barrier discharge lamp EXL to illuminate. The high-frequency lighting circuit HFI is mainly composed of a parallel inverter, and its high-frequency output is applied to the pair of power supply tubes LT of the dielectric barrier discharge lamp EX1 through the high-potential side through the power supply lines 4 and 4, respectively. Part 3 B, the low potential side is applied to the external electrode • 0E. The high-frequency lighting circuit HFI includes a high-frequency generating means for generating a high-frequency voltage 'to the dielectric barrier discharge lamp EXL, supplying the high-frequency power required for the lighting. Further, the high frequency system is 10 kHz or more, and is preferably a pulse voltage of a repetition frequency of i 〇〇 kHz to 2 MHz. In the case where the high-frequency lighting circuit HFI is output as a pulse voltage, for example, a pulse of a rectangular wave can be obtained by using an inverter of a rectangular wave output. (Infrared gas environment forming means IGB) (12) (12) 1322435 Inert gas environment forming means Ϊ GB ' is formed around the workpiece W that irradiates vacuum ultraviolet light to form an inert gas-rich environmental region R 1 for the board The means of illuminating the vacuum ultraviolet light to thereby improve the cleaning ability of the workpiece W. As the inert gas, a rare gas such as nitrogen or argon or the like can be used. Further, the configuration in which the workpiece is continuously transferred and subjected to irradiation by vacuum ultraviolet light may be configured such that an inert gas-rich environmental region R1 is formed at a specific position in advance. If so, when the workpiece W is transferred into the environmental region ri of the inert gas-rich gas, an inert gas-rich environment is formed around the member W. An inert gas-rich environment is a concentration of an inert gas, and an environment higher than the atmosphere 'allows the use of appropriate means to form the environment. For example, an inert gas discharge means or an inert gas containment means can be used to form an environment rich in inert gas. Furthermore, the higher the concentration of the inert gas in the environment rich in inert gas, the less the attenuation of the vacuum ultraviolet light, so that it is possible to perform high-intensity vacuum ultraviolet light irradiation. However, if the concentration of the inert gas is higher than the concentration of the inert gas in the atmosphere, the attenuation of the vacuum ultraviolet light is lower than that in the case of vacuum ultraviolet light irradiation in the atmosphere, and thus the relatively high-intensity vacuum ultraviolet light can be performed. Light irradiation is very effective. In the embodiment of Fig. 1, the inert gas atmosphere forming means IGB is formed by an inert gas discharge means. According to this means, in particular, from the air space, by using a partition such as a partition wall, for example, from a nozzle disposed above the workpiece, it is preferable to form an inert gas only by spraying an inert gas toward the workpiece W. Environmental area R1. -15- (13) (13) 1322435 Further, the inert gas atmosphere forming means IGB may be formed separately from the dielectric barrier discharge lamp EXL. In the case where the inert gas atmosphere forming means IGB is provided with an inert gas outlet, the outlets may be single or plural. Further, an inert gas-rich environmental region R1 is formed in a part of the irradiation region. The ratio of the atmosphere region R1 rich in inert gas to the entire irradiation region is not particularly limited. For example, as shown in Fig. 1, it can