CN107734868A - 精细导线线路及其制备方法 - Google Patents

精细导线线路及其制备方法 Download PDF

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CN107734868A
CN107734868A CN201711091379.1A CN201711091379A CN107734868A CN 107734868 A CN107734868 A CN 107734868A CN 201711091379 A CN201711091379 A CN 201711091379A CN 107734868 A CN107734868 A CN 107734868A
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郑莉
王翀
梁坤
程骄
肖定军
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Guangdong Guanghua Science And Technology Co Ltd
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Abstract

本发明涉及一种精细导线线路及其制备方法,制备方法包括如下步骤:(1)配置浆料,所述浆料包含金属离子和还原剂;(2)将所述浆料平铺于基底表面;(3)利用激光照射浆料,将金属离子还原为金属单质形成线路;(4)清洗未反应的浆料,即得所述精细导线线路。上述精细导线线路的制备方法(直写技术)是利用激光在基材和浆料表面的光作用或者热作用使得基材和浆料之间发生化学或光化学反应,形成电路或导电图形的方法。直写技术由于其精度极高,不需要掩模,适用于任何基材。

Description

精细导线线路及其制备方法
技术领域
本发明涉及电子元件制造领域,特别是涉及一种精细导线线路及其制备方法。
背景技术
随着网络的普及和电子通讯的快速发展,要求电子终端产品不断提高其产品性能的同时也要求其小型化,高密度互联技术(HDI)应运而生。HDI技术是指在绝缘基板上或者传统的印制电路板上涂覆绝缘介质,经过化学镀和电镀形成线路和连通孔,最后通过多次叠加形成的多层印制电路板。传统的制作HDI的方法主要有减成法和加成法两种。其中减成法又称为铜刻蚀法,是在覆铜板上有选择性的去除铜箔来获得导电图形的方法;加成法是在绝缘基材表面有选择性的沉积金属形成导电图形的方法。但不管是使用减成法还是加成法,都要重复使用曝光、显影、蚀刻等工序以获得导电图形。这些工序不仅流程长,而且会形成大量的废水污染环境,耗费大量的资源,基于这种现状,故提出激光直写技术制作金属线路的方法。
目前HDI板或封装基板的减成、半加成、全加成方法,流程长,曝光、显影、蚀刻耗时、耗物料的缺陷。
因此,现有技术有待改进。
发明内容
基于此,本发明的目的是提供一种精细导线线路的制备方法。
具体的技术方案如下:
一种精细导线线路的制备方法,包括如下步骤:
(1)配置浆料,所述浆料包含金属离子和还原剂;
(2)将所述浆料平铺于基底表面;
(3)利用激光照射浆料,将金属离子还原为金属单质形成线路;
(4)清洗未反应的浆料,即得所述精细导线线路。
在其中一些实施例中,所述浆料包括溶剂及如下组分:
在其中一些实施例中,所述金属离子选自Ivb、Vb、VIb、VIIb、VIII、Ib、IIb、IIIa、IVa、Va族的金属元素离子。
在其中一些实施例中,所述金属离子选自Ti、Cr、Mn、Fe、Co、Ni、Cu、Zn、Sn、Ag、Pd或Pt。
在其中一些实施例中,所述还原剂选自乙醛酸、草酸、甲醛、醋酸、水合肼、糖类或多糖类。
在其中一些实施例中,所述粘度调节剂选自甲基纤维素、羟丙基甲基纤维素、羟甲基纤维素钠、羟乙基纤维素、淀粉、明胶、琼脂、石蜡、微晶蜡硫酸羟胺或环乙醇;所述抗氧化剂选自:抗坏血酸、生育酚、叔丁基对苯二酚或茶多酚;所述溶剂选自水、甲醇、乙醇、丙醇、正丁醇、异丁醇、丙酮、丁酮、苯、四氯化碳、二氯甲烷、***、甲酸甲酯、乙酸甲酯、乙腈、吡啶、苯酚、二甲基亚砜或四氢呋喃。
在其中一些实施例中,所述激光的光斑直径为500nm-50μm,激光波长范围193nm-1650nm。
在其中一些实施例中,所述基底的材质选自玻璃基底材料、聚酰亚胺基底材料、环氧树脂基底材料、丙烯腈-丁二烯-苯乙烯基底材料、FR-4基底材料或氧化铝陶瓷基板。
在其中一些实施例中,所述制备方法还包括如下步骤:
(5)采用化学或电镀的方法加厚所述线路。
