CN108212950A - A kind of extreme ultraviolet cleaning equipment and base material cleaning method - Google Patents
A kind of extreme ultraviolet cleaning equipment and base material cleaning method Download PDFInfo
- Publication number
- CN108212950A CN108212950A CN201810009134.8A CN201810009134A CN108212950A CN 108212950 A CN108212950 A CN 108212950A CN 201810009134 A CN201810009134 A CN 201810009134A CN 108212950 A CN108212950 A CN 108212950A
- Authority
- CN
- China
- Prior art keywords
- chamber
- extreme ultraviolet
- gas
- cleaning equipment
- base material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 54
- 239000000463 material Substances 0.000 title claims abstract description 49
- 238000000034 method Methods 0.000 title claims abstract description 14
- 239000007789 gas Substances 0.000 claims abstract description 110
- 230000001105 regulatory effect Effects 0.000 claims abstract description 8
- 238000012544 monitoring process Methods 0.000 claims abstract description 7
- 238000002955 isolation Methods 0.000 claims description 23
- 230000005540 biological transmission Effects 0.000 claims description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 17
- 238000007599 discharging Methods 0.000 claims description 7
- 238000011068 loading method Methods 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 abstract description 12
- 239000001301 oxygen Substances 0.000 abstract description 12
- 125000004430 oxygen atom Chemical group O* 0.000 abstract description 12
- 230000006641 stabilisation Effects 0.000 abstract description 4
- 238000011105 stabilization Methods 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 abstract description 2
- 239000005416 organic matter Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 239000000758 substrate Substances 0.000 description 4
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to display device preparation field, more particularly to a kind of extreme ultraviolet cleaning equipment and base material cleaning method.The extreme ultraviolet cleaning equipment of the present invention includes chamber, further includes the control device for being set to the indoor gas monitor sensor of the chamber and being set to outside the chamber；Gas supply device indoor with the chamber, extreme ultraviolet emitter and gas monitoring sensor are connect the control device respectively, for receiving the information that the gas monitor sensor uploads, and the gas supply device according to the Information Regulating received is passed through the gas flow of the chamber and the power of the extreme ultraviolet emitter emitter ultraviolet light.The extreme ultraviolet cleaning equipment, can realize intelligent control, and in stability range, oxygen concentration control in chamber is ensured the active O atom and O that generate3Concentration stablize, and then ensure cleaning performance stabilization.
Description
Technical field
The present invention relates to display device preparation field, more particularly to a kind of extreme ultraviolet cleaning equipment and base material cleaning side
Method.
Background technology
The system of Thin Film Transistor-LCD (thin film transistor-liquid crystal display)
During making, some surface treatments and modified technique are frequently involved.In these techniques, such as：In wet etching and cleaning
Glass baseplate surface is handled before engineering, generally using the organic matter on extreme ultraviolet (EUV) cleaning equipment removal surface.
Extreme ultraviolet (EUV) cleaning equipment be it is a kind of utilize 172nm Excimer UVs light cleaning substrate surface organic matter
Light cleaning equipment：The component of the equipment most critical is chamber, is provided in chamber：Multiple extreme ultraviolet emitters；Multiple gas
Body feeding, for being passed through nitrogen and the air of clean dried into the chamber；Transmission device, for transmitting base material；If
The exhaust apparatus of the cavity bottom is placed in, for discharging the indoor gas of chamber；Base material entrance and the base material outlet being oppositely arranged.
In extreme ultraviolet cleaning equipment, the ultraviolet excitation O of 172nm2Generate active O atom and O3, active O atom and O3
The organic matter for aoxidizing substrate surface generates CO2And H2O, so as to achieve the purpose that remove substrate surface organic matter.Wherein, in chamber
Supply gas amount and extreme ultraviolet emitter generate accumulative amount of exposure influence O3Concentration.Gas delivery volume is bigger, tires out
It is higher to count amount of exposure, O3Concentration it is higher.In EUV light cleaning processes, the ozone concentration in extreme ultraviolet cleaning equipment is shadow
Ring the deciding factor of wash result.Ozone concentration is less than normal to cause organic matter cleaning performance unobvious, it is excessive and cause metal or
Non-metallic substrate surface is damaged, such as oxidation corrosion.As base material passes in and out chamber, chamber toxicity O atom and O3Concentration
It is easily affected and fluctuates, directly affect the cleaning performance of base material.
