CN112768138B - Preparation method of pattern with narrow channel - Google Patents

Preparation method of pattern with narrow channel Download PDF

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Publication number
CN112768138B
CN112768138B CN202011510456.4A CN202011510456A CN112768138B CN 112768138 B CN112768138 B CN 112768138B CN 202011510456 A CN202011510456 A CN 202011510456A CN 112768138 B CN112768138 B CN 112768138B
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paste
sintering
flash lamp
pattern
functional
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CN112768138A (en
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吴馨洲
朱思猛
潘丽
赵苗芬
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Akm Electronics Technology Suzhou Co ltd
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Akm Electronics Technology Suzhou Co ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00Apparatus or processes specially adapted for manufacturing conductors or cables
    • H01B13/0026Apparatus for manufacturing conducting or semi-conducting layers, e.g. deposition of metal
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B5/00Non-insulated conductors or conductive bodies characterised by their form
    • H01B5/14Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports

Abstract

The invention discloses a preparation method of a pattern with a narrow channel, which comprises the following steps: coating functional slurry on a base material, shading by adopting shading substances according to a designed pattern, carrying out flash lamp sintering, removing the shading substances, and carrying out flash lamp sintering again to obtain the pattern membrane with the narrow channel. According to the preparation method of the narrow-channel pattern, the flash lamp sintering technology is adopted, the slurry is sintered twice, the shading substance is adopted for shading during the first sintering, the shaded edge is contracted during sintering, the narrow channel with the diameter of 20-80 mu m is further obtained, and the influence of flash lamp sintering on a base material is small. By adopting the preparation method, the channel can be quickly and conveniently prepared on the graph.