be roughly half. However, it can also be formed by more than half of the score, or less than half of the score, or depending on the situation. (Regarding the oxygen environment forming means 02B) The oxygen environment forming means 02B is a region R2 in which an oxygen-rich environment is formed around the workpiece W, and in the vacuum ultraviolet light irradiation, the concentration of ozone and active oxygen is as large as necessary. The means of management and the means of management. Further, when the vacuum ultraviolet light 'irradiated by the dielectric barrier discharge lamp EXL' passes through the oxygen-rich environmental region R2 formed by the oxygen atmosphere forming means 02B, 'the ozone is generated by dissociating and bonding the oxygen molecules'. Alternatively, active oxygen is generated and acts by means of the ultraviolet light irradiation device UVE to improve the cleaning ability of the workpiece W. Further, the configuration in which the workpiece W is irradiated with vacuum ultraviolet light during the continuous transfer process may be configured such that the oxygen-rich environmental region R2 is formed at a specific position in advance. If so, when the workpiece W is transferred into the oxygen-rich environmental region R2, an oxygen-rich environment is formed around the member w. -16- (14) (14) 1322435 The oxygen in the oxygen-rich environment formed by the oxygen environment forming means o2b is in the vicinity of the surface of the workpiece W, not only 100% of oxygen, but also an inert gas. However, the oxygen concentration is higher than that of air, whereby the concentration required for ozone and active oxygen becomes easy to manage. In order to form the oxygen-rich environmental region R2, an oxygen environment forming means 02B may be constructed using an appropriate means. Further, the oxygen environment forming means o2b may be formed separately from the dielectric barrier discharge lamp EXL or may be separated. The oxygen atmosphere forming means 〇2B of the oxygen blowing outlet may be a single one or a plurality of. Further, the ratio of the oxygen-rich environmental region R2 to the entire irradiation region is not particularly limited. For example, as shown in Fig. 1, it can be roughly half. However, it can also be formed by more than half of the score, or less than half of the score, or as the situation may change. Further, the oxygen atmosphere forming means 〇2B is preferably disposed on the opposite end portion side of the vacuum ultraviolet light irradiation region of the workpiece W, that is, the downstream side of the inert gas blowing means IGB", or may be required as described above. The opposite configuration. Further, it is also possible to arrange a plurality of inert gas atmospheres to form the hand IGB and the oxygen environment forming means 〇2B, respectively, and to arrange them alternately along the moving direction of the workpiece W. (Other configuration of the ultraviolet light irradiation device UVE) The other configuration of the ultraviolet light irradiation device UVE may include the dielectric barrier discharge lamp EXL, the inert gas environment forming means IGB, and the oxygen atmosphere forming means 〇2B described above. Internally, the elements of -17-(15)(15)1322435 are held in a body casing BC in a specific positional relationship. Furthermore, the high frequency lighting circuit HFI is disposed at a position separated from other components. However, of course, it cannot be disposed at a position together with other components that are housed in the main body casing BC or the like. <Light Cleaning Apparatus LW> (About the optical cleaning