At present, can only by manually adjust in extreme ultraviolet cleaning equipment the power of extreme ultraviolet emitter and quantity come
Control accumulation amount of exposure size, to adjust chamber toxicity O atom and O3Concentration, can not direct monitoring O3Concentration changes.
Invention content
The technical problem to be solved in the present invention is to provide a kind of extreme ultraviolet cleaning equipment and base material cleaning method, equipment
Interior oxygen and O3Concentration realizes intelligence, stability contorting, so as to ensure that cleaning performance is stablized.
The invention discloses a kind of extreme ultraviolet cleaning equipments, including chamber, are provided in the chamber：
Multiple extreme ultraviolet emitters；
Multiple gas supply devices, for being passed through nitrogen and the air of clean dried into the chamber；
Transmission device, for transmitting base material；
The first exhaust device of the cavity bottom is set to, for discharging the indoor gas of chamber；
Base material entrance and the base material outlet being oppositely arranged；
It further includes and is set to the indoor gas monitor sensor of the chamber and the control being set to outside chamber dress
It puts；
The control device connects respectively with the gas supply device, extreme ultraviolet emitter and gas monitoring sensor
It connects, for receiving the information that the gas monitor sensor uploads, and the gas supply dress according to the Information Regulating received
Put the power of the gas flow for being passed through the chamber and the extreme ultraviolet emitter emitter ultraviolet light.
Preferably, wind curtain machine there are two being also set up in the chamber：Described two wind curtain machines are respectively arranged at the gas
Close to the side of base material entrance and the gas supply device close to the side that base material exports, the multiple gas supplies feedway
It is respectively positioned between described two wind curtain machines to device.
Preferably, the orthographic projection in cavity bottom of described two wind curtain machines is located at the transmission device in cavity bottom
In orthographic projection.
Preferably, isolation board is further included, the isolation board is set to below the loading surface of the transmission device；The isolation
Each side of plate is less than threshold value with the distance of the chamber sidewall.
Preferably, it is provided on the isolation board and the corresponding location hole of delivery roller shape, the isolation board and biography
Idler wheel is sent to be connected together by location hole.
Preferably, the distance between the isolation board and the loading surface of the delivery roller are no more than the delivery roller
Radius.
Preferably, the gas monitor sensor is arranged in a one-to-one correspondence with gas supply device, the control device difference
The information that each gas monitor sensor uploads is received, and according to the corresponding gas of the Information Regulating received
Feedway is passed through the gas flow of the chamber.
Preferably, the chamber is additionally provided with second exhaust device, and the second exhaust device is located at the wind curtain machine
Side far from gas supply device.
Preferably, the second exhaust device is set to chamber top of the wind curtain machine far from gas supply device side
Portion.
Invention additionally discloses a kind of cleaning methods of base material, utilize the extreme ultraviolet cleaning equipment described in above-mentioned technical proposal
Base material is cleaned.
Compared with prior art, extreme ultraviolet cleaning equipment of the invention, introduces gas monitor sensor and control
Device.Gas monitor sensor can monitor gas concentration in chamber in real time, including oxygen and O3Variation, and by gas concentration
Information be uploaded to control device.Control device receives the information of gas monitor sensor upload, and according to the information received
Regulate and control the gas supply device and be passed through the gas flow of the chamber and the work(of extreme ultraviolet emitter emitter ultraviolet light
Rate.So as to which in stability range, oxygen concentration control in chamber is ensured the active O atom and O that generate3Concentration stablize, into
And ensure the stabilization of cleaning performance.