Description

Preparation method of pattern with narrow channel
Technical Field
The invention belongs to the technical field of printed electronics, and particularly relates to a preparation method of a pattern with a narrow channel.
Background
The silk-screen printing has the characteristics of small equipment investment and simple operation, and has very wide application in the field of printing electronics. However, due to the limitation of the wire diameter, the mesh number and the flowing state of the conductive paste, the cost is greatly increased and is difficult to realize due to the fact that the pattern with the printing channel within 60 μm, such as the requirement of a special screen and the electronic paste with high requirement on the printing performance. And the pattern also has requirements, and not all patterns can adopt a screen printing mode to obtain channels within 60 mu m.
Disclosure of Invention
In view of the above, in order to overcome the defects of the prior art, the present invention provides a method for forming a narrow trench pattern, which can rapidly and conveniently form a narrow trench of 20-80 μm on the pattern.
In order to achieve the purpose, the invention adopts the following technical scheme:
a preparation method of a pattern with narrow channels comprises the following steps: the functional slurry is coated on the substrate, shading substances are adopted to shade according to the designed pattern, flashing lamp sintering is carried out, the shading substances are removed, flashing lamp sintering is carried out again, a pattern diaphragm with a narrow channel is obtained, and the narrow channel is located at the edge corresponding to the shading substances when the shading substances shade.
According to some preferred embodiments of the invention, the energy of the irradiation in the flash lamp sintering is 0.1 to 20J/cm2The flash lamp sintering time is 0.1-10ms, and a xenon lamp is adopted for irradiation in the flash lamp sintering. The parameters of the two flash lamp sintering processes can be consistent or inconsistent.
The xenon flash lamp sintering technology is a pulse light technology, which can convert a large amount of electric energy into light energy in a short time and release the light energy, and sintered particles (such as copper) can convert the light energy into heat energy in a very short time to complete sintering. The damage to the base material with poor heat resistance (such as PET and the like) by using flash lamp sintering is extremely small.
According to some preferred embodiment aspects of the invention, the functional paste is a paste comprising one, two or more of copper, silver, gold, carbon material, tin alloy, quantum dots. Copper, silver, gold, carbon materials, tin alloys, quantum dots and the like are powder particles or flakes dispersed in the slurry, have light absorption property, and can convert light energy into heat energy. When the material is powdery, the average grain diameter is 0.1-0.5 μm; when the material is in a sheet shape, the average grain diameter is 5-10 mu m, so that the material can absorb light better and convert into heat energy during flash lamp sintering, and sintering is completed. The carbon material is graphene, carbon nano tubes and the like, and the tin alloy is tin-bismuth alloy, tin-silver-copper alloy and the like.
According to some preferred embodiments of the present invention, the functional paste includes one of copper paste, silver paste, carbon paste, and gold paste, and the carbon paste is a paste containing graphene and/or carbon nanotubes. The functional slurry is also conductive slurry, and can realize the conductive function.
According to some preferred embodiments of the invention, the functional paste comprises a solvent, and the flash lamp has a pre-baking step for removing the solvent before sintering. After the solvent is removed, the functional slurry forms a functional thin film on the substrate, and the thickness of the functional thin film is 0.1-30 mu m. The substances constituting the film have light absorption properties and can convert light energy into heat energy.
In some embodiments of the present invention, the solvent is preferably ethylene glycol, butyl glycol ether, diethylene glycol ethyl ether acetate, etc., and the corresponding pre-drying parameter is 100 ℃ for 10 min.
According to some preferred embodiments of the invention, the substrate comprises one of PET, PEN, PI, PP, PC, glass, silicon wafer.
According to some preferred embodiments of the present invention, the light shielding material mainly functions to shield light, i.e. to reduce the transmittance of light, to reduce or completely block the light absorbed by the sintered object, and to select a material capable of completely absorbing light or partially absorbing light, and preferably a thinner sheet.
According to some preferred aspects of the invention, the light-shielding substance comprises one of a sheet of stainless steel, paper, polymer film, cloth, glass.
According to some preferred embodiments of the present invention, the edge of the light shielding substance is a straight line, a curved line, a broken line, or an irregular line.
According to some preferred embodiments of the present invention, the coating is to cover the functional paste on the substrate by printing or coating.
According to some preferred embodiments of the invention, the printing comprises one of screen printing, flexography, gravure printing, and transfer printing.
In some embodiments of the present invention, the method for preparing a pattern having a narrow channel specifically includes the steps of:
1) preparing functional slurry, coating the functional slurry on a base material, and pre-drying to obtain a functional film;
2) covering a light shielding substance above the functional film according to a designed pattern;
3) carrying out flash lamp sintering by adopting a xenon lamp;
4) and removing the shading substances, carrying out flash lamp sintering again by adopting a xenon lamp, and completing sintering of the unsintered region to obtain the functional thin film pattern with the narrow channel.
Compared with the prior art, the invention has the beneficial effects that: according to the preparation method of the narrow-channel pattern, the flash lamp sintering technology is adopted, the slurry is sintered twice, the shading substance is adopted for shading during the first sintering, the shaded edge is contracted during sintering, the narrow channel with the diameter of 20-80 mu m is further obtained, and the influence of flash lamp sintering on a base material is small. By adopting the preparation method, the channel can be quickly and conveniently prepared on the graph.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
FIG. 1 is a first schematic diagram of step 3) in a preferred embodiment of the present invention;
FIG. 2 is a second schematic diagram of step 3) in the preferred embodiment of the present invention;
FIG. 3 is a first schematic diagram of step 4) in the preferred embodiment of the present invention;
FIG. 4 is a second schematic diagram of step 4) in the preferred embodiment of the present invention;
FIG. 5 is an enlarged view of a narrow channel prepared in preferred embodiment 1 of the present invention;
in the drawings: a substrate-1, a functional film-2, a shading material-3, a xenon lamp-4 and a channel-5.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the technical solution in the embodiment of the present invention will be clearly and completely described below with reference to the drawings in the embodiment of the present invention, and it is obvious that the described embodiment is only a part of the embodiment of the present invention, and not a whole embodiment. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
As shown in fig. 1 to 5, the method for preparing a pattern having a narrow channel in the present embodiment includes the following steps:
1) preparation of functional slurry