apparatus main body MB) The optical cleaning apparatus main body MB removes the remaining portion of the ultraviolet light irradiation apparatus UVE from the optical cleaning apparatus LW. Further, for example, the optical cleaning apparatus main body MB includes a support mechanism SM of the ultraviolet light irradiation device UVE, a workpiece transport mechanism TM, a control panel, and the like. The support mechanism SM is a means for supporting the ultraviolet light irradiation device UVE at a specific position in such a manner that the vacuum ultraviolet light is irradiated to the workpiece W to be conveyed. Further, the support mechanism SM preferably has a direction of the tube axis of the dielectric barrier discharge lamp EXL supporting the ultraviolet light irradiation device UVE in a direction orthogonal to the moving direction of the workpiece W. Since the dielectric barrier discharge lamp EXL can easily impart a uniform illumination distribution to the tube axis direction, it is easy to uniformly irradiate the workpiece W with vacuum ultraviolet light by supporting the ultraviolet light irradiation device UVE toward the above direction. The workpiece transfer mechanism TM is a moving means for causing the workpiece W to move relative to the ultraviolet light irradiation device UVE to be irradiated to the vacuum ultraviolet light. In the embodiment shown in Fig. 1, the control panel (not shown) is constituted by the roller transport mechanism, and the entire light cleaning device LW is incorporated into 18-(16) 1322435.
行所需要的控制。 <紫外光照射裝置UVE及光洗淨裝置LW的動們 紫外光照射裝置UVE ’係如下進行動作。長 障壁放電燈EXL’是供電線4經由高頻亮燈電辞 頻輸出端的一方，例如高壓側輸出端’被連接至 極2往外部被導出的供電部3Β。而且例如低屢 側輸出端，被連接到外部電極〇Ε的一端。 因而，如果投入圖未表示的輸入電源，高海 HFI，會產生高頻脈衝電壓，該高頻脈衝電壓， 加到內部電極2、和在此透過氣密容器1之壁i 的外部電極〇E之間。其結果，在氣密容器1纪 產生電介質障壁放電。藉由該電介質障壁放電， 的準分子，產生以172nm爲中心波長的真空紫少 紫外光，會透過氣密容器1的壁面，朝外部被_ 出到外部的真空紫外光，就能因應於照射到工f 各個目的而加以利用。 又，紫外光照射裝置UVE，除了真空紫外 ，還分別從惰性氣體環境形成手段IG B及氧氣 段〇2B，噴出惰性氣體例如氧氣，藉此在真空 射區域中，富惰性氣體的環境區域R1與富氧 域R2’會形成在沿著以箭頭D所示的工件w ，而互相分離的位置。 在富惰性氣體的環境區域R1中，因能有 > ，電介質 HFI之高 從內部電 (接地） 亮燈電路 就會被施 而相對向 內部，會 並利用氙 光。真空 出。被導 W等的 的照射外 境形成手 外光的照 的環境區 搬送方向 抑制真空 -19- (17) (17)1322435 紫外光的衰減，故可藉由高照度的真空紫外光照射，來增 進工件W的洗淨效果。 其次，工件W，若進一步搬送到達富氧氣的環境區域 R2 ’此次在該區域R2內，氧受到真空紫外光照射，會藉 由氧分子的解離、結合，而形成臭氧，或者產生活性氧來 控制氧濃度，藉此以所需要的較高値，來管理臭氧量及活 性氧量，就能藉此提高工件W的洗淨效果。 由於以上的作用，因此就能提高紫外光照射裝置UV E 及光洗淨裝置LW之真空紫外光的照射效果。又，因附加 上藉由臭氧與活性氧所致的洗淨效果，故可提高光洗淨效 果。 其次，參照第5圖，將本發明的光洗淨效果與比較例 的光洗淨效果，邊做比較邊做說明。 第5圖係表示將本發明的光洗淨效果與比較例的光洗 淨效果加以比較的座標圖。於圖中分別以橫軸表示照射時 間（秒），縱軸表示接觸角〇。又，圖中分別以曲線A表 示本發明，曲線B表示比較例。再者，比較例是在大氣中 ，進行真空紫外光照射的情形。 由圖即可理解，於本發明中，照射時間爲5秒，接觸 角下降到5°。對此，於比較例中，接觸角雖下降到5°，但 必需進行8秒的光照射。 以下，參照第6圖至第8圖，針對本發明之紫外光照 射裝置及光洗淨裝置的其他形態做說明。再者，於各圖中 ，針對與第1圖至第4圖相同的部分，附上相同的符號， -20- (18) (18)1322435 省略說明。 第6圖係表示用以實施本發明之紫外光照射裝置及光 洗淨裝置的第2形態的紫外光照射裝置及具備該裝置的光 洗淨裝置的槪念圖。 於本形態中，紫外光照射裝置UVE，係活性氣體環境 形成手段IGB爲由遮蔽構造式的惰性氣體圍阻手段所形成 。惰性氣體圍阻手段，除了惰性氣體吹出手段外，還具備 圍阻手段E。圍阻手段E ’雖是以從惰性氣體吹出手段所 吹出的惰性氣體’往外部漏出的方式，與外部之間形成遮 蔽之分隔壁的構造，但以容許工件W出入的方式所構成 。而且，分隔壁，係例如做成從本體外殼BC往下垂的幕 狀乃至下垂壁狀，來包圍富惰性氣體的環境區域R1。 又，圍阻手段E ’雖然是盡量對環境阻止漏出，但以 容許工件W出入的方式所構成。圍阻手段e做成幕狀的 情形下’在工件W出入時，圍阻手段E會依據其柔軟性 而變形。又，做成下垂壁狀的情形下，隨著工件W出入 的連動，圍阻手段E，則在工件W可出入的程度，上下動 作，或者事先在下部，形成工件W出入用的間隙。 像這樣，若根據本形態，具備圍阻手段E，藉此抑制 惰性氣體的使用量，並且變得易昇高惰性氣體濃度。 第7圖係表示用以實施本發明之紫外光照射裝置及光 洗淨裝置的第3形態的紫外光照射裝置及具備該裝置的光 洗淨裝置的槪念圖。 