Description of the drawings
Fig. 1 shows the sectional views of existing extreme ultraviolet cleaning equipment；
Fig. 2 represents the sectional view of one embodiment of the invention middle chamber；
Fig. 3 represents the schematic diagram of control process；
Fig. 4 represents distribution and the control schematic diagram of control system and gas monitor sensor in chamber；
Fig. 5 represents the sectional view of one embodiment of the invention middle chamber；
Fig. 6 represents the sectional view of one embodiment of the invention middle chamber；
Fig. 7 represents the vertical view of isolation board；
Fig. 8 shows the sectional views of one embodiment of the invention middle chamber；
Fig. 9 represents extreme ultraviolet cleaning equipment Cleaning principle schematic diagram.
Specific embodiment
For a further understanding of the present invention, the preferred embodiment of the invention is described with reference to embodiment, still
It should be appreciated that these descriptions are only for the feature and advantage that further illustrate the present invention rather than to the claims in the present invention
Limitation.
Fig. 1 is the sectional view of existing extreme ultraviolet cleaning equipment.In Fig. 1,1 is chamber, and 101 be extreme ultraviolet transmitting dress
It puts；102 be gas supply device；103 be transmission device；104 be first exhaust device；105 be base material entrance；106 be base material
Outlet.
Principle using extreme ultraviolet cleaning equipment organics removal is：
Oxygen can form active O atom and O under extreme ultraviolet effect3, O3Oxygen is can be analyzed under extreme ultraviolet effect
Gas and active O atom.Organic matter is in active O atom and O3It is decomposed and removes under effect.It is specific to participate in below formula：
Embodiment of the invention discloses that a kind of extreme ultraviolet cleaning equipment, including chamber, is provided in the chamber：
Multiple extreme ultraviolet emitters；
Multiple gas supply devices, for being passed through nitrogen and the air of clean dried into the chamber；
Transmission device, for transmitting base material；
The first exhaust device of the cavity bottom is set to, for discharging the indoor gas of chamber；
Base material entrance and the base material outlet being oppositely arranged；
The extreme ultraviolet cleaning equipment, which further includes, to be set to the indoor gas monitor sensor of the chamber and is set to
Control device outside the chamber；
The control device connects respectively with the gas supply device, extreme ultraviolet emitter and gas monitoring sensor
It connects, for receiving the information that the gas monitor sensor uploads, and the gas supply dress according to the Information Regulating received
Put the power of the gas flow for being passed through the chamber and the extreme ultraviolet emitter emitter ultraviolet light.
Fig. 2 is the sectional view of middle chamber of the embodiment of the present invention.In Fig. 3,1 is chamber, and 101 be extreme ultraviolet emitter；
102 be gas supply device；103 be transmission device；104 be first exhaust device；105 be base material entrance；106 go out for base material
Mouthful；107 be gas monitor sensor.
Fig. 3 is the schematic diagram of control process, and in Fig. 3,1 is chamber, and 2 device, the control device 2 receive described in order to control
The information that gas monitor sensor 107 uploads, and the gas supply device 102 according to the Information Regulating received be passed through it is described
The power of 101 emitter ultraviolet light of the gas flow of chamber and the extreme ultraviolet emitter.
Extreme ultraviolet cleaning equipment of the present invention, by monitoring gas concentration in chamber in real time, control device is voluntarily adjusted
The indoor gas flow of whole chamber and extreme ultraviolet transmission power, realize chamber indoor oxygen and O3The stabilization of concentration, and then ensure cleaning
The stabilization of effect.Realize chamber indoor oxygen and O3The intelligence of concentration, stability contorting.The quantity of the gas monitor sensor and
Position can be adjusted according to actual conditions.
Preferably, the quantity of the gas monitor sensor and the quantity of gas supply device match, and be uniformly distributed
In chamber.
It is highly preferred that the gas monitor sensor is arranged in a one-to-one correspondence with gas supply device, the control device point
Not Jie Shou information that each the gas monitor sensor uploads, and according to the corresponding gas of the Information Regulating received
Body feeding is passed through the gas flow of the chamber.
