CN117941052A - 蒸镀装置 - Google Patents

蒸镀装置 Download PDF

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Publication number
CN117941052A
CN117941052A CN202180102311.7A CN202180102311A CN117941052A CN 117941052 A CN117941052 A CN 117941052A CN 202180102311 A CN202180102311 A CN 202180102311A CN 117941052 A CN117941052 A CN 117941052A
Authority
CN
China
Prior art keywords
substrate
mask
touch panel
vapor deposition
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180102311.7A
Other languages
English (en)
Chinese (zh)
Inventor
牛尾修士
藤原圣士
今田裕士
园田通
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Display Technology Corp
Original Assignee
Sharp Display Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Display Technology Corp filed Critical Sharp Display Technology Corp
Publication of CN117941052A publication Critical patent/CN117941052A/zh
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
CN202180102311.7A 2021-11-10 2021-11-10 蒸镀装置 Pending CN117941052A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/041307 WO2023084634A1 (ja) 2021-11-10 2021-11-10 蒸着装置

Publications (1)

Publication Number Publication Date
CN117941052A true CN117941052A (zh) 2024-04-26

Family

ID=86335247

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180102311.7A Pending CN117941052A (zh) 2021-11-10 2021-11-10 蒸镀装置

Country Status (3)

Country Link
JP (1) JPWO2023084634A1 (ja)
CN (1) CN117941052A (ja)
WO (1) WO2023084634A1 (ja)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4553124B2 (ja) * 2004-12-16 2010-09-29 株式会社日立ハイテクノロジーズ 真空蒸着方法及びｅｌディスプレイ用パネル
US10892415B2 (en) * 2016-03-10 2021-01-12 Hon Hai Precision Industry Co., Ltd. Deposition mask, vapor deposition apparatus, vapor deposition method, and method for manufacturing organic EL display apparatus
CN113614273B (zh) * 2019-03-25 2023-08-01 夏普株式会社 蒸镀装置以及显示装置的制造方法
KR20210081700A (ko) * 2019-12-24 2021-07-02 캐논 톡키 가부시키가이샤 성막장치 및 이를 사용하여 전자 디바이스를 제조하는 방법
JP7113861B2 (ja) * 2020-03-13 2022-08-05 キヤノントッキ株式会社 マスク取付装置、成膜装置、マスク取付方法、成膜方法、電子デバイスの製造方法

Also Published As

Publication number Publication date
JPWO2023084634A1 (ja) 2023-05-19
WO2023084634A1 (ja) 2023-05-19

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