CN1212238C - 平版印刷制版用支持体和预涂感光版 - Google Patents
平版印刷制版用支持体和预涂感光版 Download PDFInfo
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- CN1212238C CN1212238C CNB018033156A CN01803315A CN1212238C CN 1212238 C CN1212238 C CN 1212238C CN B018033156 A CNB018033156 A CN B018033156A CN 01803315 A CN01803315 A CN 01803315A CN 1212238 C CN1212238 C CN 1212238C
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- light sensitive
- grains
- plate
- acid
- aluminium
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- XMHIUKTWLZUKEX-UHFFFAOYSA-N hexacosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCCCCCCCC(O)=O XMHIUKTWLZUKEX-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 238000005098 hot rolling Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 239000001023 inorganic pigment Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000005605 isobutyric acids Chemical class 0.000 description 1
- LDHQCZJRKDOVOX-IHWYPQMZSA-N isocrotonic acid Chemical compound C\C=C/C(O)=O LDHQCZJRKDOVOX-IHWYPQMZSA-N 0.000 description 1
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 1
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 1
- 229940070765 laurate Drugs 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- JCDWETOKTFWTHA-UHFFFAOYSA-N methylsulfonylbenzene Chemical compound CS(=O)(=O)C1=CC=CC=C1 JCDWETOKTFWTHA-UHFFFAOYSA-N 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- CUXQLKLUPGTTKL-UHFFFAOYSA-M microcosmic salt Chemical compound [NH4+].[Na+].OP([O-])([O-])=O CUXQLKLUPGTTKL-UHFFFAOYSA-M 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000001788 mono and diglycerides of fatty acids Substances 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- BSCJIBOZTKGXQP-UHFFFAOYSA-N n-(2-hydroxyethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCCO BSCJIBOZTKGXQP-UHFFFAOYSA-N 0.000 description 1
- ICWPRFNZEBFLPT-UHFFFAOYSA-N n-(2-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=CC=C1O ICWPRFNZEBFLPT-UHFFFAOYSA-N 0.000 description 1
- KIQBVKPQYARZTK-UHFFFAOYSA-N n-(2-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=CC=C1NC(=O)C=C KIQBVKPQYARZTK-UHFFFAOYSA-N 0.000 description 1
- LMCMWVRJNPJYIZ-UHFFFAOYSA-N n-(2-sulfamoylethyl)prop-2-enamide Chemical compound NS(=O)(=O)CCNC(=O)C=C LMCMWVRJNPJYIZ-UHFFFAOYSA-N 0.000 description 1
- KFAUOAKHHDYZPL-UHFFFAOYSA-N n-(2-sulfamoylphenyl)prop-2-enamide Chemical compound NS(=O)(=O)C1=CC=CC=C1NC(=O)C=C KFAUOAKHHDYZPL-UHFFFAOYSA-N 0.000 description 1
- VAVZHSBOROHMQD-UHFFFAOYSA-N n-(3-hydroxyphenyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=CC(O)=C1 VAVZHSBOROHMQD-UHFFFAOYSA-N 0.000 description 1
- PMHOLXNNEPPFNZ-UHFFFAOYSA-N n-(3-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=CC(NC(=O)C=C)=C1 PMHOLXNNEPPFNZ-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- CEBFLGHPYLIZSC-UHFFFAOYSA-N n-benzyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCC1=CC=CC=C1 CEBFLGHPYLIZSC-UHFFFAOYSA-N 0.000 description 1