Preferably, the control device is by controlling switch to regulate and control the gas that the gas supply device is passed through the chamber
The power of amount and the extreme ultraviolet emitter emitter ultraviolet light.It is highly preferred that the gas supply device is provided with
Gas control switch, the extreme ultraviolet emitter are provided with power control switching；The control device can be according to gas
The information that monitoring sensor uploads, adjusting control switch on, and the chamber is passed through so as to regulate and control the gas supply device
Gas flow and the extreme ultraviolet emitter emitter ultraviolet light power.
Fig. 4 is control system and the distribution of gas monitor sensor in chamber and control schematic diagram, and in Fig. 4,2 fill in order to control
It puts, 201 switch in order to control, and 102 be gas supply device, and 107 be gas monitor sensor.Control device is by controlling switch to adjust
Control gas supply device is passed through the indoor gas flow of chamber.
According to the present invention, preferred embodiment, the structure of chamber is referring specifically to Fig. 5：
It is provided in the chamber 1：
Multiple extreme ultraviolet emitters 101；
Multiple gas supply devices 102, for being passed through nitrogen and the air of clean dried into the chamber；
Transmission device 103, for transmitting base material；
The first exhaust device 104 of the cavity bottom is set to, for discharging the indoor gas of chamber；
Base material entrance 105 and the base material outlet 106 being oppositely arranged；
Gas monitor sensor 107,
Wind curtain machine 108 there are two being also set up in the chamber：Described two wind curtain machines 108 are respectively arranged at the gas and supply
To device close to the side of base material entrance 105 and the gas supply device close to the side of base material outlet 106, also, preferably
Ground, described two wind curtain machines are located at chamber roof.The multiple gas supply device 102 is respectively positioned on described two wind curtain machines 108
Between.Described two wind curtain machines discharge stream of nitrogen gas, and multiple gas supply devices are enclosed in a space.
Preferably, the orthographic projection in cavity bottom of described two wind curtain machines is located at the transmission device in cavity bottom
In orthographic projection.The wind curtain machine, can discharge stream of nitrogen gas, and stream of nitrogen gas forms air curtain, by pending base material and described
Gas supply device is enclosed in the relatively independent space of air curtain formation, and gas is made to be maintained in metastable space, is subtracted
The gas flowing that few base material entrance and base material outlet are brought, base material brings the influence of air into when remover apparatus is run.
Preferably, the puff prot of the wind curtain machine is long and narrow linear.
In the described embodiment, control device is identical with the control device described in above-mentioned technical proposal.
According in another preferred embodiment of the present invention, the structure of chamber is referring specifically to Fig. 6：
It is provided in the chamber：
Multiple extreme ultraviolet emitters 101；
Multiple gas supply devices 102, for being passed through nitrogen and the air of clean dried into the chamber；
Transmission device, for transmitting base material；
The first exhaust device 104 of the cavity bottom is set to, for discharging the indoor gas of chamber；
Base material entrance 105 and the base material outlet 106 being oppositely arranged；
Gas monitor sensor 107.
Preferably, isolation board 109 is further included, the isolation board is set to below the loading surface of the transmission device.It is described
The loading surface of transmission device refer to transmission device close to the one side of chamber roof namely：The one side that transmission device is contacted with base material.
Each side of the isolation board is less than threshold value with the distance of the chamber sidewall.The threshold value is 5 centimetres.The isolation board it is each
A side can be fixed on the side wall of the chamber, alternatively, the bottom of the isolation board is connected by the bottom of support column and chamber.
The isolation board makes gas concentrate on the top of transmission device, avoids the first exhaust device of cavity bottom for chamber
Indoor O3With the influence of oxygen concentration.
The transmission device can be conveyer belt or delivery roller, preferably delivery roller 103 '.
Preferably, it referring to Fig. 7, is provided with and the corresponding location hole of 103 ' shape of delivery roller on the isolation board 109
110, the isolation board is connected together with delivery roller by location hole；The shape of institute's station holes and the delivery roller
Shape matches, and can be rectangle, ellipse or square.
Since the space of delivery roller lower part is larger, it is preferable that the loading surface of the isolation board and the delivery roller it
Between distance be not more than the delivery roller radius.In the described embodiment, it can also set described in above-mentioned technical proposal
Wind curtain machine.