於本形態中，紫外光照射裝置UVE，係活性氣體環境 -21 - (19) (19)The control required for the line. <Motion of ultraviolet light irradiation device UVE and light cleaning device LW The ultraviolet light irradiation device UVE' operates as follows. The long barrier discharge lamp EXL' is one of the power supply lines 4 via the high frequency lighting electrical frequency output terminal, for example, the high voltage side output terminal ' is connected to the power supply portion 3 that is led to the outside by the pole 2. Also, for example, the low side output is connected to one end of the external electrode 〇Ε. Therefore, if the input power source not shown in the figure is input, the high sea HFI generates a high frequency pulse voltage which is applied to the internal electrode 2 and the external electrode 透过E which passes through the wall i of the airtight container 1 between. As a result, dielectric barrier discharge occurs in the airtight container. By the excimer of the dielectric barrier discharge, a vacuum purple ultraviolet light having a center wavelength of 172 nm is generated, and the vacuum ultraviolet light which is transmitted to the outside through the wall surface of the airtight container 1 can be irradiated to the outside. It is used for each purpose of work. Further, the ultraviolet light irradiation device UVE, in addition to the vacuum ultraviolet light, separately forms the means IG B and the oxygen gas section B2B from the inert gas atmosphere, and ejects an inert gas such as oxygen, whereby the inert gas-rich environmental region R1 and the vacuum injection region are The oxygen-rich domain R2' is formed at a position separated from each other along the workpiece w indicated by an arrow D. In the inert gas-rich environmental region R1, because of the >, the dielectric HFI is high. From the internal electricity (ground), the lighting circuit is applied to the inside, and the light is used. Vacuum out. In the environment of the illuminating environment where the external light is formed by the light, etc., the direction of the transfer of the ambient light is suppressed. Vacuum-19- (17) (17) 1322435 The attenuation of ultraviolet light can be irradiated by high-intensity vacuum ultraviolet light. Improve the cleaning effect of the workpiece W. Next, the workpiece W is further transported to the oxygen-rich environmental region R2'. In this region R2, oxygen is irradiated by vacuum ultraviolet light, and ozone is formed by dissociation and combination of oxygen molecules, or active oxygen is generated. By controlling the oxygen concentration, the ozone amount and the amount of active oxygen are managed at a higher enthalpy required, whereby the cleaning effect of the workpiece W can be improved. Due to the above effects, the irradiation effect of the ultraviolet light of the ultraviolet light irradiation device UV E and the light cleaning device LW can be improved. Further, since the cleaning effect by ozone and active oxygen is added, the light washing effect can be improved. Next, the light washing effect of the present invention and the light washing effect of the comparative example will be described with reference to Fig. 5 for comparison. Fig. 5 is a graph showing the comparison of the photo-cleaning effect of the present invention with the photo-cleaning effect of the comparative example. In the figure, the irradiation time (seconds) is indicated by the horizontal axis, and the contact angle 〇 is indicated by the vertical axis. Further, the present invention is represented by a curve A in the figure, and a curve B shows a comparative example. Further, the comparative example is a case where vacuum ultraviolet light is irradiated in the atmosphere. As can be understood from the figure, in the present invention, the irradiation time is 5 seconds, and the contact angle is lowered to 5°. On the other hand, in the comparative example, although the contact angle was lowered to 5°, it was necessary to perform light irradiation for 8 seconds. Hereinafter, other aspects of the ultraviolet light irradiation device and the optical cleaning device of the present