CN107331645A - 切割/芯片接合薄膜、切割/芯片接合带及半导体装置的制造方法 - Google Patents
切割/芯片接合薄膜、切割/芯片接合带及半导体装置的制造方法 Download PDFInfo
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- CN107331645A CN107331645A CN201710265569.4A CN201710265569A CN107331645A CN 107331645 A CN107331645 A CN 107331645A CN 201710265569 A CN201710265569 A CN 201710265569A CN 107331645 A CN107331645 A CN 107331645A
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- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68354—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to support diced chips prior to mounting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Adhesive Tapes (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016086297A JP6721398B2 (ja) | 2016-04-22 | 2016-04-22 | ダイシングダイボンディングフィルム、ダイシングダイボンディングテープおよび半導体装置の製造方法 |
| JP2016-086297 | 2016-04-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107331645A true CN107331645A (zh) | 2017-11-07 |
Family
ID=60155613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710265569.4A Pending CN107331645A (zh) | 2016-04-22 | 2017-04-21 | 切割/芯片接合薄膜、切割/芯片接合带及半导体装置的制造方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP6721398B2 (ja) |
| KR (1) | KR102342479B1 (ja) |
| CN (1) | CN107331645A (ja) |
| TW (1) | TWI734774B (ja) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6623594B1 (en) * | 1998-07-22 | 2003-09-23 | Nitto Denko Corporation | Hot-melt sheet for holding and protecting semiconductor wafers and method for applying the same |
| CN101772831A (zh) * | 2007-07-19 | 2010-07-07 | 积水化学工业株式会社 | 切割和芯片接合用带以及半导体芯片的制造方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4477346B2 (ja) | 2003-12-05 | 2010-06-09 | 古河電気工業株式会社 | 半導体ダイシング用粘接着テープ |
| JP4993662B2 (ja) * | 2005-05-12 | 2012-08-08 | 日東電工株式会社 | ダイシング用粘着シート、及びそれを用いたダイシング方法 |
| JP2007027474A (ja) * | 2005-07-19 | 2007-02-01 | Denki Kagaku Kogyo Kk | ウエハフルカット用ダイシングテープの基材フィルム及びそれを有するウエハフルカット用ダイシングテープ |
| JP2007031535A (ja) * | 2005-07-26 | 2007-02-08 | Denki Kagaku Kogyo Kk | 粘着シートおよびそれを用いた電子部品の製造方法。 |
| JP5140910B2 (ja) | 2005-08-30 | 2013-02-13 | 住友ベークライト株式会社 | フィルム基材および半導体ウエハ加工用粘着テープ |
| JP4717051B2 (ja) * | 2007-11-08 | 2011-07-06 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
| JP4801127B2 (ja) * | 2008-09-01 | 2011-10-26 | 日東電工株式会社 | ダイシング・ダイボンドフィルムの製造方法 |
| CN102421865B (zh) * | 2009-05-12 | 2013-11-13 | 电气化学工业株式会社 | 粘合剂、粘合片及电子元件的制造方法 |
| KR101083959B1 (ko) * | 2010-02-01 | 2011-11-16 | 닛토덴코 가부시키가이샤 | 반도체 장치 제조용 필름 및 반도체 장치의 제조 방법 |
| JP4976532B2 (ja) * | 2010-09-06 | 2012-07-18 | 日東電工株式会社 | 半導体装置用フィルム |
| JP2012209363A (ja) | 2011-03-29 | 2012-10-25 | Sumitomo Bakelite Co Ltd | ダイシングフィルム |
| CN103013365A (zh) * | 2011-09-23 | 2013-04-03 | 古河电气工业株式会社 | 晶片加工用带 |
| WO2013069784A1 (ja) * | 2011-11-10 | 2013-05-16 | カモ井加工紙株式会社 | 粘着テープ及びマスカー |
| JP6542504B2 (ja) * | 2013-02-20 | 2019-07-10 | 日東電工株式会社 | フィルム状接着剤、フィルム状接着剤付きダイシングテープ、半導体装置の製造方法、及び半導体装置 |
| WO2016052444A1 (ja) * | 2014-09-29 | 2016-04-07 | リンテック株式会社 | 半導体ウエハ加工用シート用基材、半導体ウエハ加工用シート、および半導体装置の製造方法 |
| WO2017098736A1 (ja) * | 2015-12-08 | 2017-06-15 | リンテック株式会社 | ダイシングシートおよびダイシングシートの製造方法 |
-
2016
- 2016-04-22 JP JP2016086297A patent/JP6721398B2/ja active Active
-
2017
- 2017-04-17 KR KR1020170049073A patent/KR102342479B1/ko active IP Right Grant
- 2017-04-20 TW TW106113234A patent/TWI734774B/zh active
- 2017-04-21 CN CN201710265569.4A patent/CN107331645A/zh active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6623594B1 (en) * | 1998-07-22 | 2003-09-23 | Nitto Denko Corporation | Hot-melt sheet for holding and protecting semiconductor wafers and method for applying the same |
| CN101772831A (zh) * | 2007-07-19 | 2010-07-07 | 积水化学工业株式会社 | 切割和芯片接合用带以及半导体芯片的制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201805385A (zh) | 2018-02-16 |
| TWI734774B (zh) | 2021-08-01 |
| JP6721398B2 (ja) | 2020-07-15 |
| JP2017195336A (ja) | 2017-10-26 |
| KR20170121065A (ko) | 2017-11-01 |
| KR102342479B1 (ko) | 2021-12-24 |
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