In the described embodiment, control device is identical with the control device described in above-mentioned technical proposal.
According to the present invention, preferred embodiment, the structure of chamber is referring specifically to Fig. 8：
It is provided in the chamber：
Multiple extreme ultraviolet emitters 101；
Multiple gas supply devices 102, for being passed through nitrogen and the air of clean dried into the chamber；
Delivery roller 103 ', for transmitting base material；
The first exhaust device 104 of the cavity bottom is set to, for discharging the indoor gas of chamber；
Base material entrance 105 and the base material outlet 106 being oppositely arranged；
Gas monitor sensor 107；
The chamber is additionally provided with second exhaust device 111, and to be located at the wind curtain machine separate for the second exhaust device
The side of gas supply device.
Preferably, the second exhaust device is set to chamber top of the wind curtain machine far from gas supply device side
Portion.The second exhaust device of this kind setting can neither influence the concentration of chamber indoor ozone or oxygen, and keep away with normal exhaust
Exempt to be directly connected to factory service exhaust, reduce influence of the factory service exhaust to chamber internal ambience.
In the described embodiment, the wind curtain machine 108 described in above-mentioned technical proposal and/or the isolation board can also be set
109.The mode of setting refers to above-mentioned technical proposal.
In the described embodiment, control device is identical with the control device described in above-mentioned technical proposal.
The embodiment of the invention also discloses a kind of cleaning methods of base material, utilize the extreme ultraviolet described in above-mentioned technical proposal
Cleaning equipment cleans base material.
Fig. 9 is extreme ultraviolet cleaning equipment Cleaning principle schematic diagram, wherein, 3 be organic matter, and 4 be extreme ultraviolet.Oxygen exists
Active O atom and O can be formed under extreme ultraviolet effect3, O3It can be analyzed to oxygen and active O atom under extreme ultraviolet effect.
Organic matter is in active O atom and O3It is decomposed and removes under effect.
The explanation of above example is only intended to facilitate the understanding of the method and its core concept of the invention.It should be pointed out that pair
For those skilled in the art, without departing from the principle of the present invention, the present invention can also be carried out
Some improvements and modifications, these improvement and modification are also fallen within the protection scope of the claims of the present invention.
The foregoing description of the disclosed embodiments enables professional and technical personnel in the field to realize or use the present invention.
A variety of modifications of these embodiments will be apparent for those skilled in the art, it is as defined herein
General Principle can be realized in other embodiments without departing from the spirit or scope of the present invention.Therefore, it is of the invention
The embodiments shown herein is not intended to be limited to, and is to fit to and the principles and novel features disclosed herein phase one
The most wide range caused.
Claims (10)
1. a kind of extreme ultraviolet cleaning equipment including chamber, is provided in the chamber：
Multiple extreme ultraviolet emitters；
Multiple gas supply devices, for being passed through nitrogen and the air of clean dried into the chamber；
Transmission device, for transmitting base material；
The first exhaust device of the cavity bottom is set to, for discharging the indoor gas of chamber；
Base material entrance and the base material outlet being oppositely arranged；
It is set to the indoor gas monitor sensor of the chamber it is characterized in that, further including and is set to outside the chamber
Control device；
The control device is connect respectively with the gas supply device, extreme ultraviolet emitter and gas monitoring sensor,
For receiving the information that the gas monitor sensor uploads, and gas supply device leads to according to the Information Regulating received
Enter the gas flow of the chamber and the power of the extreme ultraviolet emitter emitter ultraviolet light.
2. extreme ultraviolet cleaning equipment according to claim 1, which is characterized in that wind there are two being also set up in the chamber
Curtain machine：Described two wind curtain machines are respectively arranged at the gas supply device and are supplied close to the side of base material entrance and the gas
Device is respectively positioned on close to the side that base material exports, the multiple gas supply device between described two wind curtain machines.
3. extreme ultraviolet cleaning equipment according to claim 2, which is characterized in that described two wind curtain machines at chamber bottom
The orthographic projection in portion is located at the transmission device in the orthographic projection of cavity bottom.