本发明的另一目的是提供一种精细导线线路。
上述制备方法制备得到的精细导线线路。
本发明的原理及优点如下:
激光是基于受激发射放大原理而产生的,具有能量极高、稳定性强、寿命长、光斑直径小、定向发光及波长可调等优点,近年来广泛应用于医疗、工业生产、通信及航空航天等方面。上述精细导线线路的制备方法(直写技术)是利用激光在基材和浆料表面的光作用或者热作用使得基材和浆料之间发生化学或光化学反应,形成电路或导电图形的方法。直写技术由于其精度极高,不需要掩模,适用于任何基材。由于印制电路板线宽线距越来越小,传统的掩模方法对于制造精细线路也越来越困难,而激光光斑的直径仅为500nm至50μm,因此相对于传统的方法而言,直写技术形成导电图形具有不可比拟的优势。随着数控技术的发展,微米级对位操作技术日益完善,使激光直写技术将成为日后导电图形的主导技术成为可能。
近年激光直写技术应用在许多方面,如使用激光直写技术制备多级结构的微阵列,但是其主要还是使用光刻胶、曝光、显影等,激光直写技术只是作为曝光的光源,利用其光斑小的特点克服了掩模版精度低的缺陷。还有利用激光直写技术制作超高分辨率并可重复使用的掩模版,是使用激光能量高的特点将热刻蚀剥膜材料刻蚀,然后利用光斑小以及薄膜材料的可逆饱和非线性吸收特点将制作超高分辨率掩模版。而本发明精细导线线路的制备方法是将金属的沉积和线路的形成统一为一个过程,简化了工序,提高了生产效率
上述精细导线线路的制备方法使用激光直写技术形成线路,由于激光光斑的直径为数十微米甚至达到纳米级别,对于日益缩小的线宽线距而言有着不可比拟的优势。同时相较于传统的减成法或加成法工艺而言,避免了重复使用曝光、显影、蚀刻等图形转移技术而产生的大量废水及造成的环境污染和资源浪费。并且不管是加成法还是减成法,其工序都冗长复杂,需要大量人力物力资源,而激光直写技术可以大大提高生产效率。除此之外,由于激光直写技术对于基材没有限制,对于制作挠性印制电路板而言也有巨大的优势。
具体实施方式
为了便于理解本发明,下面将对本发明进行更全面的描述。但是,本发明可以以许多不同的形式来实现,并不限于本文所描述的实施例。相反地,提供这些实施例的目的是使对本发明的公开内容的理解更加透彻全面。
除非另有定义,本文所使用的所有的技术和科学术语与属于本发明的技术领域的技术人员通常理解的含义相同。本文中在本发明的说明书中所使用的术语只是为了描述具体的实施例的目的,不是旨在于限制本发明。本文所使用的术语“和/或”包括一个或多个相关的所列项目的任意的和所有的组合。
一种精细导电线路的制备方法,包括如下步骤:
步骤一:配置浆料,所述浆料包括金属离子和还原剂;可以理解的还可以包括粘度调节剂、抗氧化剂及溶剂;
步骤二:对要涂抹浆料的基板材料进行表面处理以增强基板材料和金属导线之间的结合力(为可选步骤);
步骤三:将激光对浆料进行照射,使还原剂与金属离子间发生反应以形成精细线路;
步骤四:对未反应的浆料进行清洗去除;
步骤五:将形成的精细线路进行电镀或者化学镀加厚,形成最终的线路图形(为可选步骤)。
步骤一中所述浆料主要包含金属离子化合物、还原剂以及辅料如粘度调节剂、抗氧化剂及溶剂组成。
所述金属离子包含如下组分:Ivb、Vb、VIb、VIIb、VIII、Ib、IIb、IIIa、IVa、Va族的金属元素离子,优选地选自Ti、Cr、Mn、Fe、Co、Ni、Cu、Zn、Sn、Ag、Pd、Pt。
所述还原物质包含如下组分:为受激光照射能够发生分解并还原上述金属离子,特别指的是乙醛酸、草酸、甲醛、醋酸、水合肼、糖类和多糖类。
所述粘度调节剂为如下但不仅限于以下材料:甲基纤维素、羟丙基甲基纤维素、羟甲基纤维素钠、羟乙基纤维素、淀粉、明胶、琼脂、石蜡、微晶蜡硫酸羟胺、环乙醇等。
所述抗氧化剂为如下但不仅限于以下材料:抗坏血酸、生育酚、叔丁基对苯二酚,茶多酚等;
所述溶剂为如下但不仅限于如下材料:水、甲醇、乙醇、丙醇、正丁醇、异丁醇、丙酮、丁酮、苯、四氯化碳、二氯甲烷、***、甲酸甲酯、乙酸甲酯、乙腈、吡啶、苯酚、二甲基亚砜、四氢呋喃等;
步骤二中所述的基板材料但不仅限于如下材料:玻璃基底材料、聚酰亚胺基底材料、环氧树脂基底材料、丙烯腈-丁二烯-苯乙烯(ABS)基底材料、FR-4基底材料、氧化铝陶瓷基板等。
作为优选方式,所述步骤二进一步为:
(1)使用清水清洗基材表面并对基底材料进行除油。除油的方式有酸性除油、碱性除油及电解除油,应根据不同的基材选择不同的除油方式;
(2)使用有机溶剂对基材表面进行膨胀润湿(非必需作为优选方式);