The functional slurry in this embodiment is copper slurry, and the components and the specific preparation process of the copper slurry can refer to patent 201810186271.9, which is named as: disclosed are copper conductive paste suitable for xenon lamp sintering and a preparation method thereof.
2) Forming a functional film
Printing the copper paste prepared in the step 1) on a PET substrate by adopting a screen printing process.
And prebaking to remove the solvent in the copper paste, so that the copper paste forms a copper film on the surface of the PET substrate, wherein the thickness of the copper film in this embodiment is 5 μm. The copper film has light absorption and can convert light energy into heat energy.
3) Flash lamp sintering
The shading material selected in this example was a stainless steel sheet with a length of 10 cm, a width of 1 cm and a thickness of 30 μm. The edge of the stainless steel sheet is a straight line, namely the stainless steel sheet is a rectangle.
As shown in figure 1, according to a designed pattern, a stainless steel sheet is correspondingly placed on a copper film and is attached to the copper film, so that the phenomenon that the gap between the stainless steel sheet and the copper film is too large, light enters the flash lamp during sintering, and the edge of a formed channel is rough is avoided.
As shown in fig. 2, the xenon lamp is used for flash lamp sintering, and the xenon lamp can emit a large amount of light energy in a short time. The energy is controlled to be 1.5J/cm during sintering2The time is 1 ms.
4) Flash lamp sintering again
As shown in fig. 3 and 4, the stainless steel plate was removed, and flash lamp sintering was performed again using a xenon lamp, and the unsintered region was completely sintered to obtain a functional thin film patterned membrane having a narrow channel. The sintering energy and time are kept consistent with those in step 3).
The final narrow channel pattern obtained in this example is shown in fig. 5, where the channel width is 35-40 μm.
Example 2
As shown in fig. 1 to 4, the method for preparing a pattern having a narrow channel in the present embodiment includes the following steps:
1) preparation of functional slurry
The functional slurry in this embodiment is a silver paste, and components and a specific preparation process of the silver paste can refer to patent 201810180178.7, which is named as: a printed conductive silver paste and a preparation method thereof are disclosed.
2) Forming a functional film
Printing the silver paste prepared in the step 1) on the PI substrate by adopting a gravure printing process.
And pre-baking to remove the solvent in the silver paste, so that the silver paste forms a silver film on the surface of the PI substrate, wherein the thickness of the silver film in the embodiment is 10 μm. The silver film has light absorption and can convert light energy into heat energy.
3) Flash lamp sintering
The shading material selected in the embodiment is a PET film, and the size of the PET film is 10 cm in length, 1 cm in width and 50 μm in thickness. The edge of the PET film sheet is curved.
As shown in figure 1, according to the designed graph, the PET film is correspondingly placed on the silver film and is attached to the silver film, so that the phenomenon that the gap between the PET film and the silver film is too large, light enters the flash lamp during sintering, and the formed channel edge is rough is avoided.
As shown in fig. 2, the xenon lamp is used for flash lamp sintering, and the xenon lamp can emit a large amount of light energy in a short time. The energy is controlled to be 5J/cm during sintering2The time is 2 ms.
4) Flash lamp sintering again
As shown in fig. 3 and 4, the PET film was removed, and flash lamp sintering was performed again using a xenon lamp, and the unsintered region was completely sintered to obtain a functional thin film patterned film having a narrow channel. The sintering energy and time are kept consistent with those in step 3).
Example 3
As shown in fig. 1 to 4, the method for preparing a pattern having a narrow channel in the present embodiment includes the following steps:
1) preparation of functional slurry
The functional slurry in this example is carbon slurry.
2) Forming a functional film
And (3) printing the carbon paste prepared in the step 1) on the PEN substrate by adopting a flexible printing process.
And prebaking to remove the solvent in the carbon paste, so that the carbon paste forms a carbon film on the surface of the PEN substrate, wherein the thickness of the carbon film in the embodiment is 15 μm. The carbon film has light absorption and can convert light energy into heat energy.
3) Flash lamp sintering
The light-shielding material selected in this example was glass, and had a length of 10 cm, a width of 1 cm and a thickness of 100 μm. The edge of the glass is a fold line.
As shown in FIG. 1, according to the designed pattern, glass is correspondingly placed on a carbon film, and the glass is attached to the carbon film, so that the phenomenon that the gap between the glass and the carbon film is too large, light enters when a flash lamp is sintered, and the edge of a formed channel is rough is avoided.
As shown in fig. 2, the xenon lamp is used for flash lamp sintering, and the xenon lamp can emit a large amount of light energy in a short time. The energy is controlled to be 10J/cm during sintering2The time is 4 ms.
4) Flash lamp sintering again
As shown in fig. 3 and 4, the glass was removed, and flash lamp sintering was performed again using a xenon lamp, and the unsintered region was completely sintered to obtain a functional thin film patterned membrane having a narrow channel. The sintering energy and time are kept consistent with those in step 3).
Example 4
As shown in fig. 1 to 4, the method for preparing a pattern having a narrow channel in the present embodiment includes the following steps:
1) preparation of functional slurry
The functional paste in this example is gold paste.
2) Forming a functional film
Printing the gold paste prepared in the step 1) on a PP substrate by adopting a flexible printing process.
And pre-baking to remove the solvent in the gold paste, so that the gold paste forms a gold film on the surface of the PP substrate, wherein the thickness of the gold film in the embodiment is 25 μm. The gold film has light absorption and can convert light energy into heat energy.
3) Flash lamp sintering
The shading substance selected in the embodiment is a wood block, and the size is 10 cm in length, 1 cm in width and 500 μm in thickness. The edge of the wood block is an irregular line.
As shown in figure 1, according to the designed pattern, the wood blocks are correspondingly placed on the gold film and are attached to the gold film, so that the phenomenon that the gaps between the wood blocks and the gold film are too large, light enters when the flash lamp is sintered, and the edges of formed channels are rough is avoided.
As shown in fig. 2, the xenon lamp is used for flash lamp sintering, and the xenon lamp can emit a large amount of light energy in a short time. The energy is controlled to be 20J/cm during sintering2The time is 6 ms.
4) Flash lamp sintering again
As shown in fig. 3 and 4, the wood block was removed, and flash lamp sintering was performed again using a xenon lamp, and the unsintered region was completely sintered to obtain a functional thin film patterned membrane having a narrow channel. The sintering energy and time are kept consistent with those in step 3).
The above embodiments are merely illustrative of the technical concept and features of the present invention, and the purpose thereof is to enable those skilled in the art to understand the content of the present invention and implement the invention, and not to limit the scope of the invention, and all equivalent changes or modifications made according to the spirit of the present invention should be covered by the scope of the present invention.