4. extreme ultraviolet cleaning equipment according to claim 1, which is characterized in that further include isolation board；The isolation board
It is set to below the loading surface of the transmission device；
Each side of the isolation board is less than threshold value with the distance of the chamber sidewall.
5. extreme ultraviolet cleaning equipment according to claim 4, which is characterized in that the transmission device is delivery roller,
It is provided on the isolation board and passes through location hole with delivery roller with the corresponding location hole of delivery roller shape, the isolation board
It is connected together.
6. extreme ultraviolet cleaning equipment according to claim 5, which is characterized in that the isolation board and the delivery roller
The distance between loading surface be not more than the radius of the delivery roller.
7. extreme ultraviolet cleaning equipment according to claim 1, which is characterized in that the gas monitor sensor and gas
Feedway is arranged in a one-to-one correspondence, and the control device receives the information that each gas monitor sensor uploads respectively, and
The gas flow of the chamber is passed through according to the corresponding gas supply device of the Information Regulating received.
8. the extreme ultraviolet cleaning equipment according to claim 2~6 any one, which is characterized in that the chamber is also set
Second exhaust device is equipped with, and the second exhaust device is located at side of the wind curtain machine far from gas supply device.
9. extreme ultraviolet cleaning equipment according to claim 8, which is characterized in that the second exhaust device is set to institute
State chamber roof of the wind curtain machine far from gas supply device side.
10. a kind of cleaning method of base material, which is characterized in that utilize the extreme ultraviolet described in any one in claim 1~9
Cleaning equipment cleans base material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810009134.8A CN108212950B (en) | 2018-01-04 | 2018-01-04 | Extreme ultraviolet light cleaning equipment and substrate cleaning method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810009134.8A CN108212950B (en) | 2018-01-04 | 2018-01-04 | Extreme ultraviolet light cleaning equipment and substrate cleaning method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108212950A true CN108212950A (en) | 2018-06-29 |
| CN108212950B CN108212950B (en) | 2021-01-26 |
Family
ID=62643034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810009134.8A Expired - Fee Related CN108212950B (en) | 2018-01-04 | 2018-01-04 | Extreme ultraviolet light cleaning equipment and substrate cleaning method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108212950B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109354112A (en) * | 2018-10-15 | 2019-02-19 | 深圳市华星光电技术有限公司 | Cleaning equipment |
| CN109395998A (en) * | 2018-12-05 | 2019-03-01 | 苏州威格尔纳米科技有限公司 | A kind of online surface disposal facility and method of roll-to-roll coating machine substrate |
| CN113857012A (en) * | 2021-09-27 | 2021-12-31 | 常熟五临天光电科技有限公司 | Illumination processing system convenient to air is got rid of |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010043478A1 (en) * | 1999-12-31 | 2001-11-22 | Yun Heon Do | Ultraviolet cleaning apparatus of a substrate and the method thereof |
| CN1788339A (en) * | 2003-12-26 | 2006-06-14 | 株式会社杰士汤浅 | Ultraviolet ray cleaning device and cleaning method |
| CN1937102A (en) * | 2005-09-21 | 2007-03-28 | 哈利盛东芝照明株式会社 | Uv-light irradiation device and light cleaning apparatus |
| CN101055831A (en) * | 2006-04-11 | 2007-10-17 | 统宝光电股份有限公司 | Conveyor type wet-processing apparatus and treatment method of substrate |
| CN102132384A (en) * | 2008-09-18 | 2011-07-20 | 株式会社杰士汤浅国际 | Ultraviolet light irradiation device |
| CN203337164U (en) * | 2013-07-31 | 2013-12-11 | 京东方科技集团股份有限公司 | Substrate supporting table and substrate detection device |