invention will be described with reference to Figs. 6 to 8 . In the drawings, the same reference numerals are given to the same portions as those in the first to fourth embodiments, and -20-(18)(18)1322435 is omitted. Fig. 6 is a view showing the ultraviolet light irradiation device of the second embodiment for carrying out the ultraviolet light irradiation device and the optical cleaning device of the present invention, and a light cleaning device including the same. In the present embodiment, the ultraviolet light irradiation device UVE, the active gas environment forming means IGB is formed by an inert gas containment means of a shielding structure type. The inert gas containment means includes a containment means E in addition to the inert gas blowing means. The containment means E' has a structure in which a partition wall is formed between the outside and the outside of the inert gas which is blown out by the inert gas blowing means, and is formed so as to allow the workpiece W to enter and exit. Further, the partition wall is formed, for example, in a curtain shape or a sag wall shape which hangs down from the main body casing BC to surround the inert gas-rich environmental region R1. Further, the containment means E' is configured to prevent leakage of the environment as much as possible, but is configured to allow the workpiece W to enter and exit. In the case where the enclosing means e is formed into a curtain shape, when the workpiece W is taken in and out, the enclosing means E is deformed in accordance with its flexibility. Further, in the case of the sag wall, the escaping means E moves up and down to the extent that the workpiece W can be moved in and out, or the gap for the entry and exit of the workpiece W is formed in advance at the lower portion in accordance with the movement of the workpiece W. As described above, according to the present aspect, the containment means E is provided, whereby the amount of the inert gas used is suppressed, and the inert gas concentration is easily increased. Fig. 7 is a view showing the ultraviolet light irradiation device of the third embodiment for carrying out the ultraviolet light irradiation device and the light cleaning device of the present invention, and a light cleaning device including the same. In this embodiment, the ultraviolet light irradiation device UVE is an active gas environment -21 - (19) (19)
1322435 形成手段IGB爲由真空構造所形成。真空構造，傾 即氣密室s c內’形成富惰性氣體的環境區域R1。 SC，係爲了讓其內部充滿惰性氣體，故與外部之間 較高的氣密構造β並且，在內部配設有電介質障壁 EXL。又’配設有小到容許工件W出入之程度的社 圖未表示），且該出入口，係以藉由擋門閉鎖的方 成。 再者，惰性氣體，係從惰性氣體供應源，藉由 手段，供應到氣密室S C內。在圖示形態中，係以 性氣體噴出手段，供應惰性氣體的方式所構成。 第8圖係表示用以實施本發明之紫外光照射裝 及光洗淨裝置LW的第4形態的電介質障壁放電燈 主要部分正面圖。 本形態，係爲了防止電介質障壁放電燈EXL 板兼安裝件5e與供電線4的連接部之氧化，在具 氣體吹噴手段IGS的這點，與第1形態不同。在電 壁放電燈EXL中，於其亮燈中，由於端子板兼安; 與供電線4的連接部，溫度比較高溫，因此產生氧 通易變差。於是，在本形態中，爲了防止上述部位 ’故以配設惰性氣體吹噴手段IGS，在亮燈中，於 部位，吹噴惰性氣體，例如氮的方式所構成。 【圖式簡單說明】 第1圖係表示用以實施本發明之紫外光照射 在真空 氣密室 ，成爲 放電燈 入口（ 式所構 適當的 藉由惰 置UVE EXL的 的端子 備惰性 介質障 g件5e 化，導 的氧化 上述的 置及光 -22- (20) 1322435 洗淨裝置的第1形態的槪念圖。 第2圖係同一紫外光照射裝置的部份剖面正面 第3圖係同一發光管的部分切缺正面圖。 第4圖係表示同一發光管及其支撐部及供電部 圖及左右側面圖。 第5圖係本發明的光洗淨效果，與比較例的光 果，做一比較所示的座標圖。 第6圖係表示用以實施本發明之紫外光照射裝 洗淨裝置的第2形態的紫外光照射裝置及具備該裝 洗淨裝置的槪念圖。 第7圖係表示用以實施本發明之紫外光照射裝 洗淨裝置的第3形態紫外光照射裝置及具備該裝置 淨裝置的槪念圖。 第8圖係表示用以實施本發明之紫外光照射裝 及光洗淨裝置LW的第4形態的電介質障壁放電燈 主要部分正面圖。 