- OHLHOLGYGRKZMU-UHFFFAOYSA-N n-benzylprop-2-enamide Chemical compound C=CC(=O)NCC1=CC=CC=C1 OHLHOLGYGRKZMU-UHFFFAOYSA-N 0.000 description 1
- LHLLNIZKYYRADT-UHFFFAOYSA-N n-cyclohexyl-n-methylprop-2-enamide Chemical compound C=CC(=O)N(C)C1CCCCC1 LHLLNIZKYYRADT-UHFFFAOYSA-N 0.000 description 1
- GCGQYJSQINRKQL-UHFFFAOYSA-N n-hexylprop-2-enamide Chemical compound CCCCCCNC(=O)C=C GCGQYJSQINRKQL-UHFFFAOYSA-N 0.000 description 1
- IZXGMKHVTNJFAA-UHFFFAOYSA-N n-methyl-n-phenylprop-2-enamide Chemical compound C=CC(=O)N(C)C1=CC=CC=C1 IZXGMKHVTNJFAA-UHFFFAOYSA-N 0.000 description 1
- DASJFYAPNPUBGG-UHFFFAOYSA-N naphthalene-1-sulfonyl chloride Chemical compound C1=CC=C2C(S(=O)(=O)Cl)=CC=CC2=C1 DASJFYAPNPUBGG-UHFFFAOYSA-N 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- NZIDBRBFGPQCRY-UHFFFAOYSA-N octyl 2-methylprop-2-enoate Chemical compound CCCCCCCCOC(=O)C(C)=C NZIDBRBFGPQCRY-UHFFFAOYSA-N 0.000 description 1
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 239000001053 orange pigment Substances 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000004880 oxines Chemical class 0.000 description 1
- 150000002924 oxiranes Chemical class 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- DGBWPZSGHAXYGK-UHFFFAOYSA-N perinone Chemical compound C12=NC3=CC=CC=C3N2C(=O)C2=CC=C3C4=C2C1=CC=C4C(=O)N1C2=CC=CC=C2N=C13 DGBWPZSGHAXYGK-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000005562 phenanthrylene group Chemical group 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- CMPQUABWPXYYSH-UHFFFAOYSA-N phenyl phosphate Chemical compound OP(O)(=O)OC1=CC=CC=C1 CMPQUABWPXYYSH-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 1
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 150000003053 piperidines Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920005644 polyethylene terephthalate glycol copolymer Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- HHDOORYZQSEMGM-UHFFFAOYSA-L potassium;oxalate;titanium(4+) Chemical compound [K+].[Ti+4].[O-]C(=O)C([O-])=O HHDOORYZQSEMGM-UHFFFAOYSA-L 0.000 description 1
- SQTLECAKIMBJGK-UHFFFAOYSA-I potassium;titanium(4+);pentafluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[K+].[Ti+4] SQTLECAKIMBJGK-UHFFFAOYSA-I 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical compound O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- 239000001008 quinone-imine dye Substances 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 150000003254 radicals Chemical group 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 239000012966 redox initiator Substances 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- ORFSSYGWXNGVFB-UHFFFAOYSA-N sodium 4-amino-6-[[4-[4-[(8-amino-1-hydroxy-5,7-disulfonaphthalen-2-yl)diazenyl]-3-methoxyphenyl]-2-methoxyphenyl]diazenyl]-5-hydroxynaphthalene-1,3-disulfonic acid Chemical compound COC1=C(C=CC(=C1)C2=CC(=C(C=C2)N=NC3=C(C4=C(C=C3)C(=CC(=C4N)S(=O)(=O)O)S(=O)(=O)O)O)OC)N=NC5=C(C6=C(C=C5)C(=CC(=C6N)S(=O)(=O)O)S(=O)(=O)O)O.