(3)使用氧化剂对基材表面进行微蚀或在微蚀的同时加热并超声或者使用等离子体进行表面粗化(非必需作为优选方式);
(4)使用清水对基材表面清洗并烘干。
步骤三所述内容其化学原理为:使用激光对浆料进行照射是使激光使浆料中的还原剂成分受热分解为活性还原剂或发生光化学反应形成活性还原剂,活性还原剂与金属离子发生反应生成金属单质从而形成线路。
所述步骤五进一步为:使用电镀或者化学镀的方法将激光直写形成的线路加厚增加线路的可靠性。作为优选方式,使用的加厚方式为硫酸盐镀铜,主要成分为五水硫酸铜、硫酸及其他的添加剂(如聚二硫二丙烷磺酸钠、聚乙二醇、有机铵盐等)。
实施例1
使用一水合醋酸铜和醋酸混合浆料制作精细导线线路,具体步骤如下:
(1)使用一水合醋酸铜、醋酸混合及加入甲基纤维素水溶液形成浆料(粘度为10.2Pa·s):一水合醋酸铜620g/L,醋酸130g/L,羟甲基纤维素8g/L,抗氧化剂(抗坏血酸)10g/L;
(2)使用氢氧化钠处理玻璃基材表面并进行超声加热处理30min;
(3)将浆料均匀涂抹在玻璃基底上(浆料厚度约为100μm),并且用激光照射形成线路(激光的光斑直径为500nm-50μm,激光波长范围193nm-1650nm);
(4)将玻璃基板烘干,将多余的浆料清洗掉;
(5)使用胶带粘住线路部分后撕掉,未发现掉粉。
实施例2
使用乙酰丙酮钛和乙醇制作精细导线线路,形成钛为挠性基底材料的线路,具体步骤如下:
(1)使用乙酰丙酮钛和乙醇及异丙醇和水混合形成浆料(粘度为9.52Pa·s):乙酰丙酮钛260g/L,还原剂乙醇及异丙醇分别为50和60g/L,粘度调节剂(羟甲基纤维素)10g/L,抗氧化剂(抗坏血酸)15g/L;
(2)使用等离子体处理PI挠性基底材料,并且用清水冲洗;
(3)将浆料均匀涂抹在PI基底上(浆料厚度为约为100μm),用激光照射形成线路;
(4)去除基底上多余浆料。
实施例3
使用草酸亚铁和乙腈在环氧树脂上制作精细导线线路,具体步骤如下:
(1)使用草酸亚铁、乙腈及水作为浆料(粘度为6.6Pa·s):草酸亚铁150g/L(草酸根作为还原剂),粘度调节剂(明胶)15g/L,抗氧化剂(茶多酚)12g/L;
(2)使用铬酸和硫酸对环氧树脂基板进行表面粗化,然后用清水清洗烘干;
(3)将浆料均匀涂抹在环氧树脂基底上(浆料厚度约为100μm),用激光照射形成线路(激光的光斑直径为500nm-50μm,激光波长范围193nm-1650nm);
(4)去除基底上多余的浆料后烘干;
(5)使用化学镀镍把制作完成的线路进行加厚。
实施例4
使用乙酸钴和乙酸在ABS基底上制作精细导线线路,具体步骤如下:
(1)使用乙酸钴和乙酸及水制作浆料(粘度为8Pa·s):乙酸钴350g/L,乙酸130g/L,粘度调节剂(琼脂)3g/L,抗氧化剂(叔丁基对苯二酚)16g/L;
(2)使用铬酸和硫酸对环氧树脂基板进行表面粗化,然后用清水清洗后烘干;
(3)将浆料均匀涂抹在环氧树脂基底上(浆料厚度约为100μm),用激光照射形成线路(激光的光斑直径为500nm-50μm,激光波长范围193nm-1650nm);
(4)去除基底上多余的浆料后烘干,制作完成后形成线路。
实施例5
使用一水合醋酸铜及醋酸在环氧树脂基底上面制作精细导线线路,具体步骤如下:
(1)使用一水合醋酸铜及醋酸加入水和甲基纤维素形成浆料(粘度为9.84Pa·s):一水合醋酸铜400g/L,醋酸100g/L,粘度调节剂(羟乙基纤维素)15g/L,抗氧化剂(抗坏血酸)10g/L。
(2)使用铬酸和硫酸对环氧树脂基板进行表面粗化,用水清洗后烘干;
(3)将浆料均匀涂抹在环氧树脂基底上(浆料厚度为约为100μm),用激光照射形成线路(激光的光斑直径为500nm-50μm,激光波长范围193nm-1650nm);
(4)去除基底上多余的浆料后烘干,制作完成后形成线路。
按照胶带试验法使用3M胶带粘激光形成的精细线路并拉扯,并无掉粉现象及线路脱落现象出现。说明上述方法制备的精细导线线路与基底结合力好。并且该线路导电性良好、催化能力强,能够进行电镀或者化学镀加厚。
以上所述实施例的各技术特征可以进行任意的组合,为使描述简洁,未对上述实施例中的各个技术特征所有可能的组合都进行描述,然而,只要这些技术特征的组合不存在矛盾,都应当认为是本说明书记载的范围。
以上所述实施例仅表达了本发明的几种实施方式,其描述较为具体和详细,但并不能因此而理解为对发明专利范围的限制。应当指出的是,对于本领域的普通技术人员来说,在不脱离本发明构思的前提下,还可以做出若干变形和改进,这些都属于本发明的保护范围。因此,本发明专利的保护范围应以所附权利要求为准。