Claims (10)

1. A preparation method of a pattern with narrow channels is characterized by comprising the following steps: coating functional slurry on a base material, shading by adopting shading substances according to a designed pattern, carrying out flash lamp sintering, removing the shading substances, and carrying out flash lamp sintering again to obtain a pattern membrane with a narrow channel, wherein the width of the narrow channel is 20-80 mu m.
2. The method according to claim 1, wherein the energy of irradiation in the flash lamp sintering is 0.1 to 20J/cm2The irradiation time is 0.1-10ms, and a xenon lamp is adopted for irradiation.
3. The method according to claim 1, wherein the functional paste is a paste containing one, two or more of copper, silver, gold, a carbon material, and a tin alloy.
4. The method according to claim 3, wherein the functional paste comprises one of copper paste, silver paste, carbon paste, and gold paste.
5. The method of claim 1, wherein the functional paste comprises a solvent, and the flash lamp has a pre-baking step for removing the solvent before sintering.
6. The method of claim 1, wherein the substrate comprises one of PET, PEN, PI, PP, PC, glass, and silicon wafer.
7. The method of claim 1, wherein the light-shielding material is used to reduce the transmittance of light.
8. The method of claim 7, wherein the light blocking substance comprises one of stainless steel sheet, paper, polymer film, cloth, and glass.
9. The method according to claim 1, wherein the coating is performed by printing or coating the functional paste on the substrate.
10. The method of claim 9, wherein the printing comprises one of screen printing, flexography, gravure, and transfer printing.
CN202011510456.4A 2020-12-18 2020-12-18 Preparation method of pattern with narrow channel Active CN112768138B (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101157023A (en) * 2007-10-25 2008-04-09 北京师范大学 A multi-channeling titania photocatalysis membrana and method for making same
CN103108492A (en) * 2013-01-17 2013-05-15 中国科学院苏州纳米技术与纳米仿生研究所 Manufacturing method and manufacturing device of flexible printed circuit
CN105448715A (en) * 2014-06-19 2016-03-30 中芯国际集成电路制造(上海)有限公司 Semiconductor device manufacturing method
TW201624501A (en) * 2014-06-25 2016-07-01 柯尼卡美能達股份有限公司 Conductive pattern, conductive patterned substrate, method of manufacturing conductive patterned substrate, structure having conductive pattern on surface and manufacturing method of the same
CN107001030A (en) * 2014-11-19 2017-08-01 荷兰应用自然科学研究组织Tno System and method for manufacturing micro-pillar array

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101157023A (en) * 2007-10-25 2008-04-09 北京师范大学 A multi-channeling titania photocatalysis membrana and method for making same
CN103108492A (en) * 2013-01-17 2013-05-15 中国科学院苏州纳米技术与纳米仿生研究所 Manufacturing method and manufacturing device of flexible printed circuit
CN105448715A (en) * 2014-06-19 2016-03-30 中芯国际集成电路制造(上海)有限公司 Semiconductor device manufacturing method
TW201624501A (en) * 2014-06-25 2016-07-01 柯尼卡美能達股份有限公司 Conductive pattern, conductive patterned substrate, method of manufacturing conductive patterned substrate, structure having conductive pattern on surface and manufacturing method of the same
CN107001030A (en) * 2014-11-19 2017-08-01 荷兰应用自然科学研究组织Tno System and method for manufacturing micro-pillar array

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