[Na+] ORFSSYGWXNGVFB-UHFFFAOYSA-N 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- FDRCDNZGSXJAFP-UHFFFAOYSA-M sodium chloroacetate Chemical compound [Na+].[O-]C(=O)CCl FDRCDNZGSXJAFP-UHFFFAOYSA-M 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 239000002195 soluble material Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- RINCXYDBBGOEEQ-UHFFFAOYSA-N succinic anhydride Chemical compound O=C1CCC(=O)O1 RINCXYDBBGOEEQ-UHFFFAOYSA-N 0.000 description 1
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 description 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003470 sulfuric acid monoesters Chemical class 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- NLLZTRMHNHVXJJ-UHFFFAOYSA-J titanium tetraiodide Chemical compound I[Ti](I)(I)I NLLZTRMHNHVXJJ-UHFFFAOYSA-J 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- RSJKGSCJYJTIGS-UHFFFAOYSA-N undecane Chemical compound CCCCCCCCCCC RSJKGSCJYJTIGS-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- YEIGUXGHHKAURB-UHFFFAOYSA-N viridine Natural products O=C1C2=C3CCC(=O)C3=CC=C2C2(C)C(O)C(OC)C(=O)C3=COC1=C23 YEIGUXGHHKAURB-UHFFFAOYSA-N 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002349 well water Substances 0.000 description 1
- 235000020681 well water Nutrition 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/04—Printing plates or foils; Materials therefor metallic
- B41N1/08—Printing plates or foils; Materials therefor metallic for lithographic printing
- B41N1/083—Printing plates or foils; Materials therefor metallic for lithographic printing made of aluminium or aluminium alloys or having such surface layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
- B41N3/034—Chemical or electrical pretreatment characterised by the electrochemical treatment of the aluminum support, e.g. anodisation, electro-graining; Sealing of the anodised layer; Treatment of the anodic layer with inorganic compounds; Colouring of the anodic layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
- Revetment (AREA)
Abstract
Description
表面实际面积/表面表观面积 | 小坑的平均直径(μm) | 小坑表观面积/表面表观面积 | 大起伏的波长(μm) | 耐损坏能力 | 印刷寿命 | ||
实施例 | 1234 | 1.481.361.531.49 | 0.480.530.680.47 | 95939994 | 9.3-8358.0 | ○△○○△○△ | 80000张60000张100000张100000张 |
对照实施例 | 1234 | 1.361.111.601.75 | 3.301.191.270.51 | 100929681 | 9.310.5-14.4 | ×△×△△× | 10000张60000张80000张20000张 |
机械砂目处理 | |||
磨料种类 | 磨料平均颗粒度(μm) | 刷子转速(rpm) | |
实施例5实施例6实施例7实施例8 | 硅砂硅砂硅砂浮石 | 258540 | 200200200150 |
对照实施例5对照实施例6对照实施例7 | 浮石硅砂硅砂 | 402525 | 250200200 |
机械砂目处理 | |||||
电解液种类 | 电解液浓度(wt%) | 电解液温度(wt%) | 电流密度(A/dm2) | 当铝版在阳极侧时电量(C/dm2) | |
实施例5实施例6实施例7实施例8 | 盐酸盐酸盐酸盐酸 | 7.57.57.57.5 | 35353535 | 25252525 | 50805050 |
对照实施例5对照实施例6对照实施例7 | 盐酸硝酸盐酸 | 109.07.5 | 454035 | 203025 | 20027050 |
碱刻蚀处理 | 大起伏波长(μm) | 小坑平均直径(μm) | 耐损坏能力 | 印刷寿命(万张) | |
铝溶解量(g/m2) | |||||