| CN103464424A (en) * | 2013-08-28 | 2013-12-25 | 西安耀北光电科技有限公司 | Ultraviolet radiation and ozone cleaner |
| CN106238427A (en) * | 2015-12-21 | 2016-12-21 | 中国科学院长春光学精密机械与物理研究所 | A kind of extreme ultraviolet optical element surface pollutes and cleans device and method |
-
2018
- 2018-01-04 CN CN201810009134.8A patent/CN108212950B/en not_active Expired - Fee Related
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010043478A1 (en) * | 1999-12-31 | 2001-11-22 | Yun Heon Do | Ultraviolet cleaning apparatus of a substrate and the method thereof |
| CN1788339A (en) * | 2003-12-26 | 2006-06-14 | 株式会社杰士汤浅 | Ultraviolet ray cleaning device and cleaning method |
| CN1937102A (en) * | 2005-09-21 | 2007-03-28 | 哈利盛东芝照明株式会社 | Uv-light irradiation device and light cleaning apparatus |
| CN101055831A (en) * | 2006-04-11 | 2007-10-17 | 统宝光电股份有限公司 | Conveyor type wet-processing apparatus and treatment method of substrate |
| CN102132384A (en) * | 2008-09-18 | 2011-07-20 | 株式会社杰士汤浅国际 | Ultraviolet light irradiation device |
| CN203337164U (en) * | 2013-07-31 | 2013-12-11 | 京东方科技集团股份有限公司 | Substrate supporting table and substrate detection device |
| CN103464424A (en) * | 2013-08-28 | 2013-12-25 | 西安耀北光电科技有限公司 | Ultraviolet radiation and ozone cleaner |
| CN106238427A (en) * | 2015-12-21 | 2016-12-21 | 中国科学院长春光学精密机械与物理研究所 | A kind of extreme ultraviolet optical element surface pollutes and cleans device and method |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109354112A (en) * | 2018-10-15 | 2019-02-19 | 深圳市华星光电技术有限公司 | Cleaning equipment |
| CN109354112B (en) * | 2018-10-15 | 2021-11-02 | Tcl华星光电技术有限公司 | Cleaning equipment |
| CN109395998A (en) * | 2018-12-05 | 2019-03-01 | 苏州威格尔纳米科技有限公司 | A kind of online surface disposal facility and method of roll-to-roll coating machine substrate |
| CN113857012A (en) * | 2021-09-27 | 2021-12-31 | 常熟五临天光电科技有限公司 | Illumination processing system convenient to air is got rid of |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108212950B (en) | 2021-01-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN108212950A (en) | A kind of extreme ultraviolet cleaning equipment and base material cleaning method | |
| US7276097B2 (en) | Load-lock system, exposure processing system, and device manufacturing method | |
| TWI375135B (en) | Reduced-pressure drying device | |
| US8091759B2 (en) | Soldering machine comprising a soldering module and at least one soldering station that is mobile and exchangeable insertable into the soldering module | |
| US20070127916A1 (en) | Substrate processing apparatus and substrate processing method | |
| JP2007088201A (en) | Method and device for processing substrate | |
| CN102210014A (en) | Surface processing apparatus | |
| JP2002353091A (en) | Apparatus for coating substrate | |
| CN102314093A (en) | Local exposure apparatus, and local exposure method | |
| JP2008218593A (en) | Substrate-treating apparatus | |
| TW495815B (en) | Method and system for coating and developing | |
| TW201310568A (en) | Substrate processing apparatus | |
| CN101689497B (en) | Plasma monitoring device and method | |
| JP4121122B2 (en) | Heat treatment apparatus and temperature control method in heat treatment apparatus | |
| KR20030072250A (en) | Liquid processing method and liquid processing apparatus | |
| JP2006324677A (en) | Automatic setting apparatus for liquid-treating apparatus | |
| KR20110052451A (en) | Substrate processing apparatus | |
| WO2018173344A1 (en) | Exposure device, substrate treatment device, substrate exposure method, and substrate treatment method | |
| JP2005011996A (en) | Application method and application apparatus | |
| US20040060505A1 (en) | Substrate processing apparatus and substrate processing method | |
| KR101985754B1 (en) | Air conditioner and apparatus for treating substrate the same | |
| JP2001176781A (en) | Device for forming film | |
| JPH1140497A (en) | Processing device | |
| KR101583590B1 (en) | Retransfer apparatus comprising particle cleaning module | |
| JP2006347734A (en) | Storage device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20210126 |