【主要元件符號說明】1322435 Forming means IGB is formed by a vacuum structure. In the vacuum configuration, the inner portion of the airtight chamber s c is formed to form an inert gas-rich environmental region R1. In order to fill the inside of the SC with an inert gas, the SC has a high airtight structure β and a dielectric barrier EXL is disposed inside. Further, the arrangement is such that the degree of the workpiece W is allowed to enter and exit is not shown, and the entrance and exit is blocked by the door. Further, the inert gas is supplied from the inert gas supply source to the airtight chamber S C by means. In the illustrated embodiment, the inert gas is supplied by means of a gas discharge means. Fig. 8 is a front elevational view showing the principal part of a dielectric barrier discharge lamp of a fourth embodiment for carrying out the ultraviolet light irradiation apparatus and the optical cleaning apparatus LW of the present invention. In the present embodiment, in order to prevent oxidation of the connection portion between the dielectric barrier discharge lamp EXL panel and the mounting member 5e and the power supply line 4, the gas blowing means IGS is different from the first embodiment. In the electric wall discharge lamp EXL, in the lighting, the terminal plate is both safe; and the connection portion with the power supply line 4 has a relatively high temperature, so that oxygen generation is easily deteriorated. Therefore, in the present embodiment, in order to prevent the above-mentioned portion, the inert gas blowing means IGS is disposed, and an inert gas such as nitrogen is blown at a portion during lighting. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the ultraviolet light irradiation for implementing the present invention in a vacuum airtight chamber to become an inlet of a discharge lamp (the appropriate inert dielectric barrier for the terminal by the inert UVE EXL) 5e, the oxidization of the above-mentioned light -22- (20) 1322435 cleaning device in the first form of the commemorative map. Figure 2 is the same ultraviolet light irradiation device part of the front of the third picture is the same luminescence Fig. 4 is a view showing the same light-emitting tube, its support portion, and a power supply portion, and left and right side views. Fig. 5 is a light-cleaning effect of the present invention, and a light effect of the comparative example, Fig. 6 is a view showing an ultraviolet light irradiation apparatus according to a second aspect of the ultraviolet irradiation apparatus for cleaning the apparatus of the present invention, and a concept diagram including the cleaning apparatus. A third aspect ultraviolet light irradiation device for carrying out the ultraviolet light irradiation cleaning device of the present invention and a concept view including the device cleaning device. Fig. 8 is a view showing an ultraviolet light irradiation device and light for carrying out the present invention. The fourth form of the cleaning device LW The dielectric barrier discharge lamp is a main portion front view of principal elements [REFERENCE SIGNS
BC:本體外殻' D:工件W的搬送方向、EXL 質障壁放電燈、HFI :高頻亮燈電路、IGB :惰性氣 形成手段、LT :發光管、LW :光洗淨裝置、02B : 境形成手段、MB:光洗淨裝置本體、OE:外部電 出手段、R1:富惰性氣體的環境區域、R2:富氧氣 區域、SM :支撐機構、TM ··工件搬送機構、UVE 圖。 的正面 洗淨效 置及光 置的光 置及光 的光洗 置UVE EXL的 :電介 體環境 氧氣環 極氧吹 的環境 :紫外 -23- (21)1322435 光照射裝置、W :工件BC: main body casing 'D: conveying direction of workpiece W, EXL barrier discharge lamp, HFI: high-frequency lighting circuit, IGB: inert gas forming means, LT: luminous tube, LW: light cleaning device, 02B: environment forming means MB: optical cleaning device body, OE: external power supply means, R1: environmental region rich in inert gas, R2: oxygen-rich region, SM: support mechanism, TM · workpiece transfer mechanism, UVE diagram. The front side of the cleaning effect and the light and the light of the light are placed. UVE EXL: Dielectric environment Oxygen ring Aerobic blowing Environment: UV-23- (21) 1322435 Light irradiation device, W: Workpiece
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