实施例5实施例6实施例7实施例8 | 0.20.10.50.2 | 8329 | 0.10.10.10.1 | ○△○○○△ | 861010 |
对照实施例5对照实施例6对照实施例7 | 0.20.21.0 | 1388 | 0.21.30.6 | △××△ | 3102 |
大起伏波长(μm) | 小坑的平均直径(μm) | 有无微砂目结构 | |
实施例9实施例10实施例11实施例12 | 8.08.08.08.0 | 0.750.750.150.95 | 有有有有 |
实施例13实施例14 | 8.08.0 | 0.750.50 | 有有 |
对照实施例8对照实施例9对照实施例10对照实施例11对照实施例12 | -158.08.08.0 | 0.750.750.750.750.75 | 有有有有无 |
微孔 | 耐损坏能力 | 感光度(mJ/cm2) | ||
平均孔径(nm) | 平均孔密度(个/μm2) | |||
实施例9实施例10实施例11实施例12实施例13实施例14 | 1201212512 | 3800380380280380 | ○△○△○△○△○ | 605070606060 |
对照实施例8对照实施例9对照实施例10对照实施例11对照实施例12 | 1212128312 | 38038075050380 | △×△×○△○△△× | 5580140或更大140或更大60 |
Θa(°) | 平均深度(μm) | 抗损坏能力 | ||
大起伏凹陷部分 | 中起伏凹陷部分 | |||
实施例15实施例16实施例17实施例18 | 3.51.42.42.0 | 0.52--0.21 | 0.200.170.26- | ○△○△△△ |
Claims (2)
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
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JP2000326978A JP2002131919A (ja) | 2000-10-26 | 2000-10-26 | 平版印刷版 |
JP326978/2000 | 2000-10-26 | ||
JP2000395007 | 2000-12-26 | ||
JP395007/2000 | 2000-12-26 | ||
JP74171/2001 | 2001-03-15 | ||
JP2001074171 | 2001-03-15 | ||
JP2001076222A JP2002274078A (ja) | 2001-03-16 | 2001-03-16 | 平版印刷版用支持体および平版印刷版原版 |
JP76222/2001 | 2001-03-16 |
Publications (2)
Publication Number | Publication Date |
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CN1394171A CN1394171A (zh) | 2003-01-29 |
CN1212238C true CN1212238C (zh) | 2005-07-27 |
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CNB018033156A Expired - Fee Related CN1212238C (zh) | 2000-10-26 | 2001-10-26 | 平版印刷制版用支持体和预涂感光版 |
Country Status (6)
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US (1) | US6716567B2 (zh) |
EP (1) | EP1270258B1 (zh) |
CN (1) | CN1212238C (zh) |
AT (1) | ATE358596T1 (zh) |
DE (1) | DE60127658T2 (zh) |
WO (1) | WO2002034544A1 (zh) |
Families Citing this family (14)
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CN1272186C (zh) | 2001-07-06 | 2006-08-30 | 富士胶片株式会社 | 平版印刷版原版 |
ATE541709T1 (de) * | 2001-10-05 | 2012-02-15 | Fujifilm Corp | Lithographisches druckplattensubstrat und vorsensibilisierte platte und herstellungsverfahren für eine lithographische druckplatte |
JP2003241388A (ja) * | 2002-02-20 | 2003-08-27 | Fuji Photo Film Co Ltd | ポジ型感熱性平版印刷版 |
JP2003266964A (ja) * | 2002-03-13 | 2003-09-25 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
JP2004117514A (ja) * | 2002-09-24 | 2004-04-15 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
CN100446993C (zh) * | 2003-05-16 | 2008-12-31 | 富士胶片株式会社 | 平版印刷版用支持体的制造方法以及平版印刷版原版 |
KR101020164B1 (ko) | 2003-07-17 | 2011-03-08 | 허니웰 인터내셔날 인코포레이티드 | 진보된 마이크로전자적 응용을 위한 평탄화 막, 및 이를제조하기 위한 장치 및 방법 |
JP4037373B2 (ja) * | 2004-03-17 | 2008-01-23 | 富士フイルム株式会社 | 平版印刷版用支持体および平版印刷版原版 |
JP2006188038A (ja) * | 2004-12-10 | 2006-07-20 | Fuji Photo Film Co Ltd | 平版印刷版原版および製版方法 |
JP2006293162A (ja) * | 2005-04-13 | 2006-10-26 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