Claims (10)

1.一种精细导线线路的制备方法,其特征在于,包括如下步骤:
(1)配置浆料,所述浆料包含金属离子和还原剂;
(2)将所述浆料平铺于基底表面;
(3)利用激光照射浆料,将金属离子还原为金属单质形成线路;
(4)清洗未反应的浆料,即得所述精细导线线路。
2.根据权利要求1所述的制备方法,其特征在于,所述浆料包括溶剂及如下组分:
3.根据权利要求2所述的制备方法,其特征在于,所述金属离子选自Ivb、Vb、VIb、VIIb、VIII、Ib、IIb、IIIa、IVa、Va族的金属元素离子。
4.根据权利要求3所述的制备方法,其特征在于,所述金属离子选自Ti、Cr、Mn、Fe、Co、Ni、Cu、Zn、Sn、Ag、Pd或Pt。
5.根据权利要求2所述的制备方法,其特征在于,所述还原剂选自乙醛酸、草酸、甲醛、醋酸、水合肼、糖类或多糖类。
6.根据权利要求2所述的制备方法,其特征在于,所述粘度调节剂选自甲基纤维素、羟丙基甲基纤维素、羟甲基纤维素钠、羟乙基纤维素、淀粉、明胶、琼脂、石蜡、微晶蜡硫酸羟胺或环乙醇;所述抗氧化剂选自:抗坏血酸、维生素C、生育酚、叔丁基对苯二酚或茶多酚;所述溶剂选自水、甲醇、乙醇、丙醇、正丁醇、异丁醇、丙酮、丁酮、苯、四氯化碳、二氯甲烷、***、甲酸甲酯、乙酸甲酯、乙腈、吡啶、苯酚、二甲基亚砜或四氢呋喃。
7.根据权利要求1-6任一项所述的制备方法,其特征在于,所述激光的光斑直径为500nm-50μm,激光波长范围193nm-1650nm。
8.根据权利要求1-6任一项所述的制备方法,其特征在于,所述基底的材质选自玻璃基底材料、聚酰亚胺基底材料、环氧树脂基底材料、丙烯腈-丁二烯-苯乙烯基底材料、FR-4基底材料或氧化铝陶瓷基板。
9.根据权利要求1-6任一项所述的制备方法,其特征在于,还包括如下步骤:
(5)采用化学或电镀的方法加厚所述线路。
10.权利要求1-9任一项所述制备方法制备得到的精细导线线路。
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