US20080003411A1 (en) * | 2006-06-29 | 2008-01-03 | Joseph Hunter | Aluminum lithographic substrate and method of making |
CN105818563A (zh) * | 2015-01-05 | 2016-08-03 | 中国科学院化学研究所 | 一种胶印版基表面处理方法 |
JP6848180B2 (ja) * | 2016-02-10 | 2021-03-24 | 株式会社リコー | 立体造形用材料、立体造形用材料セット、立体造形物の製造方法、及び立体造形物の製造装置 |
CN110202972A (zh) * | 2019-06-26 | 2019-09-06 | 云南卓印科技有限公司 | 一种平版印刷预涂感光版或感热版及其制备方法和用途 |
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BE606888A (zh) | 1960-08-05 | 1900-01-01 | ||
JPS3622063B1 (zh) | 1959-12-11 | 1961-11-15 | ||
ZA6807938B (zh) | 1967-12-04 | |||
BE757124A (fr) | 1969-10-09 | 1971-04-06 | Kalle Ag | Plaques d'impression a plat composee de feuilles |
JPS5312739A (en) | 1976-07-22 | 1978-02-04 | Nippon Keikinzoku Sougou Kenki | Desmutting method in electrolytic roughing treatment for aluminum |
JPS5628893A (en) | 1979-08-16 | 1981-03-23 | Fuji Photo Film Co Ltd | Carrier for lithography plate and manufacture of said carrier |
JP2640564B2 (ja) | 1990-11-13 | 1997-08-13 | 富士写真フイルム株式会社 | 平版印刷版用支持体の製造法 |
JP3342776B2 (ja) * | 1994-08-30 | 2002-11-11 | 富士写真フイルム株式会社 | 平版印刷版用アルミニウム支持体及びその製造方法並びにアルミニウム支持体の粗面化処理方法 |
JP3580462B2 (ja) * | 1996-07-05 | 2004-10-20 | 富士写真フイルム株式会社 | 平版印刷版用アルミニウム支持体の製造方法 |
JPH1165096A (ja) * | 1997-08-14 | 1999-03-05 | Fuji Photo Film Co Ltd | 感光性平版印刷版及びその製造方法 |
JPH11301135A (ja) | 1998-04-17 | 1999-11-02 | Fuji Photo Film Co Ltd | 感光性平版印刷版の製造方法 |
EP1033261A3 (en) * | 1999-03-03 | 2003-03-26 | Fuji Photo Film Co., Ltd. | Planographic printing plate, non-woven cloth roller, and method and apparatus for preliminarily polishing a metal plate for printing plate |
EP1142708B1 (en) * | 2000-04-07 | 2006-12-27 | Fuji Photo Film Co., Ltd. | Planographic printing plate |
ATE387320T1 (de) * | 2001-07-23 | 2008-03-15 | Fujifilm Corp | Vorläufer für eine lithographische druckplatte |
ATE541709T1 (de) * | 2001-10-05 | 2012-02-15 | Fujifilm Corp | Lithographisches druckplattensubstrat und vorsensibilisierte platte und herstellungsverfahren für eine lithographische druckplatte |
-
2001
- 2001-10-26 CN CNB018033156A patent/CN1212238C/zh not_active Expired - Fee Related
- 2001-10-26 WO PCT/JP2001/009441 patent/WO2002034544A1/ja active IP Right Grant
- 2001-10-26 DE DE60127658T patent/DE60127658T2/de not_active Expired - Lifetime
- 2001-10-26 AT AT01976845T patent/ATE358596T1/de not_active IP Right Cessation
- 2001-10-26 EP EP01976845A patent/EP1270258B1/en not_active Expired - Lifetime
- 2001-10-26 US US10/181,733 patent/US6716567B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1394171A (zh) | 2003-01-29 |
US6716567B2 (en) | 2004-04-06 |
DE60127658T2 (de) | 2007-12-20 |
EP1270258A4 (en) | 2005-07-27 |
US20030145748A1 (en) | 2003-08-07 |
EP1270258A1 (en) | 2003-01-02 |
EP1270258B1 (en) | 2007-04-04 |
DE60127658D1 (de) | 2007-05-16 |
WO2002034544A1 (fr) | 2002-05-02 |
ATE358596T1 (de) | 2007-04-15 |
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